JPS6240829U - - Google Patents
Info
- Publication number
- JPS6240829U JPS6240829U JP13089185U JP13089185U JPS6240829U JP S6240829 U JPS6240829 U JP S6240829U JP 13089185 U JP13089185 U JP 13089185U JP 13089185 U JP13089185 U JP 13089185U JP S6240829 U JPS6240829 U JP S6240829U
- Authority
- JP
- Japan
- Prior art keywords
- electrode
- sample
- intermediate electrode
- high frequency
- frequency power
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 230000005284 excitation Effects 0.000 claims description 2
- 239000007789 gas Substances 0.000 claims 1
- 239000012495 reaction gas Substances 0.000 claims 1
Landscapes
- ing And Chemical Polishing (AREA)
- Drying Of Semiconductors (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1985130891U JPH051072Y2 (US08063081-20111122-C00044.png) | 1985-08-29 | 1985-08-29 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1985130891U JPH051072Y2 (US08063081-20111122-C00044.png) | 1985-08-29 | 1985-08-29 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6240829U true JPS6240829U (US08063081-20111122-C00044.png) | 1987-03-11 |
| JPH051072Y2 JPH051072Y2 (US08063081-20111122-C00044.png) | 1993-01-12 |
Family
ID=31028826
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1985130891U Expired - Lifetime JPH051072Y2 (US08063081-20111122-C00044.png) | 1985-08-29 | 1985-08-29 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH051072Y2 (US08063081-20111122-C00044.png) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS62130513A (ja) * | 1985-12-02 | 1987-06-12 | Hitachi Ltd | 薄膜形成方法とその製造装置 |
| JPH01214123A (ja) * | 1988-02-23 | 1989-08-28 | Tel Sagami Ltd | プラズマ処理方法 |
| JPH01287285A (ja) * | 1988-05-13 | 1989-11-17 | Matsushita Electric Ind Co Ltd | ドライエッチング装置 |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS58124223A (ja) * | 1982-01-20 | 1983-07-23 | Hitachi Ltd | プラズマ処理装置 |
| JPS5943880A (ja) * | 1982-09-03 | 1984-03-12 | Matsushita Electric Ind Co Ltd | ドライエツチング装置 |
-
1985
- 1985-08-29 JP JP1985130891U patent/JPH051072Y2/ja not_active Expired - Lifetime
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS58124223A (ja) * | 1982-01-20 | 1983-07-23 | Hitachi Ltd | プラズマ処理装置 |
| JPS5943880A (ja) * | 1982-09-03 | 1984-03-12 | Matsushita Electric Ind Co Ltd | ドライエツチング装置 |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS62130513A (ja) * | 1985-12-02 | 1987-06-12 | Hitachi Ltd | 薄膜形成方法とその製造装置 |
| JPH01214123A (ja) * | 1988-02-23 | 1989-08-28 | Tel Sagami Ltd | プラズマ処理方法 |
| JPH01287285A (ja) * | 1988-05-13 | 1989-11-17 | Matsushita Electric Ind Co Ltd | ドライエッチング装置 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH051072Y2 (US08063081-20111122-C00044.png) | 1993-01-12 |
