JPS6240723B2 - - Google Patents

Info

Publication number
JPS6240723B2
JPS6240723B2 JP53040326A JP4032678A JPS6240723B2 JP S6240723 B2 JPS6240723 B2 JP S6240723B2 JP 53040326 A JP53040326 A JP 53040326A JP 4032678 A JP4032678 A JP 4032678A JP S6240723 B2 JPS6240723 B2 JP S6240723B2
Authority
JP
Japan
Prior art keywords
pattern
controlled
wafer
rotation position
setting method
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP53040326A
Other languages
English (en)
Japanese (ja)
Other versions
JPS54133076A (en
Inventor
Yukio Kenbo
Tomohiro Kuji
Hiroshi Makihira
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP4032678A priority Critical patent/JPS54133076A/ja
Publication of JPS54133076A publication Critical patent/JPS54133076A/ja
Publication of JPS6240723B2 publication Critical patent/JPS6240723B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Control Of Position Or Direction (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP4032678A 1978-04-07 1978-04-07 Set system for pattern rotation location Granted JPS54133076A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP4032678A JPS54133076A (en) 1978-04-07 1978-04-07 Set system for pattern rotation location

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4032678A JPS54133076A (en) 1978-04-07 1978-04-07 Set system for pattern rotation location

Publications (2)

Publication Number Publication Date
JPS54133076A JPS54133076A (en) 1979-10-16
JPS6240723B2 true JPS6240723B2 (enExample) 1987-08-29

Family

ID=12577475

Family Applications (1)

Application Number Title Priority Date Filing Date
JP4032678A Granted JPS54133076A (en) 1978-04-07 1978-04-07 Set system for pattern rotation location

Country Status (1)

Country Link
JP (1) JPS54133076A (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05307919A (ja) * 1990-12-21 1993-11-19 Nippon Tungsten Co Ltd 電気接点

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5666234A (en) * 1979-11-02 1981-06-04 Canon Kk Measuring apparatus
JPS587822A (ja) * 1981-07-06 1983-01-17 Toshiba Corp 回転位置合せ装置
DE4113524A1 (de) * 1991-04-25 1992-10-29 Abb Patent Gmbh Verfahren zur behandlung von oberflaechen

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05307919A (ja) * 1990-12-21 1993-11-19 Nippon Tungsten Co Ltd 電気接点

Also Published As

Publication number Publication date
JPS54133076A (en) 1979-10-16

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