JPS6233016Y2 - - Google Patents

Info

Publication number
JPS6233016Y2
JPS6233016Y2 JP1982030612U JP3061282U JPS6233016Y2 JP S6233016 Y2 JPS6233016 Y2 JP S6233016Y2 JP 1982030612 U JP1982030612 U JP 1982030612U JP 3061282 U JP3061282 U JP 3061282U JP S6233016 Y2 JPS6233016 Y2 JP S6233016Y2
Authority
JP
Japan
Prior art keywords
etching
liquid
solution
tank
seal block
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP1982030612U
Other languages
English (en)
Japanese (ja)
Other versions
JPS58135465U (ja
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP3061282U priority Critical patent/JPS58135465U/ja
Publication of JPS58135465U publication Critical patent/JPS58135465U/ja
Application granted granted Critical
Publication of JPS6233016Y2 publication Critical patent/JPS6233016Y2/ja
Granted legal-status Critical Current

Links

Landscapes

  • ing And Chemical Polishing (AREA)
JP3061282U 1982-03-03 1982-03-03 表面処理装置 Granted JPS58135465U (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP3061282U JPS58135465U (ja) 1982-03-03 1982-03-03 表面処理装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3061282U JPS58135465U (ja) 1982-03-03 1982-03-03 表面処理装置

Publications (2)

Publication Number Publication Date
JPS58135465U JPS58135465U (ja) 1983-09-12
JPS6233016Y2 true JPS6233016Y2 (enExample) 1987-08-24

Family

ID=30042318

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3061282U Granted JPS58135465U (ja) 1982-03-03 1982-03-03 表面処理装置

Country Status (1)

Country Link
JP (1) JPS58135465U (enExample)

Also Published As

Publication number Publication date
JPS58135465U (ja) 1983-09-12

Similar Documents

Publication Publication Date Title
US5071488A (en) Method for subjecting an object to a liquid treatment
JPH04154122A (ja) 基板処理装置及び同方法
JPH10223585A5 (enExample)
JPS60189936A (ja) 半導体製造装置
KR20100098423A (ko) 얇은 기판을 이동시키기 위한 롤러 그룹 및 이를 이용하여 화학적 처리를 수행하는 방법
JPH04114777A (ja) 電子部品の乾燥方法
US4251317A (en) Method of preventing etch masking during wafer etching
JPS6233016Y2 (enExample)
JPH01304733A (ja) 半導体ウエハの洗浄装置
JP3916003B2 (ja) 引き上げ式乾燥方法及び乾燥装置
JP2006196783A (ja) 基板表面処理装置
JPS6333403B2 (enExample)
JPWO1997048129A1 (ja) 引き上げ式乾燥方法及び乾燥装置
JP2677275B2 (ja) 冷却媒体
JPS6367735A (ja) 基体収容装置及び基体乾燥方法
JP2888822B1 (ja) 洗浄物の洗浄乾燥方法及びその装置
JPS58123730A (ja) 半導体ウエハ−エツチング装置
CN214716773U (zh) 一种加热均匀的低温恒温反应浴
JP2003273054A (ja) 液晶表示装置の製造方法
JPH0322427A (ja) 半導体基板乾燥方法
JPS55138714A (en) Manufacture of liquid crystal cell
JPH02142129A (ja) ウエハの前処理方法
CN211867583U (zh) 多个方片式衬底用工艺夹具
JP2531239Y2 (ja) 温純水引上げ方式乾燥装置における昇降治具
JPS60234975A (ja) 板状物の浸漬処理方法