JPS6232614B2 - - Google Patents

Info

Publication number
JPS6232614B2
JPS6232614B2 JP16377579A JP16377579A JPS6232614B2 JP S6232614 B2 JPS6232614 B2 JP S6232614B2 JP 16377579 A JP16377579 A JP 16377579A JP 16377579 A JP16377579 A JP 16377579A JP S6232614 B2 JPS6232614 B2 JP S6232614B2
Authority
JP
Japan
Prior art keywords
compressed gas
wafer
mixed gas
container
coating
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP16377579A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5685825A (en
Inventor
Minoru Okamura
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Electric Co Ltd filed Critical Nippon Electric Co Ltd
Priority to JP16377579A priority Critical patent/JPS5685825A/ja
Publication of JPS5685825A publication Critical patent/JPS5685825A/ja
Publication of JPS6232614B2 publication Critical patent/JPS6232614B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16—Coating processes; Apparatus therefor
    • G03F7/162—Coating on a rotating support, e.g. using a whirler or a spinner

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Coating Apparatus (AREA)
JP16377579A 1979-12-17 1979-12-17 Thin film coating device of semiconductor wafer Granted JPS5685825A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP16377579A JPS5685825A (en) 1979-12-17 1979-12-17 Thin film coating device of semiconductor wafer

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP16377579A JPS5685825A (en) 1979-12-17 1979-12-17 Thin film coating device of semiconductor wafer

Publications (2)

Publication Number Publication Date
JPS5685825A JPS5685825A (en) 1981-07-13
JPS6232614B2 true JPS6232614B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1987-07-15

Family

ID=15780474

Family Applications (1)

Application Number Title Priority Date Filing Date
JP16377579A Granted JPS5685825A (en) 1979-12-17 1979-12-17 Thin film coating device of semiconductor wafer

Country Status (1)

Country Link
JP (1) JPS5685825A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02111911U (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) * 1989-02-20 1990-09-07

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5988824A (ja) * 1982-11-12 1984-05-22 Hitachi Tokyo Electronics Co Ltd ウエハ処理装置
JPS59228719A (ja) * 1983-06-10 1984-12-22 Hitachi Tokyo Electronics Co Ltd 電子部品の製造方法および製造装置
JPS6122627A (ja) * 1984-07-10 1986-01-31 Mitsubishi Electric Corp 感光性樹脂塗布装置
JPS62131264A (ja) * 1985-12-03 1987-06-13 Nec Corp シランカツプリング剤処理装置
JPS62148943A (ja) * 1985-12-23 1987-07-02 Nec Corp シランカツプリング剤処理方法
JPH0793254B2 (ja) * 1987-07-22 1995-10-09 松下電子工業株式会社 レジスト膜形成用基板の処理方法

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02111911U (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) * 1989-02-20 1990-09-07

Also Published As

Publication number Publication date
JPS5685825A (en) 1981-07-13

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