JPS62297800A - Multilayer-film reflecting mirror for x-ray - Google Patents

Abstract

(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.

Description

Detailed Description of the Invention 3. Detailed Description of the Invention [Field of Industrial Application] The present invention relates to soft X-ray optics such as X-ray phosphorography, X-ray microscopes, synchrotron radiation spectroscopy, and X-ray lasers. The present invention relates to a multilayer film reflector for X-rays that is widely used as a system, and in particular to a multilayer film reflector for X-rays that reflects XNjA close to orthogonal radiation with a high reflectance and at the same time has high X-ray resistance.

[Conventional technology]

Conventionally, such a multilayer film reflector for X-rays has been used in combinations of A u/C or Re/(: for soft X-rays of 180 people.
Research project number 58350001) ), Ifio,
Mo/for soft X-rays of 1 person, 170.4 people, and 228 people
Combination of Si (Applied 0ptics2
4(+985), 883), and also Mo/
Combinations of C, Ta/C, W/C, AuPd/C, ReW, and #: have been reported.

[Problem that the invention seeks to solve]

However, when using the previously known combination of two materials with different refractive indexes, the difference in refractive index between the two materials will not become large for soft X-rays in the vicinity of 100 people. However, since the absorption rate is also large, only a few percent to 20% reflectance can be obtained for soft X-rays with an incident angle of 0° to 40°, which is close to normal human radiation. For soft X-rays, a reflectance of only a few to 10% can be obtained.

When creating an imaging system using reflecting mirrors, several reflecting mirrors may be required. Therefore, for the entire imaging system, the effect is determined by some power of the reflectance of a single reflecting mirror. Therefore, the low reflectance of the multilayer mirror is a serious problem.

Moreover, a large absorption not only causes a decrease in reflectance, but also causes a decrease in X-ray resistance because it increases the generation of heat due to incidence of soft X-rays, leading to deterioration. Furthermore, when Au or the like is used as one of the materials, the X-ray resistance is not sufficient due to its low melting point.

The present invention has been made in view of the problems of the above-mentioned conventional example, and its purpose is to solve the problems of the above-mentioned conventional example and to
It is an object of the present invention to provide a multilayer reflector for X-rays that has a high reflectance and a small absorption coefficient even for soft X-rays of 120 people, and has a high melting point.

[Means for solving problems]

The purpose of the present invention is to form a first layer with a thickness of at least 10 layers made of one or more of platinum metals, and a layer with a thickness of at least 10 layers made of one or more elements of Be, B, C, and Si. This is achieved by an X-ray multilayer reflector in which second layers of 10A or more are alternately laminated.

FIG. 1 is an explanatory diagram of the principle of this invention.

In the figure, the X-ray multilayer reflector of the present invention is made up of a first layer 2 and a second layer 3 alternately stacked on a flat or curved substrate i.

The thickness d, d, . . . of each layer is 10 or more, and the thickness is alternately equal (d+ = d3− . . .
d2 = d4 =...), it is okay to change all film thicknesses, but the amplitude decreases due to absorption of soft X-rays in each layer and the phases of reflected light at the interface of each layer overlap. It is preferable to set the thickness to such a value that the highest reflectance can be obtained for the multilayer mirror as a whole, taking into account both the reinforcement of reflected light caused by the multilayer mirror. If the thickness of each layer is less than 10 layers, it is not preferable because a high reflectance cannot be obtained as a reflecting mirror due to the diffusion effect of the two substances at the interface. Further, the number of laminated layers is from several to several tens.

The first layer 2 is made of one or more types of platinum metals, including Ru,
Rh, 'Pd are preferably used. The second layer 3 uses one or more of Be, B, C, and Si.

When the first layer is the first layer of the alternating layers, the reflectance at the interface between the vacuum and the first layer is higher than when the top layer of the alternating layers is the second layer. Since the reflectance is larger than the reflectance at the interface between the first layer and the second layer, a large reflectance can be obtained, which is more preferable.

) A protective film may be further laminated on the top layer of the alternately laminated layers, and the material forming the protective layer may be an oxide, boride, carbide, nitride, or B, C, or Si having a high melting point. etc.

〔Example〕

The present invention will be explained in more detail by giving specific examples below.

<Multilayer film reflecting mirror for X-rays with a wavelength of 114.0 mm> Example 1 The first material in Fig. 1 is Ru, the second material is Si, and the respective film thicknesses are 36.4 mm and 23.5 mm. , a reflectance of 38.6% was obtained at an incident angle of 0° by laminating 41 layers. As a result of laminating five layers of C as the topmost layer as a protective film, a reflectance of 37.9% was obtained at an incident angle of 0°. By laminating 41 layers with respective film thicknesses of 39.1 and 25.2, a reflectance of 40.1% was obtained at an incident angle of 20°. As a result of laminating five layers of C on the top layer as a protective surface, a reflectance of 39.4% was obtained at an incident angle of 20°.

Example 2 By stacking 41 layers with Pd as the first material and Si as the second material, the film thicknesses are set to 31.3 and 28.0, respectively. The reflectance was obtained.

By setting the film thickness to 33.3 and 30.1, respectively, a reflectance of 26.7% was obtained at an incident angle of 20°.

Multilayer film reflecting mirror for X-rays with a wavelength of 112.7 mm> Example 3 The first material is Ru, the second material is Be, and the film thicknesses are 26.6 mm and 30.6 mm, respectively, 4] i11 layer By doing so, a reflectance of 77.2% was obtained at an incident angle of 0°.

By laminating 41 layers with respective film thicknesses of 27.4 and 33.4, a reflectance of 79.9% was obtained at an incident angle of 20°.

<Multilayer film reflecting mirror for X-rays with a wavelength of 108.7 people> Example 4 The first material is 1 (h), the second material is Si, and the respective film thicknesses are 33.4 people and 23.4 people, and 41 By stacking the layers, a reflectance of 33.2% was obtained at an incident angle of 0°.Assuming the film thicknesses were 48.2 and 28.8, respectively, 4.
By laminating one layer, a reflectance of 38.7% was obtained at an incident angle of 20°.

<Multilayer film reflecting mirror for X-rays with a wavelength of 82.1 people> Example 5 Ru is the first material, B is the second material, and 41 layers are laminated with respective film thicknesses of 20.1 men and 21.8 men. As a result, a reflectance of 18.0% was obtained at an incident angle of 0°.

By laminating 41 layers with respective film thicknesses of 21.3 and 23.4, a reflectance of 21.6% was obtained at an incident angle of 20°.

Example 6 By laminating 41 layers with Rh as the first material and B as the second material with a film thickness of 20.0, 2] and 9, a reflectance of 15.7% was obtained at an incident angle of 0°. was gotten.

By laminating 41 layers with respective film thicknesses of 21.0 and 23.6, a reflectance of 18.8% was obtained at an incident angle of 20°.

Example 7 A reflectance of 13.2% was obtained at an incident angle of 0° by stacking 41 layers with Pd as the first material and Pd as the second material, with respective film thicknesses of 19.4 and 22.4. It was done.

By laminating 41 layers with respective film thicknesses of 20.6 and 24.0, a reflectance of 15.7% was obtained at an incident angle of 20°.

〔Effect of the invention〕

As described above, the X-ray multilayer film reflecting mirror of the present invention has an 80 to 12
It has a high reflectance even for X-rays at the wavelength of 0 people, and is different from conventional X-rays.
Since the reflectance of the multilayer mirror for radiation is small, it can also be suitably used in fields that use X-ray lasers in wavelength ranges to which they are not applicable.

Furthermore, the X-ray multilayer reflective mirror of the present invention has a low absorption rate, so temperature rise and heat storage is also low, and since the constituent materials of each layer have high melting points, it has high X-ray resistance. For this reason as well, it is suitable as a reflecting mirror for an X-ray laser resonator.

[Brief explanation of drawings]

FIG. 1 is a schematic cross-sectional view of the multilayer X-ray reflecting mirror of the present invention. 1: Substrate 2: First layer 3: Second layer 4: Protective layer

Claims (2)

[Claims] (1) a first layer containing one or more types of white metal; and B
A multilayer reflector for X-rays, characterized in that second layers containing one or more elements of e, B, C, and Si are alternately laminated. (2) The multilayer film reflecting mirror for X-rays according to claim 1, wherein the first layer and the second layer have a layer thickness of 10 Å or more.