JPS62297492A - Method for plating aluminum by electrolytic activation - Google Patents
Method for plating aluminum by electrolytic activationInfo
- Publication number
- JPS62297492A JPS62297492A JP13984186A JP13984186A JPS62297492A JP S62297492 A JPS62297492 A JP S62297492A JP 13984186 A JP13984186 A JP 13984186A JP 13984186 A JP13984186 A JP 13984186A JP S62297492 A JPS62297492 A JP S62297492A
- Authority
- JP
- Japan
- Prior art keywords
- plating
- aluminum
- activation
- positive
- negative
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000007747 plating Methods 0.000 title claims abstract description 56
- 230000004913 activation Effects 0.000 title claims abstract description 24
- 229910052782 aluminium Inorganic materials 0.000 title claims description 23
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 title claims description 23
- 238000000034 method Methods 0.000 title claims description 22
- 230000002378 acidificating effect Effects 0.000 claims abstract description 5
- 229910052751 metal Inorganic materials 0.000 claims description 11
- 239000002184 metal Substances 0.000 claims description 11
- 229910045601 alloy Inorganic materials 0.000 claims description 6
- 239000000956 alloy Substances 0.000 claims description 6
- 239000003792 electrolyte Substances 0.000 claims description 4
- 239000000463 material Substances 0.000 abstract description 6
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 abstract description 4
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 abstract description 4
- 229910052799 carbon Inorganic materials 0.000 abstract description 4
- 239000010935 stainless steel Substances 0.000 abstract description 4
- 229910001220 stainless steel Inorganic materials 0.000 abstract description 4
- 239000001257 hydrogen Substances 0.000 abstract description 3
- 229910052739 hydrogen Inorganic materials 0.000 abstract description 3
- 229910000838 Al alloy Inorganic materials 0.000 abstract 1
- 238000005238 degreasing Methods 0.000 description 15
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 12
- 239000000243 solution Substances 0.000 description 9
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 8
- 238000006243 chemical reaction Methods 0.000 description 8
- 230000008569 process Effects 0.000 description 8
- 238000006467 substitution reaction Methods 0.000 description 8
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 7
- 238000004090 dissolution Methods 0.000 description 6
- 230000000694 effects Effects 0.000 description 6
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 5
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical group [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 5
- 229910052804 chromium Inorganic materials 0.000 description 5
- 239000011651 chromium Substances 0.000 description 5
- 238000000576 coating method Methods 0.000 description 5
- 238000005868 electrolysis reaction Methods 0.000 description 5
- 239000011701 zinc Substances 0.000 description 5
- 229910052725 zinc Inorganic materials 0.000 description 5
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 4
- 239000010410 layer Substances 0.000 description 4
- 239000007788 liquid Substances 0.000 description 4
- 229910052759 nickel Inorganic materials 0.000 description 4
- 238000004381 surface treatment Methods 0.000 description 4
- 239000012670 alkaline solution Substances 0.000 description 3
- 230000015572 biosynthetic process Effects 0.000 description 3
- 230000008859 change Effects 0.000 description 3
- 239000011248 coating agent Substances 0.000 description 3
- 238000010438 heat treatment Methods 0.000 description 3
- 230000009467 reduction Effects 0.000 description 3
- 238000011282 treatment Methods 0.000 description 3
- 229910000881 Cu alloy Inorganic materials 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical compound [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 description 2
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical group [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 2
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 2
- 239000002253 acid Substances 0.000 description 2
- -1 chlorine ions Chemical class 0.000 description 2
- 238000007796 conventional method Methods 0.000 description 2
- 238000001816 cooling Methods 0.000 description 2
- 238000007654 immersion Methods 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 230000003647 oxidation Effects 0.000 description 2
- 238000007254 oxidation reaction Methods 0.000 description 2
- 239000002244 precipitate Substances 0.000 description 2
- 150000003839 salts Chemical class 0.000 description 2
- 229910000029 sodium carbonate Inorganic materials 0.000 description 2
- 239000010959 steel Substances 0.000 description 2
- 238000004065 wastewater treatment Methods 0.000 description 2
- 229910000851 Alloy steel Inorganic materials 0.000 description 1
- MYMOFIZGZYHOMD-UHFFFAOYSA-N Dioxygen Chemical compound O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 description 1
- 229910021578 Iron(III) chloride Inorganic materials 0.000 description 1
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 1
- 229910000831 Steel Inorganic materials 0.000 description 1
- 238000005299 abrasion Methods 0.000 description 1
- 239000003929 acidic solution Substances 0.000 description 1
- 150000007513 acids Chemical class 0.000 description 1
- 238000001994 activation Methods 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 239000004566 building material Substances 0.000 description 1
- 239000000460 chlorine Substances 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- 238000004512 die casting Methods 0.000 description 1
- 229910001882 dioxygen Inorganic materials 0.000 description 1
- 238000006073 displacement reaction Methods 0.000 description 1
- 239000008151 electrolyte solution Substances 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 239000011229 interlayer Substances 0.000 description 1
- RBTARNINKXHZNM-UHFFFAOYSA-K iron trichloride Chemical compound Cl[Fe](Cl)Cl RBTARNINKXHZNM-UHFFFAOYSA-K 0.000 description 1
- 239000002932 luster Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 229910017604 nitric acid Inorganic materials 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- LJCNRYVRMXRIQR-OLXYHTOASA-L potassium sodium L-tartrate Chemical compound [Na+].[K+].[O-]C(=O)[C@H](O)[C@@H](O)C([O-])=O LJCNRYVRMXRIQR-OLXYHTOASA-L 0.000 description 1
- 229940074439 potassium sodium tartrate Drugs 0.000 description 1
- 239000011780 sodium chloride Substances 0.000 description 1
- 239000001488 sodium phosphate Substances 0.000 description 1
- 235000011006 sodium potassium tartrate Nutrition 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 230000008685 targeting Effects 0.000 description 1
- RYFMWSXOAZQYPI-UHFFFAOYSA-K trisodium phosphate Chemical compound [Na+].[Na+].[Na+].[O-]P([O-])([O-])=O RYFMWSXOAZQYPI-UHFFFAOYSA-K 0.000 description 1
- 229910000406 trisodium phosphate Inorganic materials 0.000 description 1
- 235000019801 trisodium phosphate Nutrition 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
- 239000011787 zinc oxide Substances 0.000 description 1
Abstract
Description
【発明の詳細な説明】
3、発明の詳細な説明
(産業上の利用分野)
本発明はアルミニウム及びその合金上に中間皮膜層を用
いずに直接めっきを行なうことを可能とした電解活性化
によるアルミニウム上のめつき方法、詳しくはめっきを
つける被処理金属をアルカリ性又は酸性の電解液中でス
テンレス鋼、炭素板などの不溶性対極を用い、周期的に
極性を変換させ陽極時被処理金属を溶解させ、陰極時に
水素発生により酸化皮膜を破壊するとともに還元性雰囲
気において活性化させることを繰り返し、アルミニウム
の表面を清浄活性化させることにより、鉄鋼、銅合金な
どと同じに直接めっきを行なう方法である。[Detailed Description of the Invention] 3. Detailed Description of the Invention (Field of Industrial Application) The present invention is based on electrolytic activation that enables direct plating on aluminum and its alloys without using an intermediate film layer. For details on the method of plating on aluminum, the metal to be plated is placed in an alkaline or acidic electrolyte using an insoluble counter electrode such as stainless steel or carbon plate, and the polarity is periodically changed to dissolve the metal at the time of anode. In this method, the oxide film is destroyed by hydrogen generation at the cathode, and activated in a reducing atmosphere, which is repeated to clean and activate the surface of the aluminum, allowing direct plating to be performed in the same way as steel, copper alloys, etc. .
(従来技術およびその問題点)
アルミニウムは軽量で加工性がよいため、各種Igl器
部品、建築材料、日用雑貨など広い分野で利用されてい
る。これらの表面処理としては陽極酸化皮膜、塗装がほ
とんどで、アルミニウムのめつき加工はその歴史が古い
にもかかわらず、信頼性のあるめっき方法が確立されて
いないため、その用途も一部に限られている。(Prior art and its problems) Aluminum is lightweight and has good workability, so it is used in a wide range of fields such as various IGL device parts, building materials, and daily miscellaneous goods. Most of these surface treatments are anodized coatings and coatings, and although aluminum plating has a long history, reliable plating methods have not been established, so its applications are limited to some areas. It is being
しかし、最近はアルミニウムの表面処理への要求も多様
化し、例えばはんだ付性、磁気特性、電気抵抗の減少、
硬度、耐摩耗性の向上、金属光沢の付与などの要求があ
り、従来の表面処理では対応できず、めっきによる表面
処理が必要になってきている。However, recently the requirements for aluminum surface treatment have diversified, such as solderability, magnetic properties, reduction of electrical resistance, etc.
There are demands for improved hardness, abrasion resistance, and the provision of metallic luster, which cannot be met by conventional surface treatments, and surface treatment by plating is becoming necessary.
アルミニウムは酸化されやすい金属であるため、自然酸
化皮膜が生成し密着性のよいめっきが得られない。また
1両性金属であるため、酸性及びアルカリ性溶液に侵食
されやすく、めっき液中で侵食され密着が不十分になる
など、鉄鋼、銅合金のよう通常の前処理のみでは実用で
きるめっきが得られない大きな欠点がある。これらの欠
点を補うために多くの技術が検討され提案されているが
、現在実用化されている主な方法は亜鉛置換法、錫置換
法、陽極酸化法で、いずれもアルミニウム上に他の金属
皮膜または多孔性の酸化皮膜を生成させ、それを足がか
りとしてめっきをするもので、めっき工程は極めて複雑
となり、コスト高、工程が多いための信頼性の低下をき
たし、十分な密着性、信頼性のあるめっきは得がたい。Since aluminum is a metal that is easily oxidized, a natural oxide film is formed and plating with good adhesion cannot be obtained. In addition, since it is an amphoteric metal, it is easily corroded by acidic and alkaline solutions, and it is corroded in the plating solution, resulting in insufficient adhesion, making it impossible to obtain a plating that can be used for practical purposes only with normal pretreatment, such as with steel and copper alloys. There is a big drawback. Many techniques have been studied and proposed to compensate for these shortcomings, but the main methods currently in practical use are zinc substitution, tin substitution, and anodic oxidation. This method generates a film or porous oxide film and uses it as a foothold for plating.The plating process is extremely complicated, resulting in high costs and low reliability due to the large number of steps. It is difficult to obtain a plating with a certain
例えば、一般に広く利用されている亜鉛置換法によるめ
っき工程は、第3図に示すようにめっきを行なうまでに
その前段に■〜■で示すように11工程を必要としてい
た。For example, the generally widely used plating process using the zinc substitution method requires 11 steps as shown by (1) to (2) before plating, as shown in FIG.
(問題点を解決するための手段)
本発明の目的はアルミニウム上へめっきを行なうための
?l雑な亜va置換皮膜、錫置換皮膜、vA極酸酸化皮
膜化成中間処理を省き、脱脂、活性化機直接アルミニウ
ム上に密着性のよいめっきを行ない、品質の向上、めっ
き工程の簡略化、生産設備費の低減、生産性の向上、コ
ストの低減をはかるための電解活性化によるアルミニウ
ム上のめつき方法を提供するものである。(Means for Solving the Problems) What is the purpose of the present invention for plating on aluminum? l Eliminates the complicated intermediate treatment of sub-VA substitution coating, tin substitution coating, and VA polar acid oxide coating chemical formation, and performs plating with good adhesion directly onto aluminum using a degreasing and activation machine, improving quality and simplifying the plating process. The present invention provides a method for plating on aluminum using electrolytic activation in order to reduce production equipment costs, improve productivity, and reduce costs.
すなわち、本発明は上記目的を達成するために、めっき
をするアルミニウム及びその合金をアルカリ性または酸
性の電解液中でステンレス鋼、炭素板などの不溶性対極
を用い、対極との間に正及び負の電圧を交互に印加させ
、陽極時に正電流により被処理金属の表面を溶解させ、
陽極時に負電流により水素を発生させ酸化皮膜を破壊さ
せるとともに還元性雰囲気において活性化させることを
繰り返して密着性、光沢などのすぐれためつきを得るよ
うに構成したものである。さらに、正の電圧を印加した
被処理金属に対して負の電圧を印加する反転比率を変化
させ材質及びめっきの種類に適した活性化を行なう。す
なわち、第2図において時間T2が長くなれば反転比率
が太きく負電流の流れる割合が大きくなり、発生する水
素ガスも多(還元性雰囲気も強くなる。逆の場合は溶解
が増加するが、増加しない場合は酸素ガスが発生し金属
表面の酸化を促進する。この両反応の調節が重要であり
、適正な条件は材質及びめっきの種類によって異なるの
で、反転比率も変化させてすぐれた性質のめっきを得る
ものである。本発明によるとめつぎ工程は、第1図の■
〜■に示すように、溶剤脱脂−電解活性→水洗→めつき
となり、亜鉛置換°法に比較して173以下に短縮でき
、簡略される。 本発明の大きな特徴は(1)極性変換
による陽極溶解、陰[!還元の繰り返しの操作の容易な
電解活性化でめっきの密着性を茗しく向上することがで
き、中間層を用いずに直接めっきすることができる。(
2)アルカリ脱脂液を使用すると脱脂と活性化を同時に
行なうことができるとともに、被処理金属が陽極溶解で
研摩されるためにめっきの光沢が向上する。(3)めっ
き工程が著しく短縮され、設備費の低減、生産性の向上
、コストの低減がはかれる。(4)亜鉛置換のような高
濃度の処理液を使用しないので排水処理の負荷が軽減さ
れるなどであり、従来の方法に比較して著しくすぐれて
おり、画期的な発明である。That is, in order to achieve the above object, the present invention uses an insoluble counter electrode such as stainless steel or carbon plate to plate aluminum and its alloy in an alkaline or acidic electrolyte solution, and creates positive and negative polarities between the counter electrode and the aluminum plate. Voltage is applied alternately, and the surface of the metal to be treated is melted by a positive current at the anode.
The structure is such that hydrogen is generated by a negative current at the anode to destroy the oxide film, and activation is repeated in a reducing atmosphere to obtain excellent shine such as adhesion and gloss. Further, the inversion ratio at which a negative voltage is applied to the metal to be processed to which a positive voltage has been applied is changed to perform activation appropriate to the material and type of plating. In other words, as time T2 becomes longer in Fig. 2, the reversal ratio increases and the rate at which negative current flows increases, and more hydrogen gas is generated (reducing atmosphere also becomes stronger. In the opposite case, dissolution increases, If it does not increase, oxygen gas is generated and promotes oxidation of the metal surface.It is important to control both of these reactions, and the appropriate conditions differ depending on the material and type of plating, so change the inversion ratio to obtain excellent properties. The plating process according to the present invention is shown in Figure 1.
As shown in ~■, the steps are solvent degreasing - electrolytic activation -> water washing -> plating, which can be shortened to 173 degrees or less and simplified compared to the zinc substitution method. The major features of the present invention are (1) anodic dissolution by polarity conversion, negative [! The adhesion of plating can be significantly improved by electrolytic activation, which is easy to perform repeated reduction operations, and direct plating can be performed without using an intermediate layer. (
2) When an alkaline degreasing solution is used, degreasing and activation can be performed at the same time, and the gloss of the plating is improved because the metal to be treated is polished by anodic dissolution. (3) The plating process is significantly shortened, reducing equipment costs, improving productivity, and reducing costs. (4) Since high-concentration treatment liquids such as those used for zinc substitution are not used, the burden of wastewater treatment is reduced, and this is a groundbreaking invention that is significantly superior to conventional methods.
次に本発明を実施例により、さらに詳細に説明する。Next, the present invention will be explained in more detail with reference to Examples.
(実施例1)
脱脂液組成として炭酸ナトリウム100a/ t、水酸
化ナトリウム!50t’tのアルカリ溶液を用いて、1
080純アルミニウム及びADC12ダイカスト合金を
浸漬脱脂のみでストライクニッケル、光沢ニッケルめっ
きを施したもの、浸漬脱脂後硝酸浸漬し、水酸化ナトリ
ウム500!]/ l 、酸化亜鉛100Q、’/、酒
石酸カリナトリウム10Q/l、塩化第二鉄1CJt’
lを含む浴中で亜鉛置換を行ないめっきを施したもの、
本発明の前記アルカリ脱脂液中においてステンレス鋼を
対極にし、周波数13.3H2、反転比率95%、電流
密度10 A /’ d 112の条件で1分間活性化
後めっきを施したもののめつき特性を第1表に示す。(Example 1) Degreasing liquid composition: sodium carbonate 100a/t, sodium hydroxide! Using 50t't of alkaline solution, 1
080 pure aluminum and ADC12 die-casting alloy are immersed and degreased with strike nickel and bright nickel plating, then immersed in nitric acid after immersion degreasing, and sodium hydroxide 500! ]/l, zinc oxide 100Q,'/, potassium sodium tartrate 10Q/l, ferric chloride 1CJt'
Plated by zinc substitution in a bath containing l,
The plating characteristics of stainless steel as a counter electrode in the alkaline degreasing solution of the present invention were activated for 1 minute under the conditions of a frequency of 13.3H2, a reversal ratio of 95%, and a current density of 10 A/'d 112. Shown in Table 1.
第 1 表
口の結果から明らかなように、一般のめつきに用いられ
ている浸漬脱脂のみではめつき仕上り時点で・S・<れ
が発生しており、ABC12でも300℃に加熱すれば
、S・くれが発生してしまい、密着性が著しく劣った。As is clear from the results in Table 1, when only immersion degreasing, which is used for general plating, .S. S-curling occurred and the adhesion was significantly poor.
酸化皮膜生成防止のために中間圓として、亜鉛置換皮膜
を生成させてめっきをすると、密着性は向上するが、4
00℃の加熱または400℃加熱後水冷の苛酷な条件で
は密着不良となる。それに対して周期的に極性変換を行
ない電解活性する水沫では、400℃加熱、水冷の苛酷
な条件でも密着は良好である。また水沫の大きな特長は
めつき仕上りの光沢が従来の方法に比較して著しく良好
で、素材の種類の影響を受けないことである。この理由
は水沫が活性化と同時に脱脂が効率よく行なわれ表面が
清浄になること、他の方法では表面がエツチングにより
粗面化するのに対して水沫では陽極時の溶解で活性化と
電解fi4摩が同時に進行するためである。When plating is performed by forming a zinc-substituted film as an intermediate layer to prevent the formation of an oxide film, adhesion improves, but 4
Poor adhesion occurs under severe conditions such as heating to 00°C or heating to 400°C followed by water cooling. On the other hand, water droplets that are electrolytically activated by periodically changing their polarity have good adhesion even under severe conditions of heating at 400° C. and cooling with water. Another major feature of Mizutoshi is that the gloss of the plating finish is significantly better than that of conventional methods, and is not affected by the type of material. The reason for this is that water droplets are activated and degreased efficiently at the same time, resulting in a clean surface.In other methods, the surface becomes rough due to etching, but with water droplets, activation and electrolytic fi4 occur through dissolution at the anode. This is because the friction progresses at the same time.
(実施例2)
実7il!siの条件によりAlIC12について、極
性変換周波数を変化させ5分間電解活性したときの結果
は第2表のとおりであった。(Example 2) Real 7il! Table 2 shows the results when AlIC12 was electrolytically activated for 5 minutes by changing the polarity conversion frequency under the si conditions.
周波数0、すなわち陰極直流電解活性では密着性、光沢
度とも劣るが、極性変換電解活性では0.2の低周波数
から100IIZ以上の高周波数域まで富者性、光沢の
すぐれためつきが得られた。一般に広く利用されている
脱脂液中で、極性変換し、正電流、負電流を交互に流す
のみで脱脂、活性化、研摩が可能であり、水沫はアルミ
ニウム上へ直接めっきするのに極めて有効である。At frequency 0, that is, cathode direct current electrolytic activity, both adhesion and gloss are poor, but with polarity conversion electrolytic activity, excellent richness and gloss were obtained from a low frequency of 0.2 to a high frequency range of 100IIZ or more. . Degreasing, activation, and polishing are possible by simply changing the polarity in a commonly used degreasing solution and passing positive and negative currents alternately. Water droplets are extremely effective for directly plating onto aluminum. be.
第 2 表
(実施例3)
脱脂液組成としてリン酸三ナトリウム100Q//、水
酸化ナトリウム5σl′lのアルカリ溶液を用い八〇0
12に50℃、13.311z、10Az’dm2の条
件で反転比率を変化させて1分間電解活性を行ない、ス
トライクニッケル、光沢ニッケルめっきを行なった結束
は第3表のとおりであった。Table 2 (Example 3) As the degreasing liquid composition, an alkaline solution containing 100Q// of trisodium phosphate and 5σl'l of sodium hydroxide was used.
Table 3 shows the results of electrolytic activation for 1 minute under the conditions of 50° C., 13.311z, and 10Az'dm2 at 50°C, 13.311z, and 10Az'dm2, and plated with strike nickel and bright nickel.
この結果から明らかなように、反転比率0%の陽極直流
電解で活性化されず密着性が劣り、反転比率100%の
陽極直流電解でも400℃加熱、水冷で第 3 表
剥離が生じ、活性化の効果は少ない。それに対して、周
期的に極性変換をし、かつ反転比率を変化させ、正ri
流及び負電流を流す割合を変えた場合、全反転比率域に
おいて・5・<れ、剥離は発生せず、強固に密着しため
つきが得られた。しかしめっき後の光沢度は反転比率に
よって異なる。この傾向は素材及びめっきの種類によっ
て異なるので、反転比率を変えることによって素材及び
めっきに適した活性化処理を行なうことができる。As is clear from these results, the anodic DC electrolysis with a reversal ratio of 0% did not activate and the adhesion was poor, and even with the anodic DC electrolysis with a reversal ratio of 100%, peeling occurred on the third surface when heated to 400°C and water-cooled, resulting in activation. has little effect. On the other hand, by periodically changing the polarity and changing the inversion ratio, the positive ri
When the current and the rate at which the negative current was applied were changed, in the entire reversal ratio range - 5 - <, no peeling occurred, and a firmly adhered clamp was obtained. However, the gloss level after plating differs depending on the reversal ratio. Since this tendency differs depending on the type of material and plating, it is possible to perform activation processing suitable for the material and plating by changing the inversion ratio.
(実施例4)
ADC12を炭酸ナトリウム10QQ/ Z 、水酸化
ナトリウム5t)t’lを含むアルカリ脱脂液中で1分
間電解脱脂後、常温の10%塩III溶液中で炭素板を
対極として、13.3)1z、 IOA/di’の条件
で反転比率を変化させ、30秒B電解活性を行ない、A
OA t’ d l ”の11流密度で15分間クロ
ムめっきを行なった結果は第4表のとおりであった。(Example 4) ADC12 was electrolytically degreased for 1 minute in an alkaline degreasing solution containing 10 QQ/Z of sodium carbonate and 5 t'l of sodium hydroxide, and then degreased with a carbon plate as a counter electrode in a 10% salt III solution at room temperature. .3) Change the inversion ratio under the conditions of 1z and IOA/di', perform B electrolytic activation for 30 seconds,
Table 4 shows the results of chromium plating for 15 minutes at a flow density of OA t'dl'' of 11.
部応力が極めて大きいため、アルミニウム上に密着性の
よいめっきを得ることは非常に難しい。実施例2と同じ
前処理を行なってもクロムは析出しないか、析出してち
りん片状となり容易に脱落するか剥離する。アルカリ脱
脂液中に例えば塩化ナトリウムのような塩素イオンを含
んだ塩類を添加することによっても密着性は向上するが
、塩酸溶液中で極性変換による電解活性を行なった方が
効果が大きい。電解活性でも反転比率O%、すなわち陽
極直流電解ではクロムめっきはほとんど析出しないし、
反転比率100%の陰極直流電解ではクロムは析出する
が、りん片状に剥離し、密着性及び光沢が劣る。それに
対して極性変換電解活性では反転比率の高い86〜95
%において、光沢がよく密着性のすぐれたクロムめっき
が、中間層を生成させることなしに直接アルミニウム及
びその合金上に得られる。It is very difficult to obtain plating with good adhesion on aluminum because the stress is extremely large. Even if the same pretreatment as in Example 2 is performed, chromium does not precipitate, or it precipitates into a dust-like form that easily falls off or peels off. Adhesion can also be improved by adding salts containing chlorine ions, such as sodium chloride, to the alkaline degreasing solution, but electrolytic activation by polarity conversion in a hydrochloric acid solution is more effective. Even with electrolytic activation, the reversal ratio is 0%, that is, in anodic direct current electrolysis, almost no chromium plating is deposited,
In cathodic direct current electrolysis with a reversal ratio of 100%, chromium is deposited, but it peels off in the form of flakes, resulting in poor adhesion and gloss. On the other hand, polarity conversion electrolytic activity has a high reversal ratio of 86 to 95.
%, a bright and highly adhesive chromium plating is obtained directly on aluminum and its alloys without the formation of an interlayer.
これらの実施例以外の酸、アルカリ電解液及び各種塩類
添加電解液中においても極性変換電解によりアルミニウ
ム及びその合金を活性化することができ、実施例以外の
めつきも容易に直接めっきできる画期的なめつき方法で
ある。Aluminum and its alloys can be activated by polarity conversion electrolysis even in acids, alkaline electrolytes, and various salt-added electrolytes other than these examples, and it is a breakthrough that allows direct plating with ease for plating other than those in the examples. This is a method of targeting.
(発明の効果)
以上のように構成した本発明によれば次の如き効果が得
られる。(Effects of the Invention) According to the present invention configured as described above, the following effects can be obtained.
(1)極性変換による陽極溶解、陰極還元の繰り返しの
操作の容易な電解活性化でめっきの密着性を著しく向上
することができ、中間層を用いずに直接めっきすること
ができる。(1) Plating adhesion can be significantly improved by electrolytic activation, which is easy to perform by repeating anodic dissolution and cathodic reduction by polarity change, and direct plating can be performed without using an intermediate layer.
(2)アルカリ脱脂液を使用すると脱脂と活性化を同時
に行なうことができるとともに、被処理金属が陽極溶解
で研摩されるためにめっきの光沢が向上する。(2) When an alkaline degreasing solution is used, degreasing and activation can be performed simultaneously, and the gloss of the plating is improved because the metal to be treated is polished by anodic dissolution.
(3)めっき工程が著しく短縮され、設備費の低減、生
産性の向上、コストの低減がはかれる。゛(4)亜tG
置換のような高温度の処理液を使用しないので排水処理
の負荷が軽減される。(3) The plating process is significantly shortened, reducing equipment costs, improving productivity, and reducing costs.゛(4) subtG
The burden of wastewater treatment is reduced because high-temperature treatment liquids, such as those used for displacement, are not used.
【図面の簡単な説明】
第1図は本発明によるめっきの工程、第2図は本発明の
極性変換電解活性の電圧波形、第3図は従来のアルミニ
ウム上のめつき工程を示す。
−゛J−”・エコ・
第1図
第2図
8秤 聞BRIEF DESCRIPTION OF THE DRAWINGS FIG. 1 shows a plating process according to the present invention, FIG. 2 shows a voltage waveform of polarity conversion electrolytic activation according to the present invention, and FIG. 3 shows a conventional plating process on aluminum. −゛J−”・Eco・Figure 1Figure 2Figure 8Weigher
Claims (2)
性又は酸性の電解液中に浸漬し、アルミニウムと対極と
の間に正及び負の電圧を交互に印加することにより被処
理金属の表面を活性化させ、中間層を生成させずに直接
めつきを行ない、密着性のすぐれた平滑なめつきを得る
ことを特徴とする電解活性化によるアルミニウム上のめ
つき方法。(1) Aluminum and an insoluble counter electrode are immersed in an alkaline or acidic electrolyte, respectively, and positive and negative voltages are applied alternately between the aluminum and the counter electrode to activate the surface of the metal to be treated. A method of plating on aluminum by electrolytic activation, which is characterized by directly plating without forming a layer and obtaining smooth plating with excellent adhesion.
を印加する反転比率を変化させて被処理合金及びめつき
の種類に適した活性化を行なうことを特徴とする特許請
求の範囲第1項記載の電解活性化によるアルミニウム上
のめつき方法。(2) Claims characterized in that activation is performed in a manner appropriate for the alloy to be treated and the type of plating by changing the inversion ratio of applying a negative voltage to the metal to be treated to which a positive voltage has been applied. 2. The method of plating on aluminum by electrolytic activation as described in item 1.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP13984186A JPS62297492A (en) | 1986-06-16 | 1986-06-16 | Method for plating aluminum by electrolytic activation |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP13984186A JPS62297492A (en) | 1986-06-16 | 1986-06-16 | Method for plating aluminum by electrolytic activation |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS62297492A true JPS62297492A (en) | 1987-12-24 |
JPH0240751B2 JPH0240751B2 (en) | 1990-09-13 |
Family
ID=15254756
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP13984186A Granted JPS62297492A (en) | 1986-06-16 | 1986-06-16 | Method for plating aluminum by electrolytic activation |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS62297492A (en) |
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH03104895A (en) * | 1989-09-18 | 1991-05-01 | Toshiba Corp | Electroplating method |
JPH07180080A (en) * | 1993-03-23 | 1995-07-18 | Chiyoda Kiki Hanbai Kk | Method for plating aluminum and aluminum alloy and electrolyte |
US5980722A (en) * | 1996-10-30 | 1999-11-09 | Suzuki Motor Corporation | Plated aluminum alloy, cylinder block thereof, plating line and plating method |
JP2013080700A (en) * | 2011-09-21 | 2013-05-02 | Shinwa Industry Co Ltd | Current collector material |
JP2016160486A (en) * | 2015-03-02 | 2016-09-05 | 皓 伊藤 | Surface treatment method for aluminum and aluminum alloy and electrolytic solution used for the surface treatment method |
JP2017179558A (en) * | 2016-03-31 | 2017-10-05 | 古河電気工業株式会社 | Metallic material for thin film plating and method for producing the same |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5186039A (en) * | 1975-01-28 | 1976-07-28 | Nippon Kagaku Sangyo Kk | Aruminiumuoyobi aruminiumugokinno metsukizenshorihoho |
-
1986
- 1986-06-16 JP JP13984186A patent/JPS62297492A/en active Granted
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5186039A (en) * | 1975-01-28 | 1976-07-28 | Nippon Kagaku Sangyo Kk | Aruminiumuoyobi aruminiumugokinno metsukizenshorihoho |
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH03104895A (en) * | 1989-09-18 | 1991-05-01 | Toshiba Corp | Electroplating method |
JPH07180080A (en) * | 1993-03-23 | 1995-07-18 | Chiyoda Kiki Hanbai Kk | Method for plating aluminum and aluminum alloy and electrolyte |
US5980722A (en) * | 1996-10-30 | 1999-11-09 | Suzuki Motor Corporation | Plated aluminum alloy, cylinder block thereof, plating line and plating method |
JP2013080700A (en) * | 2011-09-21 | 2013-05-02 | Shinwa Industry Co Ltd | Current collector material |
JP2016160486A (en) * | 2015-03-02 | 2016-09-05 | 皓 伊藤 | Surface treatment method for aluminum and aluminum alloy and electrolytic solution used for the surface treatment method |
JP2017179558A (en) * | 2016-03-31 | 2017-10-05 | 古河電気工業株式会社 | Metallic material for thin film plating and method for producing the same |
Also Published As
Publication number | Publication date |
---|---|
JPH0240751B2 (en) | 1990-09-13 |
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