JPS62295204A - Magnetic head - Google Patents
Magnetic headInfo
- Publication number
- JPS62295204A JPS62295204A JP61137740A JP13774086A JPS62295204A JP S62295204 A JPS62295204 A JP S62295204A JP 61137740 A JP61137740 A JP 61137740A JP 13774086 A JP13774086 A JP 13774086A JP S62295204 A JPS62295204 A JP S62295204A
- Authority
- JP
- Japan
- Prior art keywords
- sio2
- chromium
- magnetic head
- half core
- bonding
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 230000005291 magnetic effect Effects 0.000 title claims abstract description 31
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 claims abstract description 21
- 229910052804 chromium Inorganic materials 0.000 claims abstract description 21
- 239000011651 chromium Substances 0.000 claims abstract description 21
- 229910000676 Si alloy Inorganic materials 0.000 claims abstract description 8
- -1 iron-aluminum-silicon Chemical compound 0.000 claims abstract description 7
- 230000001105 regulatory effect Effects 0.000 claims description 10
- 239000000696 magnetic material Substances 0.000 claims 1
- 239000011521 glass Substances 0.000 abstract description 25
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 abstract description 22
- 229910052681 coesite Inorganic materials 0.000 abstract description 11
- 229910052906 cristobalite Inorganic materials 0.000 abstract description 11
- 239000000377 silicon dioxide Substances 0.000 abstract description 11
- 235000012239 silicon dioxide Nutrition 0.000 abstract description 11
- 229910052682 stishovite Inorganic materials 0.000 abstract description 11
- 229910052905 tridymite Inorganic materials 0.000 abstract description 11
- 230000003628 erosive effect Effects 0.000 abstract description 6
- 238000000034 method Methods 0.000 abstract description 5
- 230000006866 deterioration Effects 0.000 abstract description 3
- 238000005304 joining Methods 0.000 abstract description 3
- 238000007747 plating Methods 0.000 abstract description 3
- 238000004544 sputter deposition Methods 0.000 abstract description 3
- 239000000126 substance Substances 0.000 abstract description 3
- 238000007740 vapor deposition Methods 0.000 abstract description 3
- 238000010030 laminating Methods 0.000 abstract description 2
- 235000012721 chromium Nutrition 0.000 abstract 3
- 238000004804 winding Methods 0.000 description 15
- 230000008018 melting Effects 0.000 description 11
- 238000002844 melting Methods 0.000 description 11
- 230000003014 reinforcing effect Effects 0.000 description 9
- 239000010408 film Substances 0.000 description 5
- 229910000859 α-Fe Inorganic materials 0.000 description 5
- 238000005520 cutting process Methods 0.000 description 3
- 239000003302 ferromagnetic material Substances 0.000 description 3
- 239000010409 thin film Substances 0.000 description 3
- 230000015572 biosynthetic process Effects 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 241000689109 Corella <basidiomycete fungus> Species 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000004907 flux Effects 0.000 description 1
- 238000003475 lamination Methods 0.000 description 1
- 239000000155 melt Substances 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 230000002787 reinforcement Effects 0.000 description 1
- 230000004044 response Effects 0.000 description 1
Classifications
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/127—Structure or manufacture of heads, e.g. inductive
- G11B5/187—Structure or manufacture of the surface of the head in physical contact with, or immediately adjacent to the recording medium; Pole pieces; Gap features
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Magnetic Heads (AREA)
Abstract
Description
【発明の詳細な説明】
３、発明の詳細な説明
［産業上の利用分野コ
本発明は、特にＶＴＲ等に使用して好適な磁気ヘッドに
関する。Detailed Description of the Invention 3. Detailed Description of the Invention [Field of Industrial Application] The present invention relates to a magnetic head particularly suitable for use in VTRs and the like.
［従来の技術］
従来の磁気ヘッドとして第４図のように１対の磁気コア
３１ａ及び３１ｂの突合せ面の間にギャップ３２が形成
され、一方の磁気コア例えば３１ｂに設けられた巻線溝
３３にコイル３４が巻回された構造が知られている。こ
のような磁気ヘッドは高性能オーディオやＶＴＲに使用
されており、１対の磁気コア３１ａ、３１ｂはフェライ
ト等の強磁性体から構成され、ギャップ３２には例えば
Ｓ ｉ Ｏ２の薄膜が介在されている。[Prior Art] As shown in FIG. 4, a conventional magnetic head has a gap 32 formed between the abutting surfaces of a pair of magnetic cores 31a and 31b, and a winding groove 33 provided in one of the magnetic cores, for example, 31b. A structure in which a coil 34 is wound around the coil 34 is known. Such magnetic heads are used in high-performance audio and VTRs, and a pair of magnetic cores 31a and 31b are made of a ferromagnetic material such as ferrite, and a thin film of SiO2, for example, is interposed in the gap 32. There is.
［発明が解決しようとする問題点］
ところで従来の磁気ヘッドは、１対の磁気コア３１ａ、
３１ｂを接合（ボンディング）する際にボンディングガ
ラスを使用するが、このボンディング時５１０２がボン
ディングガラスにより浸蝕さか、ボンディングガラスと
一体化する現象が生ずる。[Problems to be Solved by the Invention] By the way, the conventional magnetic head has a pair of magnetic cores 31a,
Bonding glass is used when bonding 31b, but during this bonding, a phenomenon occurs where 5102 is eroded by the bonding glass or becomes integrated with the bonding glass.
このためボンディング温度で溶融しないはずのＳｉＯ２
が、実際はボンディングガラスと一体となってしまうた
めに溶融してしまい、ギャップ長が変化して、磁気特性
が劣化するという問題がある。For this reason, SiO2, which should not melt at the bonding temperature,
However, in reality, it melts because it becomes integrated with the bonding glass, causing a problem in that the gap length changes and the magnetic properties deteriorate.
本発明はこのような問題に対処してなされたもので、ギ
ャップ部の浸蝕を防止して磁気特性の劣化を生じさせな
い磁気ヘッドを提供することを目的とするものである。The present invention has been made in response to such problems, and an object of the present invention is to provide a magnetic head that prevents erosion of the gap portion and does not cause deterioration of magnetic properties.
［問題点を解決するための手段］
上記目的を達成するために本発明は、一方のハーフコア
のトラック幅規制切欠溝を含む突合せ面上に、ＳｉＯ２
とクロムと８１０２を積層形成したことを特徴としてい
る。[Means for Solving the Problems] In order to achieve the above object, the present invention provides SiO2 on the abutting surface including the track width regulating notch groove of one half core.
It is characterized by laminated layers of chromium, chromium, and 8102.
［作用］
ボンディングと反応しゃすいＳｉＯ、をボンディングガ
ラスと反応しにくいクロムで覆うことによって、ＳｉＯ
２とボンディングガラスとの結合が防止されるので、ギ
ャップ部分の浸蝕は生じない。[Function] By covering SiO, which does not easily react with bonding, with chromium, which does not easily react with bonding glass, SiO
Since bonding between No. 2 and the bonding glass is prevented, erosion of the gap portion does not occur.
またクロムの上に更にＳｉＯ２を薄く （例えば２００
〜５００人）積層することにより１表面のガラス流れ性
（ｆＪ３れ性）やガラスとの接着性が損なわれることも
なくなる。Also, apply a thinner layer of SiO2 on top of the chromium (e.g. 200
(~500 people) Lamination does not impair glass flowability (fJ3 flowability) or adhesion to glass on one surface.
［発明の実施例］
第１図は本発明実施例の磁気ヘッドを示すもので、フェ
ライト等の強磁性材料からなる１対のハーフコアＩＩＡ
、ＩＩＢの一方例えばＩＩＢには巻線溝１２及び補強溝
１３が形成されている。巻線溝１２にはコイル１４が巻
回される。１対のハーフコアＩＩＡ、ＩＩＢの対向面に
はトラック幅規制切欠溝１６，１６が形成され、この切
欠溝１６及び補強溝１３には低融点ガラス１７が充填さ
れてこの低融点ガラス１７によって１対のハーフコアＩ
ＩＡ、ＩＩＢが接合されている。[Embodiment of the Invention] FIG. 1 shows a magnetic head according to an embodiment of the invention, in which a pair of half cores IIA made of a ferromagnetic material such as ferrite are used.
, IIB, for example IIB, has a winding groove 12 and a reinforcing groove 13 formed therein. A coil 14 is wound around the winding groove 12 . Track width regulating cutout grooves 16, 16 are formed on the opposing surfaces of the pair of half cores IIA, IIB, and the cutout grooves 16 and reinforcing grooves 13 are filled with low melting point glass 17. half core I
IA and IIB are joined.
一方のハーフコアＩＩＡのトラック幅規制切欠溝１６．
を含む突合せ面には、ＳｉＯ□を含む積層膜２１が形成
されている。この積層膜２１は第２図に示すようにハー
フコアＩＩＡの表面から順次、クロム２１ａ（約２００
人）、鉄−アルミニウム−ケイ素合金、２１ｂ（約２．
６ μ）、５ｉ０２２１ｃ（約１．８μ）、クロム２１
ｄ（１，２〜１．３μ）、Ｓｉｎ□２１ ｅ （２００
〜５００人）から構成されている。これらの各膜２１ａ
〜２１ｅは１対のハーフコアＩＩＡ、ＩＩＢを接合する
前に、スパッタリング法、蒸着法あるいは化学メッキ法
によって形成する。Track width regulating notch groove 16 of one half core IIA.
A laminated film 21 containing SiO□ is formed on the abutting surface containing SiO□. As shown in FIG.
), iron-aluminum-silicon alloy, 21b (approx.
6μ), 5i0221c (approx. 1.8μ), Chromium 21
d (1,2~1.3μ), Sin□21 e (200
~500 people). Each of these films 21a
21e are formed by sputtering, vapor deposition, or chemical plating before joining the pair of half cores IIA and IIB.
これらのうち、ＳｉＯ□２１ｃ及びクロム２１ｄはギャ
ップ形成のために用いられている。クロム２１ａはフェ
ライトコアｌｌａと鉄−アルミニウム−シリコン合金２
１ｂとの接着強度を向上させるために用いられている。Of these, SiO□ 21c and chromium 21d are used for gap formation. Chromium 21a is a ferrite core lla and iron-aluminum-silicon alloy 2
It is used to improve the adhesive strength with 1b.
鉄−アルミニウム−シリコン合金２１ｂは高い飽和磁束
密度をもつため、フェライトコア単独の場合に比べ、よ
り強い磁界をギャップから発生させるために用いられて
いる。Since the iron-aluminum-silicon alloy 21b has a high saturation magnetic flux density, it is used to generate a stronger magnetic field from the gap than when a ferrite core is used alone.
Ｓｉ０．２１ｅはガラスボンディングの際の接合面がク
ロム２１ｄとなって、クロムとボンディングガラスとの
接着性及び濡れ性が低下するのを補うために用いられて
いる。Si0.21e is used to compensate for the reduction in adhesion and wettability between chromium and bonding glass, which occurs when the bonding surface becomes chromium 21d during glass bonding.
巻線溝１２の壁面には低融点ガラス１７と同じガラスか
らなるガラス薄膜１８が均一に形成されており、コイル
１４の被膜に傷が付くのを防止するために用いられてい
るが、必ずしも必要ではない。A glass thin film 18 made of the same glass as the low melting point glass 17 is uniformly formed on the wall surface of the winding groove 12, and is used to prevent the coating of the coil 14 from being scratched, but it is not always necessary. isn't it.
このようにギャップ形成のための５ｉＯ２２１ｃをクロ
ム２１ｄで覆い、これら積層膜の前後にさらに各々クロ
ム２１ａと鉄−アルミニウム−シリコン合金２１ｂ積層
膜及びＳｉＯ２２１ｅを積層することによって、Ｓｉｎ
、２１ ｃのより安定化を図るとかできる。In this way, by covering 5iO221c for gap formation with chromium 21d, and further laminating chromium 21a, iron-aluminum-silicon alloy 21b laminated film, and SiO221e before and after these laminated films, the SiO221c is formed.
, 21c can be made more stable.
従ってギャップ形成のためのＳｉ０，２１ｃのボンディ
ングガラスによる浸蝕が防止されるため。Therefore, corrosion of Si0, 21c by the bonding glass for forming the gap is prevented.
ハーフコアＩＩＡ、ＩＩＢのギャップ部分の浸蝕は生じ
ないので、ギャップ長は変化せず磁気特性の劣化は起き
ない。Since no erosion occurs in the gap portions of the half cores IIA and IIB, the gap length does not change and the magnetic properties do not deteriorate.
以上のような本発明の磁気ヘッドは第３図（ａ）〜（ｇ
）のような製造工程によって製造することができる。The magnetic head of the present invention as described above is shown in FIGS.
) can be manufactured by a manufacturing process such as
第３図（ａ）において、ｌｌａ、ｌｌｂはフェライト等
の強磁性材料を切断して所定の直方体形状にした１対の
ハーフコアブロックである。In FIG. 3(a), lla and llb are a pair of half core blocks made by cutting a ferromagnetic material such as ferrite into a predetermined rectangular parallelepiped shape.
このハーフコアブロックｌｌａ、ｌｌｂは少なくともそ
の一方、例えばｌｌａの突合せ面に鏡面加工を施し、次
に第３図（ｂ）のように両ブロックｌｌａ、ｌｌｂの長
手方向に沿い所定間隔でトラック幅規制切欠溝１６を形
成する。またその他方例えばｌｌｂに巻線溝１２及び補
強溝１３を、それぞれその長手方向に連続させて形成す
る。この巻線溝１２及び補強溝１３は両ブロック１１ａ
。These half core blocks lla, llb are made by mirror-finishing the abutting surfaces of at least one of them, for example lla, and then, as shown in FIG. 3(b), the track width is regulated at predetermined intervals along the longitudinal direction of both blocks lla, llb. A notch groove 16 is formed. On the other hand, for example, a winding groove 12 and a reinforcing groove 13 are formed continuously in the longitudinal direction of the llb. These winding grooves 12 and reinforcing grooves 13 are connected to both blocks 11a.
.
１１ｂに設けてもよく、又は片方のブロックずつ設けて
もよい。11b, or may be provided in each block.
以上のハーフコアブロックｌｌａ、ｌｌｂに対し、第３
図（ｃ）のように次に鏡面加工を施した側のブロック、
すなわちこの実施例ではハーフコアブロックｌｌａに順
次、クロム２１ａ、鉄−アルミニウム−シリコン合金２
１ ｂ、Ｓｉ０，２１ｃ。For the above half core blocks lla and llb, the third
As shown in figure (c), the block on the next mirror-finished side,
That is, in this embodiment, the half core block lla is sequentially coated with chromium 21a and iron-aluminum-silicon alloy 2.
1b, Si0,21c.
クロム２１ ｄ、Ｓｉ０，２１ ｅを形成する。これら
の薄膜２．１ａ〜２１ｅはいずれもスパッタリング法、
蒸着法、あるいは化学メッキ法から適当な手段を選んで
形成する。また巻線溝１２及び補強溝１３を形成した側
のブロックｌｌｂには、トラック幅規制切欠溝１６、巻
線溝１２及び補強溝１３の上に例えばＳｉＯ２−ＰｂＯ
系の低融点ガラス２５を位置させる。さらにこれを加熱
溶融させて第３図（ｄ）のように、トラック幅規制切欠
′ｒ４１ ｅ、巻線溝１２及び補強溝１３に低融点ガラ
ス１７を充填する。Chromium 21d, Si0, and 21e are formed. These thin films 2.1a to 21e are all formed by sputtering method,
It is formed by selecting an appropriate method from a vapor deposition method or a chemical plating method. In addition, in the block llb on the side where the winding groove 12 and reinforcing groove 13 are formed, there is a track width regulating notch 16, and on the winding groove 12 and reinforcing groove 13, for example, SiO2-Pb
A low melting point glass 25 of the system is placed. Further, this is heated and melted to fill the track width regulating notch 'r41e, the winding groove 12 and the reinforcing groove 13 with low melting point glass 17, as shown in FIG. 3(d).
次に第３図（ｅ）のように巻線溝１２の底部１２Ａを露
出するように巻線溝１２内の低融点ガラス１７を研削し
た後、トラック幅規制切欠溝１６、巻線溝１２及び補強
溝１３からはみ出した低融点ガラス１７を研磨等で除去
する。次に一方のブロックｌｌｂの突合せ面に低融点ガ
ラスをスパッタする。Next, as shown in FIG. 3(e), after grinding the low melting point glass 17 in the winding groove 12 to expose the bottom 12A of the winding groove 12, the track width regulating notch 16, the winding groove 12 and The low melting point glass 17 protruding from the reinforcing groove 13 is removed by polishing or the like. Next, low melting point glass is sputtered onto the abutting surfaces of one block llb.
以上の加工を施した１対のハーフコアブロック１１ａ、
ｌｌｂを、次に第３図（ｆ）のように突合せ、低融点ガ
ラス１７の溶融温度にて加熱処理するにれによりハーフ
コアブロック１１ａ。A pair of half core blocks 11a subjected to the above processing,
llb are then butted together as shown in FIG. 3(f) and heat treated at the melting temperature of the low melting point glass 17 to form a half core block 11a.
１１ｂは低融点ガラス１７し；よって接合される。11b is a low melting point glass 17; therefore, it is bonded.
接合が完了したハーフコアブロック１１ａ。Half core block 11a with completed joining.
１１ｂは第３図（ｆ）に示す切断線Ｃ１すなわちトラッ
ク幅規制切欠溝１６，１６の中央部で所定幅に切断する
とともに、補強溝１３の下部の不要部分を切断線りで示
すように切断除去して第３図（ｇ）のような磁気ヘッド
を得る。この磁気ヘッドは、その後テープ摺接面が円弧
状ｌこ研磨され、巻線溝１２にコイル１４が巻回される
。11b is cut to a predetermined width at the cutting line C1 shown in FIG. 3(f), that is, at the center of the track width regulating grooves 16, 16, and at the same time, the unnecessary portion at the bottom of the reinforcing groove 13 is cut as shown by the cutting line. By removing it, a magnetic head as shown in FIG. 3(g) is obtained. The tape sliding surface of this magnetic head is then polished into an arc shape, and a coil 14 is wound in the winding groove 12.
これによって第１図のような構造の磁気ヘッドが得られ
る。As a result, a magnetic head having a structure as shown in FIG. 1 is obtained.
［発明の効果コ
以上のように本発明の磁気ヘッドは、一方のハーフコア
の突合せ面上にＳｉＯ□とクロムとＳ ｉｏ２を積層形
成したので、１対のハーフコアのボンディング時ＳｉＯ
２のボンディングガラスによる浸蝕は防止される。従っ
てギャップ部分の浸蝕は生じないため、ボンディングが
確実に行なわれるので磁気特性の劣化は起こらない。[Effects of the Invention] As described above, in the magnetic head of the present invention, SiO□, chromium, and Sio2 are laminated on the abutting surface of one half core.
Erosion caused by the bonding glass in No. 2 is prevented. Therefore, since no erosion occurs in the gap portion, bonding is performed reliably and no deterioration of magnetic properties occurs.
第１図及び第２図は本発明実施例磁気ヘッドを示す斜視
図及び平面図、第３図（ａ）〜（ｒ）は本発明磁気ヘッ
ドの製造工程を示す斜視図、第４図は従来の磁気ヘッド
を示す斜視図である。
１１Ａ、ＩＩＢ・・・ハーフコア、
１１ａ、ｌｌｂ・・・ハーフコアブロック、１２・・・
巻線溝。
１２Ａ・・・巻線溝底部、
１３・・・補強溝、
１４・・・コイル、
１６・・・トラック幅規制切欠溝、
１７・・・低融点ガラス、
２１・・・積層膜、
２１ａ、２１ｄ・・・クロム、
２１ｂ・・・鉄−アルミニウム−シリコン合金。
２１ｃ、２１ｅ・・・５ｉＯ２゜
第１図
第２図
第３ｒＡ
第４図1 and 2 are a perspective view and a plan view showing a magnetic head according to an embodiment of the present invention, FIGS. 3(a) to (r) are perspective views showing the manufacturing process of the magnetic head of the present invention, and FIG. 4 is a conventional magnetic head. FIG. 3 is a perspective view showing the magnetic head of FIG. 11A, IIB...half core, 11a, llb...half core block, 12...
Winding groove. 12A... Winding groove bottom, 13... Reinforcement groove, 14... Coil, 16... Track width regulating notch groove, 17... Low melting point glass, 21... Laminated film, 21a, 21d ...Chromium, 21b...Iron-aluminum-silicon alloy. 21c, 21e...5iO2゜Fig. 1 Fig. 2 Fig. 3rA Fig. 4
Claims (2)
ラック幅規制切欠溝を形成し、このハーフコアの突合せ
面に、磁気ギャップを構成する非磁性膜を介在させた磁
気ヘッドにおいて、一方のハーフコアのトラック幅規制
切欠溝を含む突合せ面上に、ＳｉＯ＿２とクロムとＳｉ
Ｏ＿２を積層形成したことを特徴とする磁気ヘッド。(1) In a magnetic head in which a track width regulating notch is formed on the abutting surfaces of a pair of half cores made of a magnetic material, and a nonmagnetic film forming a magnetic gap is interposed on the abutting surfaces of the half cores, one half core SiO_2, chromium and Si
A magnetic head characterized in that O_2 is laminated.
してクロムと鉄−アルミニウム−シリコン合金を積層し
たことを特徴とする特許請求の範囲第１項記載の磁気ヘ
ッド。(2) A magnetic head according to claim 1, characterized in that chromium and an iron-aluminum-silicon alloy are laminated adjacent to the laminated film of SiO_2, chromium, and SiO_2.
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP61137740A JPH0656645B2 (en) | 1986-06-13 | 1986-06-13 | Magnetic head |
| KR1019870003220A KR900007490B1 (en) | 1986-06-13 | 1987-04-04 | Magnetic head |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP61137740A JPH0656645B2 (en) | 1986-06-13 | 1986-06-13 | Magnetic head |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS62295204A true JPS62295204A (en) | 1987-12-22 |
| JPH0656645B2 JPH0656645B2 (en) | 1994-07-27 |
Family
ID=15205719
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP61137740A Expired - Fee Related JPH0656645B2 (en) | 1986-06-13 | 1986-06-13 | Magnetic head |
Country Status (2)
| Country | Link |
|---|---|
| JP (1) | JPH0656645B2 (en) |
| KR (1) | KR900007490B1 (en) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH01260615A (en) * | 1988-04-12 | 1989-10-17 | Nec Kansai Ltd | Magnetic head |
| JPH02192006A (en) * | 1988-11-30 | 1990-07-27 | Mitsumi Electric Co Ltd | Magnetic head and production thereof |
| JPH02105210U (en) * | 1989-01-31 | 1990-08-21 | ||
| JPH02310807A (en) * | 1989-05-25 | 1990-12-26 | Alps Electric Co Ltd | Magnetic head |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS59193516A (en) * | 1983-04-19 | 1984-11-02 | Pioneer Electronic Corp | Magnetic head |
| JPS60125909A (en) * | 1983-12-12 | 1985-07-05 | Victor Co Of Japan Ltd | Magnetic head |
| JPS60205808A (en) * | 1984-03-29 | 1985-10-17 | Sony Corp | Magnetic head |
-
1986
- 1986-06-13 JP JP61137740A patent/JPH0656645B2/en not_active Expired - Fee Related
-
1987
- 1987-04-04 KR KR1019870003220A patent/KR900007490B1/en not_active IP Right Cessation
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS59193516A (en) * | 1983-04-19 | 1984-11-02 | Pioneer Electronic Corp | Magnetic head |
| JPS60125909A (en) * | 1983-12-12 | 1985-07-05 | Victor Co Of Japan Ltd | Magnetic head |
| JPS60205808A (en) * | 1984-03-29 | 1985-10-17 | Sony Corp | Magnetic head |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH01260615A (en) * | 1988-04-12 | 1989-10-17 | Nec Kansai Ltd | Magnetic head |
| JPH02192006A (en) * | 1988-11-30 | 1990-07-27 | Mitsumi Electric Co Ltd | Magnetic head and production thereof |
| JPH02105210U (en) * | 1989-01-31 | 1990-08-21 | ||
| JPH02310807A (en) * | 1989-05-25 | 1990-12-26 | Alps Electric Co Ltd | Magnetic head |
Also Published As
| Publication number | Publication date |
|---|---|
| KR900007490B1 (en) | 1990-10-10 |
| KR880000914A (en) | 1988-03-30 |
| JPH0656645B2 (en) | 1994-07-27 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| LAPS | Cancellation because of no payment of annual fees |