JPS62293718A - 露光装置 - Google Patents

露光装置

Info

Publication number
JPS62293718A
JPS62293718A JP61136182A JP13618286A JPS62293718A JP S62293718 A JPS62293718 A JP S62293718A JP 61136182 A JP61136182 A JP 61136182A JP 13618286 A JP13618286 A JP 13618286A JP S62293718 A JPS62293718 A JP S62293718A
Authority
JP
Japan
Prior art keywords
optical system
wafer
aberration
observation
image
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP61136182A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0235447B2 (cg-RX-API-DMAC7.html
Inventor
Akiyoshi Suzuki
章義 鈴木
Hideki Ine
秀樹 稲
Masao Kosugi
小杉　雅夫
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP61136182A priority Critical patent/JPS62293718A/ja
Publication of JPS62293718A publication Critical patent/JPS62293718A/ja
Priority to US07/333,727 priority patent/US4888614A/en
Publication of JPH0235447B2 publication Critical patent/JPH0235447B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP61136182A 1986-05-30 1986-06-13 露光装置 Granted JPS62293718A (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP61136182A JPS62293718A (ja) 1986-06-13 1986-06-13 露光装置
US07/333,727 US4888614A (en) 1986-05-30 1989-04-03 Observation system for a projection exposure apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP61136182A JPS62293718A (ja) 1986-06-13 1986-06-13 露光装置

Publications (2)

Publication Number Publication Date
JPS62293718A true JPS62293718A (ja) 1987-12-21
JPH0235447B2 JPH0235447B2 (cg-RX-API-DMAC7.html) 1990-08-10

Family

ID=15169258

Family Applications (1)

Application Number Title Priority Date Filing Date
JP61136182A Granted JPS62293718A (ja) 1986-05-30 1986-06-13 露光装置

Country Status (1)

Country Link
JP (1) JPS62293718A (cg-RX-API-DMAC7.html)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5094539A (en) * 1988-03-07 1992-03-10 Hitachi, Ltd. Method of making semiconductor integrated circuit, pattern detecting method, and system for semiconductor alignment and reduced stepping exposure for use in same
US5231467A (en) * 1990-09-20 1993-07-27 Matsushita Electric Industrial Co., Ltd. Reflective alignment position signal producing apparatus
US5432608A (en) * 1988-03-07 1995-07-11 Hitachi, Ltd. Method of making semiconductor integrated circuit, pattern detecting method, and system for semiconductor alignment and reduced stepping exposure for use in same
KR20130089581A (ko) * 2010-06-25 2013-08-12 케이엘에이-텐코 코포레이션 웨이퍼 검사 툴에서의 원자외선 레이저의 수명 연장 방법 및 장치

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4546830B2 (ja) * 2002-09-30 2010-09-22 アプライド マテリアルズ イスラエル リミテッド 暗フィールド検査システム

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3963353A (en) * 1974-09-26 1976-06-15 The Perkin-Elmer Corporation Monolithic beam splitter mirror arrangement
JPS56110234A (en) * 1980-02-06 1981-09-01 Canon Inc Projection printing device
US4357100A (en) * 1979-01-11 1982-11-02 Censor Patent- Und Versuchs-Anstalt Arrangement for projection copying masks on to a work piece
JPS60186845A (ja) * 1984-03-06 1985-09-24 Nippon Kogaku Kk <Nikon> 露光装置の位置合せ装置

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3963353A (en) * 1974-09-26 1976-06-15 The Perkin-Elmer Corporation Monolithic beam splitter mirror arrangement
US4357100A (en) * 1979-01-11 1982-11-02 Censor Patent- Und Versuchs-Anstalt Arrangement for projection copying masks on to a work piece
JPS56110234A (en) * 1980-02-06 1981-09-01 Canon Inc Projection printing device
JPS60186845A (ja) * 1984-03-06 1985-09-24 Nippon Kogaku Kk <Nikon> 露光装置の位置合せ装置

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5094539A (en) * 1988-03-07 1992-03-10 Hitachi, Ltd. Method of making semiconductor integrated circuit, pattern detecting method, and system for semiconductor alignment and reduced stepping exposure for use in same
US5432608A (en) * 1988-03-07 1995-07-11 Hitachi, Ltd. Method of making semiconductor integrated circuit, pattern detecting method, and system for semiconductor alignment and reduced stepping exposure for use in same
US5231467A (en) * 1990-09-20 1993-07-27 Matsushita Electric Industrial Co., Ltd. Reflective alignment position signal producing apparatus
KR20130089581A (ko) * 2010-06-25 2013-08-12 케이엘에이-텐코 코포레이션 웨이퍼 검사 툴에서의 원자외선 레이저의 수명 연장 방법 및 장치

Also Published As

Publication number Publication date
JPH0235447B2 (cg-RX-API-DMAC7.html) 1990-08-10

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Legal Events

Date Code Title Description
EXPY Cancellation because of completion of term