JPS62292690A - Boat for growing ii-vi compound single crystal - Google Patents

Boat for growing ii-vi compound single crystal

Info

Publication number
JPS62292690A
JPS62292690A JP13298386A JP13298386A JPS62292690A JP S62292690 A JPS62292690 A JP S62292690A JP 13298386 A JP13298386 A JP 13298386A JP 13298386 A JP13298386 A JP 13298386A JP S62292690 A JPS62292690 A JP S62292690A
Authority
JP
Japan
Prior art keywords
boat
single crystal
opening
growing
melt
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP13298386A
Other languages
Japanese (ja)
Other versions
JPH0735318B2 (en
Inventor
Katsumi Mochizuki
勝美 望月
Takeshi Masumoto
剛 増本
Takeshi Miyazaki
健史 宮崎
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sumitomo Electric Industries Ltd
Original Assignee
Sumitomo Electric Industries Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Electric Industries Ltd filed Critical Sumitomo Electric Industries Ltd
Priority to JP61132983A priority Critical patent/JPH0735318B2/en
Publication of JPS62292690A publication Critical patent/JPS62292690A/en
Publication of JPH0735318B2 publication Critical patent/JPH0735318B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Abstract

PURPOSE:To prevent loss of the raw material and to improve yield by providing a lid having an opening to the title boat to be used for single crystal growth at the time of producing a II-VI compd. single crystal by a horizontal Bridgman technique. CONSTITUTION:The boat 7 for growing a single crystal is composed of a boat bottom 1 and the lid 2 having the opening 3, the area of the opening 3 is controlled to <=10mm<2>, and the shape is not specified. A II-VI compd. is firstly charged on the boat bottom 1, covered with the lid 2, and set at the specified position of the reaction part 4 of a reaction vessel 6. The reaction vessel 6 is then evacuated. Subsequently, a single crystal 10 is grown from the melt 9 of the II-VI compd. by a horizontal Bridgman technique. The opening 3 is preferably provided on the rear side in the growth direction of the single crystal 10 to suppress the vapor pressure. Consequently, the vaporization of the melt 9 from the surface toward a reservoir part 5 is prevented, and loss of the raw material is prevented.

Description

【発明の詳細な説明】 3、発明の詳細な説明 〈産業上の利用分野〉 この発明は、I[−VT族化合物単結晶成長用ボートに
関する。さらに詳細には、この発明は原料の損失を防止
し収率の向上が図れるII −VI族化合物単結晶成長
用ポートに関する。
Detailed Description of the Invention 3. Detailed Description of the Invention (Field of Industrial Application) The present invention relates to a boat for growing single crystals of I[-VT group compounds. More specifically, the present invention relates to a port for single crystal growth of Group II-VI compounds that can prevent loss of raw materials and improve yield.

〈従来の技術〉 従来、II−VI族化合物単結晶の製造方法として、種
々の方法が用いられているが、そのような方法の一つと
して、第3図に示されるような単結晶成長用のボートを
用いた水平ブリッジマン法を挙げることができる。この
装置を用いて■−■族化合物単結晶、例えば、CdTe
化合物単結晶を製造する一例を説明すると、反応部(4
)とりザーバ一部(5)とがキャピラリーで連通された
反応容器(6)を使用し、リザーバ一部(5)に適量の
Cdを加えるとともに反応部(4)に設けられた単結晶
成長用ボート[7]内にCdTe化合物原料を仕込んだ
後、反応容器(6)を減圧し真空とする。そして、反応
容器(6)を炉(8)により外部から加熱し、CdTe
化合物原料を溶融させて融液(9)とした後、単結晶成
長用ボート(71の一端に設けられた棚部に保持された
CdTe化合物単結晶(種子結晶)を該融液(9)に接
触させ、結晶成長を開始させる。その後、炉(8)の温
度分布を移l1lI(装置によっては、炉またはボート
の移動)させて結晶を成長させ、CdTe化合物単結晶
(ト))が製造される。上記の製造方法において、該炉
(8)の温度分布は、反応容器(6)内部の蒸気圧の制
御を行ないつつ単結晶の成長を行うため、通常、第4図
に示されるように、71  (CdTe化合物の融点)
以上の温度領域、前記T1と後記T3との間の温度であ
るT2の温度領域、および反応系内を化学量論的な化合
物を得るに適した蒸気圧に保持するために、蒸気圧制御
物質(上記の例ではCd)を蒸発させるに必要な加熱温
度であるT3の温度領域の3つの定温度帯となされてい
る。
<Prior Art> Conventionally, various methods have been used to produce single crystals of group II-VI compounds, and one such method is a method for growing single crystals as shown in FIG. One example is the horizontal Bridgman method using a boat. This device can be used to produce single crystals of ■-■ group compounds, such as CdTe.
To explain an example of manufacturing a compound single crystal, the reaction part (4
) Using a reaction vessel (6) which is connected to a part of the reservoir (5) through a capillary, an appropriate amount of Cd is added to the part of the reservoir (5), and a part for single crystal growth provided in the reaction part (4) is used. After charging the CdTe compound raw material into the boat [7], the pressure of the reaction vessel (6) is reduced to create a vacuum. Then, the reaction vessel (6) is heated from the outside by the furnace (8), and the CdTe
After melting the compound raw material to form a melt (9), a CdTe compound single crystal (seed crystal) held on a shelf provided at one end of the single crystal growth boat (71) is added to the melt (9). Then, the temperature distribution of the furnace (8) is changed (depending on the device, the furnace or boat is moved) to grow the crystal, and a CdTe compound single crystal (7) is produced. Ru. In the above manufacturing method, the temperature distribution of the furnace (8) is usually 71°C as shown in FIG. (Melting point of CdTe compound)
In order to maintain the above temperature range, the temperature range T2 which is a temperature between T1 and T3 mentioned above, and the inside of the reaction system at a vapor pressure suitable for obtaining a stoichiometric compound, a vapor pressure controlling substance is used. There are three constant temperature zones in the temperature range T3, which is the heating temperature necessary to evaporate Cd (in the above example).

〈発明が解決しようとする問題点〉 しかしながら、CdTc化合物は融点における解離圧が
大きく、またCdおよびTeは共に高い蒸気圧を示す。
<Problems to be Solved by the Invention> However, the CdTc compound has a high dissociation pressure at its melting point, and both Cd and Te exhibit high vapor pressures.

特にCdは蒸気圧が高いので、上記方法のような化学量
論的組成制御のCd圧においても単結晶成長用ボートf
71内の融液(9)の表面からりザーバ一部(5)への
蒸発が生じ、原料の損失が大きいという問題がある。特
に、大型の単結晶を製造する際には、成長用ボートも大
型となり、表面積も広くなるので、蒸発による損失は大
きなものとなる。
In particular, since Cd has a high vapor pressure, even when the Cd pressure is stoichiometrically controlled as in the above method, the single crystal growth boat f
There is a problem in that the melt (9) in 71 evaporates from the surface to a part of the reservoir (5), resulting in a large loss of raw material. In particular, when producing large single crystals, the growth boat becomes large and the surface area becomes large, so losses due to evaporation become large.

く目 的〉 この発明は上記問題点に鑑みてなされたものであり、成
長用ボート表面からの蒸発を制御し、原料の損失を防止
できる■−■族化合物単結晶成長用ボートを提供するこ
とを目的とする。
Purpose This invention has been made in view of the above problems, and it is an object of the present invention to provide a boat for single crystal growth of ■-■ group compounds that can control evaporation from the surface of the growth boat and prevent loss of raw materials. With the goal.

く構成〉 上記目的を達成するためになされた、この発明の■−■
族化合物単結晶成長用ボートは、開口部を有する有蓋の
単結晶成長用ボートであることを特徴とし、該開口部は
小面積であることが好ましい。
■-■ of this invention made to achieve the above object
The boat for single crystal growth of group compounds is characterized by being a closed single crystal growth boat having an opening, and the opening preferably has a small area.

く作 用〉 この発明は、上記の構成よりなり、成長用ボート内の融
液は、開口部を有づる益で覆われるので、該葺が融液表
面からの蒸発の抵抗体となり、原料の4失を減少させる
ことができる。特に、開口部が小面積であれば、この効
果は一層大きくなる。
Function> The present invention has the above-mentioned configuration, and since the melt in the growth boat is covered with a layer having an opening, the covering acts as a resistance to evaporation from the surface of the melt, thereby preventing the raw material from evaporating. 4 losses can be reduced. In particular, if the area of the opening is small, this effect will be even greater.

〈実施例〉 以下、実施例を示す添附図面に基づいて詳細に説明する
<Examples> Hereinafter, examples will be described in detail based on the accompanying drawings showing examples.

第1図は、この発明の■−■族化合物単結晶成長用ポー
トの一実施例を示す斜視図で、ボート底部(1)、fi
121および開口部(3)で構成されている5ボ一ト底
部(1)は従来から使用されている単結晶成長用ボート
と実質的に同一のものである。該ボート底部(1)の上
方開口面はMI2Jで覆われ、MI2Jにはスリット状
の開口部(3)が識語(2)の幅方向に沿って設けられ
ている。ボート底部(1)と益(′2Jとは融着Mによ
り封着してもよいが、封着しなくとも、この発明の効果
は充分に達成することができる。開口部(3)の形状は
、特に限定されず、上記のJ:うにスリット状としても
よいし、小穴状等でもよい。また、益(2)を2つに分
け、その部分されたM[2]をボート底部(1)上に小
間隔をJ3いて覆設することによって開口部(3)を形
成してもよい。さらに、開口部(3)は上記実施例とは
異なり、該葺(2)の長さ方向に泊って設けられていて
もよい。
FIG. 1 is a perspective view showing an embodiment of the port for growing single crystals of group ■-■ group compounds of the present invention, showing the bottom of the boat (1), the fi
121 and an opening (3), the five-bottom bottom (1) is substantially the same as a conventional single crystal growth boat. The upper opening surface of the boat bottom (1) is covered with MI2J, and MI2J is provided with a slit-shaped opening (3) along the width direction of the mark (2). The boat bottom (1) and the hole ('2J) may be sealed by fusion M, but the effects of the present invention can be fully achieved without sealing.The shape of the opening (3) is not particularly limited, and may be in the shape of a slit or a small hole, etc.Also, divide the profit (2) into two parts, and place the divided part M[2] at the bottom of the boat (1 ) The opening (3) may be formed by covering the roof (2) at a small interval.Furthermore, the opening (3) is different from the above embodiment in that it extends in the length direction of the roof (2). It may be provided for overnight stay.

この発明にあっては、開口部(3)の形状等よりもぞの
面積が重要な意味を有し、開口部(3)の面積を10m
−以下とづるのが制御性の面から好ましい。
In this invention, the area of the opening (3) is more important than the shape etc., and the area of the opening (3) is set to 10 m.
- The following is preferable from the viewpoint of controllability.

上記ボート底部(1)および益(2)の材質としては、
外部より結晶の成長状態を観察できる点から透明石英が
好ましいが、予め設定された条件で製造を行うように観
察が不要の場合には、セラミックス、BN、SiC,A
l10s等の材質でもよい。
The materials for the bottom of the boat (1) and bottom (2) are as follows:
Transparent quartz is preferable because it allows observation of the crystal growth state from the outside, but if observation is not necessary because the manufacturing is performed under preset conditions, ceramics, BN, SiC, A
It may be made of a material such as l10s.

次に、この発明にかかる単結晶成長用ボートの使用法の
一例を説明すると、まずボート底部(1)の内部にIr
 −VI族化合物単結晶原料を充填し、開口部(3)を
有するHI2Jで苛った後、第3図で示される装置の反
応部(4)の所定位置に設置し、反応容器(6)を減圧
し真空とする。以下、従来の水平ブリッジマン法に準じ
て、ff−Vi族化合物単結晶を成長させる。上記の製
造方法中、開口部(3)は結晶の成長方向に向かって後
ろ側に設ける方が蒸気圧の制御を行うには好ましい。従
って、益(2)に開口部(3)を設ける際にも、益(2
)の長さ方向の一端に寄った部分に開口部(3)を設け
ることが好ましい。
Next, an example of how to use the boat for single crystal growth according to the present invention will be explained.
- After filling the group VI compound single crystal raw material and cauterizing it with HI2J having an opening (3), the reaction vessel (6) is placed in a predetermined position in the reaction part (4) of the apparatus shown in FIG. Reduce the pressure to create a vacuum. Thereafter, an ff-Vi group compound single crystal is grown according to the conventional horizontal Bridgman method. In the above manufacturing method, it is preferable to provide the opening (3) on the rear side in the direction of crystal growth in order to control the vapor pressure. Therefore, when providing the opening (3) in the profit (2),
) is preferably provided with an opening (3) near one end in the length direction.

以下、実験例をもって、この発明をより詳細に説明する
This invention will be explained in more detail below using experimental examples.

実験例 スリット面積を変化させた、第1図に示される単結晶成
長用ボート(長さ1701N#11幅20in、深さ1
0順)を作製し、該ボート内にCdTe化合物原料を一
部吊仕込んだ後、第3図に示される装置の反応部の所定
位置に設置し、TI=1170℃、T2=1050℃お
よびT3 = 820℃の温度条件で加熱し、原料のロ
ス量を測定した。ロス量の測定は、CdTe化合物を含
むボートの加熱前後の重量の差により求めた。その結果
を第2図に示す。
Experimental example A single crystal growth boat (length 1701N #11 width 20 inches, depth 1
After preparing a CdTe compound raw material and suspending a portion of the CdTe compound raw material into the boat, it was installed at a predetermined position in the reaction section of the apparatus shown in FIG. = 820° C., and the amount of raw material loss was measured. The amount of loss was determined by the difference in weight of the boat containing the CdTe compound before and after heating. The results are shown in FIG.

第2図から明らかなように、ロス量は、ある間口面積(
SO)までは開口面積に比例して増加覆るが、SOを越
えるとロス量の変化はなくなり、Cd分圧や融液温度の
影響が強くなる。種々の実験の結果、クリティカルポイ
ントSOは、Cd分圧や融液条件により若干の変化が見
られるが、おおよそ2〜10−の範囲に存在する。従っ
て、開口部の面積は10m1以下とするのが好ましい。
As is clear from Figure 2, the amount of loss is determined by a certain frontage area (
Up to SO), the loss increases in proportion to the opening area, but beyond SO, the amount of loss does not change, and the influence of Cd partial pressure and melt temperature becomes stronger. As a result of various experiments, the critical point SO exists approximately in the range of 2 to 10<-> although some changes are observed depending on the Cd partial pressure and melt conditions. Therefore, it is preferable that the area of the opening is 10 m1 or less.

く効果〉 以上のように、この発明の■−■族化合物単結晶成長用
ボートによれば、開口部を有する蓋が融液表面からの蒸
発を抑制するので、原料の損失を防止でき、生産性の向
上に寄与できるという特有の効果を奏する。
Effects> As described above, according to the boat for single crystal growth of group ■-■ group compounds of the present invention, the lid having the opening suppresses evaporation from the surface of the melt, which prevents loss of raw materials and improves production. It has the unique effect of contributing to improving sexual performance.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は、この発明にがかる■−■族化合物単結晶成長
用ポートの一実施例を示す斜視図、第2図は、実験例に
おける間口面積とロス量の関係を示す図、 第3図および第4図は、それぞれ水平ブリッジマン法に
用いられる装置の概略図および温度制御例の概略図であ
る。 (1)・・・・・・ボート底部    (2)・・・・
・・益0)・・・・・・開口部
FIG. 1 is a perspective view showing an embodiment of a port for growing single crystals of ■-■ group compounds according to the present invention, FIG. 2 is a diagram showing the relationship between frontage area and amount of loss in an experimental example, and FIG. and FIG. 4 are a schematic diagram of an apparatus used in the horizontal Bridgman method and a schematic diagram of an example of temperature control, respectively. (1)・・・Bottom of the boat (2)・・・・
・・Profit 0)・・・・Opening

Claims (1)

【特許請求の範囲】 1、水平ブリッジマン法によるII−VI族化合物単結晶の
製造に使用される単結晶成長用ボートにおいて、該ボー
トが開口部を有する有蓋ボートであることを特徴とする
II−VI族化合物単結晶成長用ボート。 2、開口部の面積が、10mm^2以下である上記特許
請求の範囲第1項記載のII−VI族化合物単結晶成長用ボ
ート。
[Claims] 1. A boat for single crystal growth used for producing a II-VI group compound single crystal by the horizontal Bridgman method, characterized in that the boat is a covered boat having an opening.
Boat for single crystal growth of II-VI group compounds. 2. The boat for growing a group II-VI compound single crystal according to claim 1, wherein the area of the opening is 10 mm^2 or less.
JP61132983A 1986-06-09 1986-06-09 <II>-<VI> Group compound single crystal growth boat Expired - Fee Related JPH0735318B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP61132983A JPH0735318B2 (en) 1986-06-09 1986-06-09 <II>-<VI> Group compound single crystal growth boat

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP61132983A JPH0735318B2 (en) 1986-06-09 1986-06-09 <II>-<VI> Group compound single crystal growth boat

Publications (2)

Publication Number Publication Date
JPS62292690A true JPS62292690A (en) 1987-12-19
JPH0735318B2 JPH0735318B2 (en) 1995-04-19

Family

ID=15094042

Family Applications (1)

Application Number Title Priority Date Filing Date
JP61132983A Expired - Fee Related JPH0735318B2 (en) 1986-06-09 1986-06-09 <II>-<VI> Group compound single crystal growth boat

Country Status (1)

Country Link
JP (1) JPH0735318B2 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH026330A (en) * 1988-03-07 1990-01-10 Sanyo Electric Co Ltd Production of superconducting material and superconducting single crystal

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5747795A (en) * 1980-08-09 1982-03-18 Hitachi Cable Ltd Manufacture of mixed single crystal
JPS58129634U (en) * 1982-02-25 1983-09-02 富士通株式会社 Ampoule for manufacturing semiconductor crystals
JPS5983914A (en) * 1982-10-29 1984-05-15 Fujitsu Ltd Method for forming alloy containing easily evaporable component

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5747795A (en) * 1980-08-09 1982-03-18 Hitachi Cable Ltd Manufacture of mixed single crystal
JPS58129634U (en) * 1982-02-25 1983-09-02 富士通株式会社 Ampoule for manufacturing semiconductor crystals
JPS5983914A (en) * 1982-10-29 1984-05-15 Fujitsu Ltd Method for forming alloy containing easily evaporable component

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH026330A (en) * 1988-03-07 1990-01-10 Sanyo Electric Co Ltd Production of superconducting material and superconducting single crystal

Also Published As

Publication number Publication date
JPH0735318B2 (en) 1995-04-19

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