JPS6228574B2 - - Google Patents

Info

Publication number
JPS6228574B2
JPS6228574B2 JP53008340A JP834078A JPS6228574B2 JP S6228574 B2 JPS6228574 B2 JP S6228574B2 JP 53008340 A JP53008340 A JP 53008340A JP 834078 A JP834078 A JP 834078A JP S6228574 B2 JPS6228574 B2 JP S6228574B2
Authority
JP
Japan
Prior art keywords
etching
etched
silicon oxide
gas
ion
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP53008340A
Other languages
English (en)
Japanese (ja)
Other versions
JPS54102872A (en
Inventor
Yasuhiro Horiike
Masahiro Shibagaki
Katsuo Sumino
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Shibaura Electric Co Ltd filed Critical Tokyo Shibaura Electric Co Ltd
Priority to JP834078A priority Critical patent/JPS54102872A/ja
Publication of JPS54102872A publication Critical patent/JPS54102872A/ja
Publication of JPS6228574B2 publication Critical patent/JPS6228574B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Drying Of Semiconductors (AREA)
JP834078A 1978-01-30 1978-01-30 Ion etching method Granted JPS54102872A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP834078A JPS54102872A (en) 1978-01-30 1978-01-30 Ion etching method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP834078A JPS54102872A (en) 1978-01-30 1978-01-30 Ion etching method

Publications (2)

Publication Number Publication Date
JPS54102872A JPS54102872A (en) 1979-08-13
JPS6228574B2 true JPS6228574B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1987-06-22

Family

ID=11690465

Family Applications (1)

Application Number Title Priority Date Filing Date
JP834078A Granted JPS54102872A (en) 1978-01-30 1978-01-30 Ion etching method

Country Status (1)

Country Link
JP (1) JPS54102872A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63271694A (ja) * 1987-04-30 1988-11-09 株式会社東芝 ト−クンカ−ド
JPH01143016A (ja) * 1987-11-28 1989-06-05 Furukawa Electric Co Ltd:The 磁気・光学複合記録媒体

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5683942A (en) * 1979-12-12 1981-07-08 Matsushita Electronics Corp Plasma etching of poly-crystal semiconductor
EP0413042B1 (en) * 1989-08-16 1992-12-16 International Business Machines Corporation Method of producing micromechanical sensors for the afm/stm profilometry and micromechanical afm/stm sensor head
JP2992596B2 (ja) * 1992-12-16 1999-12-20 科学技術庁長官官房会計課長 ＳｉＣのパターンエッチング方法及びそれを用いたラミナー型ＳｉＣ回折格子の製造方法

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS52127167A (en) * 1976-04-19 1977-10-25 Fujitsu Ltd Etching method

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63271694A (ja) * 1987-04-30 1988-11-09 株式会社東芝 ト−クンカ−ド
JPH01143016A (ja) * 1987-11-28 1989-06-05 Furukawa Electric Co Ltd:The 磁気・光学複合記録媒体

Also Published As

Publication number Publication date
JPS54102872A (en) 1979-08-13

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