JPS62285321A - Manufacture of electrically insulated conductor - Google Patents

Abstract

(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.

Description

Detailed Description of the Invention 3. Detailed Description of the Invention [Field of Industrial Application] The present invention relates to a method of manufacturing an electrically insulated conductor, and in particular, the present invention relates to a method of manufacturing an electrically insulated conductor, and in particular, the invention relates to a method of manufacturing an electrically insulated conductor, and in particular, the invention relates to a method of manufacturing an electrically insulated conductor, and in particular, the invention relates to a method of manufacturing an electrically insulated conductor. The present invention relates to a method of manufacturing an electrically insulated conductor forming an insulating film.

[Conventional technology]

First, the principle of electrodeposition will be explained. Mica powder, which is normally negatively charged in water, and an electrodeposition solution made by adding water to water-dispersed varnish, which is also negatively charged, are placed in an electrodeposition tank, and the conductor to be electrodeposited is immersed in the electrodeposition solution to form an anode. When a DC voltage is applied using the electrodeposition tank as a cathode, an electrodeposited layer containing mica powder as a main component is formed on the surface of the electrodeposited object. Here, the water-dispersed varnish is used to increase the adhesive strength between the mica powders.

As a conventional method for manufacturing electrically insulated conductors, Japanese Patent Application Laid-Open No. 58-5
The first method disclosed in Bulletin No. 5967 will be explained with reference to FIG. In FIG. 2, a nozzle (2) is provided in an electrodeposition tank (1) facing a conductive electrodeposited object (3), and the electrodeposition liquid (4) is pumped through first and second pumps (3). ), (6
). (7) is a turning plate.

This method requires a main fi (P) for circulating the electrodeposition liquid (4) at a constant speed and a stirring flow (Q) for stirring the electrodeposition liquid (4). Two sets of devices for circulating the water are also required. Here, if the electrodeposited object (3) is a hexagonal conductor, the film thickness will be uneven between the surface facing the flow of the electrodeposition liquid (4) and the shadow part. At an intermediate point in the progress of electrodeposition, the application of DC voltage was temporarily stopped, the electrodeposited object (6) was rotated 1800 times with respect to the vertical line, and electrodeposition was performed again. After the electrodeposition was completed, the electrodeposition object (3) Rotate 180° again and return to the original position. Therefore, if the time required for electrodeposition is T4, the first half electrodeposition time T2, the second half electrodeposition time T3, and the rotation time T5, then T4 = T2 +TA±2·T5.

In addition, as a conventional method for manufacturing electrically insulated conductors,
There is a second method disclosed in Japanese Patent No. 8-1513808, which will be explained with reference to FIG. In Figure 6,
A discharge nozzle (
9), and the electrodeposition tank (8) has a suction hole (10) for the electrodeposition liquid (4) at the bottom, an overflow pipe (11), and an inflow pipe (12) at the side. ing. Then, the electrodeposition liquid (4) is discharged from the discharge nozzle (9) to the electrodeposition tank (8).
) and circulate at low speed. Next, the electrodeposition liquid supply system consisting of an overflow pipe (11) and an inflow pipe (12) has the function of supplying the electrodeposition liquid (4) consumed during electrodeposition and keeping the electrodeposition liquid level constant. . If this device is used, the mica powder will not settle at the bottom of the electrodeposition tank (8), the electrodeposition solution (4) will circulate at a low speed, and the mica powder will be evenly distributed in the electrodeposition tank (8). , a uniform film can be obtained without rotating the electrodeposited object when DC voltage is applied.

[Problem that the invention seeks to solve]

The conventional method for producing electrically insulated conductors as described above is as follows: In the first method, the application of DC voltage is temporarily stopped during the progress of electrodeposition, the object to be electrodeposited is rotated 180 degrees, and after the electrodeposition is completed, Since this method requires an extra step of rotating the electrodeposited material again, when this method is applied to a production line for mass production, there is a lot of wasted time, resulting in poor productivity. There were problems such as complicated speed control of the agitation flow.

In addition, in the second method, precipitation of mica powder can be prevented by the tapered shape of the bottom of the electrodeposition tank, but strictly speaking, the distribution of mica powder cannot be said to be uniform in each part of the electrodeposition tank. When electrodepositing a relatively large hexagonal conductor, the film thickness will be non-uniform, and if the electrodeposition is performed so that the part where it is most difficult to form a film has a thickness greater than the set thickness, other parts of the conductor may Since an extra thick film is formed in the parts, if a coil is made by combining these electrodeposited conductors, the dimensions will be larger compared to the coil made by the first method, and it will not fit inside the rotating machine slot. There was a problem in that the space factor of the rotary machine deteriorated, which became one of the factors that made it difficult to make the rotating machine smaller and lighter.

This invention was made to solve these problems, and it not only shortens the time required for electrodeposition and improves productivity, but also makes it easier to control the speed of the electrodeposition solution, and also eliminates the need for layered and curly coatings. The purpose of the present invention is to obtain a method for producing an electrically insulated conductor that enables the production of a more compact coil, improves the space factor, and reduces the size and weight of a rotating machine.

[Means for solving problems]

The method for manufacturing an electrically insulated conductor according to the present invention includes flowing the electrodeposition liquid in the electrodeposition tank vertically downward from the liquid level at low speed, and reciprocating the electrodeposited material of the conductor in the horizontal direction when a DC voltage is applied. By increasing the relative speed between the conductor and the electrodeposition liquid, mica powder is deposited on the conductor surface in a layered manner and with a uniform thickness.

[Effect]

In this invention, the total time required for electrodeposition is T1 (se
c, ), the time to move the conductor in one direction while applying a DC voltage is T2 (813C,), and the time to move the conductor in the opposite direction is T3 [8θc,), then T+ = T2
+T3.

On the other hand, in the first conventional method, the conductor must be rotated by a certain angle at the intermediate point of electrodeposition, and the rotation time is T4 (se
c.), the total time required for electrodeposition in the conventional method is '
If rs(sea,], then TS = T2+T!l
-1-2・T4, therefore T+ (Ts.

Furthermore, in order to control the flow rate of the electrodeposition liquid in this invention, while the electrodeposition liquid in the electrodeposition bath is flowing vertically downward from the liquid surface at a low speed, the conductor is reciprocated in the horizontal direction when a DC voltage is applied. Since the method uses a method of increasing the relative velocity of the conductor and the electrodepositing liquid, the reciprocating speed of the conductor can replace the conventional control of the flow rate of the electrodepositing liquid, allowing fine-grained speed control and setting the optimal conditions. can.

〔Example〕

An embodiment of the present invention will be described below with reference to FIG. In FIG. 1, a slide base (one slide base) is engaged with a lifting device (13) provided on the side of an electrodeposition bath (8) having a tapered bottom surface via a hydraulic cylinder (13).

The electrodeposited object (3) is attached to a support rod (17) via a hanging device (16).
) is suspended and supported.

In addition, the same reference numerals as in FIG. 3 indicate the same parts.

With the above device, the electrodeposition liquid (4) first enters the electrodeposition tank (8) from the discharge nozzle (9), passes through the electrodeposition liquid circulation pump from the suction hole (10), and returns to the discharge nozzle (9). ). Further, an electrodeposition liquid supply system consisting of an overflow pipe (11) and an inflow pipe (12) replenishes the electrodeposition liquid (4) consumed during electrodeposition and maintains a constant level of the electrodeposition liquid. .

When the conductor to be electrodeposited (3) is set together with the hanging tool (16) in a fixed position on the support rod (17), the lifting device (13) operating in the direction of arrow (B) descends and removes the conductor. The electrodeposited material (3) is immersed in the electrodeposition liquid (4). Next, the conductor electrodeposited material (3) is used as an anode, the electrodeposition tank (8) is used as a cathode,
At the same time when a DC voltage is applied between these, the hydraulic cylinder (13) is actuated to apply the arrow mark ( A reciprocating motion is performed in the horizontal direction shown in A), and when the electrodeposition is completed, the lifting device (13) rises to take out the electrodeposited object (3) from the electrodeposition tank (8).

Note that the above steps can be executed automatically.

In the above manufacturing method, the average moving speed of the reciprocating movement of the electrodeposited material (3) during application of DC voltage is 1.2WL/Tni
A range of n to 12 ffL/min is preferred. If the moving speed is higher than this range, the film thickness will be uneven due to the influence of vortices generated in the shadow part against the flow in the moving direction, and if the moving speed is lower than the above range, the effect of the reciprocating motion of the conductor will be less and the film thickness will be uneven. If the thickness becomes uneven, the number of times of this reciprocating movement (the force may be any number of times as long as it is one or more times, but depending on the electrodeposition time (T), the size of the electrodeposited object (3) and Electrodeposition tank (
Stroke (L) of reciprocating motion set from the dimensions of 8)
It is determined by the following equation from the three-way relationship between

7=-r- The average flow velocity of the electrodeposition liquid (4) in the vertical downward direction is 0.5"/
mx n or more is preferred. If the average flow velocity is lower than this, the distribution of mica powder will be uneven, and the film formed after electrodeposition will also vary. Further, although there is no particular restriction on the maximum value of the flow velocity, increasing the flow velocity only unnecessarily increases equipment costs and power consumption, and there is no benefit at all.

Table 1 below shows data from various experimental examples. That is, in Experimental Example 1, 85 M of mica powder was added to the electrodeposition tank (8) at a ratio of 85 M parts by weight to 15 parts by weight of the resin content of the water-dispersed varnish. An electrodeposition solution (4) with a non-volatile content of 12% was prepared by mixing and adding ion-exchanged water. This electrodeposition liquid (4) is applied to IWL/
With a constant flow in the vertical downward direction at a flow rate of min., a DC voltage of 100 V was applied for 24 seconds to the electrodeposited object (3) of a hexagonal conductor, and then a moving speed of 6"L/rnin and a reciprocating stroke of 0.4 tn were applied. This shows that an electrodeposited film with an average thickness of 1.OOn+ was formed on the conductor surface by performing three reciprocating movements.In both Experimental Examples 1 and 2. The film was deposited with a uniform thickness.

〔Effect of the invention〕

As is clear from the above description, this invention allows the electrodeposition liquid in the electrodeposition tank to flow vertically downward from the liquid surface at low speed, and
By reciprocating the electrodeposition material in the horizontal direction when a DC voltage is applied and increasing the relative speed between the electrodeposition material and the electrodeposition liquid, the electrodeposition time is shortened, productivity is improved, and the speed of the electrodeposition liquid can be controlled. In addition, since the mica powder is deposited in layers on the surface of the electrodeposited object in this way and has a uniform thickness, there is no need for excessive film thickness to exist on each part of the electrodeposited object. First, the dimensions of a coil formed by combining several electrodeposited materials become compact, improving the space factor, and it becomes possible to reduce the size and weight of a rotating machine using such a coil.

[Brief explanation of drawings]

FIG. 1 is a perspective view of an apparatus for explaining an embodiment of the present invention, and FIGS. 2 and 6 are a front sectional view and a perspective view, respectively, for explaining a conventional method of manufacturing an electrically insulated conductor. . (3): Conductor electrodeposited object, (4): Electrodeposition liquid, (8): Electrodeposition tank, (9): Discharge nozzle, (10): Suction hole, (11
) Niober flow tube, (12) two inflow tubes, ([)
: Lifting device, (14) Nislide base, (13) Two hydraulic cylinders, (16) : Lifting device, (17) : Support rod. In each figure, the same reference numerals indicate the same or corresponding parts. Atsushi 2 Zudantomi.

Claims (3)

[Claims] (1) A conductor to be electrodeposited to form a coil of a rotating machine is immersed in an electrodeposition solution containing mica powder as a main component and a small amount of water-dispersed varnish in an electrodeposition bath. in the method of forming an insulating film on the electrodeposited object by co-electrodeposition of the mica powder and the water-dispersed varnish by applying a DC voltage between the electrode and the electrodeposition bath serving as the other electrode, The insulating film is formed by causing the electrodeposited material to reciprocate horizontally while applying a DC voltage while flowing the electrodeposition liquid vertically downward from the liquid level in the electrodeposition tank at a low speed. A method for producing a featured electrically insulated conductor. (2) The average flow velocity of the electrodeposition liquid is at least 0.5 m/min.
The average moving speed of the electrodeposited material in the horizontal direction is 1.2 m/m.
2. The method for manufacturing an electrically insulated conductor according to claim 1, wherein the electrically insulated conductor is produced at a rate of in to 12 m/min. (3) A method for producing an electrically insulated conductor according to claim 1, in which the steps up to the completion of forming the electrodeposited insulating film are automatically performed.