JPS6227743B2 - - Google Patents
Info
- Publication number
- JPS6227743B2 JPS6227743B2 JP56139204A JP13920481A JPS6227743B2 JP S6227743 B2 JPS6227743 B2 JP S6227743B2 JP 56139204 A JP56139204 A JP 56139204A JP 13920481 A JP13920481 A JP 13920481A JP S6227743 B2 JPS6227743 B2 JP S6227743B2
- Authority
- JP
- Japan
- Prior art keywords
- wafer
- mounting plate
- shaft
- shafts
- arm rod
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- H10P72/7608—
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/707—Chucks, e.g. chucking or un-chucking operations or structural details
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Manipulator (AREA)
- Clamps And Clips (AREA)
- Weting (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP56139204A JPS5840837A (ja) | 1981-09-02 | 1981-09-02 | クランプ装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP56139204A JPS5840837A (ja) | 1981-09-02 | 1981-09-02 | クランプ装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5840837A JPS5840837A (ja) | 1983-03-09 |
| JPS6227743B2 true JPS6227743B2 (show.php) | 1987-06-16 |
Family
ID=15239970
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP56139204A Granted JPS5840837A (ja) | 1981-09-02 | 1981-09-02 | クランプ装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5840837A (show.php) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0460591U (show.php) * | 1990-10-01 | 1992-05-25 |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3695971B2 (ja) * | 1998-12-22 | 2005-09-14 | シャープ株式会社 | 成膜装置および成膜方法 |
| US7667822B2 (en) * | 2006-02-14 | 2010-02-23 | Asml Netherlands B.V. | Lithographic apparatus and stage apparatus |
| KR101156902B1 (ko) * | 2010-09-01 | 2012-06-21 | 삼성전기주식회사 | 기판 고정용 클램프 |
-
1981
- 1981-09-02 JP JP56139204A patent/JPS5840837A/ja active Granted
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0460591U (show.php) * | 1990-10-01 | 1992-05-25 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5840837A (ja) | 1983-03-09 |
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