JPS62275091A - Production of tungsten single crystal - Google Patents

Production of tungsten single crystal

Info

Publication number
JPS62275091A
JPS62275091A JP11708586A JP11708586A JPS62275091A JP S62275091 A JPS62275091 A JP S62275091A JP 11708586 A JP11708586 A JP 11708586A JP 11708586 A JP11708586 A JP 11708586A JP S62275091 A JPS62275091 A JP S62275091A
Authority
JP
Japan
Prior art keywords
single crystal
tungsten
doped
zro2
al2o3
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP11708586A
Other languages
Japanese (ja)
Other versions
JPH0458437B2 (en
Inventor
Hiroshi Yamamoto
弘 山本
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Tungsten Co Ltd
Original Assignee
Nippon Tungsten Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Tungsten Co Ltd filed Critical Nippon Tungsten Co Ltd
Priority to JP11708586A priority Critical patent/JPS62275091A/en
Publication of JPS62275091A publication Critical patent/JPS62275091A/en
Publication of JPH0458437B2 publication Critical patent/JPH0458437B2/ja
Granted legal-status Critical Current

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  • Crystals, And After-Treatments Of Crystals (AREA)
  • Powder Metallurgy (AREA)

Abstract

PURPOSE:To easily produce a W single crystal nearly free from gain boundaries and having improved processability by adding a specified amount of ZrO2 to W doped with Al2O3, K2O or SiO2 and subjecting them to pressing, a sintering and heat treatment at a specified temp. CONSTITUTION:Doped W powder contg. 0.01-1.0wt% one or more among Al2O3, K2O and SiO2 is mixed with 0.01-0.05% ZrO2 powder. The powdery mixture is compacted, sintered in hydrogen or the like, machined to a prescribed size and heat treated at >=2,600 deg.C. By this method, the grain boundaries of fine recrystallized grains are vanished and a large W single crystal is grown.

Description

【発明の詳細な説明】 3、発明の詳細な説明 〔産業上の利用分野〕 本発明はタングステン単結晶の製造法に関する。[Detailed description of the invention] 3. Detailed description of the invention [Industrial application field] The present invention relates to a method for manufacturing tungsten single crystals.

尚、ここでいう単結晶は径に比較して十分に大きな長さ
を持つ粗大結晶をも含むものとする。
It should be noted that the term "single crystal" here includes coarse crystals having a sufficiently large length compared to the diameter.

〔従来の技術〕[Conventional technology]

通常のタングステンは、1800℃〜2o○0℃以上に
おいて再結晶を起こし高温強度の低下する欠点があった
。このため結晶粒界の少ない粗大結晶タングステンある
いは単結晶タングステンが高温材料として有望視されて
いるが、従来のゾーンメルトによる単結晶の製作では製
品の寸法・形状が限定され又、時間あたりの生産量も限
られる等の麗点があった。又再結晶法による単結晶の製
法として特開昭61−619.7ではタングステンにカ
ルシウム及びマグネシウムを添加し、所定の大きさに加
工した後この成形体を熱処理する方法が提供されている
が、これら酸化物は高温で揮発するため焼結を1800
℃〜2000℃の比較的低い温度で行なう必要があり、
そのため焼結体の比重を十分に上げることができず以後
の加工性が悪いという欠点があった。
Ordinary tungsten has the disadvantage that it recrystallizes at temperatures above 1800°C to 200°C and its high-temperature strength decreases. For this reason, coarse-crystal tungsten with few grain boundaries or single-crystal tungsten are considered promising as high-temperature materials, but the conventional method of manufacturing single crystals using zone melting limits the size and shape of the product, and the production volume per hour is limited. It also had the advantage of being limited. Furthermore, as a method for producing a single crystal by a recrystallization method, Japanese Patent Application Laid-Open No. 61-619.7 provides a method in which calcium and magnesium are added to tungsten, the molded body is processed to a predetermined size, and then the formed body is heat-treated. These oxides volatilize at high temperatures, so the sintering temperature is 1800 m
It is necessary to carry out the process at a relatively low temperature between ℃ and 2000℃.
Therefore, the specific gravity of the sintered body could not be sufficiently increased, resulting in poor workability.

〔発明が解決しようとする問題点〕[Problem that the invention seeks to solve]

本発明の目的は、加工性も容易で、結晶粒界の少ないタ
ングステン単結晶の製造方法を提供することにある。
An object of the present invention is to provide a method for producing a tungsten single crystal that is easy to process and has few grain boundaries.

〔問題を解決するための手段〕[Means to solve the problem]

本発明の特徴は、A Q、O,、K2O,S i O2
を添加した通常のドープタングステンにZrO,を0.
01重量%〜0.05重量%添加してプレス焼結した後
所定の大きさまで加工し、次いで2600℃思上の温度
に加熱することにある。
The characteristics of the present invention are A Q, O,, K2O, S i O2
ZrO is added to normal doped tungsten with 0.
The method is to add 0.01% to 0.05% by weight, press sinter it, process it to a predetermined size, and then heat it to an assumed temperature of 2600°C.

〔作用〕[Effect]

通常のタングステン材料は圧粉体を水素雰囲気巾約30
oO℃で焼結して成形体を得1次いで該成形体を熱間お
よび温間で加工することにより得られる。タングステン
材料の製造に際し、しばしばAl2O3、K2O、Si
O203+ K、o、 sio、を単独又は複合で0.
01重量%〜1.0重量%添加したいわゆるドープタン
グステンが用いられる。これらドープタングステンはタ
ングステン材料の加工性の向上に寄与する。本発明の目
的とするタングステン単結晶は、これらドープタングス
テンに更にZrO2を0.01重量%〜0.05重量%
添加し、通常の方法により所定の大きさまで加工した後
2600℃以上の温度に加熱することにより得られる1
本発明の方法に用いるZrO2は融点が2700℃と高
く通常の焼結においてもその大部分は飛散することなく
残留する。そのため焼結温度を十分に高くとることが出
来、焼結体の密度も理論密度の90%以上となり加工性
も良好である0本発明の方法によるタングステン材料は
1900℃付近から再結晶を開始するが、2600℃以
下の再結晶粒は微細で粒状であるが2600℃以上では
微細な再結晶粒の粒界が消滅して粗大な単結晶を形成す
る。
For normal tungsten materials, the green compact is heated to a hydrogen atmosphere width of about 30
A molded body is obtained by sintering at oO°C, and then the molded body is hot- and warm-processed. When manufacturing tungsten materials, often Al2O3, K2O, Si
O203+ K, o, sio, alone or in combination, 0.
So-called doped tungsten added in an amount of 0.01% to 1.0% by weight is used. These doped tungstens contribute to improving the workability of tungsten materials. The tungsten single crystal that is the object of the present invention further contains 0.01% to 0.05% by weight of ZrO2 in addition to these doped tungsten.
1 obtained by adding it, processing it to a specified size by a normal method, and then heating it to a temperature of 2600°C or higher
ZrO2 used in the method of the present invention has a high melting point of 2700° C., and most of it remains without scattering even during normal sintering. Therefore, the sintering temperature can be set sufficiently high, and the density of the sintered body is 90% or more of the theoretical density, and the workability is also good.The tungsten material produced by the method of the present invention starts recrystallizing at around 1900°C. However, at temperatures below 2600°C, recrystallized grains are fine and granular, but at temperatures above 2600°C, the grain boundaries of the fine recrystallized grains disappear to form coarse single crystals.

以下実施例にそって本発明の方法をより詳細に説明する
The method of the present invention will be explained in more detail below with reference to Examples.

〔実施例〕〔Example〕

AΩ201.に20,5in2を複合で計0.63%添
加したドープタングステンにZrO2を表1に示すよう
な割合で添加した後、圧力1.3t/aJで成形した後
、水素巾約3000℃で焼結して焼結体を得た。次いで
該焼結体を通常の方法で転打加工し線引してφ0 、3
9 m mのワイヤーとし、水素中各温度で熱処理して
結晶粒の大きさを見た。
AΩ201. ZrO2 was added to doped tungsten with a total of 0.63% of 20.5in2 added in the proportions shown in Table 1, then molded at a pressure of 1.3t/aJ, and then sintered at a hydrogen pressure of about 3000℃. A sintered body was obtained. Next, the sintered body is rolled and drawn using a conventional method to obtain a diameter of φ0,3.
A 9 mm wire was heat treated in hydrogen at various temperatures and the size of crystal grains was observed.

結果はまとめて表1に示す。The results are summarized in Table 1.

表1 表1から明らかなようにZrO□0.01%未満では再
結晶粒は細長く延びたいわゆるノンサグ組織に近い形と
なりZrO2添加の効果は表われなかった。又0,06
%以上添加したものでは微細な粒状組織となり単結晶粒
は得られながった。試料2.3.4において熱処理温度
2500℃以下では再結晶組織は微細な粒状組織となり
、2600℃以上の温度において単結晶粒が得られたが
Table 1 As is clear from Table 1, when ZrO□ is less than 0.01%, the recrystallized grains become elongated and close to a so-called non-sag structure, and the effect of ZrO2 addition is not apparent. Also 0,06
When it was added in excess of %, a fine granular structure formed and single crystal grains could not be obtained. In sample 2.3.4, the recrystallized structure became a fine granular structure at a heat treatment temperature of 2500°C or lower, and single crystal grains were obtained at a temperature of 2600°C or higher.

2600’C以上では温度と組織の間に特に顕著な差は
見られなかった。
At temperatures above 2600'C, no significant difference was observed between temperature and structure.

〔発明の効果〕〔Effect of the invention〕

以上述べてきたように本発明の方法によれば比較的容易
にタングステン単結晶を得ることができ、本発明の工業
的利用価値は大きいと考える。
As described above, according to the method of the present invention, tungsten single crystals can be obtained relatively easily, and the present invention is considered to have great industrial utility value.

Claims (1)

【特許請求の範囲】[Claims] Al_2O_3、K_2O、SiO_2を単独又は複合
で0.01重量%〜1.0重量%添加したドープタング
ステンにZrO_2を0.01重量%〜0.05重量%
添加し、該タングステン粉末をプレス焼結して所定の大
きさまで加工した後2600℃以上の温度に加熱するこ
とを特徴とするタングステン単結晶の製造法。
0.01% to 0.05% by weight of ZrO_2 to doped tungsten with 0.01% to 1.0% by weight of Al_2O_3, K_2O, and SiO_2 added alone or in combination.
A method for producing a tungsten single crystal, which comprises adding the tungsten powder to a predetermined size by press-sintering the tungsten powder, and then heating the tungsten powder to a temperature of 2,600° C. or higher.
JP11708586A 1986-05-20 1986-05-20 Production of tungsten single crystal Granted JPS62275091A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP11708586A JPS62275091A (en) 1986-05-20 1986-05-20 Production of tungsten single crystal

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11708586A JPS62275091A (en) 1986-05-20 1986-05-20 Production of tungsten single crystal

Publications (2)

Publication Number Publication Date
JPS62275091A true JPS62275091A (en) 1987-11-30
JPH0458437B2 JPH0458437B2 (en) 1992-09-17

Family

ID=14703021

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11708586A Granted JPS62275091A (en) 1986-05-20 1986-05-20 Production of tungsten single crystal

Country Status (1)

Country Link
JP (1) JPS62275091A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02160694A (en) * 1988-12-14 1990-06-20 Nippon Tungsten Co Ltd Production of tungsten single crystal
WO1991005070A1 (en) * 1989-09-28 1991-04-18 Tosoh Corporation Giant particle and single crystal of chromium and production thereof
CN102358826A (en) * 2011-08-19 2012-02-22 永州皓志稀土材料有限公司 Method for preparing aluminum-doped zirconium oxide compound polishing powder

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02160694A (en) * 1988-12-14 1990-06-20 Nippon Tungsten Co Ltd Production of tungsten single crystal
JPH0519519B2 (en) * 1988-12-14 1993-03-16 Nippon Tungsten
WO1991005070A1 (en) * 1989-09-28 1991-04-18 Tosoh Corporation Giant particle and single crystal of chromium and production thereof
CN102358826A (en) * 2011-08-19 2012-02-22 永州皓志稀土材料有限公司 Method for preparing aluminum-doped zirconium oxide compound polishing powder

Also Published As

Publication number Publication date
JPH0458437B2 (en) 1992-09-17

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