JPS62262869A - プリント配線基板用露光装置 - Google Patents
プリント配線基板用露光装置Info
- Publication number
- JPS62262869A JPS62262869A JP61106433A JP10643386A JPS62262869A JP S62262869 A JPS62262869 A JP S62262869A JP 61106433 A JP61106433 A JP 61106433A JP 10643386 A JP10643386 A JP 10643386A JP S62262869 A JPS62262869 A JP S62262869A
- Authority
- JP
- Japan
- Prior art keywords
- light
- light source
- source lamp
- mirror
- sensors
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 229920002120 photoresistant polymer Polymers 0.000 claims description 5
- 230000006866 deterioration Effects 0.000 abstract description 11
- 230000003287 optical effect Effects 0.000 abstract description 7
- 230000007423 decrease Effects 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 230000035945 sensitivity Effects 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000001771 impaired effect Effects 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Light Sources And Details Of Projection-Printing Devices (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP61106433A JPS62262869A (ja) | 1986-05-09 | 1986-05-09 | プリント配線基板用露光装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP61106433A JPS62262869A (ja) | 1986-05-09 | 1986-05-09 | プリント配線基板用露光装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS62262869A true JPS62262869A (ja) | 1987-11-14 |
| JPH0427543B2 JPH0427543B2 (enrdf_load_stackoverflow) | 1992-05-12 |
Family
ID=14433516
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP61106433A Granted JPS62262869A (ja) | 1986-05-09 | 1986-05-09 | プリント配線基板用露光装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS62262869A (enrdf_load_stackoverflow) |
-
1986
- 1986-05-09 JP JP61106433A patent/JPS62262869A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0427543B2 (enrdf_load_stackoverflow) | 1992-05-12 |
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