JPS62262792A - Treatment of organic material-containing water - Google Patents

Treatment of organic material-containing water

Info

Publication number
JPS62262792A
JPS62262792A JP10622786A JP10622786A JPS62262792A JP S62262792 A JPS62262792 A JP S62262792A JP 10622786 A JP10622786 A JP 10622786A JP 10622786 A JP10622786 A JP 10622786A JP S62262792 A JPS62262792 A JP S62262792A
Authority
JP
Japan
Prior art keywords
water
treated
oxidizing agent
org
organic matter
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP10622786A
Other languages
Japanese (ja)
Other versions
JP2582550B2 (en
Inventor
Masamasu Hirose
広瀬 正益
Katsuhiro Kawai
河合 勝弘
Shinobu Tsuruta
弦田 忍
Masahiro Kazama
正博 風間
Shigeru Ono
茂 大野
Yoshihiro Kenmoku
見目 善弘
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NIPPON DENKI KANKYO ENG KK
Iwasaki Denki KK
Original Assignee
NIPPON DENKI KANKYO ENG KK
Iwasaki Denki KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NIPPON DENKI KANKYO ENG KK, Iwasaki Denki KK filed Critical NIPPON DENKI KANKYO ENG KK
Priority to JP61106227A priority Critical patent/JP2582550B2/en
Publication of JPS62262792A publication Critical patent/JPS62262792A/en
Application granted granted Critical
Publication of JP2582550B2 publication Critical patent/JP2582550B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01JCHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J19/00Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J19/08Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
    • B01J19/12Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electromagnetic waves
    • B01J19/122Incoherent waves
    • B01J19/123Ultraviolet light

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  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Health & Medical Sciences (AREA)
  • General Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Physical Water Treatments (AREA)
  • Treatment Of Water By Oxidation Or Reduction (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)

Abstract

PURPOSE:To effectively treat org. materials by economically controlling the amt. of the oxidizing agent to be incorporated into the water to be treated at the time of adding the oxidizing agent under the irradiation of UV rays into the org. material-contg. water to oxidize and decompose the org. materials contained in the water to be treated. CONSTITUTION:The oxidizing agent such as H2O2 is added under the irradiation of the UV rays into the org. material-contg. water to oxidize and decompose the org. materials contained in the water to be treated. The amt. of the oxidizing agent to be added to the water to be treated is economically controlled within the range of 1-5 times the equiv. of the amt. of the oxidizing agent to be incorporated into said water relative to the TOC value in the total water to be treated. As a result, the org. materials in the org. material-contg. water are effectively treated. This method is widely applicable to the treatment of the waste water used for producing semiconductors and the reclamation and use of ultra-pure water.

Description

【発明の詳細な説明】 〔産業上の利用分野〕 本発明は半導体工場等より排出された有機物含有排水の
処理や半導体工場にて使用される超純水の製造に用いる
有機物含有水の処理方法に関する。
[Detailed Description of the Invention] [Industrial Application Field] The present invention relates to a method for treating organic matter-containing wastewater discharged from semiconductor factories, etc., and for producing ultrapure water used in semiconductor factories. Regarding.

〔従来の技術〕[Conventional technology]

従来より上記の目的で有機物含有水を処理する方法とし
て、紫外線照射下にて例えば酸化剤として被処理水中に
H,02を添加し、有機物を酸化分解処理する方法が知
られている。被処理水中にH,O□を添加することによ
り下記(1) 、 (2)式の反応により有機物が酸化
分解して被処理水中より除去される。
Conventionally, as a method of treating organic matter-containing water for the above-mentioned purpose, a method is known in which, for example, H,02 is added as an oxidizing agent to the water to be treated under ultraviolet irradiation to oxidize and decompose the organic matter. By adding H and O□ to the water to be treated, organic substances are oxidized and decomposed by the reactions of the following formulas (1) and (2) and removed from the water to be treated.

0゛は活性酸素 従来はその処理に際して被処理水中のTOC値に対し、
予め定められた量のH2O,を一度に添加することによ
って行っていた。
0゛ stands for active oxygen. Conventionally, during treatment, the TOC value in the water to be treated is
This was done by adding a predetermined amount of H2O at once.

〔発明が解決しようとする問題点〕[Problem that the invention seeks to solve]

ところが、被処理水中に大過剰の11.0□が添加され
ると、被処理水中のH20□濃度が高くなり、第1図に
示す如く被処理水中の紫外線透過率が低下し。
However, when a large excess of 11.0□ is added to the water to be treated, the concentration of H20□ in the water to be treated increases, and the ultraviolet transmittance in the water to be treated decreases as shown in FIG.

よって紫外線ランプより離れたところにおいては(1)
式の反応に必要な紫外線照度を得ることができなくなる
。その結果、該紫外線ランプより離れたところにおいて
は(1)式における活性酸素の生成量が低下し、(2)
式の反応が進みにくく有機物が未処理のまま残されるこ
とがある。従って、従来法によるときには有機物の除去
率が非常に低いという問題点を有していた。
Therefore, in places far from the ultraviolet lamp, (1)
It becomes impossible to obtain the ultraviolet irradiance necessary for the reaction of the formula. As a result, the amount of active oxygen produced in equation (1) decreases in areas far from the ultraviolet lamp, and (2)
The reaction of the formula may be slow and organic substances may be left untreated. Therefore, when using the conventional method, there was a problem that the removal rate of organic matter was very low.

本発明の目的は上記従来法が有する諸問題を解決して実
用性に優れた有機物含有水の処理方法を提供することに
ある。
An object of the present invention is to provide a method for treating organic matter-containing water that solves the problems of the above-mentioned conventional methods and is highly practical.

[問題点を解決するための手段〕 本発明は有機物含有水中に、紫外線照射下にて酸化剤を
添加し、被処理水中に含まれた有機物を酸化分解処理す
るに際し、全被処理水中のTOC値に対して被処理水中
に混入させる酸化剤の量を1〜5倍当量の範囲内でその
添加量を経時的に制御することを特徴とする有機物含有
水の処理方法である。
[Means for Solving the Problems] The present invention adds an oxidizing agent to organic matter-containing water under ultraviolet irradiation to oxidize and decompose the organic matter contained in the water to be treated. This is a method for treating organic matter-containing water, characterized in that the amount of the oxidizing agent mixed into the water to be treated is controlled over time within a range of 1 to 5 times the equivalent value.

〔原理・作用〕[Principle/effect]

本発明は有機物含有水の処理に際し、該有機物含有水に
紫外線を照射しながら全被処理水中のTOC値に対して
1〜5倍当量の酸化剤としてH,O□を例えばn回(n
≧2)に分けて添加すると、H,O□を一度に添加する
場合に比べてH2O2添加時の被処理水中のl(、O□
濃度は低下する。したがって、該有機物含有水の流路に
おいて、紫外線ランプから離れたところにおいても(1
)の反応に必要な紫外線照度を得ることができる。その
結果(1) 、 (2)式の反応が効果的に進み高い除
去率で有機物が処理される。
When treating organic matter-containing water, the present invention applies H, O□ as an oxidizing agent in an amount equivalent to 1 to 5 times the TOC value in the total water to be treated, for example, n times (n times) while irradiating the organic matter-containing water with ultraviolet rays.
≧2), the amount of l(, O□
concentration decreases. Therefore, in the flow path of the organic matter-containing water, even at a place away from the ultraviolet lamp (1
) can obtain the ultraviolet irradiance necessary for the reaction. As a result, the reactions of formulas (1) and (2) proceed effectively and organic substances are treated at a high removal rate.

酸化剤としてはH,O□の他にNaCQ Oe 03等
のいづれを用いても有効である。また有機物含有水の濃
度、紫外線照射量、被処理水の流量などの条件によって
も異なるが、一般に紫外線照射による酸化分解処理の適
用が可能な条件の下では酸化剤の添加量は該有機物含有
水中のTOC値に対して常時1倍当量より少ない量では
酸化剤の量が有機物の絶対量に対して不足しているため
有機物は未分解で残存し、除去率が低下する。一方散化
剤の添加量が該有機物含有水中のTOC値に対して5倍
当量より多い場合は、酸化剤の過剰添加となり上記(1
)式にて発生した活性酸素の一部は有機物と反応せずに
活性を失うため、添加した酸化剤の一部が無駄となり、
非常に不経済である。
As an oxidizing agent, it is effective to use any of H, O□, NaCQ Oe 03, etc. It also varies depending on conditions such as the concentration of organic matter-containing water, the amount of ultraviolet irradiation, and the flow rate of the water to be treated, but in general, under conditions where oxidative decomposition treatment by ultraviolet irradiation can be applied, the amount of oxidizing agent added to the organic matter-containing water is If the amount is always less than one equivalent with respect to the TOC value, the amount of oxidizing agent is insufficient relative to the absolute amount of organic matter, so the organic matter remains undecomposed and the removal rate decreases. On the other hand, if the amount of the dispersing agent added is more than 5 times equivalent to the TOC value in the organic matter-containing water, the oxidizing agent will be added excessively and the above (1)
) Some of the active oxygen generated in the formula does not react with organic matter and loses its activity, so some of the added oxidizing agent is wasted.
It is extremely uneconomical.

また酸化剤の定量をn回に分は等量ずつ添加する場合に
原則的にnの数値が大きくなるほど1回に添加するH2
O,の量は少量であるため、該有機物含有水中の820
□濃度が薄くなり、紫外線の透過率が高くなる。したが
って紫外線照射の利用効率が高まり、含有水中の有機物
の除去率は高くなる。
In addition, when adding an equal amount of oxidizing agent every n times, as a general rule, the larger the value of n, the more H2 is added at one time.
Since the amount of O, is small, 820 in the organic matter-containing water
□The concentration becomes thinner and the transmittance of ultraviolet rays increases. Therefore, the utilization efficiency of ultraviolet irradiation increases, and the removal rate of organic matter in the contained water increases.

しかし、当然ながら最小限度の量を常に維持する必要が
ある。
However, of course, it is necessary to always maintain a minimum amount.

更に本発明の有機物含有水の処理に使用する紫外線ラン
プとしては、(1)式の反応を進行させるために非常に
有効な波長253.7nmにエネルギーが集中している
低圧水銀ランプを使用することが望ましい。酸化剤の添
加量や添加の時期等については特に制約されるものでは
なく、断続的、連続的のいずれでもよい。濃度センサー
、流量計などを用い被処理水中の酸化剤濃度を監視しな
がらその添加の時期、添加量を制御することもできる。
Furthermore, as the ultraviolet lamp used in the treatment of organic matter-containing water according to the present invention, a low-pressure mercury lamp whose energy is concentrated at a wavelength of 253.7 nm, which is extremely effective for promoting the reaction of formula (1), should be used. is desirable. There are no particular restrictions on the amount or timing of addition of the oxidizing agent, and it may be either intermittent or continuous. It is also possible to control the timing and amount of addition while monitoring the oxidant concentration in the water to be treated using a concentration sensor, flow meter, etc.

〔実施例〕〔Example〕

以下、本発明の実施例を第2図に示すUv酸化装置を用
いて説明する。また該Uv酸化装置の構成を第1表に、
本発明の実施例に用いた有機物含有実排水の組成を第2
表に各々示した。
Hereinafter, embodiments of the present invention will be described using a Uv oxidation apparatus shown in FIG. The configuration of the Uv oxidizer is shown in Table 1.
The composition of the organic matter-containing actual wastewater used in the examples of the present invention was
Each is shown in the table.

第  1  表 第2表 第2図(a) 、 (b)において、1はステンレス材
等で構成された筒状の装置本体である。この装置本体1
の一端には被処理水の流入口5が、他端には流出口6が
設けである。また、流入口5には酸化剤の添加ロアが開
口されている。この装置本体1の内面は紫外線反射が効
率良く行われるように研磨されている。2は紫外線透過
率の良い材料、例えば高純度石英ガラスにより構成され
た筒状のジャケットで装置本体1の内部に適数本配置し
である。
In Table 1, Table 2, and Figures 2 (a) and (b), 1 is a cylindrical device body made of stainless steel or the like. This device body 1
An inlet 5 for water to be treated is provided at one end, and an outlet 6 is provided at the other end. Further, the inlet 5 has an opening for adding an oxidizing agent. The inner surface of the device main body 1 is polished to efficiently reflect ultraviolet rays. Numeral 2 is a cylindrical jacket made of a material with good ultraviolet transmittance, such as high-purity quartz glass, and an appropriate number of jackets are arranged inside the main body 1 of the apparatus.

3はジャケット2の内部に収納した紫外線放電灯であり
、本発明においては、電極間距離1■あたり2〜8Wの
負荷の低圧水銀ランプを使用している。
Reference numeral 3 denotes an ultraviolet discharge lamp housed inside the jacket 2, and in the present invention, a low-pressure mercury lamp with a load of 2 to 8 W per 1 inch of inter-electrode distance is used.

かかる装置を運転する場合は、被処理水を流入口5を通
して装置本体1内に注入する。この際。
When operating such an apparatus, water to be treated is injected into the apparatus main body 1 through the inlet 5. On this occasion.

添加ロアを通じて被処理水に過酸化水素等の酸化剤を投
入する。そして装置本体1内に注入した被処理水に低圧
水銀ランプ3により紫外線を照射し、被処理水中の有機
物を酸化分解させる。
An oxidizing agent such as hydrogen peroxide is added to the water to be treated through the addition lower. Then, the water to be treated that has been injected into the main body 1 of the apparatus is irradiated with ultraviolet rays from the low-pressure mercury lamp 3 to oxidize and decompose the organic matter in the water to be treated.

処理された水は流出口6を通して連続的に外部に取り出
される、なお、4は装置本体1に注入した被処理水を攪
拌して酸化分解を効率よく行わせるための乱流板である
The treated water is continuously taken out to the outside through the outlet 6. Reference numeral 4 is a turbulence plate for stirring the water to be treated that has been injected into the main body 1 of the apparatus to efficiently carry out oxidative decomposition.

上記装置を用い、実排水を4.0m1″/Hr、 8.
Om’/Hr。
Using the above device, the actual drainage was 4.0 m1″/Hr, 8.
Om'/Hr.

16、orn’/Hrの流量で各々該U■酸化装置1の
流入口5より連続的に流しながら、35%820212
kgをまず添加ロアより一度に添加したときの結果を比
較例として各々第3図中(A)に示した。また、実施例
1として35%H20□12kgを4回に分けて、  
3kgづつ添加したときの結果を各々第3図中(B)に
示した。
16, 35% 820212 while continuously flowing from the inlet 5 of the U∙ oxidizer 1 at a flow rate of 16, orn'/Hr.
As a comparative example, the results obtained when 1 kg of each sample were added at once from the addition lower are shown in FIG. 3 (A). In addition, as Example 1, 12 kg of 35% H20□ was divided into 4 times,
The results obtained when 3 kg each was added are shown in FIG. 3 (B).

さらに実施例2として35%H20□12kgを8回に
分けて、1.5kgづつ添加したときの結果を各々第3
図中(C)に示した。
Furthermore, as Example 2, 12 kg of 35% H20□ was divided into 8 times and 1.5 kg was added each time.
It is shown in (C) in the figure.

第3図より明らかなように、比較例(A)においては、
紫外線照射量 IKlt・Hr/ rn’でTOC除去率は38%、紫
外線照射量2KW・Hr/rn’でTOC除去率は62
%、紫外線照射量4KW−Hr/mでTOC除去率は7
9%であった。それに対して本発明にて処理した場合、
例えば実施例1(B)においては紫外線照射量IKW・
Ilr/rri’でTOC除去率は69%、紫外線照射
量2KIll−Hr/rr?でTOG除去率は88%、
紫外線照射量4Kw・Hr/ rri’でTOC除去率
は92%であった。また実施例2(C)においては紫外
線照射量IKV−Hr/rrrでTOC除去率は72%
As is clear from FIG. 3, in comparative example (A),
The TOC removal rate is 38% with the UV irradiation amount IKlt・Hr/rn', and the TOC removal rate is 62% with the UV irradiation amount 2KW・Hr/rn'.
%, TOC removal rate is 7 with UV irradiation amount of 4KW-Hr/m
It was 9%. On the other hand, when processed according to the present invention,
For example, in Example 1 (B), the amount of ultraviolet irradiation IKW・
TOC removal rate is 69% with Ilr/rri', UV irradiation amount is 2KIll-Hr/rr? The TOG removal rate was 88%,
The TOC removal rate was 92% at an ultraviolet irradiation dose of 4 Kw·Hr/rri'. Furthermore, in Example 2 (C), the TOC removal rate was 72% at an ultraviolet irradiation amount of IKV-Hr/rrr.
.

紫外線照射量2KV−Hr/rrrでTOC除去率は9
0%、紫外線照射量4KW’Hr/rn’でTOC除去
率は97%であった。
TOC removal rate is 9 with UV irradiation amount of 2KV-Hr/rrr
TOC removal rate was 97% at 0% and UV irradiation amount of 4KW'Hr/rn'.

尚、実施例においては、TOC値で30■/Qの該実排
水を用いたが、TOC値で100■IQ及び1 、00
0■/Qのいづれにおいても同様の効果を得ることがで
きた。
In the examples, the actual wastewater with a TOC value of 30 ■/Q was used, but the TOC value was 100 ■IQ and 1,00
Similar effects could be obtained with both 0■/Q.

〔発明の効果〕〔Effect of the invention〕

以上のように本発明の処理方法によれば有機物含有水の
有機物をより効果的に処理することができ、半導体の製
造に用いられた排水の処理並びに超純水の再生使用など
に広く利用できる効果を有するものである。
As described above, according to the treatment method of the present invention, organic matter in organic matter-containing water can be treated more effectively, and it can be widely used in the treatment of wastewater used in semiconductor manufacturing and the reuse of ultrapure water. It is effective.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は水層厚11におけるH2O2濃度(■/Q)と
紫外線の吸収率(%)の関係のグラフを示す図、第2図
(a)は本発明の実施例を用いたU■酸化装置の断面図
、(b)は(a)のB−B線断面図、第3図は紫外線照
射量(W−Hr/rn’)とTOC除去率(%)の関係
のグラフを示す図である。 1は本体、2はジャケット、3は低圧水銀ランプ、4は
乱流板、5は流入口、6は流出口、7はH2O2添加口
である。
FIG. 1 is a graph showing the relationship between H2O2 concentration (■/Q) and ultraviolet absorption rate (%) at a water layer thickness of 11, and FIG. A cross-sectional view of the device, (b) is a cross-sectional view taken along line B-B in (a), and Figure 3 is a graph showing the relationship between ultraviolet irradiation amount (W-Hr/rn') and TOC removal rate (%). be. 1 is a main body, 2 is a jacket, 3 is a low-pressure mercury lamp, 4 is a turbulence plate, 5 is an inlet, 6 is an outlet, and 7 is an H2O2 addition port.

Claims (1)

【特許請求の範囲】[Claims] (1)有機物含有水中に、紫外線照射下にて酸化剤を添
加し、被処理水中に含まれた有機物を酸化分解処理する
に際し、全被処理水中のTOC値に対して被処理水中に
混入させる酸化剤の量を1〜5倍当量の範囲内でその添
加量を経時的に制御することを特徴とする有機物含有水
の処理方法。
(1) When an oxidizing agent is added to organic matter-containing water under ultraviolet irradiation and the organic matter contained in the water to be treated is oxidized and decomposed, it is mixed into the water to be treated based on the TOC value of the total water to be treated. A method for treating organic matter-containing water, characterized in that the amount of an oxidizing agent added is controlled over time within a range of 1 to 5 equivalents.
JP61106227A 1986-05-09 1986-05-09 Treatment of water containing organic matter Expired - Lifetime JP2582550B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP61106227A JP2582550B2 (en) 1986-05-09 1986-05-09 Treatment of water containing organic matter

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP61106227A JP2582550B2 (en) 1986-05-09 1986-05-09 Treatment of water containing organic matter

Publications (2)

Publication Number Publication Date
JPS62262792A true JPS62262792A (en) 1987-11-14
JP2582550B2 JP2582550B2 (en) 1997-02-19

Family

ID=14428244

Family Applications (1)

Application Number Title Priority Date Filing Date
JP61106227A Expired - Lifetime JP2582550B2 (en) 1986-05-09 1986-05-09 Treatment of water containing organic matter

Country Status (1)

Country Link
JP (1) JP2582550B2 (en)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE4005488A1 (en) * 1990-02-21 1991-08-22 Wabner Dietrich METHOD AND DEVICE FOR WATER DETOXIFICATION
EP0453646A2 (en) * 1990-02-28 1991-10-30 GOEMA DR. GÖTZELMANN PHYSIKALISCH-CHEMISCHE PROZESSTECHNIK GmbH Process for degrading noxious matters containing liquid.
US5523001A (en) * 1994-12-30 1996-06-04 At&T Corp. Treatment of electroless plating waste streams
US5798047A (en) * 1996-04-05 1998-08-25 Nec Corporation Process and apparatus for ultraviolet decomposition of waste water containing organic substances
JP2014233658A (en) * 2013-05-31 2014-12-15 オルガノ株式会社 Treatment device and treatment method for organic matter-containing water
CN111056615A (en) * 2019-12-31 2020-04-24 清华大学深圳国际研究生院 Method for treating algal bloom or red tide by intermittently combining ultraviolet rays and hydrogen peroxide

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JPS5929073A (en) * 1982-08-09 1984-02-16 Hitachi Plant Eng & Constr Co Ltd Automatic control method for treatment of waste water containing humic acid

Cited By (8)

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DE4005488A1 (en) * 1990-02-21 1991-08-22 Wabner Dietrich METHOD AND DEVICE FOR WATER DETOXIFICATION
EP0453646A2 (en) * 1990-02-28 1991-10-30 GOEMA DR. GÖTZELMANN PHYSIKALISCH-CHEMISCHE PROZESSTECHNIK GmbH Process for degrading noxious matters containing liquid.
US5523001A (en) * 1994-12-30 1996-06-04 At&T Corp. Treatment of electroless plating waste streams
US5798047A (en) * 1996-04-05 1998-08-25 Nec Corporation Process and apparatus for ultraviolet decomposition of waste water containing organic substances
JP2014233658A (en) * 2013-05-31 2014-12-15 オルガノ株式会社 Treatment device and treatment method for organic matter-containing water
CN111056615A (en) * 2019-12-31 2020-04-24 清华大学深圳国际研究生院 Method for treating algal bloom or red tide by intermittently combining ultraviolet rays and hydrogen peroxide
WO2021135585A1 (en) * 2019-12-31 2021-07-08 清华大学深圳国际研究生院 Method for treating algal blooms or red tide by means of intermittent combination of ultraviolet rays and hydrogen peroxide
CN111056615B (en) * 2019-12-31 2022-04-19 清华大学深圳国际研究生院 Method for treating algal bloom or red tide by intermittently combining ultraviolet rays and hydrogen peroxide

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