JPS62260053A - 化合物薄膜蒸着装置 - Google Patents

化合物薄膜蒸着装置

Info

Publication number
JPS62260053A
JPS62260053A JP10215286A JP10215286A JPS62260053A JP S62260053 A JPS62260053 A JP S62260053A JP 10215286 A JP10215286 A JP 10215286A JP 10215286 A JP10215286 A JP 10215286A JP S62260053 A JPS62260053 A JP S62260053A
Authority
JP
Japan
Prior art keywords
vapor
substance
thin film
vacuum chamber
clusters
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP10215286A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0510423B2 (enrdf_load_stackoverflow
Inventor
Shigeru Yamaji
茂 山地
Hiromoto Ito
弘基 伊藤
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Priority to JP10215286A priority Critical patent/JPS62260053A/ja
Publication of JPS62260053A publication Critical patent/JPS62260053A/ja
Publication of JPH0510423B2 publication Critical patent/JPH0510423B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Physical Vapour Deposition (AREA)
JP10215286A 1986-05-06 1986-05-06 化合物薄膜蒸着装置 Granted JPS62260053A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10215286A JPS62260053A (ja) 1986-05-06 1986-05-06 化合物薄膜蒸着装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10215286A JPS62260053A (ja) 1986-05-06 1986-05-06 化合物薄膜蒸着装置

Publications (2)

Publication Number Publication Date
JPS62260053A true JPS62260053A (ja) 1987-11-12
JPH0510423B2 JPH0510423B2 (enrdf_load_stackoverflow) 1993-02-09

Family

ID=14319760

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10215286A Granted JPS62260053A (ja) 1986-05-06 1986-05-06 化合物薄膜蒸着装置

Country Status (1)

Country Link
JP (1) JPS62260053A (enrdf_load_stackoverflow)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5529634A (en) * 1992-12-28 1996-06-25 Kabushiki Kaisha Toshiba Apparatus and method of manufacturing semiconductor device
US5582879A (en) * 1993-11-08 1996-12-10 Canon Kabushiki Kaisha Cluster beam deposition method for manufacturing thin film

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5176182A (en) * 1974-12-27 1976-07-01 Matsushita Electric Industrial Co Ltd Butsushitsuhakumakuseiseisochi

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5176182A (en) * 1974-12-27 1976-07-01 Matsushita Electric Industrial Co Ltd Butsushitsuhakumakuseiseisochi

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5529634A (en) * 1992-12-28 1996-06-25 Kabushiki Kaisha Toshiba Apparatus and method of manufacturing semiconductor device
US5582879A (en) * 1993-11-08 1996-12-10 Canon Kabushiki Kaisha Cluster beam deposition method for manufacturing thin film

Also Published As

Publication number Publication date
JPH0510423B2 (enrdf_load_stackoverflow) 1993-02-09

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