JPS62259045A - Stray light removing method for transparent substrate inspection instrument - Google Patents

Stray light removing method for transparent substrate inspection instrument

Info

Publication number
JPS62259045A
JPS62259045A JP10261886A JP10261886A JPS62259045A JP S62259045 A JPS62259045 A JP S62259045A JP 10261886 A JP10261886 A JP 10261886A JP 10261886 A JP10261886 A JP 10261886A JP S62259045 A JPS62259045 A JP S62259045A
Authority
JP
Japan
Prior art keywords
laser beam
substrate
light
stray light
glass
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP10261886A
Other languages
Japanese (ja)
Inventor
Yasuo Hachikake
保夫 八掛
Noboru Kato
昇 加藤
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi High Tech Corp
Original Assignee
Hitachi Electronics Engineering Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Electronics Engineering Co Ltd filed Critical Hitachi Electronics Engineering Co Ltd
Priority to JP10261886A priority Critical patent/JPS62259045A/en
Publication of JPS62259045A publication Critical patent/JPS62259045A/en
Pending legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84Systems specially adapted for particular applications
    • G01N21/88Investigating the presence of flaws or contamination
    • G01N21/89Investigating the presence of flaws or contamination in moving material, e.g. running paper or textiles
    • G01N21/892Investigating the presence of flaws or contamination in moving material, e.g. running paper or textiles characterised by the flaw, defect or object feature examined
    • G01N21/896Optical defects in or on transparent materials, e.g. distortion, surface flaws in conveyed flat sheet or rod

Abstract

PURPOSE:To remove stray light from a defect inspecting which inspects a transparent substrate by using a laser beam by providing a black-painted glass plate which absorbs the laser beam on the opposite side from the laser beam. CONSTITUTION:A mask substrate 1 is irradiated with the laser beam 3 and reflected light from the substrate 1 is received by a photodetector to inspect the defect of the substrate 1. In this case, the 1st glass 11-1 and the 2nd glass 11-2 which have their reverse surfaces painted in black are provided on the opposite side of the substrate from the laser beam 3. Then, transmitted light 3-1 from the substrate 1 is absorbed by the 1st glass 11-1 and part of it is reflected by 90 deg., made incident on the 2nd glass 11-2, and reflected in the opposite direction from the laser beam 3. At this time, the 1st glass 11-1 and the 2nd glass 11-2 absorb the majority of the incident light. Thus, stray light which is transmitted through the mask substrate 1 and reflected by the surface of a moving mechanism under the substrate 1, so the mask substrate 1 is inspected with high accuracy.

Description

【発明の詳細な説明】 〔産業上の利用分野コ この発明は、IC素子製造用のマスクサブストレート基
板など透明基板の検香装置において、基板面に投射され
たレーザビームにより生ずる迷光を除去する方法に関す
るものである。
[Detailed Description of the Invention] [Industrial Field of Application] This invention removes stray light caused by a laser beam projected onto the substrate surface in a scent detection device for a transparent substrate such as a mask substrate substrate for manufacturing IC devices. It is about the method.

[従来の技術] ゛:4導体のIC素子を製造するために、まずパターン
を拡大したマスクが製作される。マスクは原板であるた
め、欠陥があるときはこれより作られるtCはすべて不
良となる可能性があり、欠陥検査が屯殻である。
[Prior Art] ゛: In order to manufacture a four-conductor IC element, a mask with an enlarged pattern is first manufactured. Since the mask is an original plate, if there is a defect, there is a possibility that all the TCs made from it will be defective, and defect inspection is the most important task.

マスクのサブストレートは通常石英を材料とする角形の
透明基板である。このような基板の検査には、従来から
レーザビームを用いた光学的方法が行われている。これ
を第3図(a)により説明する。図において、マスク基
板1はY軸移動機構9の1−に固定された図(b)に示
す枠形の載置台8に載置されており、レーザ光源2より
のレーザビーム3は、振動ミラー4により掃引されかつ
レンズ系(図示を省略する)で小さい径のスポットに絞
り込まれて、マスク基板1を照射するとともにX軸方向
に点91間を走査する。5はスポットの走査線を示す。
The mask substrate is usually a square transparent substrate made of quartz. Conventionally, optical methods using laser beams have been used to inspect such substrates. This will be explained with reference to FIG. 3(a). In the figure, a mask substrate 1 is placed on a frame-shaped mounting table 8 shown in FIG. 4, and narrowed down to a small diameter spot by a lens system (not shown) to irradiate the mask substrate 1 and scan between points 91 in the X-axis direction. 5 indicates the scanning line of the spot.

マスク基板1の全域を照射するため、Y軸移動機構9に
より基板Jdii、yr台8とともにマスク基板1はY
軸方向に移動する。マスク基板1に欠陥が存在するとき
は、スポットによる散乱光6が受光器7に入力し欠陥が
検出されるものである。
In order to irradiate the entire area of the mask substrate 1, the mask substrate 1 is moved along with the substrate Jdii and the yr table 8 by the Y-axis moving mechanism 9.
Move in the axial direction. When a defect exists in the mask substrate 1, the scattered light 6 from the spot enters the light receiver 7 and the defect is detected.

1−記において、マスク基klは透明であるため、照射
したレーザビームの一部はマスク基板1を透過し、Y軸
移動機構9の移動部9−1の而を1!(1射する。もし
その而がレーザビームを反射するときは、その反射光は
ilびマスク基板lを透過して、その−・部がいわゆる
迷光となって受光器7に入力する。この迷光は走査に伴
って強度が変化し、あたかも散乱光と同様に振る舞うも
ので、その区別ができず、すなわちS/Nが劣化し検出
性能が低下する。
In 1-, since the mask base kl is transparent, a part of the irradiated laser beam passes through the mask substrate 1, and the moving part 9-1 of the Y-axis moving mechanism 9 moves 1! (If the laser beam is reflected by the laser beam, the reflected light passes through the mask substrate l and the - part becomes so-called stray light and enters the light receiver 7. This stray light The intensity of the light changes as it scans, and it behaves just like scattered light, making it impossible to distinguish between them. In other words, the S/N ratio deteriorates and the detection performance deteriorates.

この対策は、移動部9−1の表面におけるレーザビーム
3の反射を防止することで、このために、移動部9−1
の表面に反射率の小さい黒色塗装がおこなわれているが
、しかしレーザビーム3の光度はきわめて強力で、わず
かな反射光でも結構強い迷光になり、効果が十分でない
。そこで従来、丸形の透明基板に対しては第4図に示す
トラップホー710が用いられる場合がある。トラップ
ホーン10はレーザビーム3がいかなる方向から入射し
ても、ホーンの先端部10−1に集まるもので、反射し
て入力端に戻ることがなく、これをマスク基板1の裏面
側に設けることにより、迷光を除去できる。しかしなが
ら、角形のマスク基板1の場合、最近はマスク基板のサ
イズが大き(なったことに加えて、基板を包含するトラ
ップホーンは直径の大きいものが必要であることから、
これを使用することは困難である。簡易で効果的な迷光
除去方法が必要とされる理由である。
This countermeasure is to prevent the reflection of the laser beam 3 on the surface of the moving part 9-1.
Although the surface of the laser beam 3 is coated with a black coating with low reflectance, the luminous intensity of the laser beam 3 is extremely strong, and even a small amount of reflected light becomes quite strong stray light, making it ineffective. Conventionally, a trap hoe 710 shown in FIG. 4 is sometimes used for round transparent substrates. The trap horn 10 collects the laser beam 3 at the tip 10-1 of the horn no matter what direction the laser beam 3 is incident on, and does not reflect back to the input end. This allows stray light to be removed. However, in the case of a rectangular mask substrate 1, the size of the mask substrate has become large recently, and the trap horn that encloses the substrate needs to have a large diameter.
This is difficult to use. This is why a simple and effective stray light removal method is needed.

[発明の[1的] この発明は、以」―に述べた事情に鑑み、角形のマスク
基板など透明な基板の検査装置に使用して、レーザビー
ムの透過光にもとずく迷光を効果的に除去する、マスク
基板検査装置の迷光除去方法を提供することをII的と
するものである。
[Object 1 of the Invention] In view of the circumstances described below, this invention is used in an inspection device for transparent substrates such as rectangular mask substrates to effectively eliminate stray light based on transmitted light of a laser beam. The second object of the present invention is to provide a method for removing stray light in a mask substrate inspection apparatus, which removes stray light.

[問題点を解決するための手段コ 第1図はこの発明によるマスク基板JfA査装置の迷光
除去方法の原理図で、マスク基板1に対してレーザビー
ム3と反対側に、透過光3−1を吸収しその・部を直角
方向に反射する裏面を黒色塗装した第1のガラス板11
−1を設け、さらにこの反射光を吸収し、その一部をi
l)び直角方向に反射する裏面を黒色塗装した第2のガ
ラス板11−2を設け、透過光3−1を大部分を第1、
第2のガラス板が吸収し、一部のわずかな反射光12を
マスク基板1と反対方向に逃がすものである。
[Means for solving the problem] Fig. 1 is a principle diagram of a method for removing stray light in a mask substrate JfA scanning device according to the present invention. A first glass plate 11 whose back surface is painted black and absorbs the light and reflects it in the right angle direction.
-1 is provided, further absorbs this reflected light, and a part of it is
l) A second glass plate 11-2 whose back surface is painted black and reflects the light in the right angle direction is provided, and most of the transmitted light 3-1 is transmitted to the first glass plate 11-2.
The second glass plate absorbs the reflected light 12 and allows a small portion of the reflected light 12 to escape in the direction opposite to the mask substrate 1.

[作用] 1−述において、裏面を黒色塗装された第1、第2のガ
ラス板は、それぞれ入射光のほぼ95%を吸収するもの
で、反射光はいずれも5%程度に過ぎない。従って第2
のガラス板により反射されてマスク基板と反対方向に進
む反射光は、透過光3−1の400分の1程度の微tS
1であり、マスク基板1の下部に設けられている各種の
部品の内に、反射率の大きいものがあっても、迷光とし
て受光器に入力するものはいたって少ないものである。
[Function] In 1-, the first and second glass plates whose back surfaces are painted black each absorb approximately 95% of the incident light, and the reflected light is only about 5%. Therefore, the second
The reflected light reflected by the glass plate and traveling in the opposite direction to the mask substrate has a microtS of about 1/400 of the transmitted light 3-1.
1, and even if some of the various components provided at the bottom of the mask substrate 1 have a high reflectance, very little stray light will enter the light receiver as stray light.

[実施例] 第2図はこの発明による透明基板検査装置の迷光除去方
法の実施例を示すもので、マスク基板lのレーザビーム
3の光源2(図示省略)と反対側に、レーザビーム3の
走査線5の範囲をカバーして透過光3−1を受光して吸
収する裏面を黒色塗装した第1のガラス板11−1を設
け、その反射方向を直角とする。さらにこの反射光を受
光して吸収する第2のガラス板11−2を設け、その反
射方向を直角として反射光12をマスク基板1の反対方
向とするものである。
[Embodiment] Fig. 2 shows an embodiment of the method for removing stray light in a transparent substrate inspection apparatus according to the present invention. A first glass plate 11-1 whose back surface is painted black and which covers the range of the scanning line 5 and receives and absorbs the transmitted light 3-1 is provided, and its reflection direction is set at right angles. Further, a second glass plate 11-2 is provided to receive and absorb this reflected light, and the direction of reflection is set at right angles, so that the reflected light 12 is directed in the opposite direction to the mask substrate 1.

1−記において、マスク基板1に対するY軸方向の走査
はマスク基板l自身が移動するので、この走査の間にお
いても、迷光は有効に除去されるものである。
1-, since the mask substrate 1 itself moves when scanning the mask substrate 1 in the Y-axis direction, stray light is effectively removed even during this scanning.

[発明の効果] 以−[ユの説明により明らかなように、この発明による
透明基板検査装置の迷光除去方法によれば、マスク基板
に照射されたレーザビームの内、マスク基板を透過し、
Y軸移動機構などの表面で反射する迷光が除去されるの
で、マスク基板の検査におけるS/Nが向−1−シ、欠
陥検査の効率が敗訴される効果には大きいものがある。
[Effects of the Invention] As is clear from the explanation of [Yu], according to the method for removing stray light in a transparent substrate inspection apparatus according to the present invention, some of the laser beam irradiated on the mask substrate passes through the mask substrate,
Since stray light reflected on the surface of the Y-axis moving mechanism and the like is removed, the S/N ratio in mask substrate inspection increases by -1, which has a significant effect on the efficiency of defect inspection.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は、この発明による透明基板検査装置の迷光除去
方法における迷光除去の原理の説明図、第2図は、第1
図に対する実施例の!P&要図、第3図(a)および(
b)はマスク基板などの透明載板の検査装置の構造と迷
光の発生の説明図、第4図は従来迷光除去に使用された
トラップホーンを示す説明図である。 1・・・マスク基板、   2・・・レーザ光源、3・
・・レーザビーム、3−1・・・透過光、4・・・振動
ミラー、   5・・・走査線、6・・・散乱光、  
   7・・・受光器、8・・・補助板、     9
・・・Y軸移動機構、トド・・移動部、    ト2・
・・固定部、10・・・トラップホーン、10−1−・
・先端部、!I−1・・・第1のガラス板、+1−2・
・・第2のガラス板、12・・・反射光。
FIG. 1 is an explanatory diagram of the principle of stray light removal in the stray light removal method of a transparent substrate inspection apparatus according to the present invention, and FIG.
Examples for illustrations! P & key figures, Figure 3 (a) and (
b) is an explanatory diagram of the structure of an inspection apparatus for a transparent mounting plate such as a mask substrate and the generation of stray light, and FIG. 4 is an explanatory diagram showing a trap horn conventionally used for removing stray light. DESCRIPTION OF SYMBOLS 1... Mask substrate, 2... Laser light source, 3...
... Laser beam, 3-1... Transmitted light, 4... Oscillating mirror, 5... Scanning line, 6... Scattered light,
7... Light receiver, 8... Auxiliary plate, 9
...Y-axis movement mechanism, Tod.. Moving part, To2.
・Fixed part, 10... Trap horn, 10-1-・
・Tip! I-1...first glass plate, +1-2.
...Second glass plate, 12...Reflected light.

Claims (1)

【特許請求の範囲】[Claims] レーザビームを透明基板に照射して、該透明基板に存在
する表面欠陥による散乱光を受光して該欠陥を検出する
透明基板検査装置において、該透明基板に対して、レー
ザビームの光源側と反対側に、該レーザビームを吸収し
て一部を直角方向に反射する裏面を黒色塗装した第1の
ガラス板と、該第1のガラス板の反射光を吸収して一部
を直角方向でかつ上記光源と反対の方向に反射する裏面
を黒色塗装した第2のガラス板とを設けたことを特徴と
する透明基板検査装置の迷光除去方法。
In a transparent substrate inspection device that irradiates a laser beam onto a transparent substrate and detects the defect by receiving scattered light due to a surface defect existing on the transparent substrate, a laser beam is placed opposite to the light source side of the laser beam with respect to the transparent substrate. A first glass plate whose back surface is painted black absorbs the laser beam and reflects a part of the laser beam in a right-angled direction; A method for removing stray light from a transparent substrate inspection device, comprising: a second glass plate whose back surface is painted black and reflects light in a direction opposite to the light source.
JP10261886A 1986-05-02 1986-05-02 Stray light removing method for transparent substrate inspection instrument Pending JPS62259045A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10261886A JPS62259045A (en) 1986-05-02 1986-05-02 Stray light removing method for transparent substrate inspection instrument

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10261886A JPS62259045A (en) 1986-05-02 1986-05-02 Stray light removing method for transparent substrate inspection instrument

Publications (1)

Publication Number Publication Date
JPS62259045A true JPS62259045A (en) 1987-11-11

Family

ID=14332235

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10261886A Pending JPS62259045A (en) 1986-05-02 1986-05-02 Stray light removing method for transparent substrate inspection instrument

Country Status (1)

Country Link
JP (1) JPS62259045A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01131688A (en) * 1987-11-18 1989-05-24 Sankyo Kk Variable prize-winning means in pinball machine
JPH06331556A (en) * 1993-05-21 1994-12-02 Toyo Glass Co Ltd Discrimination apparatus of opaque foreign body in transparent body

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01131688A (en) * 1987-11-18 1989-05-24 Sankyo Kk Variable prize-winning means in pinball machine
JPH06331556A (en) * 1993-05-21 1994-12-02 Toyo Glass Co Ltd Discrimination apparatus of opaque foreign body in transparent body

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