JPS622541A - フオトリソグラフイ - Google Patents

フオトリソグラフイ

Info

Publication number
JPS622541A
JPS622541A JP60140244A JP14024485A JPS622541A JP S622541 A JPS622541 A JP S622541A JP 60140244 A JP60140244 A JP 60140244A JP 14024485 A JP14024485 A JP 14024485A JP S622541 A JPS622541 A JP S622541A
Authority
JP
Japan
Prior art keywords
discharge
pressure
mercury
wavelength
photo resist
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP60140244A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0467773B2 (enExample
Inventor
Tatsumi Hiramoto
立躬 平本
Ikuo Iwai
郁夫 祝
Masamitsu Ooyama
大山　将允
Mitsuo Narita
光男 成田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ushio Denki KK
Ushio Inc
Original Assignee
Ushio Denki KK
Ushio Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ushio Denki KK, Ushio Inc filed Critical Ushio Denki KK
Priority to JP60140244A priority Critical patent/JPS622541A/ja
Publication of JPS622541A publication Critical patent/JPS622541A/ja
Publication of JPH0467773B2 publication Critical patent/JPH0467773B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP60140244A 1985-06-28 1985-06-28 フオトリソグラフイ Granted JPS622541A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP60140244A JPS622541A (ja) 1985-06-28 1985-06-28 フオトリソグラフイ

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP60140244A JPS622541A (ja) 1985-06-28 1985-06-28 フオトリソグラフイ

Publications (2)

Publication Number Publication Date
JPS622541A true JPS622541A (ja) 1987-01-08
JPH0467773B2 JPH0467773B2 (enExample) 1992-10-29

Family

ID=15264262

Family Applications (1)

Application Number Title Priority Date Filing Date
JP60140244A Granted JPS622541A (ja) 1985-06-28 1985-06-28 フオトリソグラフイ

Country Status (1)

Country Link
JP (1) JPS622541A (enExample)

Also Published As

Publication number Publication date
JPH0467773B2 (enExample) 1992-10-29

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