JPS62246826A - Production of glass - Google Patents
Production of glassInfo
- Publication number
- JPS62246826A JPS62246826A JP8762186A JP8762186A JPS62246826A JP S62246826 A JPS62246826 A JP S62246826A JP 8762186 A JP8762186 A JP 8762186A JP 8762186 A JP8762186 A JP 8762186A JP S62246826 A JPS62246826 A JP S62246826A
- Authority
- JP
- Japan
- Prior art keywords
- sol
- glass
- ultrasonic wave
- ultrafine silica
- silica particles
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000011521 glass Substances 0.000 title claims abstract description 18
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 11
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims abstract description 29
- 238000000034 method Methods 0.000 claims abstract description 10
- 239000002994 raw material Substances 0.000 claims abstract description 7
- 238000002156 mixing Methods 0.000 claims abstract description 6
- 238000003980 solgel method Methods 0.000 claims abstract description 6
- 238000007654 immersion Methods 0.000 claims abstract description 5
- 230000001678 irradiating effect Effects 0.000 claims abstract description 5
- 239000007788 liquid Substances 0.000 claims abstract description 5
- 238000006243 chemical reaction Methods 0.000 claims abstract description 3
- 239000000203 mixture Substances 0.000 claims abstract description 3
- -1 alkyl silicate Chemical compound 0.000 claims description 7
- 239000000377 silicon dioxide Substances 0.000 claims description 7
- 238000002360 preparation method Methods 0.000 claims description 4
- 238000003756 stirring Methods 0.000 abstract description 8
- 239000006185 dispersion Substances 0.000 abstract description 6
- 239000000499 gel Substances 0.000 description 4
- 239000000463 material Substances 0.000 description 4
- 238000001035 drying Methods 0.000 description 3
- 239000002245 particle Substances 0.000 description 3
- 238000005245 sintering Methods 0.000 description 3
- BOTDANWDWHJENH-UHFFFAOYSA-N Tetraethyl orthosilicate Chemical compound CCO[Si](OCC)(OCC)OCC BOTDANWDWHJENH-UHFFFAOYSA-N 0.000 description 2
- 238000010521 absorption reaction Methods 0.000 description 2
- 238000000862 absorption spectrum Methods 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 229910002012 Aerosil® Inorganic materials 0.000 description 1
- VHUUQVKOLVNVRT-UHFFFAOYSA-N Ammonium hydroxide Chemical compound [NH4+].[OH-] VHUUQVKOLVNVRT-UHFFFAOYSA-N 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- 239000004743 Polypropylene Substances 0.000 description 1
- 235000011114 ammonium hydroxide Nutrition 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 239000010419 fine particle Substances 0.000 description 1
- 239000005350 fused silica glass Substances 0.000 description 1
- 239000007863 gel particle Substances 0.000 description 1
- 230000005484 gravity Effects 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 238000006460 hydrolysis reaction Methods 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 239000013307 optical fiber Substances 0.000 description 1
- 238000007500 overflow downdraw method Methods 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 229920001155 polypropylene Polymers 0.000 description 1
- 238000000746 purification Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 239000011882 ultra-fine particle Substances 0.000 description 1
- 238000002604 ultrasonography Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/04—Glass compositions containing silica
- C03C3/06—Glass compositions containing silica with more than 90% silica by weight, e.g. quartz
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C1/00—Ingredients generally applicable to manufacture of glasses, glazes, or vitreous enamels
- C03C1/006—Ingredients generally applicable to manufacture of glasses, glazes, or vitreous enamels to produce glass through wet route
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2203/00—Production processes
- C03C2203/20—Wet processes, e.g. sol-gel process
- C03C2203/34—Wet processes, e.g. sol-gel process adding silica powder
Landscapes
- Chemical & Material Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Glass Melting And Manufacturing (AREA)
- Manufacture, Treatment Of Glass Fibers (AREA)
- Silicon Compounds (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は、ゾル−ゲル法によるガラスの製造方法に関す
る。DETAILED DESCRIPTION OF THE INVENTION [Industrial Field of Application] The present invention relates to a method for producing glass by a sol-gel method.
径径のアルキルシリケートおよび超微粒子シリカを主原
料とし、アルキルシリケートの加水分解溶液中に、超微
粒子シリカを混合して調製したゾルをゲル化させた後、
これを乾燥、焼結するゾル−ゲル法によるガラスの製造
においては、アルキルシリケートの加水分解溶液中に混
合した超微粒子シリカを均一に分散させるため、混合容
器の外部から間接的に超音波を照射する方法で行なって
いた。After gelling a sol prepared by mixing ultrafine silica into a hydrolyzed alkyl silicate solution using alkyl silicate and ultrafine silica as main raw materials,
When producing glass using the sol-gel method, which involves drying and sintering this, ultrasonic waves are indirectly applied from outside the mixing container in order to uniformly disperse the ultrafine silica particles mixed into the alkyl silicate hydrolyzed solution. It was done in a way that
しかし、前述の従来技術では、超音波照射を容器を介し
て行なっていたために、容器による超音波の吸収2反射
が生じ、分散効率が耘く超微粒子シリカの分散に非常に
長時間を要した。また、容器の材質により超音波の吸収
、反射の度合が具なるため、容器の材質の選定が難しく
、場合によっては、かなり高価なものを使用せざるをえ
なかった。そこで本発明は、このような問題点を解決す
るものでその目的とするところは、従来の装置と同等の
装置を用い、分散液に対して直接超音波を照射できるシ
ステムにし、さらに攪拌を併用することにより、アルキ
ルシリケートの加水分解溶液中への超微粒子シリカの分
散が均一にしかも効率的に行ない、大量生産への対応を
容易にするゾル−ゲル法によるガラスの製造方法を提供
するとこ・ろにある。However, in the above-mentioned conventional technology, since the ultrasonic irradiation was performed through the container, the ultrasonic wave was absorbed and reflected by the container, and it took a very long time to disperse the ultrafine silica particles, which decreased the dispersion efficiency. . Further, since the degree of absorption and reflection of ultrasonic waves depends on the material of the container, it is difficult to select the material of the container, and in some cases, it is necessary to use a rather expensive material. Therefore, the present invention aims to solve these problems.The purpose of the present invention is to create a system that can directly irradiate ultrasonic waves to the dispersion liquid using equipment equivalent to the conventional equipment, and also uses stirring. By doing so, it is possible to uniformly and efficiently disperse ultrafine silica particles in a hydrolyzed solution of alkyl silicate, and to provide a method for manufacturing glass using a sol-gel method that facilitates mass production. It's in the ro.
本発明の方法は、アルキルシリケートおよび超微粒子シ
リカを主原料として、目的ガラス成分組成の液状ゾルを
調製し、該ゾルをゲル化させた後乾燥、焼結するゾル−
ゲル法によるガラスの製造方法において、ゾル調製工程
中以下の処理方法を有することを特徴とするものである
。The method of the present invention involves preparing a liquid sol with a desired glass composition using alkyl silicate and ultrafine silica as main raw materials, gelling the sol, drying and sintering the sol.
The method for producing glass by the gel method is characterized by having the following treatment method during the sol preparation step.
a、原料混合後、超微粒子シリカの分散を、投込式の超
音波振動子、超音波ホモジナイザーなどを用い、反応容
器などの媒体を介さずに直接的に超音波を照射すること
により行なう、b、αにおいて、超音波を照射する際、
該超微粒子シリカ分散液を攪拌しながら行なう
〔作用〕
本発明によれば、ゾルに対して直接的に超音波が照射さ
れるため、容器を介し間接的に行なう場合に生じる超音
波の吸収、反射による減衰がないため、非常に効率的で
あり、さらに攪拌を併用することにより、均質な分散性
の良いゾルを短時間で作製することができる。したがり
て、ガラスの大量生産への対応が極めて容易になるもの
である〔実施例〕
市販のエチルシリケート(Si (OEc) 、) 1
52A、(LOINHO6108tおよび超微粒子シリ
カ(商品名アエロジルoxso (デグサ社)45tを
同時に混合し、ディシルバー(攪拌分散装置)にて攪拌
を2〜3時間行ない、エチルシリケートの加水分解反応
を行なうと共に超微粒子シリカのある程度分散したゾル
を調製した。この後の、該ゾル中超微粒子シリカの分散
体を向上させるための超音波照射は、前記同様にして調
製したゾル3バツチに対し、次の3つの方法で行なった
。なおゾル中の超微粒子シリカの分散体の評価として、
粘度および粒度分布の測定を用い、従来の経験的データ
より、粘度15Cp、平均粒径[L08μm以下になる
まで超音波照射を行なった。a. After mixing the raw materials, the ultrafine silica particles are dispersed by directly irradiating ultrasonic waves using an immersion type ultrasonic vibrator, an ultrasonic homogenizer, etc. without using a medium such as a reaction container. b, When irradiating ultrasound at α,
According to the present invention, the ultrasonic waves are directly irradiated to the sol while stirring the ultrafine silica dispersion liquid, so that the absorption of the ultrasonic waves that occurs when the ultrasonic waves are irradiated indirectly through a container, Since there is no attenuation due to reflection, it is very efficient, and by using stirring in combination, a homogeneous sol with good dispersibility can be produced in a short time. Therefore, it becomes extremely easy to cope with mass production of glass. [Example] Commercially available ethyl silicate (Si (OEc)) 1
52A, (LOINHO 6108t and 45t of ultrafine silica (trade name: Aerosil oxso (Degussa)) were mixed at the same time, and stirred for 2 to 3 hours using a Dissilver (stirring and dispersing device) to perform a hydrolysis reaction of ethyl silicate and A sol in which fine particle silica was dispersed to some extent was prepared.The subsequent ultrasonic irradiation to improve the dispersion of ultrafine particle silica in the sol was performed using the following three methods on three batches of sols prepared in the same manner as described above. As an evaluation of the dispersion of ultrafine silica particles in the sol,
Using measurements of viscosity and particle size distribution, and based on conventional empirical data, ultrasonic irradiation was performed until the viscosity was 15 Cp and the average particle size [L08 μm or less].
■ 含ゾル容器の外側からrwi接的に超音波を照射し
た。■ Ultrasonic waves were irradiated directly from the outside of the sol-containing container.
■ ゾル中に投込式の超音波振動子を投入し、超音波を
照射した。■ An immersion type ultrasonic transducer was placed in the sol and ultrasonic waves were irradiated.
■ ゾル中に投込式の超音波振動子を投入し、該ゾルを
攪拌しながら超音波の照射を行なった。この結果は、前
記条件(粘摩15cn以下、平均粒子径108μ鶏以下
)に致達するまでの所要時間で比較すると■、■、■の
場合、それぞれ、20時間、8時間、4時間であった。(2) An immersion type ultrasonic vibrator was placed in the sol, and the sol was irradiated with ultrasonic waves while stirring. This result shows that when comparing the time required to reach the above conditions (viscosity of 15cn or less, average particle size of 108μ or less), it was 20 hours, 8 hours, and 4 hours in the cases of ■, ■, and ■, respectively. .
ここで■が■に比べ、効率が悪かったのは、分散が不均
一で部分的に分散性が悪かつたためである。Here, the reason that ■ was less efficient than ■ was because the dispersion was non-uniform and the dispersibility was poor in some areas.
次工程として、該ゾル中の半ゲル化ゼリー状物や不純物
を含有した大粒子、凝集粒子およびゴミなどを除去する
ため該ゾルに対し遠心外1i11(3000rpm、1
0〜30−)を加えた。この後、さらに該ゾルを一過し
、異物を除去した。そして該ゾルを攪拌しながら、[1
1Nアンモニア水を滴下し、PH値を3〜6に調整し、
20分間撹拌した後、この際に生じたゲル小片などを除
去するため、再遠心分11il!(3000rpm 、
10〜50mm)、再濾過の処理を施し、大きさ36
X24X12(cIn)のポリプロピレン製容器に各6
0Of、各バツチ毎、400個、計1.200個に投入
し、密閉状態にてゲル化させた。この後、収縮が始まっ
た時点で、容器のフタを乾kW度m節のため穴のあいた
所定のものに変え、乾燥機に入れ、室温から昇温速度5
℃/ h rで60〜80℃に加熱し、以後この温度に
保持し10〜15日間で大きさく25±(L5)X (
15±(L4)X ((L5±(Ll)〔m〕の乾燥ゲ
ルを得た。As the next step, the sol is centrifuged at 1i11 (3000 rpm, 1
0 to 30-) were added. After this, the sol was further passed through to remove foreign substances. Then, while stirring the sol, [1
Drop 1N ammonia water and adjust the pH value to 3 to 6.
After stirring for 20 minutes, re-centrifuge 11 il! to remove gel particles generated during this process. (3000rpm,
10-50mm), re-filtered, size 36
6 each in x24 x 12 (cIn) polypropylene containers
0Of, 400 pieces in each batch (total 1,200 pieces) were added and gelatinized in a sealed state. After this, when the shrinkage starts, change the lid of the container to a specified one with holes for drying kW degree m section, put it in the dryer, and heat it up from room temperature to 5 m.
Heated to 60-80℃ at ℃/hr and kept at this temperature thereafter, increasing in size to 25±(L5)X (
A dry gel of 15±(L4)×((L5±(Ll) [m] was obtained.
これらの乾燥ゲルを焼結炉に投入し所定の昇温方法によ
り加熱焼結し、1300〜1450℃にて透明なガラス
体を得た。このガラスの大きさは(18±[14)X
(11±[L3)X ((L!1±a、05)〔創〕で
重置は、180±5〔?〕でありた。These dried gels were put into a sintering furnace and heated and sintered using a predetermined heating method to obtain a transparent glass body at 1300 to 1450°C. The size of this glass is (18±[14)X
(11±[L3)X ((L!1±a, 05) [wound] and the superposition was 180±5[?].
以上のようにして得られたガラスに関する諸物性分析の
結果は、ビッカース硬度、比重、熱膨張係数、赤外吸収
スペクトル、近赤外吸収スペクトル、屈折率など溶融石
英ガラスと全く一致していた。The results of physical property analysis of the glass obtained as described above were completely consistent with fused silica glass, including Vickers hardness, specific gravity, coefficient of thermal expansion, infrared absorption spectrum, near-infrared absorption spectrum, and refractive index.
このように本発明により製造される石英ガラスは、大損
生産が容易であり、ゾル調整時の精製により、高品質な
ものが製造できる。As described above, the quartz glass produced according to the present invention can be easily produced at a large loss, and high-quality products can be produced by purification during sol preparation.
以上、溶融法に比べ低コストであるなどの利点を有する
上に、非常に高品質な石英ガラスが容易に大祉生産可能
であり、これまで石英ガラスを使。As described above, in addition to having advantages such as lower cost than the fusion method, it is also possible to easily produce very high quality quartz glass, which has not been used until now.
用していた分野ではもちろんのこと、工C用フォトマス
ク基板、光フアイバー用母材など種々の分野に応用が広
がるものと考える。また、At。We believe that it will find applications not only in the fields in which it has been used, but also in a variety of other fields, such as photomask substrates for engineering C and base materials for optical fibers. Also, At.
Ti、Gel、Na、Mg、Li、Toなどの諸元累を
、ゾル調製時に混合することにより、種々の異なる特性
を持つ為成分系で高品質なガラスの作製も可能である。By mixing the specifications of Ti, Gel, Na, Mg, Li, To, etc. at the time of sol preparation, it is possible to produce high-quality glass with a component system that has various different characteristics.
以 上that's all
Claims (1)
料として、目的ガラス成分組成の液状ゾルを調製し、該
ゾルをゲル化させた後、乾燥、焼結するゾル−ゲル法に
よるガラスの製造方法において、ゾル調製工程中以下の
処理方法を有することを特徴とするガラスの製造方法。 a)原料混合後、超微粒子シリカの分散を、投込式の超
音波振動子、超音波ホモジナイザーなどを用い、反応容
器などの媒体を介さずに直接的に超音波振動を照射する
ことにより行なう、 b)aにおいて、超音波を照射する際、該超微粒子シリ
カ分散液を攪拌しながら行なう、(1) A method for producing glass by a sol-gel method in which a liquid sol with a desired glass component composition is prepared using alkyl silicate and ultrafine silica as main raw materials, the sol is gelled, and then dried and sintered. A method for producing glass, which comprises the following treatment method during the sol preparation step. a) After mixing the raw materials, the ultrafine silica particles are dispersed by directly applying ultrasonic vibrations using an immersion type ultrasonic vibrator, ultrasonic homogenizer, etc. without using a medium such as a reaction vessel. , b) in a, when irradiating the ultrasonic wave, the ultrafine silica dispersion is stirred;
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP8762186A JPS62246826A (en) | 1986-04-16 | 1986-04-16 | Production of glass |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP8762186A JPS62246826A (en) | 1986-04-16 | 1986-04-16 | Production of glass |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS62246826A true JPS62246826A (en) | 1987-10-28 |
Family
ID=13920041
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP8762186A Pending JPS62246826A (en) | 1986-04-16 | 1986-04-16 | Production of glass |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS62246826A (en) |
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO1990007390A1 (en) * | 1988-12-27 | 1990-07-12 | Symetrix Corporation | Methods and apparatus for material deposition |
US5138520A (en) * | 1988-12-27 | 1992-08-11 | Symetrix Corporation | Methods and apparatus for material deposition |
WO1993004196A1 (en) * | 1991-08-13 | 1993-03-04 | The Regents Of The University Of California | Sol-gel encapsulated enzyme |
US5614252A (en) * | 1988-12-27 | 1997-03-25 | Symetrix Corporation | Method of fabricating barium strontium titanate |
US5962085A (en) * | 1991-02-25 | 1999-10-05 | Symetrix Corporation | Misted precursor deposition apparatus and method with improved mist and mist flow |
KR20010038790A (en) * | 1999-10-27 | 2001-05-15 | 윤종용 | Apparatus and method for manufacturing silica glass for sol-gel process |
CN104671248A (en) * | 2013-11-30 | 2015-06-03 | 天津晶美微纳科技有限公司 | Method for directly preparing high-purity silica sol with large particle size by using silicon powder method |
-
1986
- 1986-04-16 JP JP8762186A patent/JPS62246826A/en active Pending
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO1990007390A1 (en) * | 1988-12-27 | 1990-07-12 | Symetrix Corporation | Methods and apparatus for material deposition |
US5138520A (en) * | 1988-12-27 | 1992-08-11 | Symetrix Corporation | Methods and apparatus for material deposition |
US5614252A (en) * | 1988-12-27 | 1997-03-25 | Symetrix Corporation | Method of fabricating barium strontium titanate |
US5962085A (en) * | 1991-02-25 | 1999-10-05 | Symetrix Corporation | Misted precursor deposition apparatus and method with improved mist and mist flow |
WO1993004196A1 (en) * | 1991-08-13 | 1993-03-04 | The Regents Of The University Of California | Sol-gel encapsulated enzyme |
KR20010038790A (en) * | 1999-10-27 | 2001-05-15 | 윤종용 | Apparatus and method for manufacturing silica glass for sol-gel process |
CN104671248A (en) * | 2013-11-30 | 2015-06-03 | 天津晶美微纳科技有限公司 | Method for directly preparing high-purity silica sol with large particle size by using silicon powder method |
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