JPS62246238A - X-ray generating device - Google Patents

X-ray generating device

Info

Publication number
JPS62246238A
JPS62246238A JP61087212A JP8721286A JPS62246238A JP S62246238 A JPS62246238 A JP S62246238A JP 61087212 A JP61087212 A JP 61087212A JP 8721286 A JP8721286 A JP 8721286A JP S62246238 A JPS62246238 A JP S62246238A
Authority
JP
Japan
Prior art keywords
plasma
capillary
dielectric sheet
insulator
sheet
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP61087212A
Other languages
Japanese (ja)
Inventor
Mitsuaki Amamiya
光陽 雨宮
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP61087212A priority Critical patent/JPS62246238A/en
Priority to DE19873712049 priority patent/DE3712049A1/en
Publication of JPS62246238A publication Critical patent/JPS62246238A/en
Priority to US07/309,918 priority patent/US4935947A/en
Pending legal-status Critical Current

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  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)

Abstract

PURPOSE:To maintain a high output X-ray generating capability for a long time, by forming a capillary wall surface with a dielectric sheet, and renewing the wall surface as it is consumed. CONSTITUTION:When a condenser Cd is charged and a sufficient voltage is applied to an insulator 8, a dielectric sheet 9 covering the insulator is evaporated by the surface discharge of capillaries 2 to generate a plasma 5. In this case, by radiating electron beams from a cathode 6 to the plasma 5, the temperature of the plasma 5 rises, the density of the plasm also rises, and X-rays 7 are generated. Since a part of the surface of the dielectric sheet 9 facing the capillaries 2 is made into plasma by the surface discharge, the sheet is made thinner. Therefore, the dielectric sheet 9 is moved so as to cover the capillaries 2 by the new surface which is not made into plasma yet.

Description

【発明の詳細な説明】 [発明の属する分野1 本発明は、高輝度かつ高効率のパルスXtaを発生させ
るX線発生装置に関する。
DETAILED DESCRIPTION OF THE INVENTION [Field 1 of the Invention] The present invention relates to an X-ray generation device that generates high-luminance and high-efficiency pulses Xta.

[従来の技術] 近時、半導体ウェハやマスク等の試料に微細なパターン
を形成するための装置として、X線を利用したX線露光
装置の開発が進められている。このX線露光装置に用い
られるX線発生装置としては、ターゲットに高速電子ビ
ームを衝突させてターゲットからX線を発生させる方式
が一般的である。しかし、この方式によると、X線発生
効率は0.1%程度と低い上に、ターゲットに衝突させ
る電子ビームの強度を上げるとターゲラ1−が溶VRす
るので、高出力のX線を得るには限界があった。
[Prior Art] Recently, development of an X-ray exposure apparatus using X-rays has been progressing as an apparatus for forming fine patterns on samples such as semiconductor wafers and masks. The X-ray generating device used in this X-ray exposure apparatus generally uses a method in which a high-speed electron beam collides with a target to generate X-rays from the target. However, according to this method, the X-ray generation efficiency is as low as about 0.1%, and when the intensity of the electron beam collided with the target is increased, the target laser 1- melts into VR, making it difficult to obtain high-power X-rays. had its limits.

そこで、高出力のX線を得るものとして、沿面放電を利
用したX線発生装置が考案されている。
Therefore, an X-ray generator using creeping discharge has been devised to obtain high-output X-rays.

このX線発生5A置(細管型プラズマX線源)の−般的
な構造を第3図に示ず。
The general structure of this X-ray generator 5A (capillary plasma X-ray source) is not shown in FIG.

すむわら、円筒型のポリエチレンからなる碍子1にその
中央部をL’S通するキャピラリ内細管状の空間)2が
形成され、また、碍子1の両側には電極3.4が設置ノ
られている。Ra、Rbは抵抗、Cb 、Cdはコンデ
ンサ“であり、抵抗II aの一端には直流高電圧−1
−I Vが印加される。
In the insulator 1 made of cylindrical polyethylene, a capillary-like thin tube-shaped space (2) is formed through which the central portion of the insulator 1 passes through L'S, and electrodes 3.4 are installed on both sides of the insulator 1. There is. Ra and Rb are resistors, Cb and Cd are capacitors, and one end of the resistor IIa is connected to a DC high voltage of -1
-IV is applied.

このような構造でコンデンサ゛Cdが充電され、411
子1に充分大きな゛電圧が印加されると、−11子1を
構成するポリエチレンがキャピラリ2の沿面放電により
蒸発し、プラズマ5が発生する。この時カソード6から
電子ビームをプラズマ5に照射すると、プラズマ5のm
 [Jtが上昇し、かつプラズマ密欧が高まり、X線7
が発生する。
With this structure, the capacitor Cd is charged and 411
When a sufficiently large voltage is applied to the element 1, the polyethylene constituting the -11 element 1 is evaporated by the creeping discharge of the capillary 2, and plasma 5 is generated. At this time, when the plasma 5 is irradiated with an electron beam from the cathode 6, m of the plasma 5 is
[Jt rises and plasma concentration increases, X-ray 7
occurs.

[発明が解決しようとする問題点] しかしながら、このようむ従来の方法ではtA1子1を
構成するボリエブレンが消費されるので、キャピラリ2
の直径が大きくなる。例えば、50K V程度の電圧を
印加して300回程度のIJIi電を行なうと、はじめ
(ま1 #l#Iであった4ニヤピラリの直tyが3a
mどなる。キャピラリの直径が大きくなると、プラズマ
密度が低下し、発生するXrAの強度)〕(低下するの
で、従来の方法ではX線発生装置のスフ Qlが短いと
いう欠点があった。
[Problems to be Solved by the Invention] However, in such a conventional method, since the voliethylene constituting the tA1 child 1 is consumed, the capillary 2
diameter becomes larger. For example, if a voltage of about 50K V is applied and IJIi electricity is performed about 300 times, the direct ty of 4 grins which was initially (Ma1 #l#I) becomes 3a.
m yell. As the diameter of the capillary increases, the plasma density decreases and the intensity of the generated XrA decreases, so the conventional method had the disadvantage that the sulfur Ql of the X-ray generator was short.

本発明の目的は、上述従来例の欠点に鑑み、高出力なX
線の発生能力を長期に維持できる細管型のXF11発生
HIMを提供することにある。
In view of the drawbacks of the above-mentioned conventional examples, an object of the present invention is to provide a high-output
The object of the present invention is to provide a capillary-type XF11 generation HIM that can maintain the ability to generate radiation for a long period of time.

E問題点を解決するための手段J5よび作用]本発明の
X線発生装置は、キャピラリ内に沿面M電によって高密
度のプラズマをつくり、これに高速の電子ビームを打ち
込んでX線を発生させる細管型プラズマX線源において
、上記キャピラリを、誘電体シー1−によって覆われた
絶縁物の壁によって構成し、該誘電体シートを更新可能
なものとしたものである。
Means J5 for solving problem E and operation] The X-ray generator of the present invention creates a high-density plasma in a capillary by creeping M electric current, and injects a high-speed electron beam into the plasma to generate X-rays. In the capillary type plasma X-ray source, the capillary is constituted by an insulating wall covered with a dielectric sheet 1-, and the dielectric sheet is renewable.

従って、キャピラリに面する誘電体シー(・のプラズマ
化による消費を該誘電体シートの更新により補うことが
できる。
Therefore, the consumption of the dielectric sheet facing the capillary due to plasma formation can be compensated for by renewing the dielectric sheet.

[実施例] 以下、図面を用いて本発明の詳細な説明する。[Example] Hereinafter, the present invention will be explained in detail using the drawings.

な↓、第3図の従来例と共通または対応する部分につい
ては同一の符号で表わす。
↓ Components common or corresponding to those of the conventional example shown in FIG. 3 are denoted by the same reference numerals.

第1図は、本発明の一実施例に係るX線発生装置の構成
を示す。同図において、Ra  、Rbは抵抗、Cb 
 、Cdはコンデンサ、2はキャピラリ、3.4は電極
、5は発生したプラズマ、6はカソード、7はX線、8
は碍子、9は誘電体のシートである。同図かられかるよ
うに、キャピラリ2は6個の三角柱状の碍子8と、碍子
を覆う誘電体シー]・9で構成される。そして、ギヤピ
ラリ2は誘電体シート9で囲まれている。誘電体シート
9は所定の波長域のX線を/j5[rJJすべぎ元素を
含有する電気的絶縁性の物′FJ(例えば炭素のX線力
を必要な場合、ポリエチレン等)で厚さ1〜100μl
程度のシートである。碍子8はMffi体シー上シート
9の材料でもよいが、絶縁物であれば誘電体シートつと
異なる材質(例えばアルミナAJ203 )のものでも
よい。電極3,4、カソード6、碍子8おJ:び誘電体
シート9は兵学容器に収められている。
FIG. 1 shows the configuration of an X-ray generator according to an embodiment of the present invention. In the same figure, Ra and Rb are resistances, and Cb
, Cd is a capacitor, 2 is a capillary, 3.4 is an electrode, 5 is a generated plasma, 6 is a cathode, 7 is an X-ray, 8
is an insulator, and 9 is a dielectric sheet. As can be seen from the figure, the capillary 2 is composed of six triangular prism-shaped insulators 8 and a dielectric sheet 9 covering the insulators. The gear pillar 2 is surrounded by a dielectric sheet 9. The dielectric sheet 9 is made of an electrically insulating material containing an element (e.g., polyethylene, etc. when the X-ray power of carbon is required) and has a thickness of 1. ~100μl
It is a sheet of about. The insulator 8 may be made of the material of the Mffi sheet 9, but may be made of a different material from the dielectric sheet (for example, alumina AJ203) as long as it is an insulator. The electrodes 3, 4, cathode 6, insulator 8, and dielectric sheet 9 are housed in a military container.

次に、第1図の装置の動作を説明する。Next, the operation of the apparatus shown in FIG. 1 will be explained.

コンデンサCdが充電され、碍子8に十分大きな電圧が
印加されると碍子8を覆うvh誘電体シートがキャピラ
リ20沿面tli電により蒸発しプラズマ5が発生する
。このとき、カソード6から電子ビームをプラズマ5に
照射すると、プラズマ5の温度が上昇し、かつプラズマ
密度が高まる。そして、X線7が発生ずる。ここまでは
従来形と同様である。ただし、キ17ビラリ2に面して
いる誘電体シート9の表面の一部は沿面放電によりプラ
ズマ化されるのでシートは薄くなっている。そこで、プ
ラズマ化されていない新しい而がキャピラリ2を囲むよ
うに、誘電体シート9を移動させる。この様子を第2図
に示す。ただし、同図では、キャピラリ2を構成する碍
子8と誘電体シート9のみを図示してあり、電極等は省
略した。同図に示す如り、誘電体シート9の移動は矢印
の示す方向に行なう。この誘電体シート9の移動は、1
回の放電ごとに行なってもよいし、数回〜数十回ごとの
適当な回数の放電をさせた後に行なってもよい。
When the capacitor Cd is charged and a sufficiently large voltage is applied to the insulator 8, the VH dielectric sheet covering the insulator 8 is evaporated by the electric current along the surface of the capillary 20, and plasma 5 is generated. At this time, when the plasma 5 is irradiated with an electron beam from the cathode 6, the temperature of the plasma 5 increases and the plasma density increases. Then, X-rays 7 are generated. The process up to this point is the same as the conventional type. However, since a part of the surface of the dielectric sheet 9 facing the dielectric sheet 9 is turned into plasma by creeping discharge, the sheet is thin. Therefore, the dielectric sheet 9 is moved so that the capillary 2 is surrounded by new material that has not been turned into plasma. This situation is shown in FIG. However, in this figure, only the insulator 8 and the dielectric sheet 9 constituting the capillary 2 are shown, and electrodes and the like are omitted. As shown in the figure, the dielectric sheet 9 is moved in the direction indicated by the arrow. The movement of this dielectric sheet 9 is 1
It may be carried out every time the discharge is performed, or it may be carried out after an appropriate number of discharges from several times to several tens of times.

また、シート9の移動の際に、キャピラリ2の空間が増
大するように4!ノ子8間の距離を増せばシート9の移
動を容易に行なうことができる。
Also, when the sheet 9 is moved, the space of the capillary 2 is increased by 4! If the distance between the saws 8 is increased, the sheet 9 can be moved easily.

[他の実施例] 前述の実施例で説明したような細管型プラズマxiIQ
で用いるプラズマ発生用の電気回路として多くのものが
考案されている。本発明は、このような細管型プラズマ
X線源用の電気回路のいずれによっても構成でき、該電
気回路に制限されることはない。例えば第4図は、本発
明の他の実施例であるが、本発明はこのような回路をも
つ細管型プラズマX11源としても構成できる。
[Other Examples] Capillary plasma xiIQ as described in the previous example
Many electrical circuits have been devised for plasma generation. The present invention can be configured by any of such electrical circuits for a capillary plasma X-ray source, and is not limited to such electrical circuits. For example, FIG. 4 shows another embodiment of the present invention, but the present invention can also be configured as a capillary plasma X11 source having such a circuit.

また、キャピラリ2を構成する碍子8と誘電体シート9
については第5〜7図に示したように多くの変形が考え
られる。第5〜7図はいずれもキャピラリの中央におけ
る断面図で、第1図の断面A−Δに相当する。
In addition, an insulator 8 and a dielectric sheet 9 constituting the capillary 2
As shown in FIGS. 5 to 7, many variations are possible. 5 to 7 are all cross-sectional views at the center of the capillary, and correspond to the cross section A-Δ in FIG. 1.

すなわち、第5図に示すように8つの碍子8をbつ構造
でもよいし、または、第6図に示すように4つの碍子8
をもつ構造も可能である。さらに、第7図に示ずように
lJ7子8を回転可能な内材状の形状として誘電体シー
ト9の移動を容易に行なえるような構71も可能である
That is, as shown in FIG. 5, the structure may include eight insulators 8, or as shown in FIG.
A structure with . Furthermore, as shown in FIG. 7, a structure 71 is possible in which the lj7 element 8 is shaped like a rotatable inner material so that the dielectric sheet 9 can be easily moved.

[R明の効果] 以上のように、本発明によると、細管型のX線発生装置
において、誘電体シー]へによりキャピラリの壁面を形
成し、該壁面の消耗に応じて該壁面を更新できるように
したため、従来形のようなキャピラリの直径の拡大によ
るX線の出力低下が起こらず高出力のX線発生能力を維
持することができ、Xa発生装置としての寿命が長くな
る。
[Effect of R-light] As described above, according to the present invention, in a capillary type X-ray generator, the wall surface of the capillary is formed by the dielectric sheet, and the wall surface can be renewed as the wall surface wears out. As a result, the X-ray output power does not decrease due to the enlargement of the capillary diameter as in the conventional type, and the high-output X-ray generation ability can be maintained, thereby extending the life of the Xa generator.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は、本発明の一実施例に係るX線発生装置の構成
を示す構造図、 第2図は、第1図の装置において誘電体シート9を移動
させるときの様子を示す斜視図、第3図は、従来の細管
型プラズマX線源、第4〜7図は、本発明の他の実施例
である。 1−:誘電体、2:キャピラリ、3.4:電極、5:プ
ラズマ、6:カソード、7:X線、8:碍子、9:誘電
体シート。
FIG. 1 is a structural diagram showing the configuration of an X-ray generating device according to an embodiment of the present invention, FIG. 2 is a perspective view showing how the dielectric sheet 9 is moved in the device of FIG. 1, FIG. 3 shows a conventional capillary plasma X-ray source, and FIGS. 4 to 7 show other embodiments of the present invention. 1-: dielectric, 2: capillary, 3.4: electrode, 5: plasma, 6: cathode, 7: X-ray, 8: insulator, 9: dielectric sheet.

Claims (1)

【特許請求の範囲】 1、細管状の空間を形成する壁に沿った沿面放電によっ
て該細管状の空間内にプラズマを発生させることによっ
てX線を発生させる細管型のX線発生装置において、上
記細管状の空間が複数の絶縁物で取り囲むことによつて
形成されており、該細管状の空間に面する該絶縁物の面
が誘電体シートで覆われていることを特徴とするX線発
生装置。 2、前記絶縁物が複数の柱状形絶縁物から成り、前記誘
電体シートを上記複数の絶縁物がそれぞれ互いに接する
接面または接線の間隙を通して移動させることにより前
記細管状の空間に面する誘電体シートの面を更新するこ
とができることを特徴とする特許請求の範囲1項記載の
X線発生装置。 3、前記絶縁物が、複数の円柱状の絶縁物から成り、そ
の円柱を回転軸として回転可能なものである特許請求の
範囲第1または2項記載のX線発生装置。
[Claims] 1. A capillary-type X-ray generator that generates X-rays by generating plasma in a capillary-shaped space by creeping discharge along the wall forming the capillary-shaped space, the above-mentioned X-ray generation characterized in that a tubular space is formed by surrounding a plurality of insulators, and a surface of the insulators facing the tubular space is covered with a dielectric sheet. Device. 2. The insulator is composed of a plurality of columnar insulators, and the dielectric sheet is moved through the tangential surfaces or gaps between the tangential lines where the plurality of insulators are in contact with each other, so that the dielectric faces the capillary space. The X-ray generator according to claim 1, characterized in that the surface of the sheet can be updated. 3. The X-ray generator according to claim 1 or 2, wherein the insulator is made of a plurality of cylindrical insulators and is rotatable about the cylinders as a rotation axis.
JP61087212A 1986-04-10 1986-04-17 X-ray generating device Pending JPS62246238A (en)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP61087212A JPS62246238A (en) 1986-04-17 1986-04-17 X-ray generating device
DE19873712049 DE3712049A1 (en) 1986-04-10 1987-04-09 X-RAY EXPOSURE DEVICE
US07/309,918 US4935947A (en) 1986-04-10 1989-02-07 X-ray exposure apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP61087212A JPS62246238A (en) 1986-04-17 1986-04-17 X-ray generating device

Publications (1)

Publication Number Publication Date
JPS62246238A true JPS62246238A (en) 1987-10-27

Family

ID=13908624

Family Applications (1)

Application Number Title Priority Date Filing Date
JP61087212A Pending JPS62246238A (en) 1986-04-10 1986-04-17 X-ray generating device

Country Status (1)

Country Link
JP (1) JPS62246238A (en)

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