JPS62240315A - Resin composition for sealing use - Google Patents
Resin composition for sealing useInfo
- Publication number
- JPS62240315A JPS62240315A JP8216186A JP8216186A JPS62240315A JP S62240315 A JPS62240315 A JP S62240315A JP 8216186 A JP8216186 A JP 8216186A JP 8216186 A JP8216186 A JP 8216186A JP S62240315 A JPS62240315 A JP S62240315A
- Authority
- JP
- Japan
- Prior art keywords
- resin
- epoxy
- rubber elastomer
- water
- component
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000007789 sealing Methods 0.000 title claims description 16
- 239000011342 resin composition Substances 0.000 title description 15
- 229920001971 elastomer Polymers 0.000 claims abstract description 36
- 239000003822 epoxy resin Substances 0.000 claims abstract description 20
- 229920000647 polyepoxide Polymers 0.000 claims abstract description 20
- 239000000806 elastomer Substances 0.000 claims abstract description 18
- 229920003986 novolac Polymers 0.000 claims abstract description 12
- 125000000217 alkyl group Chemical group 0.000 claims abstract description 10
- 239000000203 mixture Substances 0.000 claims abstract description 10
- 239000005011 phenolic resin Substances 0.000 claims abstract description 9
- 239000011256 inorganic filler Substances 0.000 claims abstract description 8
- 229910003475 inorganic filler Inorganic materials 0.000 claims abstract description 8
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N phenol group Chemical group C1(=CC=CC=C1)O ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 claims abstract description 7
- KXGFMDJXCMQABM-UHFFFAOYSA-N 2-methoxy-6-methylphenol Chemical compound [CH]OC1=CC=CC([CH])=C1O KXGFMDJXCMQABM-UHFFFAOYSA-N 0.000 claims abstract description 6
- 229920001568 phenolic resin Polymers 0.000 claims abstract description 6
- 125000003700 epoxy group Chemical group 0.000 claims abstract description 4
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims abstract description 4
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims abstract 2
- 229920005989 resin Polymers 0.000 claims description 15
- 239000011347 resin Substances 0.000 claims description 15
- 239000010680 novolac-type phenolic resin Substances 0.000 claims description 11
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical group [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 abstract description 11
- 238000002156 mixing Methods 0.000 abstract description 7
- 238000005476 soldering Methods 0.000 abstract description 7
- 238000004519 manufacturing process Methods 0.000 abstract description 3
- 239000012778 molding material Substances 0.000 description 10
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 9
- 230000000694 effects Effects 0.000 description 7
- 239000004065 semiconductor Substances 0.000 description 7
- 239000004593 Epoxy Substances 0.000 description 5
- 239000003795 chemical substances by application Substances 0.000 description 5
- 238000000034 method Methods 0.000 description 5
- 239000000843 powder Substances 0.000 description 5
- 229910000679 solder Inorganic materials 0.000 description 5
- 239000001993 wax Substances 0.000 description 5
- ADCOVFLJGNWWNZ-UHFFFAOYSA-N antimony trioxide Chemical compound O=[Sb]O[Sb]=O ADCOVFLJGNWWNZ-UHFFFAOYSA-N 0.000 description 4
- 238000004132 cross linking Methods 0.000 description 4
- 150000002148 esters Chemical class 0.000 description 4
- 239000008188 pellet Substances 0.000 description 4
- 239000000377 silicon dioxide Substances 0.000 description 4
- WSFSSNUMVMOOMR-UHFFFAOYSA-N Formaldehyde Chemical compound O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 description 3
- 238000006243 chemical reaction Methods 0.000 description 3
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 3
- 238000000465 moulding Methods 0.000 description 3
- 238000012360 testing method Methods 0.000 description 3
- QTWJRLJHJPIABL-UHFFFAOYSA-N 2-methylphenol;3-methylphenol;4-methylphenol Chemical compound CC1=CC=C(O)C=C1.CC1=CC=CC(O)=C1.CC1=CC=CC=C1O QTWJRLJHJPIABL-UHFFFAOYSA-N 0.000 description 2
- VTYYLEPIZMXCLO-UHFFFAOYSA-L Calcium carbonate Chemical compound [Ca+2].[O-]C([O-])=O VTYYLEPIZMXCLO-UHFFFAOYSA-L 0.000 description 2
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- 239000006087 Silane Coupling Agent Substances 0.000 description 2
- -1 alkyl phenols Chemical class 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- 239000007822 coupling agent Substances 0.000 description 2
- 229930003836 cresol Natural products 0.000 description 2
- 230000006866 deterioration Effects 0.000 description 2
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 239000002994 raw material Substances 0.000 description 2
- 229910000077 silane Inorganic materials 0.000 description 2
- 229920001187 thermosetting polymer Polymers 0.000 description 2
- 238000012546 transfer Methods 0.000 description 2
- QSSXJPIWXQTSIX-UHFFFAOYSA-N 1-bromo-2-methylbenzene Chemical compound CC1=CC=CC=C1Br QSSXJPIWXQTSIX-UHFFFAOYSA-N 0.000 description 1
- 229930185605 Bisphenol Natural products 0.000 description 1
- 229920000049 Carbon (fiber) Polymers 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 229930040373 Paraformaldehyde Natural products 0.000 description 1
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 125000002723 alicyclic group Chemical group 0.000 description 1
- 150000001408 amides Chemical class 0.000 description 1
- 150000008064 anhydrides Chemical class 0.000 description 1
- 150000004982 aromatic amines Chemical class 0.000 description 1
- 125000003118 aryl group Chemical group 0.000 description 1
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 1
- 229910000019 calcium carbonate Inorganic materials 0.000 description 1
- 239000006229 carbon black Substances 0.000 description 1
- 239000004917 carbon fiber Substances 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 239000004927 clay Substances 0.000 description 1
- 239000003086 colorant Substances 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 125000000113 cyclohexyl group Chemical class [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 235000014113 dietary fatty acids Nutrition 0.000 description 1
- 238000005538 encapsulation Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 239000000194 fatty acid Substances 0.000 description 1
- 229930195729 fatty acid Natural products 0.000 description 1
- 150000004665 fatty acids Chemical class 0.000 description 1
- 239000003063 flame retardant Substances 0.000 description 1
- 239000005350 fused silica glass Substances 0.000 description 1
- 238000007429 general method Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 239000003365 glass fiber Substances 0.000 description 1
- 125000005843 halogen group Chemical group 0.000 description 1
- CAYGQBVSOZLICD-UHFFFAOYSA-N hexabromobenzene Chemical compound BrC1=C(Br)C(Br)=C(Br)C(Br)=C1Br CAYGQBVSOZLICD-UHFFFAOYSA-N 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- JEIPFZHSYJVQDO-UHFFFAOYSA-N iron(III) oxide Inorganic materials O=[Fe]O[Fe]=O JEIPFZHSYJVQDO-UHFFFAOYSA-N 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 1
- 239000010445 mica Substances 0.000 description 1
- 229910052618 mica group Inorganic materials 0.000 description 1
- 239000006082 mold release agent Substances 0.000 description 1
- 231100000252 nontoxic Toxicity 0.000 description 1
- 230000003000 nontoxic effect Effects 0.000 description 1
- 239000004843 novolac epoxy resin Substances 0.000 description 1
- QWVGKYWNOKOFNN-UHFFFAOYSA-N o-cresol Chemical compound CC1=CC=CC=C1O QWVGKYWNOKOFNN-UHFFFAOYSA-N 0.000 description 1
- 229920002866 paraformaldehyde Polymers 0.000 description 1
- 150000002989 phenols Chemical class 0.000 description 1
- 230000002040 relaxant effect Effects 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 229920006395 saturated elastomer Polymers 0.000 description 1
- 239000000454 talc Substances 0.000 description 1
- 229910052623 talc Inorganic materials 0.000 description 1
- 235000010215 titanium dioxide Nutrition 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Compositions Of Macromolecular Compounds (AREA)
- Epoxy Resins (AREA)
- Structures Or Materials For Encapsulating Or Coating Semiconductor Devices Or Solid State Devices (AREA)
Abstract
Description
【発明の詳細な説明】
[発明の目的]
(産業上の利用分野)
本発明は、低応力で耐湿性、半田耐熱性に優れた電子・
電気部品の封止用樹脂組成物に関する。[Detailed Description of the Invention] [Objective of the Invention] (Industrial Application Field) The present invention provides an electronic and
The present invention relates to a resin composition for sealing electrical parts.
(従来の技術)
従来ダイオード、トランジスタ、!!積回路などの電子
部品を熱硬化性樹脂を用いて封止する方法が行われてぎ
た。 この樹脂封止は、ガラス、金属、セラミックを用
いたハーメチックシール方式に比較して経済的に有利な
ために広く実用化されている。 封止用樹脂とし使用さ
れる熱硬化性樹脂の中でもエポキシ樹脂が最も一般的に
用いられている。 エポキシ樹脂は、1llI無水物、
芳香族アミン、ノボラック型フェノール樹脂等の硬化剤
が用いられている。 これらの中でもノボラック型フェ
ノール樹脂を硬化剤としたエポキシ樹脂は、他の硬化剤
を使用したものに比べて、成形性、耐湿性に優れ、毒性
がなく、かつ安価であるため半導体封止材料として広く
用いられている。(Conventional technology) Conventional diode, transistor,! ! 2. Description of the Related Art Methods of sealing electronic components such as integrated circuits using thermosetting resin have been used. This resin sealing is widely put into practical use because it is economically advantageous compared to hermetic sealing methods using glass, metal, or ceramic. Among thermosetting resins used as sealing resins, epoxy resins are most commonly used. Epoxy resin is 1llI anhydride,
Hardening agents such as aromatic amines and novolac type phenolic resins are used. Among these, epoxy resins using novolac type phenolic resin as a curing agent have excellent moldability and moisture resistance, are non-toxic, and are inexpensive compared to those using other curing agents, so they are used as semiconductor encapsulation materials. Widely used.
(発明が解決しようとする問題点)
しかし、近年、半導体集積回路の分野において、素子の
高集積化、ペレットの大形化が進み、これまでのノボラ
ック型フェノール樹脂を硬化剤としたエポキシ樹脂では
、成形硬化時に収縮して半導体素子に応力がかかり、信
頼性に劣るという欠点があった。 そして、こうした樹
脂を使用した成形品(封止品)の4寒サイクルテストを
行うと、ボンディングワイヤのオープン、樹脂クラック
、ペレットクラックが発生し、電子部品としての機能が
果せなくなるという欠点がある。(Problem to be solved by the invention) However, in recent years, in the field of semiconductor integrated circuits, elements have become more highly integrated and pellets have become larger. However, this method had the disadvantage that it contracts during molding and hardening, applying stress to the semiconductor element, resulting in poor reliability. When a molded product (sealed product) using such resin is subjected to a 4-cold cycle test, open bonding wires, resin cracks, and pellet cracks occur, making it impossible to function as an electronic component. .
更に、現在半導体装置の組立工程の自動化が推進されて
いる。 例えばフラットパッケージ型の半導体装置を回
路基板に取り付ける場合、従来はリードビン毎に半田付
けを行っていたが、最近では半導体装置全体を250℃
以上に加熱した半田浴に浸漬して半田付けを行う方法が
採用されている。Furthermore, automation of semiconductor device assembly processes is currently being promoted. For example, when attaching a flat package type semiconductor device to a circuit board, conventionally soldering was done for each lead bin, but recently the entire semiconductor device has been soldered at 250°C.
A method has been adopted in which soldering is performed by immersing the device in a solder bath heated to the above temperature.
従来のエポキシ樹脂を用いた成形品全体の半田浴浸漬を
行うと、樹脂と半導体ペレットおよびフレームとの間に
剥がれが生じ著しい耐湿性劣化を(aくという欠点があ
った。When the entire molded article using conventional epoxy resin is immersed in a solder bath, there is a drawback that peeling occurs between the resin and the semiconductor pellet and frame, resulting in significant deterioration of moisture resistance.
本発明は、これらの欠点を解消するためになされたもの
で、低応力で耐湿性、半田耐熱性、耐クラツク性に優れ
た封止用樹脂組成物を提供することを目的としている。The present invention was made to eliminate these drawbacks, and an object of the present invention is to provide a sealing resin composition that is low in stress and has excellent moisture resistance, soldering heat resistance, and crack resistance.
[発明の構成]
(問題を解決するための手段と作用)
本発明者らは、上記の目的を達成しようと鋭意研究を重
ねた結果、ノボラック型フェノール樹脂を硬化剤とした
エポキシ樹脂の三次元構造中に、それとは相互に関与し
ない別の網目構造を水架橋性ゴムエラストマーによって
導入することにより、低応力で、耐湿性、半田耐熱性並
びに耐クラツク性に優れることを見いだし、本発明を完
成したらのである。[Structure of the Invention] (Means and Effects for Solving the Problem) As a result of intensive research aimed at achieving the above object, the present inventors have developed a three-dimensional epoxy resin using a novolak type phenolic resin as a curing agent. The present invention was completed by discovering that by introducing a separate network structure using a water-crosslinkable rubber elastomer into the structure, which is not mutually involved, low stress and excellent moisture resistance, soldering heat resistance, and crack resistance can be achieved. It was then.
即ら、本発明は、
(A)エポキシ樹脂
(B)ノボラック型フェノール樹脂
(C)一般式
%式%(2)
(但し、R1はアルキル基を R2はアルキル基又はフ
ェニル基を、nはO〜2の整数を表す)で示される活性
シラン基を有する水架橋性ゴムエラストマーおよび
(D)無機質充填剤
を必須成分とし、樹脂組成物に対して前記(C)の水架
橋性ゴムエラスI・マーを0.1〜30重伍%5、また
前記(D)無機質充填剤を25〜90重量%の割合で含
有することを特徴とする封止用樹脂組成物である。 そ
して、エポキシ樹脂のエポキシ基(a)とノボラック型
フェノール樹脂のフェノール性水酸W(b)との当量比
[(a)/(b)]が0.1〜10の範囲内にある封止
用樹脂組成物である。That is, the present invention provides the following: (A) Epoxy resin (B) Novolac type phenolic resin (C) General formula % formula % (2) (However, R1 is an alkyl group, R2 is an alkyl group or a phenyl group, and n is O The water-crosslinkable rubber elastomer having an active silane group (representing an integer of 2 to 2) and (D) an inorganic filler are essential components, and the water-crosslinkable rubber elastomer I. This is a resin composition for sealing, characterized in that it contains 0.1 to 30 wt. %5 of the inorganic filler (D) and 25 to 90 wt. Then, sealing in which the equivalent ratio [(a)/(b)] between the epoxy group (a) of the epoxy resin and the phenolic hydroxyl W (b) of the novolac type phenolic resin is within the range of 0.1 to 10. It is a resin composition for
本発明に用いる(A)エポキシ樹脂としては、その分子
中にエポキシ基を少なくとも2個有する化合物であるか
ぎり、分子構造、分子mなど特に制限はなく、一般に封
止材料に使用されているものを広く包含することができ
る。 例えばビスフェノール型の芳香族系、シクロヘキ
サン誘導体等の脂環族系、さらに次の一般式で示される
エポキシノボラック系等、の樹脂が挙げられる。The epoxy resin (A) used in the present invention is not particularly limited in terms of its molecular structure and molecule m, as long as it is a compound having at least two epoxy groups in its molecule. Can be broadly encompassed. Examples include aromatic resins such as bisphenol type, alicyclic resins such as cyclohexane derivatives, and epoxy novolak resins represented by the following general formula.
(式中、R1は水素原子、ハロゲン原子又はアルキル基
を、R2は水素原子又はアルキル基を、nは1以上の整
数を表す)これらのエポキシ樹脂は、1種又は2種以上
混合して用いられる。(In the formula, R1 represents a hydrogen atom, a halogen atom, or an alkyl group, R2 represents a hydrogen atom or an alkyl group, and n represents an integer of 1 or more.) These epoxy resins may be used alone or in combination of two or more. It will be done.
本発明に用いる(B)ノボラック型フェノール樹脂とし
ては、フェノール、アルキルフ1ノール等のフェノール
類とホルムアルデヒドあるいはバラホルムアルデヒドを
反応させて得られるノボラック型フェノール樹脂および
これらの変性樹脂、例えばエポキシ化もしくはブチル化
ノボラック型フェノール樹脂等、が挙げられる。 ノボ
ラック型フェノール樹脂の配合割合は、前記(Δ)エポ
キシ樹脂のエポキシm<a>と([3)ノボラック型フ
ェノール樹脂のフェノール性水M塁(b)どの当」比[
(a)/(b)]が0.1〜10の範囲内にあることが
望ましい。 この当量比が0.1未満もしくは10を超
えると、耐湿性、成形作業性および硬化物の電気特性が
悪くなり、いずれの場合も好ましくない。 従って、上
記の範囲内に限定される。The (B) novolak type phenolic resin used in the present invention includes novolak type phenol resins obtained by reacting phenols such as phenol and alkyl phenols with formaldehyde or paraformaldehyde, and modified resins thereof, such as epoxidized or butylated resins. Examples include novolac type phenolic resins. The blending ratio of the novolac type phenolic resin is determined by the ratio of the epoxy m<a> of the (Δ) epoxy resin and ([3) the phenolic water M base of the novolac type phenolic resin (b) [
(a)/(b)] is preferably within the range of 0.1 to 10. If this equivalent ratio is less than 0.1 or more than 10, the moisture resistance, molding workability, and electrical properties of the cured product will deteriorate, which is undesirable in either case. Therefore, it is limited within the above range.
本発明に用いる(C)一般式
%式%(2)
で示される活性シラン基を有する水架橋性ゴムエラス1
−マー(但し、式中、R1はアルキル基を、R2はアル
キル基又はフェニル基を、nは0〜2の整数を表す)は
、活性シラン基として一8i <R’ ) (OR’
)
n 3−n
を有する限り、分子構造、分子量等に特に制約されるも
のではない。 具体的には例えば次のものがある。(C) Water-crosslinkable rubber elastomer having an active silane group represented by the general formula % (2) used in the present invention 1
-mer (in the formula, R1 represents an alkyl group, R2 represents an alkyl group or a phenyl group, and n represents an integer of 0 to 2) is an active silane group of -8i<R') (OR'
) There are no particular restrictions on the molecular structure, molecular weight, etc., as long as it has n 3-n . Specifically, there are the following:
(但し、mは1以上の整数を表す)
この活性シラン基を有する水架橋性ゴムエラストマーを
用いた封止用樹脂組成物の成形品を空気中又は耐湿性評
価のためのプレッシャフッカテスト(PCT)装置中に
置くと、筒中に水分によって架橋反応を示ず。 即ち、
活性シラン基を有する水架橋性ゴムエラストマーを用い
た封止用樹脂組成物で成形すると、成形後第1架橋反応
として、封止用樹脂組成物のエポキシ樹脂がノボラック
型フェノール樹脂を硬化剤として硬化し、エポキシ樹脂
の三次元構造ができる。 次に第2次架橋反応としてゴ
ムエラスI・マーの別の網目構造が完成するもので、各
々の三次元構造は相互に関与せず、いわゆる相互網目構
造となる。 従って、水架橋性ゴムエラストマーの配合
は、樹脂組成物に柔軟性を付与し、応力を緩和させて低
応力となり、かつ半田浴に浸漬しても耐湿性劣化が少な
い効果がある。 この水架橋性ゴムエラストマーの配合
割合は、樹脂組成物に対して0.1〜30!!! 量%
とすることが望ましい。 その割合が0.1@l1%未
満の場合は、低応力、4寒サイクル、半田耐熱性に効果
なく、また30m ffi%を超えると成形性が悪くな
り実用に適さず好ましくない。(However, m represents an integer of 1 or more.) A molded product of a sealing resin composition using a water-crosslinkable rubber elastomer having an active silane group was subjected to a pressure hookah test (PCT) for evaluation of air or moisture resistance. ) When placed in the device, no crosslinking reaction occurs due to moisture in the cylinder. That is,
When molded with a sealing resin composition using a water-crosslinkable rubber elastomer having active silane groups, as a first crosslinking reaction after molding, the epoxy resin of the sealing resin composition is cured using a novolac type phenolic resin as a curing agent. This creates a three-dimensional structure of epoxy resin. Next, as a second crosslinking reaction, another network structure of the rubber elastomer I/mer is completed, and each three-dimensional structure does not interact with each other, resulting in a so-called mutual network structure. Therefore, the blending of the water-crosslinkable rubber elastomer has the effect of imparting flexibility to the resin composition, relaxing stress, resulting in low stress, and less deterioration of moisture resistance even when immersed in a solder bath. The blending ratio of this water-crosslinkable rubber elastomer to the resin composition is 0.1 to 30! ! ! amount%
It is desirable to do so. If the proportion is less than 0.1@l1%, it has no effect on low stress, 4-cold cycle, and soldering heat resistance, and if it exceeds 30m ffi%, moldability deteriorates, making it unsuitable for practical use.
本発明に用いる(D)無機質充填剤としては、シリカ粉
末、アルミナ、三酸化アンチモン、タルク、炭酸カルシ
ウム、チタンホワイト、クレー、マイカ、ベンガラ、ガ
ラス繊維、炭素繊維等が挙げられ、これらの中でもシリ
カ粉末やアルミナが好んで用いられる。 無機質充填剤
の配合割合は、樹脂組成物に対して25〜90重量%配
合することが望ましい。 その割合が25重量%未満で
は耐湿性、耐熱性、機械的特性および成形性に効果なく
、また90重G%を超えるとかさぼりが大きくなり成形
性が悪く実用に適さない。Examples of the inorganic filler (D) used in the present invention include silica powder, alumina, antimony trioxide, talc, calcium carbonate, titanium white, clay, mica, red iron, glass fiber, carbon fiber, etc. Among these, silica Powder and alumina are preferably used. The blending ratio of the inorganic filler is preferably 25 to 90% by weight based on the resin composition. When the proportion is less than 25% by weight, there is no effect on moisture resistance, heat resistance, mechanical properties and moldability, and when it exceeds 90% by weight, the bulk becomes large and the moldability is poor, making it unsuitable for practical use.
本発明の封止用樹脂組成物は、エポキシ樹脂、ノボラッ
ク型フェノール樹脂、活性シラン基を有する水架橋性ゴ
ムエラストマー及び無機質充填剤を必須成分とするが、
必要に応じて、例えば天然ワックス類、合成ワックス類
、直鎖脂肪酸の金属塩、酸アミド、エステル類、パラフ
ィン類などの離型剤、塩素化パラフィン、ブロムトルエ
ン、ヘキサブロムベンゼン、三酸化アンチモンなどの難
燃剤、カーボンブラック、ベンガラなどの着色剤、シラ
ンカップリング剤、種々の硬化促進剤等を適宜添加配合
することもできる。The sealing resin composition of the present invention contains an epoxy resin, a novolac type phenol resin, a water-crosslinkable rubber elastomer having an active silane group, and an inorganic filler as essential components.
If necessary, for example, natural waxes, synthetic waxes, metal salts of linear fatty acids, acid amides, esters, mold release agents such as paraffins, chlorinated paraffins, bromotoluene, hexabromobenzene, antimony trioxide, etc. Flame retardants, colorants such as carbon black and red iron oxide, silane coupling agents, various curing accelerators, etc. can also be appropriately added and blended.
本発明の封止用樹脂組成物を成形材料として製造する場
合の一般的4を方法は、エポキシ樹脂、ノボラック型フ
ェノール樹脂、活性シラン基を有する水架橋性ゴムエラ
ストマー、無機質充填剤、その他を所定の組成比に選ん
だ原料組成分をミキサー等によって十分均一に混合した
後、更に熱ロールによる溶融混合処理、またはニーダ等
による混合処理を行い、・次いで冷却固化させ、適当な
大きさに粉砕して成形材料とする。 成形材料の製造に
当って、活性シラン基を有する水架橋性ゴムエラストマ
ーを使用するため、製造工程中の環境を十分注意しなけ
ればならない。 即ち、水架橋性ゴムエラストマーは、
空気中の水分により架橋するので原料段階から環境湿度
を十分管理し、できる限り湿度の低い条件で製造するこ
とが重要である。 こうして得られた成形材料は、電子
部品或いは電気部品の封止、被覆、絶縁等に適用するこ
とができる。General method 4 for producing the encapsulating resin composition of the present invention as a molding material involves adding an epoxy resin, a novolac type phenol resin, a water-crosslinkable rubber elastomer having an active silane group, an inorganic filler, etc. After mixing the raw material compositions selected to have the composition ratio sufficiently uniformly using a mixer, etc., the mixture is further melted and mixed using hot rolls, or mixed using a kneader, etc., and then cooled to solidify and pulverized to an appropriate size. and use it as a molding material. In producing the molding material, a water-crosslinkable rubber elastomer having active silane groups is used, so the environment during the production process must be carefully monitored. That is, the water-crosslinkable rubber elastomer is
Since crosslinking occurs due to moisture in the air, it is important to sufficiently control the environmental humidity from the raw material stage and to manufacture under as low humidity conditions as possible. The molding material thus obtained can be applied to sealing, covering, insulating, etc. electronic or electrical components.
(実施例)
次に本発明を実施例によって具体的に説明するが、本発
明は以下の実施例に限定されるものではない。 以下の
実施例および比較例において「%」とあるのは「重量%
」を意味する。(Examples) Next, the present invention will be specifically explained by examples, but the present invention is not limited to the following examples. In the following Examples and Comparative Examples, "%" means "% by weight".
” means.
実施例 1
クレゾールノボラックエポキシ樹脂(エポキシ5恰21
5) 18%に、ノボラック型フェノール樹脂(フェノ
ール当1107) 9%、水架橋性ゴムエラストマー
3%、溶融シリカ粉末69%、硬化促進剤0.3%、エ
ステル系ワックス0.3%、およびシランカップリング
剤0.4%を常温で混合し、更に90〜95℃で混練し
て冷却した後、粉砕して成形材料を得た。Example 1 Cresol novolac epoxy resin (epoxy 5/21
5) 18%, 9% novolac type phenolic resin (phenol weight 1107), 3% water-crosslinkable rubber elastomer, 69% fused silica powder, 0.3% curing accelerator, 0.3% ester wax, and silane. 0.4% of a coupling agent was mixed at room temperature, further kneaded at 90 to 95°C, cooled, and then crushed to obtain a molding material.
得られた成形材料を170℃に加熱した金型内にトラン
スファー注入し硬化させて成形品(封止品)を得た。
この成形品について耐湿性、応力等に関連する諸特性を
試験し、その結果を第1表にした。 本発明の顕著な効
果が認められた。The obtained molding material was transfer-injected into a mold heated to 170° C. and cured to obtain a molded product (sealed product).
This molded article was tested for various properties related to moisture resistance, stress, etc., and the results are shown in Table 1. Remarkable effects of the present invention were observed.
実施例 2
クレゾールノボラックエポキシ樹脂(エポキシ当υ21
5) 18%、ノボラック型フェノール樹脂(フェノー
ル当fi 107) 9%、水架橋性ゴムエラストマ
ー
3%、シリカ粉末69%、硬化促進剤0.3%、エステ
ル系ワックス0.3%、およびシラン系カップリング剤
0.4%を実施例1と同様に混合、混線、粉砕して成形
材料を得た。 また同様にして成形品を得てこれらの成
形品について実施例1と同様にして耐湿性、応力等に関
連する諸特性を試験したので、その結果を第1表に示し
た。 本発明の顕著な効果が認められた。Example 2 Cresol novolak epoxy resin (epoxy υ21
5) 18%, novolak type phenolic resin (phenol fi 107) 9%, water-crosslinkable rubber elastomer 3%, silica powder 69%, curing accelerator 0.3%, ester wax 0.3%, and silane type 0.4% of the coupling agent was mixed, mixed, and crushed in the same manner as in Example 1 to obtain a molding material. Molded articles were also obtained in the same manner, and these molded articles were tested for various properties related to moisture resistance, stress, etc. in the same manner as in Example 1. The results are shown in Table 1. Remarkable effects of the present invention were observed.
比較例
クレゾールノボラックエポキシ樹脂(エポキシ当121
5) 20%に、ノボラック型フェノール樹脂(フェノ
ール当1107) 10%、シリカ粉末69%、硬化促
進剤0.3%、エステル系ワックス0.3%、およびシ
ラン系カップリング剤0.4%を実施例と同様に混合、
混線、粉砕して成形材料を得た。Comparative Example Cresol novolak epoxy resin (epoxy 121
5) To 20%, add 10% novolac type phenolic resin (phenol weight 1107), 69% silica powder, 0.3% curing accelerator, 0.3% ester wax, and 0.4% silane coupling agent. Mix as in the example,
The mixture was mixed and crushed to obtain a molding material.
この成形材料を用いて成形品とし、成形品の諸特性につ
いて実施例と同様に試験した。 その結果を第1表に示
した。This molding material was used to make a molded article, and the various properties of the molded article were tested in the same manner as in the examples. The results are shown in Table 1.
第1表
1:1 ニクラック数は、30×25×5fflIm
の成形品の底面に25X25X伽lの銅板を埋め込み、
−40℃と+200℃の恒温槽へ各30分間ずつ入れ、
15サイクル繰り返した後の樹脂クラックを調査した。Table 1 1:1 Nikrac number is 30×25×5fflIm
A 25 x 25 x 1 copper plate is embedded in the bottom of the molded product,
Place it in a constant temperature bath at -40℃ and +200℃ for 30 minutes each.
Resin cracks after 15 cycles were investigated.
の起こる時間を評価した。The time at which this occurred was evaluated.
*3 : 封止用樹脂組成物(成形材料)を用いて、2
本のアルミニウム配線を有する電気部品を通常の427
0イフレームに接着し、170℃で3分間トランスファ
ー成形し、5x10x 1,5mmのフラットパッケー
ジ型成形品を得て、そのl 180℃で8時間後硬化を
行った。この成形品を予め40℃、90%RI−1゜1
00時間の吸湿処理をした後、250℃の半田浴に10
秒間浸漬した。その後127℃、2.5気圧の飽和水蒸
気中でプレッシャークツカーテスト(PCT)を行い、
アルミニウムの腐食による断線を不良として評価した。*3: Using a sealing resin composition (molding material),
Regular 427 electrical components with aluminum wiring
It was adhered to a zero frame and transfer molded for 3 minutes at 170°C to obtain a flat package molded product measuring 5 x 10 x 1.5 mm, which was then post-cured at 180°C for 8 hours. This molded product was heated to 40℃ in advance, 90% RI-1゜1.
After 00 hours of moisture absorption treatment, it was placed in a solder bath at 250℃ for 10 hours.
Immersed for seconds. After that, a pressure tester test (PCT) was performed in saturated steam at 127°C and 2.5 atm.
Disconnection due to aluminum corrosion was evaluated as a defect.
*4:DIP16ビンリードフレームのアイランド部に
市販のストレインゲージを接着し、180℃で8時間硬
化させた侵の歪を測定した。*4: A commercially available strain gauge was attached to the island portion of a DIP16 bin lead frame, and the strain was measured after curing at 180° C. for 8 hours.
[発明の効果]
以上の説明および第1表からも明らかなように本発明の
封止用樹脂組成物は、低応力で耐湿性、半田耐熱性、耐
熱性に優れているため、ボンディングワイヤーのオープ
ンや樹脂クラック、ベレットクラックの発生がなく、か
つ硬化時の収縮による応力が低く、250℃以上の半田
浴浸漬後においても優れた特性を示し、これを使用する
ことによって信頼性の高い電子・電気部品を得ることが
できる。[Effects of the Invention] As is clear from the above explanation and Table 1, the encapsulating resin composition of the present invention has low stress and excellent moisture resistance, soldering heat resistance, and heat resistance, so it is suitable for bonding wires. There are no opens, resin cracks, or pellet cracks, and the stress caused by shrinkage during curing is low, and it shows excellent characteristics even after being immersed in a solder bath at temperatures of 250°C or higher. You can get electrical parts.
Claims (1)
、R^1はアルキル基を、R^2はアルキル基又はフェ
ニル基を、nは0〜2の整 数を表す) で示される活性シラン基を有する水架橋性 ゴムエラストマーおよび (D)無機質充填剤 を必須成分とし、樹脂組成物に対して前記 (C)の水架橋性ゴムエラストマーを0.1〜30重量
%、また前記(D)無機質充填剤を25〜90重量%の
割合で含有することを特徴とする封止用樹脂組成物。 2 エポキシ樹脂のエポキシ基(a)とノボラック型フ
ェノール樹脂のフェノール性水酸基(b)との当量比[
(a)/(b)]が0.1〜10の範囲内にある特許請
求の範囲第1項記載の封止用樹脂組成物。[Claims] 1 (A) Epoxy resin (B) Novolak phenolic resin (C) General formula -Si(R^1)_n(OR^2)_3_-_n (wherein R^1 represents an alkyl group) , R^2 represents an alkyl group or a phenyl group, and n represents an integer of 0 to 2. A sealing resin characterized by containing the water-crosslinkable rubber elastomer (C) in an amount of 0.1 to 30% by weight and the inorganic filler (D) in an amount of 25 to 90% by weight. Composition. 2 Equivalence ratio of the epoxy group (a) of the epoxy resin and the phenolic hydroxyl group (b) of the novolac type phenolic resin [
(a)/(b)] is within the range of 0.1 to 10.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP61082161A JPH0662739B2 (en) | 1986-04-11 | 1986-04-11 | Sealing resin composition |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP61082161A JPH0662739B2 (en) | 1986-04-11 | 1986-04-11 | Sealing resin composition |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS62240315A true JPS62240315A (en) | 1987-10-21 |
JPH0662739B2 JPH0662739B2 (en) | 1994-08-17 |
Family
ID=13766706
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP61082161A Expired - Lifetime JPH0662739B2 (en) | 1986-04-11 | 1986-04-11 | Sealing resin composition |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH0662739B2 (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2016056377A (en) * | 2010-03-26 | 2016-04-21 | ジーカ テクノロジー アクチェンゲゼルシャフト | Shape memory material based on structural adhesive |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5933319A (en) * | 1982-08-20 | 1984-02-23 | Shin Etsu Chem Co Ltd | Flame-retarding epoxy resin composition |
JPS6055025A (en) * | 1983-09-06 | 1985-03-29 | Toshiba Corp | Epoxy resin composition |
JPS60206824A (en) * | 1984-03-30 | 1985-10-18 | Toshiba Corp | Epoxy resin composition for sealing semiconductor |
JPS6112724A (en) * | 1984-06-27 | 1986-01-21 | Toshiba Corp | Epoxy resin composition |
-
1986
- 1986-04-11 JP JP61082161A patent/JPH0662739B2/en not_active Expired - Lifetime
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5933319A (en) * | 1982-08-20 | 1984-02-23 | Shin Etsu Chem Co Ltd | Flame-retarding epoxy resin composition |
JPS6055025A (en) * | 1983-09-06 | 1985-03-29 | Toshiba Corp | Epoxy resin composition |
JPS60206824A (en) * | 1984-03-30 | 1985-10-18 | Toshiba Corp | Epoxy resin composition for sealing semiconductor |
JPS6112724A (en) * | 1984-06-27 | 1986-01-21 | Toshiba Corp | Epoxy resin composition |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2016056377A (en) * | 2010-03-26 | 2016-04-21 | ジーカ テクノロジー アクチェンゲゼルシャフト | Shape memory material based on structural adhesive |
Also Published As
Publication number | Publication date |
---|---|
JPH0662739B2 (en) | 1994-08-17 |
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