JPS62239352A - Production of photomagnetic recording medium - Google Patents
Production of photomagnetic recording mediumInfo
- Publication number
- JPS62239352A JPS62239352A JP8172186A JP8172186A JPS62239352A JP S62239352 A JPS62239352 A JP S62239352A JP 8172186 A JP8172186 A JP 8172186A JP 8172186 A JP8172186 A JP 8172186A JP S62239352 A JPS62239352 A JP S62239352A
- Authority
- JP
- Japan
- Prior art keywords
- film
- target
- sputtering
- thin film
- substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000004519 manufacturing process Methods 0.000 title claims description 8
- 239000010408 film Substances 0.000 claims abstract description 21
- 239000010409 thin film Substances 0.000 claims abstract description 15
- 238000004544 sputter deposition Methods 0.000 claims abstract description 13
- 238000001704 evaporation Methods 0.000 claims description 12
- 230000008020 evaporation Effects 0.000 claims description 12
- 238000000034 method Methods 0.000 claims description 8
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 abstract description 12
- 239000001301 oxygen Substances 0.000 abstract description 12
- 229910052760 oxygen Inorganic materials 0.000 abstract description 12
- 239000000758 substrate Substances 0.000 abstract description 12
- 239000007789 gas Substances 0.000 abstract description 9
- 230000000694 effects Effects 0.000 abstract description 8
- 230000015572 biosynthetic process Effects 0.000 abstract description 7
- 238000007740 vapor deposition Methods 0.000 abstract description 5
- 230000003247 decreasing effect Effects 0.000 abstract 1
- 230000001747 exhibiting effect Effects 0.000 abstract 1
- 238000005247 gettering Methods 0.000 abstract 1
- 230000008016 vaporization Effects 0.000 abstract 1
- 238000009834 vaporization Methods 0.000 abstract 1
- 238000010586 diagram Methods 0.000 description 4
- 230000006866 deterioration Effects 0.000 description 3
- 230000001681 protective effect Effects 0.000 description 2
- 229910052581 Si3N4 Inorganic materials 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 229910052723 transition metal Inorganic materials 0.000 description 1
Abstract
Description
【発明の詳細な説明】
（産業上の利用分野）
本発明は、例えば、書換え可能な光磁気デスクなどに用
いられ、磁気カー回転効果、あるいはファラデー効果な
どの磁気光学効果を用いて読みだすことのできる光磁気
記録媒体の製法に係わる。[Detailed Description of the Invention] (Industrial Application Field) The present invention is used, for example, in a rewritable magneto-optical desk, and reads data using a magneto-optic effect such as the magnetic Kerr rotation effect or the Faraday effect. It is concerned with the manufacturing method of magneto-optical recording media that can be used.
（従来の技術）
近年、レーザーを用いた高密度記録法として、？、＋ｕ
ＪｌムＬ ＦＴＺＺ ｌｋ−＆ ｌ プ１コｂ
Ｌ４ｔＩ−に−＋−巳☆ＩＦ−４，衾り二μ ツヤとに
よりビットを書込み、磁気光学効果を利用して読みだす
という光磁気記録が研究開発されている。その記録媒体
として、量産に適し且つ読み出しノイズの少ないＧｄＴ
ｂＦｅ、ＤｙＦｅ、ＧｄＣｏ、ＧｄＦｅ。(Conventional technology) In recent years, as a high-density recording method using a laser, ? ,+u
Jlmu L FTZZ lk-&l pu1cob
Magneto-optical recording is being researched and developed in which bits are written in L4tI- by -+-sniff☆IF-4, 2μ gloss and read out using the magneto-optic effect. As a recording medium, GdT is suitable for mass production and has low read noise.
bFe, DyFe, GdCo, GdFe.
ＴｂＤｙＦｅ、ＴｂＦｅＣｏなどの希土類−遷移金属か
らなる非晶質薄膜が注目されている。Amorphous thin films made of rare earth-transition metals such as TbDyFe and TbFeCo are attracting attention.
（発明が解決しようとする問題点）
ＧｄＴｂＦｅをはじめとして、一般にこれら薄膜は、耐
蝕性におとり、湿気を有する雰囲気中では、腐食されて
磁気特性の劣化、外観の劣化を生じるという欠点をもつ
。(Problems to be Solved by the Invention) These thin films, including GdTbFe, generally have poor corrosion resistance, but have the disadvantage that they corrode in a humid atmosphere, resulting in deterioration of magnetic properties and appearance.
膜形成後の記録媒体の劣化を防ぐ為に、従来から記録媒
体上に光学的に透明なＳｉＯ，５ｉ０２．Ｓｉ３Ｎ４な
どの保護膜が設けられている。しかしながら、膜形成時
において取りこまれた酸素による特性の劣化は、従来技
術では十分に対処されていない。In order to prevent deterioration of the recording medium after film formation, optically transparent SiO, 5i02. A protective film such as Si3N4 is provided. However, deterioration of properties due to oxygen introduced during film formation has not been adequately addressed in the prior art.
本発明の目的は、磁気特性の優れた記録媒体の製法を提
供することにある。An object of the present invention is to provide a method for manufacturing a recording medium with excellent magnetic properties.
（発明が解決しようとする手段）
本発明は、製膜装置内にゲッター作用の強いターゲット
、又は蒸発源を設け、前記ターゲット、又は蒸発源によ
りスパッター又は蒸着を行なった後、目的の薄膜を形成
することにより、膜形成時の酸素分圧を下げ、磁気特性
の良い膜形成が可能であることを特徴としている。(Means to be Solved by the Invention) The present invention provides a target with a strong getter action or an evaporation source in a film forming apparatus, and after sputtering or vapor deposition is performed using the target or evaporation source, a desired thin film is formed. By doing so, it is possible to lower the oxygen partial pressure during film formation and form a film with good magnetic properties.
（作用）
本発明は、製膜装置内にゲッター作用の強いターゲット
、又は蒸発源を設け、前記ターゲット、又は蒸発源によ
りスパッター又は蒸着を行なった後、目的の薄膜を形成
することにより、膜形成時の酸素分圧を下げ、磁気特性
の良い膜形成が可能であることを特徴としている。この
方法により膜中の酸素量が少ない薄膜が形成され、磁気
特性が良く、しかも、弁傘の長い光磁気記録媒体が得ら
れる。(Function) The present invention provides a target with a strong getter effect or an evaporation source in a film forming apparatus, and after performing sputtering or evaporation using the target or evaporation source, a desired thin film is formed. It is characterized by the ability to lower the oxygen partial pressure at the time and form a film with good magnetic properties. By this method, a thin film with a small amount of oxygen in the film is formed, and a magneto-optical recording medium with good magnetic properties and a long umbrella can be obtained.
（実施例−１）
第１図は、スパッター法により本発明を実施するための
一例を示す図である。第１図中１は真空容器、２は真空
ポンプへの排気孔、３はスパッターのだめのガス導入孔
、４はゲッター作用の強いターゲット（例えば、Ｔｉ、
Ｓｉ、Ｆｅ、Ｔｂ等）、５は目的の膜形成するためのタ
ーゲット、６は電力導入端子、７は基板シャッター、８
は接地された対向電極であり、基板ホルダーを兼ねてい
る。(Example-1) FIG. 1 is a diagram showing an example of implementing the present invention by a sputtering method. In Fig. 1, 1 is a vacuum container, 2 is an exhaust hole to the vacuum pump, 3 is a gas inlet hole for sputtering, and 4 is a target with a strong getter action (for example, Ti,
(Si, Fe, Tb, etc.), 5 is a target for forming the desired film, 6 is a power introduction terminal, 7 is a substrate shutter, 8
is a grounded counter electrode, which also serves as a substrate holder.
第１図に基づき、本発明の薄膜の製造方法の一例を説明
する。基板ホルダーを兼ねた対向７１！ｔｆｆｉｓ上に
基板を設置した後、真空容５１を１０ ”Ｔｏｒｒ程度
まで排気する。しかるのち、ガス導入孔３よりスパッタ
ーガスを１０−３〜１０ ’Ｔｏｒｒの範囲になるよう
に導入する。基板シャッター７を閉じた状態で、ターゲ
ット４を１０００程度スパッターする。この膜厚は、タ
ーゲット４の材質により、数１００人から数１０００人
の厚みでつける。この後、真空容器１を再び１Ｏ−７Ｔ
ｏｒｒ程度まで排気し、スパッターガスを導入して、基
板シャッター７を開き、目的の薄膜を形成する。An example of the method for manufacturing a thin film of the present invention will be explained based on FIG. Opposing 71 that also serves as a board holder! After placing the substrate on the tffis, the vacuum volume 51 is evacuated to about 10' Torr. Then, sputtering gas is introduced from the gas introduction hole 3 to a pressure in the range of 10-3 to 10' Torr.Substrate shutter 7 is closed, the target 4 is sputtered to a thickness of about 1000 mm.The film thickness is from several 100 to several 1000 mm depending on the material of the target 4.After this, the vacuum vessel 1 is sputtered again at 10-7T.
The gas is evacuated to a level of 10.0 m, sputtering gas is introduced, and the substrate shutter 7 is opened to form a desired thin film.
上記の薄膜製造方法において、ターゲット４によるスパ
ッターを、何度か繰り返すことにより、効果を大きくす
ることができる。また、ターゲット１により形成された
薄膜が、基板に積層されても、特性に影響しない場合に
は、基板シャッター７を開いたままターゲット４をスパ
ッターしてもよい。この場合には、膜形成後の保護膜を
兼ねることができる。In the above thin film manufacturing method, the effect can be increased by repeating sputtering using the target 4 several times. Further, even if the thin film formed by the target 1 is laminated on the substrate, if the characteristics are not affected, the target 4 may be sputtered with the substrate shutter 7 open. In this case, it can also serve as a protective film after film formation.
この製法により、膜中の酸素量が少なく、角形成のよい
カー回転ヒステリシスループを示す光磁気記録媒体を形
成することができる。第３図（ａ）、（ｂ）に、膜形成
時に取りこまれた酸素量による、カー回転ヒステリシス
ループの違いを示す。第３図（ａ）は、取りこまれた酸
素量の多い場合であり、第３図（ｂ）は、取りこまれた
酸素量の少ない場合である。By this manufacturing method, it is possible to form a magneto-optical recording medium that has a small amount of oxygen in the film and exhibits a well-formed Kerr rotation hysteresis loop. FIGS. 3(a) and 3(b) show the difference in the Kerr rotation hysteresis loop depending on the amount of oxygen taken in during film formation. FIG. 3(a) shows a case where the amount of oxygen taken in is large, and FIG. 3(b) shows a case where the amount of oxygen taken in is small.
（実施例−２）
第２図は、蒸着法により本発明を実施するための一例を
示す図である。実施方法は、実施例−１同様であり、蒸
発源９により蒸着を行った後、蒸発源１０により目的の
薄膜を形成する。(Example-2) FIG. 2 is a diagram showing an example of implementing the present invention by a vapor deposition method. The implementation method is the same as in Example-1, and after vapor deposition is performed using the evaporation source 9, the desired thin film is formed using the evaporation source 10.
（発明の効果）
本発明によれば、形成された膜中の酸素を極力少なくす
ることができ、それにより特性が良く弄命の長い光磁気
記録媒体を得ることができる。(Effects of the Invention) According to the present invention, the amount of oxygen in the formed film can be reduced as much as possible, thereby making it possible to obtain a magneto-optical recording medium with good characteristics and a long lifespan.
第１図は、スパッター法により本発明を実施するための
装置の説明図、第２図は、蒸着法により本発明を実施す
るための装置の説明図、第３図（ａ）、（ｂ）は、取り
こまれた酸素量の違いによるカー回転ヒステリシスルー
プの違いを示す図、
１・・・真空容器、２・・・真空ポンプへの排気孔、３
・・・ガス導入孔、４・・・ゲッター作用の強いターゲ
ット、５０．。
目的の薄膜を形成するためのターゲット、６・・・電力
導入端子、７・・・基板シャッター、８・・・対向電極
、又は、基板ホルダー、９・・・ゲッター作用の強い蒸
発源、１０・・・目的の薄膜を形成するための蒸発源。
□−１＼
代、・二′、、〜゛士１“Δム、′、１目。
＼。
亭 １ 図Fig. 1 is an explanatory diagram of an apparatus for carrying out the present invention by sputtering method, Fig. 2 is an explanatory diagram of an apparatus for carrying out the invention by vapor deposition method, and Figs. 3(a) and (b). The figure shows the difference in the Kerr rotation hysteresis loop due to the difference in the amount of oxygen taken in. 1... Vacuum vessel, 2... Exhaust hole to the vacuum pump, 3
... Gas introduction hole, 4... Target with strong getter action, 50. . Target for forming the desired thin film, 6... Power introduction terminal, 7... Substrate shutter, 8... Counter electrode or substrate holder, 9... Evaporation source with strong getter action, 10. ...Evaporation source for forming the desired thin film. □−1＼ 代、・２′、、〜゛士１「Δｍ、′、1st. ＼。 Tei 1 Figure
Claims (1)
蒸発源を設け、前記ターゲット、又は蒸発源によりスパ
ッター又は蒸着を行なった後、目的の薄膜を形成するこ
とを特徴とする光磁気記録媒体の製造方法。Production of a magneto-optical recording medium characterized in that a target or evaporation source with a large getter action is provided in a film forming apparatus, and after sputtering or evaporation is performed by the target or evaporation source, a desired thin film is formed. Method.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8172186A JPS62239352A (en) | 1986-04-08 | 1986-04-08 | Production of photomagnetic recording medium |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8172186A JPS62239352A (en) | 1986-04-08 | 1986-04-08 | Production of photomagnetic recording medium |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS62239352A true JPS62239352A (en) | 1987-10-20 |
Family
ID=13754278
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP8172186A Pending JPS62239352A (en) | 1986-04-08 | 1986-04-08 | Production of photomagnetic recording medium |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS62239352A (en) |
-
1986
- 1986-04-08 JP JP8172186A patent/JPS62239352A/en active Pending
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JPS62239352A (en) | Production of photomagnetic recording medium | |
| JPS60107751A (en) | Photothermomagnetic recording medium | |
| JPS60246041A (en) | Photo thermomagnetic recording medium | |
| JPS61258353A (en) | Photomagnetic recording medium | |
| JPH0550400B2 (en) | ||
| JPS62239349A (en) | Magneto-optical recording medium | |
| JPS60231935A (en) | Photomagnetic recording medium | |
| JPH0555941B2 (en) | ||
| JPS58196639A (en) | Photothermic and magnetic recording medium | |
| JPS60101742A (en) | Photomagnetic recording medium | |
| GB2150946A (en) | Magneto-optical recording medium | |
| JPS6148151A (en) | Optical recording medium | |
| JPS62172547A (en) | Photomagnetic recording medium | |
| JP2539401B2 (en) | Magneto-optical recording medium and manufacturing method thereof | |
| JPH0458661B2 (en) | ||
| JPS61153856A (en) | Information recording medium | |
| JPS62121943A (en) | Optical recording medium | |
| JPS60101740A (en) | Photomagnetic recording medium | |
| JP2620088B2 (en) | Magneto-optical recording element and manufacturing method thereof | |
| JPH0410132B2 (en) | ||
| JPS60173745A (en) | Photoelectromagnetic recording medium | |
| JPS60143460A (en) | Optothermomagnetic recording medium and its production | |
| JPS62209750A (en) | Photomagnetic recording medium | |
| JPS62117157A (en) | Optical recording medium | |
| JPH0589555A (en) | Information recording and reproducing method |