JPS62224576A - Electroformed thin blade grindstone and its manufacture - Google Patents

Electroformed thin blade grindstone and its manufacture

Info

Publication number
JPS62224576A
JPS62224576A JP6814686A JP6814686A JPS62224576A JP S62224576 A JPS62224576 A JP S62224576A JP 6814686 A JP6814686 A JP 6814686A JP 6814686 A JP6814686 A JP 6814686A JP S62224576 A JPS62224576 A JP S62224576A
Authority
JP
Japan
Prior art keywords
grindstone
thin
metal plating
cutting edge
electroformed thin
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP6814686A
Other languages
Japanese (ja)
Other versions
JPH0771790B2 (en
Inventor
Tsutomu Takahashi
務 高橋
Takeshi Katayama
武志 片山
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Metal Corp
Original Assignee
Mitsubishi Metal Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Metal Corp filed Critical Mitsubishi Metal Corp
Priority to JP61068146A priority Critical patent/JPH0771790B2/en
Publication of JPS62224576A publication Critical patent/JPS62224576A/en
Publication of JPH0771790B2 publication Critical patent/JPH0771790B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Abstract

PURPOSE:To make it possible to obtain excellent cutting sharpness and high processing accuracy from the beginning of grinding by making super fine abrasive particles project from the surface of a peripheral cutting edge part of a metallic plating layer by 1/5 or more of average particle diameter of the abrasive particles. CONSTITUTION:Super fine abrasive particles 11 are made to project from a surface 10a of a metallic plating layer 10 on each of both surfaces and a peripheral cutting edge part by a projecting amount H of 1/5 or more of average particle diameter. By setting the projection amount H in this way, excellent cutting sharpness and high processing accuracy can be obtained from the beginning of grinding.

Description

【発明の詳細な説明】 「産業上の利用分野コ この発明は、特に高い精度を要求されるシリコンやフェ
ライト等の切断や溝加工に用いて好適な電鋳薄刃砥石お
よびその製造方法に関する乙のである。
[Detailed Description of the Invention] "Industrial Field of Application This invention relates to an electroformed thin-blade grindstone suitable for cutting and grooving materials such as silicon and ferrite, which require particularly high precision, and a method for manufacturing the same. be.

[従来の技術] 例えば、シリコン、GaΔs1 フェライト等の電子祠
科あるいはセラミックス、水晶、ガラス等の硬脆(オ科
に、高い精度による切断加工や溝加工を施す場合には、
一般に金属メッキ相内に超砥粒を分散させてなる電鋳薄
刃砥石と呼ばれる薄刃砥石が用いられている。
[Prior Art] For example, when cutting or grooving with high precision is applied to electronic materials such as silicon and GaΔs1 ferrite, or hard and brittle materials such as ceramics, crystal, and glass,
Generally, a thin-blade grindstone called an electroformed thin-blade grindstone, which is made by dispersing superabrasive grains in a metal plating phase, is used.

この電鋳薄刃砥石は、ステンレス鋼等からなる基板の表
面に、ダイヤモンドやCl5N等の超砥粒を分散させた
Ni基等を含む電気メッキ液によって電気メッキを施し
、N1メッキ相内に上記超砥粒を分散させた砥石層を電
析さU゛たのち、さらに上記基板を取り除くことによっ
て得られる厚さ数十μm〜数百μmの輪環板状のらので
ある。
This electroformed thin-blade grindstone is produced by electroplating the surface of a substrate made of stainless steel or the like with an electroplating solution containing a Ni base or the like in which superabrasive grains such as diamond or Cl5N are dispersed, and the above superabrasive is applied within the N1 plating phase. After electrolytically depositing a grindstone layer in which abrasive grains are dispersed, the substrate is further removed, resulting in an annular plate shape having a thickness of several tens of micrometers to several hundred micrometers.

そして、第5図に示すように、このようにして得られた
電鋳薄刃砥石1は、両側面に配設された一対の取付用フ
ランジ2.2間に挾まれたうえ、ナツト3により軸線回
りに回転する砥石軸4に締付は固定されて使用に供され
る。
As shown in FIG. 5, the electroformed thin-blade grindstone 1 thus obtained is sandwiched between a pair of mounting flanges 2 and 2 provided on both sides, and the axis is fixed by a nut 3. The clamp is fixed to the whetstone shaft 4 which rotates around it and is ready for use.

[発明が解決しようとする問題点] ところで、上記従来の電鋳薄刃砥石Iは、通常上記砥石
軸4に固定後その使用に供される前に、一般の砥石を用
いたドレッシングプレートあるいはスティックによって
ドレッシングと呼ばれるその超砥粒の突き出しが行なイ
9れる。
[Problems to be Solved by the Invention] By the way, the conventional electroformed thin-blade whetstone I is usually fixed to the whetstone shaft 4 and before being put to use, it has to be fixed with a dressing plate or stick using a general whetstone. The protrusion of the superabrasive grains, called dressing, is performed.

しかしながら、上記従来の電鋳薄刃砥石Iにおいては、
その超砥粒の結合相を形成する金属メッキ相の強度や硬
度が極めて高いため、上述したような一般砥石によるド
レッシングを行なってらその外周切刃部の金属メッキ相
からの1−記超砥粒の突き出し爪か極く僅かであった。
However, in the conventional electroformed thin-blade grindstone I,
Since the strength and hardness of the metal plating phase that forms the bonding phase of the superabrasive grains are extremely high, if dressing is performed using a general grindstone as described above, the superabrasive grains from the metal plating phase of the outer cutting edge will be removed. There were only a few protruding claws.

加えて、上記超砥粒の粒径が大きくなると一層これら超
砥粒を上記金属メッキ相から突出させることが難しくな
り、例えばその平均粒径か20〜30μmを超えると6
はや」−記一般砥石を用いたドレッシングプレート等に
よっては上記金属メッキ相から突出させることが殆どで
きないう欠点があった。
In addition, as the particle size of the superabrasive grains increases, it becomes even more difficult to make these superabrasive grains protrude from the metal plating phase. For example, if the average grain size exceeds 20 to 30 μm,
Dressing plates using general grindstones have the disadvantage that they are hardly able to protrude from the metal plating layer.

したがって、この種の一般砥石を用いたドレッシングプ
レート等によりドレッシングしたものにあってはその切
れ味に劣り、このため被削材にチッピング(欠け)を発
生させたりあるいは研削抵抗が増加して一方向に曲がっ
てしまい」】記披削材を直線状に切断できずに曲がって
切断してしまうという問題点があった。
Therefore, when dressed with a dressing plate or the like using this type of general grindstone, the sharpness is inferior, and this may cause chipping of the workpiece or increase the grinding resistance, causing it to be cut in one direction. There was a problem in that the cutting material could not be cut in a straight line, but would be cut in a curved manner.

[発明の目的] この発明は上記事情に鑑みてなされたら、ので、研削開
始当初から切れ味に優れて被削材の波加工11hl=y
y!−−/、、−+、m−、&/fi+1−111−1
−J、Jk−ノ1ノ、、Jllq時に高い加工精度を得
ることができる電鋳薄刃砥石およびその製造方法を提供
することを目的とするらのである。
[Purpose of the Invention] This invention has been made in view of the above circumstances, so that it is possible to perform wave machining of a workpiece material with excellent sharpness from the beginning of grinding.
Y! --/,,-+,m-,&/fi+1-111-1
It is an object of the present invention to provide an electroformed thin-blade grindstone that can obtain high machining accuracy when machining -J, Jk-No. 1, Jllq, and a method for manufacturing the same.

[問題点を解決するための手段] この発明の電鋳薄刃砥石は、金属メッキ相の外周刃先部
の表面から、超砥粒をこれら超砥粒の平均粒径の115
以上突出させたしのである。
[Means for Solving the Problems] The electroformed thin-blade grindstone of the present invention extracts superabrasive grains from the surface of the outer peripheral cutting edge portion of the metal plating phase into particles with an average grain size of 115
This is what made it stand out.

[作用] 上記構成の電鋳薄刃砥石によれば、金属メッキ相の基板
側の表面から平均粒径の115以上突出させた超砥粒に
より、研削開始当初から浸れた切れ味を得ることができ
る。
[Function] According to the electroformed thin-blade grindstone having the above configuration, sharp sharpness can be obtained from the beginning of grinding due to the superabrasive grains having an average grain size of 115 or more protruding from the surface of the metal plated phase on the substrate side.

[実施例] 第1図は、この発明の電鋳薄刃砥石の一例を示す乙ので
、そのメッキ層の表面(基板側表面、メッキ層成長側表
面あるいは外周切刃部)の拡大断面図である。
[Example] Figure 1 shows an example of the electroformed thin-edged grindstone of the present invention, and is an enlarged sectional view of the surface of the plated layer (substrate side surface, plated layer growth side surface, or outer peripheral cutting edge part). .

第1図において、この例の電鋳薄刃砥石においては、両
側の表面および外周切刃部の谷部の金属メッキ相IOの
表面10aから、超砥粒!1・・・がそれぞれ図中符号
11で示す量だけ突出さU゛られている。ここでこの突
出m Hは、これら超砥粒II・・・の平均粒径の11
5以上であり、さらに115〜2/3の範囲内に設定す
れば一層好ましい。
In FIG. 1, in the electroformed thin-edged grindstone of this example, superabrasive grains! 1... are each protruded by an amount indicated by reference numeral 11 in the figure. Here, this protrusion m H is 11 of the average grain size of these superabrasive grains II...
5 or more, and more preferably within the range of 115 to 2/3.

すなわち、上記超砥粒11・・・の上記突出量■1が1
15に満たないと、超砥粒11・・・の突出量が少な過
ぎて充分な、切れ味の向上作用をftkることかできな
いからである。また、2/3を超えると金属メッキ相I
Oによる超砥粒II・・・の保持力が低下するためこれ
ら超砥粒11・・・の比較的早い時期における脱落を招
き、これにより砥石厚さの減少等を招いて加工精度が低
下してしまうため、好ましくないからである。
That is, the protrusion amount ■1 of the superabrasive grains 11 is 1
If it is less than 15, the amount of protrusion of the super abrasive grains 11 is too small to achieve a sufficient sharpness improvement effect. Moreover, if it exceeds 2/3, metal plating phase I
The holding power of superabrasive grains II... by O decreases, causing these superabrasive grains 11... to fall off at a relatively early stage, which causes a decrease in the thickness of the grinding wheel and reduces machining accuracy. This is because it is not desirable.

次ぎに、上記電鋳薄刃砥石の製造方法を具体的に説明す
る。
Next, a method for manufacturing the electroformed thin-blade grindstone will be specifically described.

先ず、ステンレス等の金属からなる基板の表面に、ダイ
ヤモンド等の超砥粒を分散させたNi基、Co基あるい
はこれらの合金を含む電気メッキ液を用いて電気メッキ
を施し、これらN + 、 G oおよびこれらの合金
のうちの一種以上の金属からなる金属メッキ相内に上記
超砥粒を分散させた厚さ寸法が数+71 m〜数百μm
の砥石層を形成する。
First, electroplating is applied to the surface of a substrate made of metal such as stainless steel using an electroplating solution containing Ni-based, Co-based, or alloys thereof in which superabrasive grains such as diamond are dispersed, and these N + , G The thickness dimension of the superabrasive grains dispersed in the metal plating phase consisting of one or more metals of O and one or more of these alloys is from several +71 m to several hundred μm.
Forms a grindstone layer.

引き続いて、このようにして形成された砥石層のメッキ
成長側の面上に、超砥粒を含まないNi等の電気メッキ
を施し、上記メッキ成長側の金嘱メッキ相表面から、の
超砥粒の突出量を、その平均粒径の1/゛5〜2/3に
する。そして、次ぎに上記基板にブラッシング等を含む
水洗処理を施した後、この基板から上記砥石層を剥離す
る。
Subsequently, electroplating of Ni or the like that does not contain superabrasive grains is applied to the surface of the grinding wheel layer formed in this way on the plating growth side, and the superabrasive is removed from the surface of the gold plating phase on the plating growth side. The amount of protrusion of the grains is set to 1/5 to 2/3 of the average grain size. Then, after the substrate is subjected to water washing treatment including brushing, etc., the grindstone layer is peeled off from the substrate.

ついで、得られた薄肉板状の砥石層の基板側に位置して
いた金属メッキ相の表面を、化学的あるいは電気化学的
に溶解して上記金属メッキ相の表面から超砥粒をこれら
超砥粒の平均粒径の115〜2/3だけ突出さU・る。
Next, the surface of the metal plating phase located on the substrate side of the obtained thin plate-like grinding wheel layer is chemically or electrochemically dissolved to remove the superabrasive grains from the surface of the metal plating phase. It protrudes by 115 to 2/3 of the average particle size of the grains.

そして、このようにして得られた薄肉板状の砥石層から
、この発明に係る電鋳薄刃砥石を製作するのに際して、
以下に挙げるの2種類の方法が好適に採用され得る。
When manufacturing the electroformed thin-blade grindstone according to the present invention from the thin plate-shaped grindstone layer obtained in this way,
The following two methods can be suitably employed.

すなわち、第1の方法としては、先ず上記砥石層をパン
チング加工等により円形の砥石形状に成形した後、さら
に真円に加工して電鋳薄刃砥石を得る。次いで、この電
鋳薄刃砥石の外周切刃部以外の表面にマスキングを施し
、露出している上記外周切刃部の金属メッキ相の表面を
電気化学的あるいは化学的に溶解することにより、上記
金属メッキ相表面から超砥粒をその平均粒径の115〜
2/3突出させてこの発明に係る電鋳薄刃砥石を得る。
That is, in the first method, the above-mentioned grindstone layer is first formed into a circular grindstone shape by punching or the like, and then further processed into a perfect circle to obtain an electroformed thin-blade grindstone. Next, the surface of this electroformed thin-edged grindstone other than the outer peripheral cutting edge is masked, and the exposed surface of the metal plating phase on the outer peripheral cutting edge is electrochemically or chemically dissolved, thereby removing the metal. Super abrasive grains are removed from the surface of the plating phase with an average grain size of 115~
The electroformed thin blade grindstone according to the present invention is obtained by protruding 2/3.

ここで、上記外周切刃部の金属メッキ相の表面の電気化
学的な溶解方法としては、電解エツチングや電解研摩法
等があり、さらに上記電解研摩液としてはリン酸あるい
はスルファミン酸を主成分とする溶液が好適である。
Here, methods for electrochemically dissolving the surface of the metal plating phase on the outer cutting edge include electrolytic etching, electrolytic polishing, etc., and the electrolytic polishing liquid mainly contains phosphoric acid or sulfamic acid. Solutions are preferred.

この電気化学的な溶解方法によれば、金属メッキ相の溶
解量が通電量に比例するためその管理が容易であり、そ
のため化学的な溶解方法と比較して上記金属メッキ相を
より一層均−に溶解することができるという利点がある
。また、上記電解研摩法にあっては、例えばその電解研
摩液にグリセ+1   ’/  ’n  /7’l  
b’/+  11:  M:  l1rll  fF 
 A’)  々 nl、 #D  ’l’E  /7’
l  M  /l’  匁1    太 ニにはアルコ
ール等のインヒビタ等を添加丁れば、さらに一層上記金
属メッキ用の溶解の均一性を向上させることができる。
According to this electrochemical dissolution method, the dissolution amount of the metal plating phase is proportional to the amount of current applied, so it is easy to manage, and therefore the metal plating phase is more uniformly dissolved than the chemical dissolution method. It has the advantage that it can be dissolved in In addition, in the above electrolytic polishing method, for example, the electrolytic polishing solution contains Glyse+1'/'n/7'l.
b'/+ 11: M: l1rll fF
A') tnl, #D 'l'E /7'
If an inhibitor such as alcohol is added to lM/l', the uniformity of dissolution for metal plating can be further improved.

また、上記金属メッキ相の外周切刃部の表面を溶解する
に際しては、第2図に示すように、金属メッキ相10の
上記外周切刃部の表面10aの両縁部21.21をその
中央部22より多く溶解することにより、上記外周切刃
部の表面10aの形状をその中央部22が突出するとと
もにその両縁部21,21にいイつゆるアール状の面取
り加工が施された、円滑な凸曲面状に形成することが望
ましい。
Further, when melting the surface of the outer peripheral cutting edge portion of the metal plating phase, as shown in FIG. By melting more than the portion 22, the shape of the surface 10a of the outer peripheral cutting edge portion is changed so that the central portion 22 thereof protrudes, and both edges 21, 21 are chamfered in a so-called radius shape. It is desirable to form a smooth convex curved surface.

他方、この発明に係る電鋳薄刃砥石を得る第2の方法は
、先ず基板から剥離した後の上記砥石層の両側面に、第
3図に示すように、その外周部30と内周部31の余分
寸法となる部分を除いた正規の砥石形状の部分に輪環状
のマスキング32を施す。そして次ぎに、これを適性濃
度のII、So。
On the other hand, a second method for obtaining the electroformed thin-blade grindstone according to the present invention is to first coat the outer periphery 30 and inner periphery 31 on both sides of the above-mentioned grindstone layer after it has been peeled off from the substrate, as shown in FIG. An annular masking 32 is applied to the part of the regular grindstone shape excluding the part that becomes the extra dimension. Next, this is mixed with II, So at an appropriate concentration.

十H202溶液、II N O3溶液、あるいは塩化第
二鉄→用ICσ等の酸性溶液を用いた化学エツヂングに
より上記金属メッキ相を所定量溶解し、次0でこれを水
洗および乾燥した後上記マスギングを除去する。これに
より、円形状の砥石形状をなし、かつ同時に上記金属メ
ッキ相の外周切刃部の表面から超砥粒をこれら超砥粒の
平均粒径の115〜2/3たけ突出させたこの発明に係
る電鋳薄刃砥石を得る。
A predetermined amount of the metal plating phase is dissolved by chemical etching using an acidic solution such as H202 solution, II N O3 solution, or ferric chloride → ICσ, and then it is washed with water and dried with zero water, and then the massing is carried out. Remove. As a result, the present invention has a circular grindstone shape, and at the same time, the superabrasive grains are made to protrude from the surface of the outer peripheral cutting edge portion of the metal plating phase by 115 to 2/3 of the average particle diameter of these superabrasive grains. The electroformed thin-edged grindstone is obtained.

したかって、この第2の方法によれば、薄肉板状の砥石
層の砥石形状への成形と、その外周切刃部表面からの超
砥粒の突出とを同時に行なうことができる。
Therefore, according to this second method, it is possible to simultaneously form the thin plate-like grindstone layer into the shape of the grindstone and to protrude the superabrasive grains from the surface of the outer peripheral cutting edge.

しかして、このような製造方法によって得られた」−記
電鋳薄刃砥石にあっては、その金属メッキ化10の外周
切刃部の表面10aから超砥粒11・・を、それらの平
均粒径の115〜2/3突出させているので、研削開始
当初から浸れた切れ味を得ることができる。このため、
この電鋳薄刃砥石の基板側表面およびメッキ層成長側表
面とも被削材の被加工表面にチッピングやムシリを発生
させることがない。しかも、これら超砥粒11・・・は
充分に上記金属メッキ相10に保持されているので、こ
の金属メッキ化lOから早期に脱落することがなく、よ
って高い加工精度を得ることができる。
Therefore, in the case of the "-electroformed thin blade grindstone obtained by such a manufacturing method, the superabrasive grains 11... Since it protrudes by 115 to 2/3 of the diameter, sharp sharpness can be obtained from the beginning of grinding. For this reason,
Both the substrate side surface and the plated layer growth side surface of this electroformed thin blade grindstone do not cause chipping or burrs on the processed surface of the workpiece. Furthermore, since these superabrasive grains 11 are sufficiently retained in the metal plating phase 10, they do not fall off from the metal plating layer 10 at an early stage, so that high processing accuracy can be obtained.

また、上記電鋳薄刃砥石を製造するに際して、その外周
切刃部の表面10aを電気化学的に溶解して超砥粒11
・・・を突出させる方法によれば、上記金属メッキ相1
0の溶解量の管理が容易であるため上記金属メッキ相1
0を均一に溶解することができ、これにより高い製品品
質を得ることができる。
In addition, when manufacturing the electroformed thin-edged grindstone, the surface 10a of the outer peripheral cutting edge part is electrochemically melted to form superabrasive grains 11.
According to the method of protruding..., the metal plating phase 1
The above metal plating phase 1
0 can be uniformly dissolved, thereby achieving high product quality.

さらに、その外周切刃部の表面10aの両縁部21.2
1をその中央部22より多く溶解することにより、上記
外周切刃部の表面10aをその中央部22が突出する円
滑な凸曲面状に形成すれば、一層その切れ味を向上させ
ることができ、よって被削材をより高い精度でかつ確実
に直線状に切断することができる。
Further, both edges 21.2 of the surface 10a of the outer peripheral cutting edge portion
1 is melted in a larger amount than in the central part 22, and the surface 10a of the outer peripheral cutting edge part is formed into a smooth convex curved surface with the central part 22 protruding, the cutting quality can be further improved. It is possible to cut the workpiece material in a straight line with higher accuracy and reliably.

他方、上記外周切刃部の表面10aを化学エツチングに
より溶解して超砥粒を突出させる方法によれば、円形の
砥石形状への成形と、その外周切刃部の表面10aから
の超砥粒の突出とを同時に行なうことができるため、そ
の製造工程の合理化を図ることができる。
On the other hand, according to the method in which the surface 10a of the peripheral cutting edge is dissolved by chemical etching to protrude the superabrasive grains, the superabrasive grains are formed into a circular grindstone shape and the superabrasive grains are released from the surface 10a of the peripheral cutting edge. Since the protrusion and ejection can be performed simultaneously, the manufacturing process can be rationalized.

[実験例] 先ず、不働態化皮膜が形成されたステンレス調からなる
基板の表面に、砥石原型形状をなす部分を残してマスキ
ングをしたのち、通常の脱脂等による清浄化処理を施し
た。次ぎに、ダイヤモンド砥粒を分散さ仕たスルファミ
ン酸Niメッキ液を用いて上記基板の表面に電気メッキ
を施し、Niメツギ(日内に上記ダイヤモンド砥粒を分
散さU・た砥石層を形成した。この場合における上記電
気メッキの条件を以下に示す。
[Experimental Example] First, the surface of a stainless steel-like substrate on which a passivation film was formed was masked leaving a portion forming the shape of a grindstone prototype, and then a cleaning treatment such as normal degreasing was performed. Next, the surface of the substrate was electroplated using a Ni sulfamate plating solution in which diamond abrasive particles were dispersed to form a Ni abrasive layer (in which the diamond abrasive particles were dispersed). The conditions for the electroplating in this case are shown below.

(イ)電気メッキ液の組成 スルファミン酸Ni: 4509/Q 塩化Ni:  I Og/12、  硼酸:309/(
1、ピット防止剤、光沢剤:各少量、 I’H:4、分
散超砥粒の種類:ダイヤモンド拉、 分散砥粒の粒度 :20〜307zm、(ロ)電気メッ
キ条件 浴温度:50℃、 メッキ時間: 160分、陰極電流
密度:5A/d+n’。
(a) Composition of electroplating solution Ni sulfamate: 4509/Q Ni chloride: I Og/12, boric acid: 309/(
1. Pit prevention agent, brightener: small amount of each, I'H: 4, type of dispersed superabrasive: diamond abrasive, particle size of dispersed abrasive: 20-307zm, (b) electroplating conditions bath temperature: 50℃, Plating time: 160 minutes, cathode current density: 5A/d+n'.

次ぎに、上記基板を分散メッキ槽から取り出してブラッ
シング等を含む水洗処理を施した後、引き続き上記基板
表面の砥石層のメッキ成長側の面上に、ダイヤモンド砥
粒を含まないスルファミン酸Niメッキを用いて厚さ約
8μmの電気メッキを施し、上記メッキ成長側の金属メ
ッキ相表面からのダイヤモンド砥粒の突出量を、その平
均粒径の1/2とした。
Next, the substrate is taken out from the dispersion plating tank and subjected to water washing including brushing, and then Ni sulfamate plating that does not contain diamond abrasive grains is applied to the surface of the substrate surface on the plating growth side of the grindstone layer. The diamond abrasive grains were electroplated to a thickness of approximately 8 μm, and the amount of protrusion of the diamond abrasive grains from the surface of the metal plating phase on the growth side of the plating was set to 1/2 of the average grain size.

次ぎに、上記基板を分散メッキ槽から取り出し、水洗し
た後上記基板から上記砥石層を剥離した。
Next, the substrate was taken out from the dispersion plating bath, washed with water, and then the grindstone layer was peeled off from the substrate.

そして、上記砥石層のメッキ成長側の金属メッキ相表面
にマスキングを施し、電解研摩液を用いて上記砥石層の
基板側の金属メッキ相表面に電解研摩を施して、この表
面からのダイヤモンド砥石の突出量をその平均粒径の1
/2とした。この場合における上記電解研摩条件を以下
に示す。
Then, the surface of the metal plating phase on the plating growth side of the grinding wheel layer is masked, and the surface of the metal plating phase on the substrate side of the grinding wheel layer is electrolytically polished using an electrolytic polishing solution, and the diamond grinding wheel is removed from this surface. The amount of protrusion is 1 of the average particle size.
/2. The electrolytic polishing conditions in this case are shown below.

(イ)電解研摩液の組成 リン酸:  700g/(1,グリセリン: 40g/
ρ、(ロ)電解研摩条件 浴温度;40℃、 電解時間;4分、 陽極電流密度:20A/dm2゜ 次いで、上記砥石層を電解研摩槽から取り出して水洗し
、さらに上記マスキングを剥離した後乾燥させた。
(a) Composition of electrolytic polishing solution Phosphoric acid: 700g/(1, Glycerin: 40g/
ρ, (b) Electrolytic polishing conditions Bath temperature: 40°C, electrolysis time: 4 minutes, anode current density: 20A/dm2° Next, the above-mentioned grindstone layer was taken out from the electrolytic polishing tank and washed with water, and the above-mentioned masking was peeled off. Dry.

そして、このようにして得られた上記薄肉板状の砥石層
を、放電加工等により円形の砥石形状に成形して電鋳薄
刃砥石を得た後、その外周切刃部およびその近傍以外を
取り除いた金属メッキ相の表面に、電流が流れないよう
にマスキングを施した。
Then, the thin plate-shaped grindstone layer obtained in this way is formed into a circular grindstone shape by electric discharge machining or the like to obtain an electroformed thin-blade grindstone, and then the outer cutting edge portion and the vicinity thereof are removed. The surface of the metal plated phase was masked to prevent current from flowing.

そして次ぎに、露出している表面を脱脂清浄化した後に
、この表面に電解研摩を施してその金属メッキ相表面か
らのダイヤモンド砥粒の突出量をその平均粒径の1/2
とした。この場合における電解研摩条件は、陽極電流密
度が80 A / d、m”でかつその電解時間111
分である以外は、上記基板側表面に対する電解研摩条件
と同様であった。以上により、この発明に係る電鋳薄刃
砥石である本発明例Iで示ず電鋳薄刃砥石を得た。
Next, after degreasing and cleaning the exposed surface, electrolytic polishing is applied to this surface to reduce the protrusion of the diamond abrasive grains from the surface of the metal plating phase to 1/2 of the average grain size.
And so. The electrolytic polishing conditions in this case are that the anode current density is 80 A/d, m" and the electrolysis time is 111
The electrolytic polishing conditions were the same as those for the substrate side surface above, except that the polishing conditions were as follows. As described above, an electroformed thin-blade grindstone not shown in Invention Example I, which is an electroformed thin-blade grindstone according to the present invention, was obtained.

また、上記本発明例Iの電鋳薄刃砥石と同様の方法によ
り、それぞれ基板側およびメッキ成長側の金属メッキ柑
表面からダイヤモンド砥粒をその平均粒径の115突出
させた薄肉板状の砥石層を作成し、これらに以下の2種
類の処理を施して、それぞれこの発明に係る電鋳薄刃砥
石である、本発明例2および本発明例3の2種類の電鋳
薄刃砥石を作成した。
In addition, by the same method as the electroformed thin-blade grindstone of Example I of the present invention, a thin plate-like grindstone layer in which diamond abrasive grains were protruded by 115 mm of the average particle diameter from the metal-plated surface on the substrate side and the plating growth side, respectively. These were subjected to the following two types of treatments to create two types of electroformed thin-blade grindstones, Invention Example 2 and Invention Example 3, which are electroformed thin-blade grindstones according to the present invention, respectively.

■ 本発明例2 : 上記薄肉板状の砥石層を、レーザ切断で円形に加工した
後、第5図に示すようにその両側面に配設した塩化ビニ
ル製のマスク仮40.40を間に介して回転軸41て挾
持した。そして、上記回転軸41を回転させながら上記
本発明例1で用いたものと同様の電解研摩液を用いて、
上記砥石層のマスク仮40.40から露出している金属
メッキ相の外周切刃部の表面を溶解して、この表面から
のダイヤモンド砥粒の突出量をその平均粒径の7/10
以」二とした。
■ Invention Example 2: After processing the thin plate-shaped grinding wheel layer into a circular shape by laser cutting, as shown in FIG. The rotary shaft 41 was clamped therebetween. Then, while rotating the rotating shaft 41, using the same electrolytic polishing liquid as that used in Example 1 of the present invention,
The surface of the outer peripheral cutting edge of the metal plating phase exposed through the mask 40.40 of the grinding wheel layer is melted, and the amount of diamond abrasive grains protruding from this surface is reduced to 7/10 of the average grain size.
I made it ``2''.

この場合において、得られた電鋳薄刃砥石の外周切刃部
の形状は、その両縁部が中央部より一層溶解されたこと
により、第2図に示すようなその中央部が突出した円滑
な凸曲面状になった。
In this case, the outer peripheral cutting edge of the obtained electroformed thin-edged grindstone has a smooth shape with the center protruding as shown in Figure 2 because both edges have been melted more than the center. It became a convex curved surface.

■ 本発明例3 ; 」−記薄肉板状、の低石層に、第3図に示すようにその
外周部30と内周部31の余分寸法となる部分を除いた
正規の砥石形状となるべき部分に輪環状のマスキング3
2を施した。そして次ぎに、これに塩化第二鉄が400
 g/12. [I CCがIoom(J/Iからなる
化学エツチング液を噴射して上記マスキング32がない
部分を溶解し、正規寸法とされた円形の電鋳薄刃砥石を
得るとと乙に、これと平行してその金属メッキ相の外周
切刃部表面からのダイヤモンド砥粒の突出量を、その平
均粒径の7/10以上とした。
■ Example 3 of the present invention: The thin plate-like low stone layer has a regular whetstone shape with the extra dimensions of the outer circumference 30 and inner circumference 31 removed, as shown in Fig. 3. Ring-shaped masking 3 on the desired area
2 was applied. Next, add 400% ferric chloride to this.
g/12. [I CC sprays a chemical etching solution consisting of Ioom (J/I) to dissolve the part without the masking 32 and obtain a circular electroformed thin blade grindstone with regular dimensions, and in parallel with this, The amount of protrusion of the diamond abrasive grains from the surface of the outer peripheral cutting edge of the metal plating phase was set to be 7/10 or more of the average grain size.

他方これらとは別に、従来の電鋳薄刃砥石として、略同
様の金属メッキ化と超砥粒からなり、かつ上述した超砥
粒の突出処理が施されていないものを作成した。
On the other hand, apart from these, a conventional electroformed thin-blade grindstone was created, which was made of substantially the same metal plating and superabrasive grains, but was not subjected to the above-mentioned protrusion treatment of the superabrasive grains.

第1表は、以上によって得られたこの発明に係る3種類
の電鋳薄刃砥石、および従来の電鋳薄刃砥石の谷々の寸
法、組成等並びにそれぞれの試験結果を示すものである
Table 1 shows the valley dimensions, compositions, etc. of the three types of electroformed thin-blade grindstones according to the present invention obtained above and the conventional electroformed thin-blade grindstones, as well as their respective test results.

(以下、余白) 第1表 研削条件  被削材 :I−(IPフェライト、砥石周
速:  1500 m/min。
(Hereafter, blank space) Table 1 Grinding conditions Work material: I- (IP ferrite, grinding wheel circumferential speed: 1500 m/min.

刃先突出し爪: 3 mm、 送り速度:  50 mm/min。Protruding blade tip: 3 mm, Feed speed: 50 mm/min.

切込み虫:2.5mm、 研削液 : 水溶性 [発明の効果コ 以上説明したようにこの発明の電鋳薄刃砥石およびその
製造方法は、金属メッキ相の外周切刃部の表面を化学的
または電気化学的に溶解することにより、この表面から
超砥粒をこれら超砥粒の平均粒径の115以上突出させ
た乙のであるので、この発明の電鋳薄刃砥石によれば、
研削開始当初からffれだ切れ味と高い加工精度を得る
ことができる。
Cutting depth: 2.5 mm, Grinding fluid: Water soluble By chemically dissolving the superabrasive grains, the superabrasive grains are made to protrude from the surface by 115 or more of the average grain size of these superabrasive grains, so according to the electroformed thin blade grindstone of the present invention,
ff sharpness and high machining accuracy can be obtained from the beginning of grinding.

【図面の簡単な説明】[Brief explanation of drawings]

第1図〜第4図はこの発明の電鋳薄刃砥石およびその製
造方法を説明するためのもので、第1図はこの発明の電
鋳薄刃砥石の一実施例を示すメッキ層表面の拡大断面図
、第2図はこの発明の製造方法の一実施例を用いて形成
される電鋳薄刃砥石の外周切刃部の形状を示す概略断面
図、第3図はこの発明の製造方法の他の実施例における
マスキングの状態を示す平面図、第4図は第2図に示す
外周切刃印形状を形成する際に用いられる回転治具の一
例を示す概略構成図、第5図は従来の電鋳薄刃砥石を砥
石軸に固定した状態を示す概略側断面図である。 IO・・金属メッキ相、10a・・表面、11・・超砥
粒、 21・・縁部、    22・・中央部、32・・マス
キング、 40・・マスク板、II・・金属メッキ相か
らの超砥粒の突出量。
1 to 4 are for explaining the electroformed thin-edged grindstone of the present invention and its manufacturing method, and FIG. 1 is an enlarged cross-section of the surface of the plating layer showing one embodiment of the electroformed thin-edged grindstone of the present invention. 2 is a schematic cross-sectional view showing the shape of the outer cutting edge of an electroformed thin-edged grindstone formed using an embodiment of the manufacturing method of the present invention, and FIG. FIG. 4 is a plan view showing the state of masking in the example. FIG. 4 is a schematic configuration diagram showing an example of a rotating jig used to form the outer cutting edge mark shape shown in FIG. 2. FIG. FIG. 2 is a schematic side sectional view showing a cast thin blade grindstone fixed to a grindstone shaft. IO...metal plating phase, 10a...surface, 11...superabrasive, 21...edge, 22...center, 32...masking, 40...mask plate, II...from metal plating phase Protrusion amount of super abrasive grains.

Claims (6)

【特許請求の範囲】[Claims] (1)金属メッキ相内に超砥粒を分散させてなる薄肉板
状の電鋳薄刃砥石において、上記金属メッキ相の外周切
刃部の表面から、上記超砥粒をこれら超砥粒の平均粒径
の1/5以上突出させてなることを特徴とする電鋳薄刃
砥石。
(1) In a thin plate-shaped electroformed thin-blade grindstone in which superabrasive grains are dispersed in a metal plating phase, the superabrasive grains are removed from the surface of the outer peripheral cutting edge of the metal plating phase by the average of these superabrasive grains. An electroformed thin blade whetstone characterized by protruding 1/5 or more of the grain size.
(2)上記金属メッキ相は、Ni、Coおよびこれらの
合金から選択される一種以上の金属からなることを特徴
とする特許請求の範囲第1項記載の電鋳薄刃砥石。
(2) The electroformed thin-blade grindstone according to claim 1, wherein the metal plating phase is made of one or more metals selected from Ni, Co, and alloys thereof.
(3)電気メッキ液中において基板上にメッキ層を形成
しつつこの金属メッキ相内に超砥粒を分散させて砥石層
を形成し、次いで上記基板を取り除いて薄肉板状の電鋳
薄刃砥石を得た後、この電鋳薄刃砥石に円形加工を施し
て円板状の砥石形状に成形し、次いでこの電鋳薄刃砥石
の金属メッキ相の外周切刃部の表面を、化学的あるいは
電気化学的に溶解して上記金属メッキ相の表面から上記
超砥粒をこれら超砥粒の平均粒径の1/5以上突出させ
てなることを特徴とする電鋳薄刃砥石の製造方法。
(3) While forming a plating layer on the substrate in an electroplating solution, superabrasive grains are dispersed in the metal plating phase to form a grinding wheel layer, and then the substrate is removed and an electroformed thin-blade grinding wheel is formed into a thin plate. After that, this electroformed thin-blade grindstone is circularly processed to form a disc-shaped grindstone, and then the surface of the outer cutting edge of the metal-plated phase of this electroformed thin-blade grindstone is chemically or electrochemically processed. A method for manufacturing an electroformed thin-edged grindstone, characterized in that the superabrasive grains are melted to protrude from the surface of the metal plating phase by 1/5 or more of the average grain size of the superabrasive grains.
(4)上記金属メッキ相の外周切刃部の表面を電気化学
的に溶解する溶液が、リン酸あるいはスルファミン酸を
主成分とする溶液であることを特徴とする特許請求の範
囲第3項記載の電鋳薄刃砥石の製造方法。
(4) Claim 3, characterized in that the solution that electrochemically dissolves the surface of the peripheral cutting edge of the metal plating phase is a solution containing phosphoric acid or sulfamic acid as a main component. A manufacturing method for electroformed thin-edged grindstones.
(5)上記金属メッキ相の外周切刃部を溶解するに際し
て、上記外周切刃部の両縁部を中央部より多く溶解して
上記外周切刃部を上記中央部が突出する円滑な凸曲面状
に形成することを特徴とする特許請求の範囲第3項又は
第4項記載の電鋳薄刃砥石の製造方法。
(5) When melting the outer peripheral cutting edge portion of the metal plating phase, both edges of the outer peripheral cutting edge portion are melted more than the central portion to form a smooth convex curved surface with the central portion protruding from the outer peripheral cutting edge portion. 5. A method for manufacturing an electroformed thin-blade grindstone according to claim 3 or 4, wherein the thin-edged electroformed grindstone is formed into a shape.
(6)電気メッキ液中において基板上にメッキ層を形成
しつつこの金属メッキ相内に超砥粒を分散させて砥石層
を形成し、次いで上記基板を取り除いて薄肉板状の電鋳
薄刃砥石を得た後、この電鋳薄刃砥石にマスキングを施
し、次いで化学エッチングにより円形状の砥石形状を得
るとともに、これと同時に上記金属メッキ相の外周切刃
部の表面から上記超砥粒をこれら超砥粒の平均粒径の1
/5以上突出させてなることを特徴とする電鋳薄刃砥石
の製造方法。
(6) While forming a plating layer on the substrate in an electroplating solution, superabrasive grains are dispersed in this metal plating phase to form a grinding wheel layer, and then the substrate is removed and an electroformed thin-blade grinding wheel is formed into a thin plate. After this, the electroformed thin-edged grinding wheel is masked and then chemically etched to obtain a circular grinding wheel shape.At the same time, the superabrasive grains are removed from the surface of the outer peripheral cutting edge of the metal plating phase. 1 of the average particle size of the abrasive grains
A method for manufacturing an electroformed thin-edged grindstone characterized by protruding by /5 or more.
JP61068146A 1986-03-26 1986-03-26 Method of manufacturing electroformed thin blade grindstone Expired - Lifetime JPH0771790B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP61068146A JPH0771790B2 (en) 1986-03-26 1986-03-26 Method of manufacturing electroformed thin blade grindstone

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP61068146A JPH0771790B2 (en) 1986-03-26 1986-03-26 Method of manufacturing electroformed thin blade grindstone

Publications (2)

Publication Number Publication Date
JPS62224576A true JPS62224576A (en) 1987-10-02
JPH0771790B2 JPH0771790B2 (en) 1995-08-02

Family

ID=13365308

Family Applications (1)

Application Number Title Priority Date Filing Date
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Country Status (1)

Country Link
JP (1) JPH0771790B2 (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1997025184A1 (en) * 1996-01-09 1997-07-17 Osaka Diamond Industrial Co., Ltd. Superabrasive tool and method of manufacturing the same
JP2004136431A (en) * 2002-08-21 2004-05-13 Mitsubishi Materials Corp Electroforming thin edge whetstone and its manufacturing method
WO2009107274A1 (en) * 2008-02-25 2009-09-03 株式会社村田製作所 Sharp-edge grinding wheel and process for producing the sharp-edge grinding wheel
JP2009196057A (en) * 2008-02-25 2009-09-03 Murata Mfg Co Ltd Thin-bladed whetstone and its manufacturing method

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS52136482A (en) * 1976-05-11 1977-11-15 Toshiba Corp Blade for cutting ingot
JPS53133288U (en) * 1977-03-29 1978-10-21
JPS5493285A (en) * 1975-03-05 1979-07-24 Hitachi Ltd Method of producing molded diamond grindstones

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5493285A (en) * 1975-03-05 1979-07-24 Hitachi Ltd Method of producing molded diamond grindstones
JPS52136482A (en) * 1976-05-11 1977-11-15 Toshiba Corp Blade for cutting ingot
JPS53133288U (en) * 1977-03-29 1978-10-21

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1997025184A1 (en) * 1996-01-09 1997-07-17 Osaka Diamond Industrial Co., Ltd. Superabrasive tool and method of manufacturing the same
JP2004136431A (en) * 2002-08-21 2004-05-13 Mitsubishi Materials Corp Electroforming thin edge whetstone and its manufacturing method
WO2009107274A1 (en) * 2008-02-25 2009-09-03 株式会社村田製作所 Sharp-edge grinding wheel and process for producing the sharp-edge grinding wheel
JP2009196057A (en) * 2008-02-25 2009-09-03 Murata Mfg Co Ltd Thin-bladed whetstone and its manufacturing method
JP4711025B2 (en) * 2008-02-25 2011-06-29 株式会社村田製作所 Thin blade whetstone and manufacturing method thereof

Also Published As

Publication number Publication date
JPH0771790B2 (en) 1995-08-02

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