JPS62219631A - 異物検査装置 - Google Patents

異物検査装置

Info

Publication number
JPS62219631A
JPS62219631A JP61060871A JP6087186A JPS62219631A JP S62219631 A JPS62219631 A JP S62219631A JP 61060871 A JP61060871 A JP 61060871A JP 6087186 A JP6087186 A JP 6087186A JP S62219631 A JPS62219631 A JP S62219631A
Authority
JP
Japan
Prior art keywords
reticle
scanning
scanning beam
foreign matter
matter inspection
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP61060871A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0569300B2 (enrdf_load_stackoverflow
Inventor
Eiichi Murakami
栄一 村上
Michio Kono
道生 河野
Akiyoshi Suzuki
章義 鈴木
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP61060871A priority Critical patent/JPS62219631A/ja
Publication of JPS62219631A publication Critical patent/JPS62219631A/ja
Priority to US07/348,177 priority patent/US4886975A/en
Priority to US07/406,090 priority patent/US5017798A/en
Publication of JPH0569300B2 publication Critical patent/JPH0569300B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
JP61060871A 1986-02-14 1986-03-20 異物検査装置 Granted JPS62219631A (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP61060871A JPS62219631A (ja) 1986-03-20 1986-03-20 異物検査装置
US07/348,177 US4886975A (en) 1986-02-14 1989-05-02 Surface examining apparatus for detecting the presence of foreign particles on two or more surfaces
US07/406,090 US5017798A (en) 1986-02-14 1989-09-12 Surface examining apparatus for detecting the presence of foreign particles on two or more surfaces

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP61060871A JPS62219631A (ja) 1986-03-20 1986-03-20 異物検査装置

Publications (2)

Publication Number Publication Date
JPS62219631A true JPS62219631A (ja) 1987-09-26
JPH0569300B2 JPH0569300B2 (enrdf_load_stackoverflow) 1993-09-30

Family

ID=13154878

Family Applications (1)

Application Number Title Priority Date Filing Date
JP61060871A Granted JPS62219631A (ja) 1986-02-14 1986-03-20 異物検査装置

Country Status (1)

Country Link
JP (1) JPS62219631A (enrdf_load_stackoverflow)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4999511A (en) * 1989-03-15 1991-03-12 Canon Kabushiki Kaisha Surface state inspecting device for inspecting the state of parallel first and second surfaces

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5532792B2 (ja) * 2009-09-28 2014-06-25 富士通株式会社 表面検査装置及び表面検査方法

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4999511A (en) * 1989-03-15 1991-03-12 Canon Kabushiki Kaisha Surface state inspecting device for inspecting the state of parallel first and second surfaces

Also Published As

Publication number Publication date
JPH0569300B2 (enrdf_load_stackoverflow) 1993-09-30

Similar Documents

Publication Publication Date Title
US4669885A (en) Apparatus for inspecting negatives
JP3158446B2 (ja) 表面位置検出装置及び表面位置検出方法、並びに露光装置、露光方法及び半導体製造方法
US5048967A (en) Detection optical system for detecting a pattern on an object
US5381225A (en) Surface-condition inspection apparatus
US4870452A (en) Projection exposure apparatus
US5581089A (en) Apparatus and method for inspecting a reticle for color centers
US20020001759A1 (en) Method for repairing a photomask, method for inspecting a photomask, method for manufacturing a photomask, and method for manufacturing a semiconductor device
US5721605A (en) Alignment device and method with focus detection system
JPH0580497A (ja) 面状態検査装置
US5861952A (en) Optical inspection method and apparatus including intensity modulation of a light beam and detection of light scattered at an inspection position
JPH075115A (ja) 表面状態検査装置
US4999511A (en) Surface state inspecting device for inspecting the state of parallel first and second surfaces
US5162867A (en) Surface condition inspection method and apparatus using image transfer
JPH07209202A (ja) 表面状態検査装置、該表面状態検査装置を備える露光装置及び該露光装置を用いてデバイスを製造する方法
EP0894262B1 (en) Optical inspection device and lithographic apparatus provided with such a device
US5448350A (en) Surface state inspection apparatus and exposure apparatus including the same
JPS62219631A (ja) 異物検査装置
JPH0534128A (ja) 異物検査装置
JPH04339245A (ja) 表面状態検査装置
JPS6138448B2 (enrdf_load_stackoverflow)
JPH0621877B2 (ja) 表面状態測定装置
JP2962752B2 (ja) パターン検査装置
JP3158538B2 (ja) 基板表面の光学的検査装置及び方法
JP2569713B2 (ja) 投影露光装置
JP2006250843A (ja) 表面検査装置

Legal Events

Date Code Title Description
LAPS Cancellation because of no payment of annual fees