JPS62219553A - Resistor - Google Patents
ResistorInfo
- Publication number
- JPS62219553A JPS62219553A JP61063322A JP6332286A JPS62219553A JP S62219553 A JPS62219553 A JP S62219553A JP 61063322 A JP61063322 A JP 61063322A JP 6332286 A JP6332286 A JP 6332286A JP S62219553 A JPS62219553 A JP S62219553A
- Authority
- JP
- Japan
- Prior art keywords
- carrier concentration
- concentration
- carrier
- electric field
- resistor
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000004065 semiconductor Substances 0.000 claims abstract description 9
- 230000005684 electric field Effects 0.000 abstract description 8
- 239000012535 impurity Substances 0.000 abstract description 4
- 238000010030 laminating Methods 0.000 abstract description 2
- 238000000034 method Methods 0.000 abstract 2
- 239000013078 crystal Substances 0.000 description 2
- 230000007423 decrease Effects 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 239000002784 hot electron Substances 0.000 description 2
- 230000020169 heat generation Effects 0.000 description 1
Landscapes
- Non-Adjustable Resistors (AREA)
- Semiconductor Integrated Circuits (AREA)
Abstract
Description
【発明の詳細な説明】 (産業上の利用分野) 本発明は半導体よりなる抵抗体の構造に関する。[Detailed description of the invention] (Industrial application field) The present invention relates to the structure of a resistor made of a semiconductor.
(従来技術とその問題点)
半導体よりなる抵抗体に高電界を印加するといわゆるホ
ットエレクトロンのためキャリア移動度が低下し、抵抗
が非線型となり応用上不都合が生じる。この現象はキャ
リアの温度が上がるためで、抵抗体即ち、結晶格子を冷
却しても発生する。(Prior art and its problems) When a high electric field is applied to a resistor made of a semiconductor, the carrier mobility decreases due to so-called hot electrons, and the resistance becomes nonlinear, causing problems in terms of application. This phenomenon occurs because the temperature of the carrier increases, and it occurs even if the resistor, that is, the crystal lattice, is cooled.
第2図(a)は通常の抵抗体を示す概略1析面図で、電
極1から電極2へ向けて電流を流すと低キヤリア濃度層
4でジュール熱が発生する。この熱は主に結晶格子に逃
げるが、両電極へはその距離が遠いため逃げない。その
ため第2図(b)に示すように内部での電子温度は上昇
し、キャリア移動度が低下し、I X 10’v/cm
以上の電界で非線型な抵抗を示す。FIG. 2(a) is a schematic cross-sectional view showing a typical resistor. When a current is passed from electrode 1 to electrode 2, Joule heat is generated in the low carrier concentration layer 4. FIG. This heat mainly escapes to the crystal lattice, but does not escape to the two electrodes because they are far apart. Therefore, as shown in FIG. 2(b), the internal electron temperature rises, carrier mobility decreases, and I
It exhibits nonlinear resistance in electric fields above.
本発明は上記欠点を除去し、ホットエレクトロンにより
抵抗が非線型になりにくい抵抗体の構造を提供すること
にある。The object of the present invention is to eliminate the above drawbacks and provide a resistor structure in which the resistance is less likely to become non-linear due to hot electrons.
(問題点を解決するための手段)
本発明は電流の流れる方向に同一導電型でキャリア濃度
の異なる半導体層が交互に重ねられてなる抵抗体で構成
される。(Means for Solving the Problems) The present invention is composed of a resistor in which semiconductor layers of the same conductivity type and different carrier concentrations are alternately stacked in the direction of current flow.
(実施例)
第1図(a)は本発明の抵抗体の一実施例を示す断面!
である。電流方向の厚さが0.1pm不純物濃度1×1
017cm−3のn型8iからなる低キヤリア濃度層4
では前記の従来例と同様にジュール熱が発生する。(Example) FIG. 1(a) is a cross section showing an example of the resistor of the present invention!
It is. Thickness in current direction: 0.1 pm Impurity concentration: 1×1
Low carrier concentration layer 4 made of n-type 8i of 017 cm-3
In this case, Joule heat is generated as in the conventional example.
しかし電流方向の厚さが0.1pm不純物濃度lXl0
18cm−3のn型Siからなる高キャリア濃度層3で
は電界が弱いため発熱は少なく、かつ、高いキャリア濃
度のため効率良く格子へ熱を逃がすことができる。その
ため低キヤリア濃度層4で発生した熱はその場で格子に
逃げるのみならず高濃度キャリア層3を通しても格子へ
逃げるので、第1図(b)に示すように電子温度は余り
あがらない。つまり従来例より、より高電界まで抵抗の
直線性が保たれる。本実施例では2X104v/cmま
で直線性が保たれた。However, if the thickness in the current direction is 0.1 pm, the impurity concentration lXl0
In the high carrier concentration layer 3 made of n-type Si of 18 cm -3 , the electric field is weak, so there is little heat generation, and the high carrier concentration allows heat to be efficiently released to the lattice. Therefore, the heat generated in the low carrier concentration layer 4 not only escapes to the lattice on the spot, but also escapes to the lattice through the high concentration carrier layer 3, so that the electron temperature does not rise much as shown in FIG. 1(b). In other words, the linearity of resistance is maintained up to higher electric fields than in the conventional example. In this example, linearity was maintained up to 2×10 4 v/cm.
このような構造はMBE技術を用いれば高キャリア濃度
層3、低キヤリア濃度層4をともに100人程度の厚さ
から制御良く積層して作ることができる。Such a structure can be made by laminating the high carrier concentration layer 3 and the low carrier concentration layer 4 with a thickness of about 100 layers in a controlled manner using MBE technology.
また前記実施例ではキャリアが電子の場合について述べ
たが、キャリアがホールの場合も本発明に含まれる。ま
た前記実施例では交互に配置した複数の高、低キヤリア
濃度層3,4がそれぞれ同じ濃度であったがこれに限ら
ず、例えば隣りあう高キャリア濃度層が異なる濃度であ
ってもよい。Further, in the above embodiments, the case where the carrier is an electron has been described, but the present invention also includes a case where the carrier is a hole. Further, in the above embodiment, the plurality of high and low carrier concentration layers 3 and 4 arranged alternately have the same concentration, but the present invention is not limited to this, and for example, adjacent high carrier concentration layers may have different concentrations.
(発明の効果)
3°、2)
以上の説明で明らかなように、本発明によればキャリア
の温度を」二げることなくより高い電界まで直線性の良
い抵抗が実現できる。(Effects of the Invention) 3°, 2) As is clear from the above explanation, according to the present invention, a resistance with good linearity can be realized up to a higher electric field without lowering the carrier temperature.
第1図(a)は本発明による半導体抵抗の模式的断面図
で、1,2は電極、3は高キャリア濃度層、4は低キヤ
リア濃度層、第1図(b)は第1図(a)の抵抗体中で
の電子温度の分布図である。
第2図(a)は従来構造の半導体抵抗の概略断面図であ
る。第2図(b)は第2図(a)中での電子温度の分布
図である。FIG. 1(a) is a schematic cross-sectional view of a semiconductor resistor according to the present invention, 1 and 2 are electrodes, 3 is a high carrier concentration layer, 4 is a low carrier concentration layer, and FIG. 1(b) is a schematic cross-sectional view of a semiconductor resistor according to the present invention. FIG. 3 is a distribution diagram of electron temperature in the resistor of a). FIG. 2(a) is a schematic cross-sectional view of a semiconductor resistor having a conventional structure. FIG. 2(b) is a distribution diagram of the electron temperature in FIG. 2(a).
Claims (1)
る半導体層が交互に重ねられてなることを特徴とする抵
抗体。A resistor characterized in that semiconductor layers of the same conductivity type but with different carrier concentrations are stacked alternately in the direction of current flow.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP61063322A JPS62219553A (en) | 1986-03-19 | 1986-03-19 | Resistor |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP61063322A JPS62219553A (en) | 1986-03-19 | 1986-03-19 | Resistor |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS62219553A true JPS62219553A (en) | 1987-09-26 |
Family
ID=13225911
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP61063322A Pending JPS62219553A (en) | 1986-03-19 | 1986-03-19 | Resistor |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS62219553A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0553204U (en) * | 1991-12-19 | 1993-07-13 | ソニー株式会社 | In-pipe resistance |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS61168952A (en) * | 1985-01-22 | 1986-07-30 | Nec Corp | Semiconductor integrated circuit device |
-
1986
- 1986-03-19 JP JP61063322A patent/JPS62219553A/en active Pending
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS61168952A (en) * | 1985-01-22 | 1986-07-30 | Nec Corp | Semiconductor integrated circuit device |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0553204U (en) * | 1991-12-19 | 1993-07-13 | ソニー株式会社 | In-pipe resistance |
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