JPS62214170A - Surface-treatment of inner wall of small hole - Google Patents
Surface-treatment of inner wall of small holeInfo
- Publication number
- JPS62214170A JPS62214170A JP5708386A JP5708386A JPS62214170A JP S62214170 A JPS62214170 A JP S62214170A JP 5708386 A JP5708386 A JP 5708386A JP 5708386 A JP5708386 A JP 5708386A JP S62214170 A JPS62214170 A JP S62214170A
- Authority
- JP
- Japan
- Prior art keywords
- wire
- wall
- hole
- coating material
- metallic
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000004381 surface treatment Methods 0.000 title claims description 7
- 239000000463 material Substances 0.000 claims abstract description 22
- 239000011248 coating agent Substances 0.000 claims abstract description 17
- 238000000576 coating method Methods 0.000 claims abstract description 17
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims abstract description 8
- 229910000679 solder Inorganic materials 0.000 claims abstract description 6
- 229910052802 copper Inorganic materials 0.000 claims abstract description 5
- 239000010949 copper Substances 0.000 claims abstract description 5
- 230000001678 irradiating effect Effects 0.000 claims abstract description 3
- 239000011148 porous material Substances 0.000 claims description 16
- 238000000034 method Methods 0.000 claims description 12
- 230000003287 optical effect Effects 0.000 abstract description 3
- 239000007769 metal material Substances 0.000 abstract 1
- 238000007747 plating Methods 0.000 description 3
- 238000005476 soldering Methods 0.000 description 3
- 238000005260 corrosion Methods 0.000 description 2
- 230000007797 corrosion Effects 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 239000007921 spray Substances 0.000 description 2
- 230000005540 biological transmission Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 238000007751 thermal spraying Methods 0.000 description 1
- 238000005491 wire drawing Methods 0.000 description 1
Landscapes
- Physical Vapour Deposition (AREA)
- Insulated Metal Substrates For Printed Circuits (AREA)
- Printing Elements For Providing Electric Connections Between Printed Circuits (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は金属板やプリント基板等に設けた細孔内壁部の
表面処理方法に関するものである。DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a method for surface treatment of inner walls of pores provided in metal plates, printed circuit boards, etc.
周知のように細孔内壁部に導通、耐摩耗、絶縁、防食お
よび光の透過等を目的として種々の材料が被覆される。As is well known, the inner walls of the pores are coated with various materials for the purposes of conduction, wear resistance, insulation, corrosion protection, light transmission, and the like.
この被覆材料を被着させる方法としては、溶射法、湿式
めっき法、cv−n法があるが、それぞれ多くの問題点
がある。Methods for applying this coating material include thermal spraying, wet plating, and CVN, but each method has many problems.
溶射法について言えば、溶射用ガンが入らないような細
い穴に対しては不可能だし、膜厚の均一性も数百ミクロ
ンオーダと悪く再現性に乏しい。Regarding the thermal spray method, it is impossible to apply it to holes so small that a thermal spray gun cannot fit into it, and the uniformity of the film thickness is poor, on the order of several hundred microns, and reproducibility is poor.
また湿式めっき法については、めっき液によって被処理
物が犯されることがあるので被処理物の材質が駆足され
るし、膜厚も細孔部端部が厚くなりやすく、シかもめつ
き液が残シやすく、これが彼で腐食等の原因になったシ
、公害の問題もある等欠点が多い。更に、OVD法につ
いては、被処理物を500℃以上に加熱する必要があり
、細孔部内部はど膜厚が薄くなるという問題があった。In addition, in the wet plating method, the plating solution may attack the object, which affects the material of the object, and the film thickness tends to be thicker at the edges of the pores. There are many disadvantages such as easy to leave residue, which causes corrosion etc., and there is also a problem of pollution. Furthermore, in the OVD method, it is necessary to heat the object to be treated to a temperature of 500° C. or higher, which causes a problem in that the film thickness inside the pores becomes thinner.
本発明は上記の問題点を解決するためになされたもので
、被覆材料を、例えば細線の形で細孔内部に装入した彼
、レーザを被覆材料に照射し、それを溶融蒸発させるこ
とによシ細孔内壁部に付着させる方法である。The present invention was made to solve the above-mentioned problems, and it involves charging the coating material, for example, in the form of a thin wire, into the pores, and then irradiating the coating material with a laser to melt and evaporate it. This is a method of attaching it to the inner wall of the pore.
この表面処理方法は、作業が簡単で被覆材料を加熱しな
くてもよく、膜厚も線径を変えるか、処理物を移動させ
る速度を変えることによりコントロールでき、細孔郡全
体に均一な膜厚の被覆処理ができる。もちろん公害もな
い。This surface treatment method is easy to work with and does not require heating the coating material, and the film thickness can be controlled by changing the wire diameter or the speed at which the material is moved, resulting in a uniform film over the entire pore group. Thick coating treatment is possible. Of course there is no pollution.
第1図は本発明の実施に使用した装置の概略図で、最大
出力ioowのYAGレーザ装置1、レーザ光線2′を
被覆材料2に導くための光学系3、被覆材料2を送る機
構をもった装置4(実施例では細線繰り出し装置)、細
孔部5をもった被処理物6、被覆材料2を細孔部5の中
心部に配置するためのガイド7から構成されている。FIG. 1 is a schematic diagram of the device used to carry out the present invention, which includes a YAG laser device 1 with maximum output ioow, an optical system 3 for guiding the laser beam 2' to the coating material 2, and a mechanism for feeding the coating material 2. The device 4 includes a device 4 (a thin wire feeding device in the embodiment), a workpiece 6 having a pore portion 5, and a guide 7 for placing the coating material 2 in the center of the pore portion 5.
被処理物として、例えば(φ1.1mのスルーホールを
もつプリント基板f:lO枚重ね、スルーホール部を一
列にそろえた後、このスルーホール部に細線線シ出し装
置4から直径0.01■の銅線を繰シ出して装入し、1
w/分の速度で銅線を移動させながら、銅線の端部にレ
ーザを照射した。As the object to be processed, for example, (printed circuit boards f: 10 with a through hole of 1.1 m in diameter are stacked, the through holes are aligned in a row, and then a fine wire drawing device 4 is used to insert a wire with a diameter of 0.01 mm into the through hole. Pay out and charge the copper wire of 1
The end of the copper wire was irradiated with a laser while moving the copper wire at a speed of w/min.
銅は溶融蒸発してスルーホール内壁部に付着した。The copper melted and evaporated and adhered to the inner wall of the through hole.
この場合レーザ出力t−20W、 ビーム径は300μ
mとした。In this case, the laser output is t-20W and the beam diameter is 300μ.
It was set as m.
各スルーホールについて同じ操作を繰り返したあと、次
に608n−Pbはんだ線(φ0.511+ )をこの
スルーホール部に装入し、10m/分の速度で移動させ
ながら同様にレーザを照射してはんだを銅の上に付着さ
せた。After repeating the same operation for each through hole, next insert a 608n-Pb solder wire (φ0.511+) into this through hole, move it at a speed of 10 m/min, and irradiate the laser to solder it. was deposited on the copper.
全スルーホール部について操作をくシ返したあと、自動
はんだ付はラインではんだ付は性を調べたところ良好な
結果を得た。さらに断面検鏡によシはんだ付は状況を調
べたらブローホールもなく、膜厚も銅が10.0〜1
G、2 ttm 、はんだが8.0〜8.1μ溝と均一
であった。さらに、処理物、被処理物を加えて、種々目
的に応じて細孔内壁部に皮膜を付着したあと膜厚を測定
したところ、いずれも均一に付着していた。付着条件と
結果を示すと第1表の通シである。After repeating the operations for all the through-holes, I checked the soldering performance on the automatic soldering line and found good results. Furthermore, when I examined the soldering condition using a cross-sectional microscope, I found that there were no blowholes and the film thickness was 10.0 to 1.
G, 2 ttm, the solder was uniform with a groove of 8.0 to 8.1μ. Furthermore, when a treated material and a to-be-treated material were added and films were deposited on the inner walls of the pores according to various purposes, the film thickness was measured, and it was found that the films were uniformly deposited. The adhesion conditions and results are shown in Table 1.
第 1 表
なお、本実施例では、処理物を孔の内部に装入したが孔
の深さが浅い場合は孔の入口付近に配置してもよい。レ
ーザもYAG以外のエキシマレーザ、CO2レーザでも
よい。Table 1 Note that in this example, the material to be treated is charged inside the hole, but if the depth of the hole is shallow, it may be placed near the entrance of the hole. The laser may also be an excimer laser other than YAG or a CO2 laser.
本発明の実施例から明らかなように本発明の表面処理法
を細孔内壁部の表面処理に適用すれば・公害もなく簡単
な処理によシ、被覆材料、被処理物の材質を選ばず均一
な膜厚からなる表面処理を可能にする。As is clear from the examples of the present invention, if the surface treatment method of the present invention is applied to the surface treatment of the inner walls of pores, the treatment is simple and non-polluting, and can be applied to any coating material or material to be treated. Enables surface treatment with uniform film thickness.
また、処理物の寸法や、送シ速度を選定することにより
均一でしかも任意の膜厚が見られる。Further, by selecting the size of the object to be treated and the feeding speed, a uniform and arbitrary film thickness can be obtained.
第1図は本発明の実施に使用した装置の構成を示す概略
図である。
1−YAGレーザ装置
2・・・被覆材料
3・・・光学系
4・・・細線線シ出し装置
5・・・細孔
6・・・被処理物
7・・・ガイrFIG. 1 is a schematic diagram showing the configuration of an apparatus used to implement the present invention. 1-YAG laser device 2...Coating material 3...Optical system 4...Fine line drawing device 5...Small hole 6...Workpiece 7...Guy r
Claims (3)
材料にレーザを照射して溶融蒸発させ、細孔内壁部に被
覆材料を被覆させることを特徴とする細孔内壁部表面処
理法。(1) A pore inner wall surface treatment method characterized by placing a coating material at the entrance or inside of the pore, irradiating the coating material with a laser to melt and evaporate it, and coating the pore inner wall with the coating material. .
細孔内壁部表面処理法。(2) The method for treating the surface of the inner wall of a pore according to claim 1, wherein the coating material is copper.
載の細孔内壁部表面処理法。(3) The method for treating the surface of the inner wall of a pore according to claim 1, wherein the coating material is solder.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP5708386A JPS62214170A (en) | 1986-03-17 | 1986-03-17 | Surface-treatment of inner wall of small hole |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP5708386A JPS62214170A (en) | 1986-03-17 | 1986-03-17 | Surface-treatment of inner wall of small hole |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS62214170A true JPS62214170A (en) | 1987-09-19 |
Family
ID=13045589
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP5708386A Pending JPS62214170A (en) | 1986-03-17 | 1986-03-17 | Surface-treatment of inner wall of small hole |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS62214170A (en) |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH02310993A (en) * | 1989-05-25 | 1990-12-26 | Matsushita Electric Works Ltd | Forming method for through hole of circuit board |
JPH04174594A (en) * | 1990-07-20 | 1992-06-22 | Matsushita Electric Works Ltd | Formation of through hole of wiring board |
JP2009230934A (en) * | 2008-03-19 | 2009-10-08 | Toppan Forms Co Ltd | Metal material for substrate interconnect |
JP2009231394A (en) * | 2008-03-19 | 2009-10-08 | Toppan Forms Co Ltd | Method for forming wiring of substrate |
JP2012074482A (en) * | 2010-09-28 | 2012-04-12 | Sekisui Chem Co Ltd | Method of forming through hole electrode and electronic component |
-
1986
- 1986-03-17 JP JP5708386A patent/JPS62214170A/en active Pending
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH02310993A (en) * | 1989-05-25 | 1990-12-26 | Matsushita Electric Works Ltd | Forming method for through hole of circuit board |
JPH04174594A (en) * | 1990-07-20 | 1992-06-22 | Matsushita Electric Works Ltd | Formation of through hole of wiring board |
JP2009230934A (en) * | 2008-03-19 | 2009-10-08 | Toppan Forms Co Ltd | Metal material for substrate interconnect |
JP2009231394A (en) * | 2008-03-19 | 2009-10-08 | Toppan Forms Co Ltd | Method for forming wiring of substrate |
JP2012074482A (en) * | 2010-09-28 | 2012-04-12 | Sekisui Chem Co Ltd | Method of forming through hole electrode and electronic component |
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