JPS62207724A - Production of quartz glass - Google Patents
Production of quartz glassInfo
- Publication number
- JPS62207724A JPS62207724A JP5165486A JP5165486A JPS62207724A JP S62207724 A JPS62207724 A JP S62207724A JP 5165486 A JP5165486 A JP 5165486A JP 5165486 A JP5165486 A JP 5165486A JP S62207724 A JPS62207724 A JP S62207724A
- Authority
- JP
- Japan
- Prior art keywords
- quartz glass
- sol
- salt
- glass
- temperature
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 title claims abstract description 73
- 238000004519 manufacturing process Methods 0.000 title claims description 8
- 239000000377 silicon dioxide Substances 0.000 claims abstract description 17
- -1 alkyl silicate Chemical compound 0.000 claims abstract description 16
- 239000000843 powder Substances 0.000 claims abstract description 16
- 150000003839 salts Chemical class 0.000 claims abstract description 13
- 239000011521 glass Substances 0.000 claims abstract description 12
- 239000011148 porous material Substances 0.000 claims abstract description 9
- 229910021645 metal ion Inorganic materials 0.000 claims abstract description 8
- 238000002156 mixing Methods 0.000 claims abstract description 8
- 239000002243 precursor Substances 0.000 claims abstract description 8
- 239000012445 acidic reagent Substances 0.000 claims abstract description 6
- 230000003301 hydrolyzing effect Effects 0.000 claims abstract description 4
- 238000005245 sintering Methods 0.000 claims abstract description 4
- 150000003863 ammonium salts Chemical group 0.000 claims abstract description 3
- 230000015572 biosynthetic process Effects 0.000 claims description 3
- 239000002994 raw material Substances 0.000 claims description 3
- 238000003786 synthesis reaction Methods 0.000 claims description 3
- NLXLAEXVIDQMFP-UHFFFAOYSA-N Ammonia chloride Chemical compound [NH4+].[Cl-] NLXLAEXVIDQMFP-UHFFFAOYSA-N 0.000 abstract description 13
- 238000000034 method Methods 0.000 abstract description 9
- 235000019270 ammonium chloride Nutrition 0.000 abstract description 7
- 238000010438 heat treatment Methods 0.000 abstract description 6
- BFNBIHQBYMNNAN-UHFFFAOYSA-N ammonium sulfate Chemical compound N.N.OS(O)(=O)=O BFNBIHQBYMNNAN-UHFFFAOYSA-N 0.000 abstract description 2
- 229910052921 ammonium sulfate Inorganic materials 0.000 abstract description 2
- 235000011130 ammonium sulphate Nutrition 0.000 abstract description 2
- 230000007062 hydrolysis Effects 0.000 abstract 1
- 238000006460 hydrolysis reaction Methods 0.000 abstract 1
- 239000002245 particle Substances 0.000 abstract 1
- 239000007789 gas Substances 0.000 description 14
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 10
- 239000001307 helium Substances 0.000 description 9
- 229910052734 helium Inorganic materials 0.000 description 9
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 9
- 239000000243 solution Substances 0.000 description 9
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 7
- 239000013078 crystal Substances 0.000 description 7
- 229910002804 graphite Inorganic materials 0.000 description 7
- 239000010439 graphite Substances 0.000 description 7
- 230000005484 gravity Effects 0.000 description 7
- VHUUQVKOLVNVRT-UHFFFAOYSA-N Ammonium hydroxide Chemical compound [NH4+].[OH-] VHUUQVKOLVNVRT-UHFFFAOYSA-N 0.000 description 6
- 239000004743 Polypropylene Substances 0.000 description 6
- 229910052783 alkali metal Inorganic materials 0.000 description 6
- 150000001340 alkali metals Chemical class 0.000 description 6
- 235000011114 ammonium hydroxide Nutrition 0.000 description 6
- 239000012456 homogeneous solution Substances 0.000 description 6
- 230000003287 optical effect Effects 0.000 description 6
- 229920001155 polypropylene Polymers 0.000 description 6
- 230000000694 effects Effects 0.000 description 5
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 4
- 238000004458 analytical method Methods 0.000 description 4
- 239000007864 aqueous solution Substances 0.000 description 4
- 229910001873 dinitrogen Inorganic materials 0.000 description 4
- 239000000126 substance Substances 0.000 description 4
- 238000002834 transmittance Methods 0.000 description 4
- 230000000052 comparative effect Effects 0.000 description 3
- 238000001035 drying Methods 0.000 description 3
- 239000000203 mixture Substances 0.000 description 3
- 239000010453 quartz Substances 0.000 description 3
- 238000003980 solgel method Methods 0.000 description 3
- 239000000758 substrate Substances 0.000 description 3
- BOTDANWDWHJENH-UHFFFAOYSA-N Tetraethyl orthosilicate Chemical compound CCO[Si](OCC)(OCC)OCC BOTDANWDWHJENH-UHFFFAOYSA-N 0.000 description 2
- 229910052784 alkaline earth metal Inorganic materials 0.000 description 2
- 150000001342 alkaline earth metals Chemical class 0.000 description 2
- 238000004891 communication Methods 0.000 description 2
- 230000007423 decrease Effects 0.000 description 2
- 239000000835 fiber Substances 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 238000002844 melting Methods 0.000 description 2
- 230000008018 melting Effects 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 150000002739 metals Chemical class 0.000 description 2
- 238000004017 vitrification Methods 0.000 description 2
- 229910021494 β-cristobalite Inorganic materials 0.000 description 2
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 1
- QGZKDVFQNNGYKY-UHFFFAOYSA-O Ammonium Chemical compound [NH4+] QGZKDVFQNNGYKY-UHFFFAOYSA-O 0.000 description 1
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 1
- 241000123069 Ocyurus chrysurus Species 0.000 description 1
- BPQQTUXANYXVAA-UHFFFAOYSA-N Orthosilicate Chemical compound [O-][Si]([O-])([O-])[O-] BPQQTUXANYXVAA-UHFFFAOYSA-N 0.000 description 1
- 239000004809 Teflon Substances 0.000 description 1
- 229920006362 Teflon® Polymers 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- BIVUUOPIAYRCAP-UHFFFAOYSA-N aminoazanium;chloride Chemical compound Cl.NN BIVUUOPIAYRCAP-UHFFFAOYSA-N 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 150000001768 cations Chemical class 0.000 description 1
- 239000000460 chlorine Substances 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- 230000000593 degrading effect Effects 0.000 description 1
- 230000002542 deteriorative effect Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000010304 firing Methods 0.000 description 1
- DKAGJZJALZXOOV-UHFFFAOYSA-N hydrate;hydrochloride Chemical compound O.Cl DKAGJZJALZXOOV-UHFFFAOYSA-N 0.000 description 1
- 238000005286 illumination Methods 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 238000010926 purge Methods 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 238000002604 ultrasonography Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B19/00—Other methods of shaping glass
- C03B19/12—Other methods of shaping glass by liquid-phase reaction processes
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C1/00—Ingredients generally applicable to manufacture of glasses, glazes, or vitreous enamels
- C03C1/006—Ingredients generally applicable to manufacture of glasses, glazes, or vitreous enamels to produce glass through wet route
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Manufacturing & Machinery (AREA)
- Life Sciences & Earth Sciences (AREA)
- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Glass Melting And Manufacturing (AREA)
- Manufacture, Treatment Of Glass Fibers (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明はゾルmゲμ法による石英ガラスの製造方法に関
する。DETAILED DESCRIPTION OF THE INVENTION [Industrial Field of Application] The present invention relates to a method for producing quartz glass by the Solge μ method.
本発明は高温処理を用いるゾル−ゲル法による石英ガラ
スの製造方法において、ゾル中に金属イオンを含まない
塩を添加することにより、石英ガラス純度を悪くするこ
となくドライゲルの閉孔化温度を低下させ、炉材の消耗
を軽減し、二ネμギーを省力化させたものである0
〔従来の技術〕
ゾル−ゲル法を用いて作製したドライゲルを、ヘリウム
雰囲気あるいは減圧下で閉孔化し、石英ガラスまたはガ
ラス前駆体とした試料を、1500〜2200℃に加熱
処理すると、インクルージランの全く存在しない、光学
的に極めて高品質な石英ガラスを製造することができる
。ICマスク用石英基板や光通信ファイバー用マザーロ
ッドニモ応用できるようになった。The present invention is a method for producing quartz glass using a sol-gel method that uses high-temperature treatment.By adding a salt that does not contain metal ions to the sol, the pore-closing temperature of the dry gel is lowered without deteriorating the purity of the quartz glass. [Conventional technology] Dry gel produced using the sol-gel method is closed in a helium atmosphere or under reduced pressure. When a sample made of quartz glass or a glass precursor is heat-treated at 1,500 to 2,200°C, it is possible to produce quartz glass of extremely high optical quality, which is completely free of inclusions. It can now be applied to quartz substrates for IC masks and mother rod nemo for optical communication fibers.
ドライヴμの作製方法は種々提案されているがアルキル
シリケートを酸性試薬で加水分解して得られる溶液と、
シリカ超微粉末とを、所定の割合で混合して得られるゾ
ル溶液を原料とする方法が安価かつ高歩留シで作製でき
、有利である。Various methods have been proposed for producing Drive μ, including a solution obtained by hydrolyzing an alkyl silicate with an acidic reagent,
A method using a sol solution obtained by mixing ultrafine silica powder at a predetermined ratio as a raw material is advantageous because it can be produced at low cost and with a high yield.
ドライゲルの閉孔化温度は、アルキルシリケートの加水
分解溶液と、シリカ超微粉末との混合比で決まる。シリ
カ超微粉末の混合比が減少するほど閉孔化温度は低下す
る。しかし、焼結後の石英ガラス重量に対し、シリカ超
微粉末の重量が50%以下になると、ドライゲルの作製
歩留シが著しく低下する。The pore closing temperature of the dry gel is determined by the mixing ratio of the alkyl silicate hydrolyzed solution and the ultrafine silica powder. As the mixing ratio of ultrafine silica powder decreases, the pore-closing temperature decreases. However, when the weight of ultrafine silica powder is less than 50% of the weight of silica glass after sintering, the production yield of dry gel is significantly reduced.
シリカ超微粉末を50%以上含む場合、閉孔化温度は1
200℃以上である。炉心管等の炉材は純度を考慮する
と石英ガラスが望ましいが、使用眼界温度を超えている
ため、消耗はさけられない。When containing 50% or more of ultrafine silica powder, the pore closing temperature is 1
The temperature is 200°C or higher. Considering the purity of the furnace material such as the furnace core tube, quartz glass is preferable, but wear is unavoidable since the temperature exceeds the operating eye temperature.
また、高温での焼結はエネルギー省費においても問題で
ある。Sintering at high temperatures also poses a problem in terms of energy savings.
そこで本発明はこのような問題点を解決するもので、そ
の目的とするところは、ドライゲルの閉孔化温度を低下
させ、効率よく高品質な石英ガラスを製造するところに
ある。The present invention is intended to solve these problems, and its purpose is to lower the pore-closing temperature of dry gel and efficiently produce high-quality quartz glass.
本発明は、アルキルシリケートを酸性試薬で加水分解し
て得られる溶液と、シリカ超微粉末とを所定の割合で混
合して得られるゾIv溶液を原料として作製したドライ
ゲルを、ヘリウム雰囲’Ahるいは減圧下で閉孔化し、
得られたガラスまたはガラス前駆体を1500〜220
0℃に加熱し、一定時間保持する石英ガラス合成におい
て、ゾル中に金属イオンを含まない塩を添加することを
特徴とする。In the present invention, a dry gel prepared using a ZoIv solution obtained by mixing a solution obtained by hydrolyzing an alkyl silicate with an acidic reagent and ultrafine silica powder at a predetermined ratio as a raw material is prepared in a helium atmosphere. The pores become closed under reduced pressure,
The obtained glass or glass precursor was heated to 1500 to 220
In silica glass synthesis, which is heated to 0°C and held for a certain period of time, it is characterized by adding a salt that does not contain metal ions to the sol.
通常の溶融法によるガラス製造においてはNa rK等
の添加で溶融温度が低下することが知られている。ゾル
−ゲp法の場合、同様にドライゲルの閉口化温度が低下
する。このように、閉口化温度を低下させる作用を有す
る添加物は、アルカリ金属及びアルカリ金属において顕
著であるが、アンモニウムイオンのような陽イオン一般
に見られる現象である。It is known that in the production of glass by the usual melting method, the melting temperature is lowered by adding NarK or the like. In the case of the sol-ge p method, the closing temperature of the dry gel is similarly lowered. As described above, additives having the effect of lowering the closing temperature are noticeable in alkali metals and alkali metals, but this is a phenomenon that is commonly observed in cations such as ammonium ions.
閉孔化した閉気孔中の成分がHeまたは真空であれば、
1500〜2200℃の高温処理により閉気孔は消滅す
る。閉孔化させる際にはヘリウム雰囲気あるいは減圧下
で焼成する必要があり、閉孔化温度を低下させることが
できれば、炉や炉内治具に対する負担を著しく軽減する
ことができる。If the component in the closed pores is He or vacuum,
Closed pores disappear by high temperature treatment at 1500 to 2200°C. When pore-closing, it is necessary to sinter in a helium atmosphere or under reduced pressure, and if the pore-closing temperature can be lowered, the burden on the furnace and furnace jig can be significantly reduced.
石英ガラスの有する種々の特性は、その高純度性にあり
、特に金属イオンは極負量でも悪影響を及ホス。アンモ
ニウム塩のような金属イオンを含まない塩は、焼成工程
でほとんどが分解除去されガラス中に残存した場合でも
、石英ガラスの特性にはほとんど影Vを及ぼさない。The various properties of quartz glass lie in its high purity, and in particular, metal ions can have an adverse effect even in extremely negative amounts. Salts that do not contain metal ions, such as ammonium salts, have almost no effect on the properties of quartz glass even if most of them are decomposed and removed during the firing process and remain in the glass.
実施例 1゜
エチルシリケート44ONと0,05規定塩酸水溶液3
60Mを激しく攪拌し、無色透明の均一溶液を得た。そ
こに超微粉末シリカ(AerosilOX−50)15
0.17を徐々に添加し、充分に攪拌した。このゾルを
20℃に保ちながら28KHzの超音波を2時間照射し
、更に1500Gの遠心力を10分間かけた後、1μm
のフィルターを通過させた。そこに速比アンモニウム粉
末13.5.9(NH4CI /S i O2−5%)
を添加し、10分間攪拌した。更にCL1規定アンモニ
ア水を滴下L/5PI(4,2に調整した。Example 1゜Ethyl silicate 44ON and 0.05N hydrochloric acid aqueous solution 3
60M was stirred vigorously to obtain a colorless and transparent homogeneous solution. Ultrafine powder silica (AerosilOX-50) 15
0.17 was added gradually and stirred thoroughly. This sol was irradiated with 28KHz ultrasonic waves for 2 hours while being kept at 20°C, and then centrifugal force of 1500G was applied for 10 minutes.
passed through the filter. There, the speed ratio ammonium powder 13.5.9 (NH4CI/S i O2-5%)
was added and stirred for 10 minutes. Furthermore, CL1 normal ammonia water was added dropwise to adjust L/5PI (4.2).
内寸30crIL×50cIrL×10crtLHのポ
リプロピレン製容器に700a注入し、密閉状態で3日
間60℃に保りた。開口率1%のフタをして、60℃で
7日間乾燥させたところ、板状のドライヴμが作製でき
た。700a was poured into a polypropylene container with inner dimensions of 30 crIL x 50 cIrL x 10 crtLH, and kept at 60°C for 3 days in a sealed state. When it was dried at 60° C. for 7 days with a lid having an aperture ratio of 1%, a plate-shaped drive μ was produced.
石英ガラスを炉心管とするガス置換炉内にドライゲルを
入れ、乾燥空気を流しながら60℃/hrの速度で80
0℃まで昇温した。800℃から純ヘリウムガスを11
/min の流量で炉心管内に流入しはじめ、50
℃/hrの速度で1150℃まで昇温し、1150℃で
5時間保持した。ガラス化が終了しており、比重は2.
20になっていた大きさは15crnX15cWLxQ
、4c7rLだった。直径10μm程度のインクp−ジ
ョン及びβクリストバライト型結晶が検出された。The dry gel was placed in a gas exchange furnace with a quartz glass core tube, and heated at a rate of 60°C/hr for 80°C while flowing dry air.
The temperature was raised to 0°C. 11 pure helium gas from 800℃
It started flowing into the reactor core tube at a flow rate of 50 min.
The temperature was raised to 1150°C at a rate of °C/hr and held at 1150°C for 5 hours. Vitrification has been completed and the specific gravity is 2.
The size that was 20 is 15crnX15cWLxQ
, 4c7rL. Ink p-johns and β-cristobalite type crystals with a diameter of about 10 μm were detected.
黒鉛発熱炉内に該石英ガラス板を入れ、窒素ガスで置換
した後、2時間で1800℃まで昇温し10分間保持し
た。1200℃まで1600℃/hrの速度で降温し、
それ以後室温まで100℃/ h rの速度で降温した
。The quartz glass plate was placed in a graphite heating furnace, and after the furnace was purged with nitrogen gas, the temperature was raised to 1800° C. over 2 hours and held for 10 minutes. The temperature is lowered to 1200°C at a rate of 1600°C/hr,
Thereafter, the temperature was lowered to room temperature at a rate of 100°C/hr.
厚さ2Mに鏡面研磨し、暗室内で5G、000Auxの
照度になるよう集光ランプを当てたが、光点は全く検出
できなかった。結晶は完全に消失しており、歪も存在せ
ず、光学的に極めて高器質だった。化学分析においてア
ルカリ金属及びアルカリ土金属は不検出であった。まだ
、紫外域での透過率は250uまで90%以上を保持し
ていた。It was mirror-polished to a thickness of 2M, and a condensing lamp was applied to it in a dark room at an illuminance of 5G, 000Aux, but no light spot could be detected. The crystals had completely disappeared, there was no distortion, and the optical quality was extremely high. No alkali metals or alkaline earth metals were detected in chemical analysis. Still, the transmittance in the ultraviolet region was maintained at 90% or more up to 250u.
比較例 1゜
実施例1.と同様のゾル調整を行ない、塩化アンモニウ
ムを添加せずにドライヴμをfv、製した。石英ガラス
を炉心管とするガス置換炉内にドライゲルを入れ、実施
例1.と同様の方法で加熱したが、白色不透明のままで
あり、比重は2.15であった。Comparative example 1゜Example 1. The sol was prepared in the same manner as described above, and drive μ was prepared without adding ammonium chloride. The dry gel was placed in a gas exchange furnace with a quartz glass core tube, and Example 1. Although it was heated in the same manner as above, it remained white and opaque, and its specific gravity was 2.15.
黒鉛発熱炉内に移し、やはり実施例1.と同様の方法で
1800℃まで加熱したところ、肉眼でも多数の気泡が
観察できた。Transferred to a graphite heating furnace, the same procedure as that of Example 1 was carried out. When heated to 1800° C. in the same manner as above, many bubbles were observed with the naked eye.
比較例 2
実施例1.と同様のゾル調整を行ない、塩化アンモニウ
ムを添加せずにドライヴμを作製した。石英ガラスを炉
心管とするガス置換炉内にドライヴpを入れ、60℃/
hrの速度で800℃まで昇温した。800℃から純ヘ
リウムガスを11/minの流量で炉心管内に流入しは
じめ、50℃/hrの速度で1200℃まで舛温し、1
200℃で5時間保持した。白色不透明のままであり、
比重は2.18であった。Comparative Example 2 Example 1. Drive μ was prepared using the same sol preparation without adding ammonium chloride. Drive P was placed in a gas exchange furnace with a quartz glass core tube, and heated to 60℃/
The temperature was raised to 800°C at a rate of hr. Pure helium gas begins to flow into the reactor core tube from 800°C at a flow rate of 11/min, and is heated to 1200°C at a rate of 50°C/hr.
It was held at 200°C for 5 hours. remains white and opaque;
Specific gravity was 2.18.
黒鉛発熱炉内に移し、実施例1.と同様の方法で180
0℃まで加熱したところ、肉眼でも気泡が観察できた。Transferred to a graphite heating furnace, Example 1. 180 in the same way as
When heated to 0°C, bubbles could be observed with the naked eye.
実施例 2
エチルシリケー) 44011Llと0.05規定塩酸
水溶液590ytlを欣しく攪拌し、無色透明の均一溶
液を得た。そこに超微粉末シリカ(AerosilOX
−50)220gを徐々に添加し、充分に攪拌した。こ
のゾρを20℃に保ちながら28K)izの超音波を2
時間照射し、更に1500Gの遠心力を10分間かけた
後、1μmのフィルターを通過させた。そこに塩化アン
モニウム粉末6811(NH4C1/S i Oz −
20%)を添加し、10分間攪拌した。更にα1規定ア
ンモニア水を滴下し、P H4,2に調整した。Example 2 44011 Ll of ethyl silicate and 590 ytl of a 0.05 N hydrochloric acid aqueous solution were gently stirred to obtain a colorless and transparent homogeneous solution. There, ultrafine powdered silica (AerosilOX)
-50) 220g was gradually added and stirred thoroughly. While keeping this ρ at 20℃, apply 28K) iz ultrasonic waves to the
After irradiation for a period of time and further applying a centrifugal force of 1500 G for 10 minutes, the sample was passed through a 1 μm filter. There, ammonium chloride powder 6811 (NH4C1/S i Oz −
20%) and stirred for 10 minutes. Furthermore, α1 normal ammonia water was added dropwise to adjust the pH to 4.2.
内寸30c!rLx30crrL×10crItHのポ
リプロピレン製容器に700d注入し、密閉状態で3日
間30℃に保った。開口率1%のフタをして、60℃で
7日間乾燥させたところ、板状のドライヴpが作製でき
た。Inner size 30c! The mixture was poured into a polypropylene container of rL x 30 crrL x 10 crItH for 700 d, and kept at 30°C for 3 days in a sealed state. A plate-shaped drive p was produced by covering with a lid having an aperture ratio of 1% and drying it at 60° C. for 7 days.
石英ガラスを炉心管とするガス置換炉内にドライゲルを
入れ、乾燥空気を流入しながら60℃/hrの1興で8
00℃まで昇温した。800℃からMヘリウムガスをI
A?/minの流量で炉心管内に流入しはじめ、15℃
/hrの速度で1150℃まで昇温し、1150℃で5
時間保持した。半透明状態だったが、比重は2.20に
なりていた。The dry gel was placed in a gas exchange furnace with a quartz glass core tube, and heated at 60°C/hr for 8 hours while dry air was flowing in.
The temperature was raised to 00°C. M helium gas from 800℃ to I
A? It begins to flow into the reactor core tube at a flow rate of /min, and the temperature reaches 15℃.
The temperature was raised to 1150°C at a rate of
Holds time. Although it was translucent, its specific gravity was 2.20.
大きさは15crILX 15cmX 0.4611だ
りた。The size was 15crILX 15cmX 0.4611.
黒鉛発熱炉内に該石英ガラス前駆体を入れ、窒素ガスで
置換した後、2時間で1850℃まで昇温し、5分間保
持した。1200℃まで10口OC/ b rの速度で
降温し、それ以後室温まで100℃/h rの速度で降
温した。The quartz glass precursor was placed in a graphite heat-generating furnace, and after the furnace was replaced with nitrogen gas, the temperature was raised to 1850° C. in 2 hours and held for 5 minutes. The temperature was lowered to 1200°C at a rate of 10 OC/br, and thereafter the temperature was lowered to room temperature at a rate of 100°C/hr.
厚さ21!IEに鏡面研磨し、暗室内で50. OO0
4!uxの照度になるよう集光ランプを当てたが、光点
は全く検出できなかった。結晶は完全に消失しており、
歪も存在せず、光学的に極めて高品質だった。Thickness 21! Mirror polished to IE, 50. OO0
4! A condensing lamp was applied to achieve the illumination intensity of ux, but no light spot could be detected. The crystals have completely disappeared,
There was no distortion and the optical quality was extremely high.
化学分析においてアルカリ金属及びアルカリ出金属は不
検出であった。また、紫外域での透過率は25011K
まで90%以上を保持していた。No alkali metals or alkaline metals were detected in chemical analysis. In addition, the transmittance in the ultraviolet region is 25011K.
It held more than 90% until now.
実施例 3゜
エチルシリケート440m1とα05規定塩酸水浴液3
60罰を撒しく撹拌し、無色透明の均一溶液を得た。そ
こに超微粉末シリカ(Aerosil0X−50)15
0.9を徐々に添加し、充分に攪拌した。このゾルを2
0℃に保ちながら28KHzの超音波を2時間照射し、
更に1500Gの遠心力を10分間かけた後、1μmの
フィルターを通過させた。そこに硫酸アンモニウム粉末
2.7g((NH4) 2 So 4/S i O2=
1%)を添加し、10分間攪拌した。更に0.1規定
アンモニア水を滴下し、PH4,2に調整した。Example 3 440ml of ethyl silicate and α05 normal hydrochloric acid water bath solution 3
The mixture was stirred thoroughly for 60 minutes to obtain a colorless and transparent homogeneous solution. Ultrafine powder silica (Aerosil0X-50) 15
0.9 was gradually added and stirred thoroughly. This sol 2
Irradiated with 28KHz ultrasonic waves for 2 hours while keeping the temperature at 0℃,
After further applying a centrifugal force of 1500 G for 10 minutes, the mixture was passed through a 1 μm filter. There, 2.7 g of ammonium sulfate powder ((NH4) 2 So 4/S i O2 =
1%) and stirred for 10 minutes. Furthermore, 0.1N ammonia water was added dropwise to adjust the pH to 4.2.
内寸30cWL×30cIIL×10c1rLHのポリ
プロピレン製容器に700M注入し、密閉状態で3日間
30℃に保った。開口率1%つフタをして、60℃で7
日間乾燥させたところ、板状のドライグルが作製できた
。700M was poured into a polypropylene container with inner dimensions of 30cWL x 30cIIL x 10c1rLH and kept at 30°C for 3 days in a sealed state. Close the lid with an opening ratio of 1% and heat at 60℃ for 7 days.
After drying for several days, a plate-shaped Draigle was produced.
ムフィト管を炉心管とし、石英ガラス管を内張シした真
空炉内にドライヴpを入れ、乾燥空気を流入しながら6
0℃/ h rの速度で800℃まで昇温した。800
℃からロータリーポンプを用いてITo、rr以下の紙
圧を保ちながら30℃/hrの速度で1150℃まで外
温し、1000℃で5時間保持した。半透明状態だった
が、比重は2..2゜になっていた。大きさは15cr
rL×15cIrLXO14cr!Lだった。Drive P was placed in a vacuum furnace with a Mufito tube as the core tube and lined with a quartz glass tube, and was heated while dry air was flowing in.
The temperature was raised to 800°C at a rate of 0°C/hr. 800
℃ to 1150° C. using a rotary pump at a rate of 30° C./hr while maintaining the paper pressure below ITo, rr, and held at 1000° C. for 5 hours. It was translucent, but the specific gravity was 2. .. It was 2 degrees. The size is 15cr
rL×15cIrLXO14cr! It was L.
黒鉛発熱炉内に該石英ガラス前駆体を入れ、窒素ガスで
置換した後、2時間で1750℃まで昇温し、30分間
保持した。1200℃まで1000℃/h rの速度で
降温し、それ以後室温まで100℃/h rの速度で降
温した。The quartz glass precursor was placed in a graphite heat-generating furnace, and after replacing the furnace with nitrogen gas, the temperature was raised to 1750° C. over 2 hours and held for 30 minutes. The temperature was lowered to 1200°C at a rate of 1000°C/hr, and thereafter the temperature was lowered to room temperature at a rate of 100°C/hr.
厚さ2 mlKに鏡面研磨し、暗室内で5へOO0lu
xの照度になるよう集光ランプを当てたが、光点は全く
検出できなかった。結晶は完全に消失しており、歪も存
在せず、光学的に極めて高品質だった。Mirror-polished to a thickness of 2 mlK and OO0lu to 5 in a dark room.
A condensing lamp was applied so that the illuminance was x, but no light spot could be detected. The crystals had completely disappeared, there was no distortion, and the optical quality was extremely high.
化学分析においてアルカリ金属及びアルカリ出金属は不
検出であった。また、紫外域での透過率は250 xm
まで90%以上を保持していた。No alkali metals or alkaline metals were detected in chemical analysis. In addition, the transmittance in the ultraviolet region is 250 x m
It held more than 90% until now.
実施例 4゜
エチルシリケー) 880dとO,OSS規定塩酸水溶
液1180m合撒しく撹拌し、無色透明の均一溶液を得
た。そこに超微粉末シリカ(Cob−0−8il L
−90)440.9を徐々に添加し、充分に撹拌した。Example 4 (Ethyl silica) 880 d and 1180 ml of O, OSS normal hydrochloric acid aqueous solution were mixed and stirred thoroughly to obtain a colorless and transparent homogeneous solution. There, ultrafine powdered silica (Cob-0-8il L
-90) 440.9 was gradually added and stirred thoroughly.
このゾルを20℃に保ちながら28K)izの超音波を
2時間照射し、更に1500Gの遠心力を10分間かけ
た後、1μmのフィルターを通過させた。This sol was irradiated with ultrasonic waves at 28K) for 2 hours while being kept at 20°C, and then subjected to centrifugal force of 1500G for 10 minutes, and then passed through a 1 μm filter.
そこに塩化アンモニウム粉末54.9 (NH4C1/
5iO2−5%)添加し、10分間攪拌した。更にα1
規定アンモニア水を滴下し、PH4,8に調整した。There, ammonium chloride powder 54.9 (NH4C1/
5iO2-5%) and stirred for 10 minutes. Furthermore α1
Standard ammonia water was added dropwise to adjust the pH to 4.8.
内径6(1m%長さ60crILのテフロン容器に15
00−注入し、密栓をした。円柱の中心軸を回転軸とす
る回転装置に装着し、回転数100 Or−p、mで2
時間回転させた。30℃の恒温槽に移し、4日間静置し
てから、5%程度線収縮したゲルをポリプロピレン製容
器(内寸2 ocmx 70cIILX 15cIIL
H)に入れ、開口率1%のフタをした。60℃で10日
間乾燥させたところ、チューブ形状のドライグルが作製
できた。15 in a Teflon container with an inner diameter of 6 (1 m% and a length of 60 crIL)
00- Injected and capped tightly. Mounted on a rotating device with the center axis of the cylinder as the rotation axis, and rotated at 100 Or-p and 2 m.
Rotated time. Transfer the gel to a constant temperature bath at 30°C, leave it for 4 days, and then transfer the gel, which has linearly shrunk by about 5%, to a polypropylene container (inner size: 2 ocm x 70 cIIL x 15cIIL).
H) and covered with a lid with an aperture ratio of 1%. After drying at 60° C. for 10 days, a tube-shaped Draigle was produced.
石英ガラスを炉心管とするガス置換炉内にドライヴ〃を
入れ、乾燥空気を21/m1nO流景で炉内に流入した
。60℃/ h rの速度で700℃まで昇温し、5時
間保持した。流入ガスをヘリウム(t81/m1n)と
塩素(Q、21/fnin)の混合ガスに切り換え、3
0℃/hrの速度で1000℃まで外温した。流入ガス
を酸素(217m in)に切り換え、1000℃と1
050℃でそれぞれ5時間保持した。The drive was placed in a gas exchange furnace with a quartz glass core tube, and dry air was introduced into the furnace at a rate of 21/m1nO. The temperature was raised to 700°C at a rate of 60°C/hr and held for 5 hours. Switch the inflow gas to a mixed gas of helium (t81/m1n) and chlorine (Q, 21/fnin), and
External heating was performed to 1000°C at a rate of 0°C/hr. Switch the inflow gas to oxygen (217 m in) and heat to 1000°C and 1
Each sample was held at 050°C for 5 hours.
最後に流入ガスをヘリウム(2ilm1n)に切り換え
、1050℃11100℃、1150℃の各温度で5時
間ずつ保持した。Finally, the inflow gas was switched to helium (2ilm1n), and the temperature was maintained at 1050°C, 11100°C, and 1150°C for 5 hours each.
半透明状態だったが、比重は#1ぼ2.20になってい
た。大きさは外径311m%内径1cIrL1長さ75
crrLだった。Although it was translucent, its specific gravity was about #1 and 2.20. Size: Outer diameter 311m% Inner diameter 1cIrL1 Length 75
It was crrL.
得られた石英ガラス前駆体を、黒鉛を発熱体とした約2
000℃のリングヒーター内を、20儂/min の
速度で移動させた。次に電気炉内に入れ1200℃で1
時間保持した後、100℃/hrの速度で降温し、除歪
を行なった。The obtained quartz glass precursor was heated with graphite as a heating element for about 2 hours.
The sample was moved at a speed of 20 f/min in a ring heater at 000°C. Next, put it in an electric furnace and heat it at 1200℃ for 1
After holding for a period of time, the temperature was lowered at a rate of 100° C./hr to remove strain.
波長CL655μmのレーザー光を照射したところ、散
乱は全く醜察されなかった。また、2.72μmの吸収
により含水率ヲホリ定したところ、lppm以下であっ
た。When irradiated with a laser beam having a wavelength CL of 655 μm, no scattering was observed at all. Further, when the moisture content was determined by absorption at 2.72 μm, it was found to be 1 ppm or less.
実施例 5゜
エチルシリク゛−)440mlと0.05規定塩酸水溶
液360m1を激しく攪拌し、無色透明の均一溶液を得
た。そこに超微粉末シリカ(AerosilOX−50
)150gを徐々に添加し、充分に攪拌した。このゾル
を、20℃に保ちながら28 KHzの超音波を2時間
照射し、更に1500Gの遠心力を10分間かけた後、
1μmのフィルターを通過させた。そこに塩化ヒドラジ
ニウム粉末1五5g (NzHsCJ?/5ioz=5
%)を添加し、10分間攪拌した。虹に01規定アンモ
ニア水を滴下しP I44.2に調整した。Example 5 440 ml of ethyl silica and 360 ml of a 0.05N aqueous hydrochloric acid solution were vigorously stirred to obtain a colorless and transparent homogeneous solution. There, ultrafine powdered silica (AerosilOX-50
) 150g was gradually added and thoroughly stirred. This sol was irradiated with 28 KHz ultrasound for 2 hours while being kept at 20°C, and then subjected to a centrifugal force of 1500 G for 10 minutes.
It was passed through a 1 μm filter. Add 155g of hydrazinium chloride powder (NzHsCJ?/5ioz=5
%) and stirred for 10 minutes. 01 normal ammonia water was added dropwise to the rainbow to adjust the PI to 44.2.
内寸、30にylX 3 oax j D(yHのポリ
プロピレン製容器に700m1注入し、ヅ閉状態で5日
間30℃に保った。開口率1%のフタをして、60℃で
7日間乾燥させたところ、板状のドライヴμが作製でき
た。Pour 700 ml of ylX 3 oax j D (yH) into a polypropylene container with an inner dimension of 30, and keep it closed at 30°C for 5 days. Cover with a lid with a 1% open area and dry at 60°C for 7 days. As a result, we were able to fabricate a plate-shaped drive μ.
石英ガラスを炉・b管とするガス置換炉内にドライゲル
を入れ、乾燥空気を流入しながら60℃/hrの速度で
800℃まで昇温した。800℃かう純ヘリウムガスを
11/minの流量で炉心管内に流入しはじめ、30℃
/ h rの速度で1150℃まで昇温し、1150℃
で5時間保持した。ガラス化が終了しており、比重は2
.20になっていた。大きさは15CrrL×15cW
LXQ、4crrLだった。直径10μm程度のインク
ルージ讐ン及びβクリストバライト型結晶が検出された
。The dry gel was placed in a gas replacement furnace using quartz glass as the furnace/B tube, and the temperature was raised to 800°C at a rate of 60°C/hr while flowing dry air. Pure helium gas at 800℃ begins to flow into the reactor core tube at a flow rate of 11/min, and the temperature reaches 30℃.
Raise the temperature to 1150℃ at a rate of 1150℃ / hr.
It was held for 5 hours. Vitrification has been completed and the specific gravity is 2
.. It was 20 years old. Size is 15CrrL x 15cW
It was LXQ, 4crrL. Inclusion crystals and β-cristobalite type crystals with a diameter of about 10 μm were detected.
黒鉛発熱炉内に該石英ガラス板を入れ、窒素ガスで置換
した後、2時間で1800℃まで外温し10分間保持し
た。1200℃まで1000℃/hrの速度で降温し、
それ以後室rMまで100℃/ h rの速度で降温し
た。The quartz glass plate was placed in a graphite heat-generating furnace, and after purging with nitrogen gas, the temperature was externally raised to 1800° C. over 2 hours and held for 10 minutes. The temperature is lowered to 1200°C at a rate of 1000°C/hr,
Thereafter, the temperature was lowered to room rM at a rate of 100°C/hr.
厚さZ tax K m重研磨し、暗室内で50,00
0Auxの照度になるよう集光ランプを当てたが、光点
は全く検出できなかった。結晶は完全に消失しており、
歪も存在せず、光学的に瞳めて茜品質だった0化学分析
においてアルカリ金属及びアルカリ土金属は不検出であ
った。また、紫外域での透過率は250mまで90%以
上を保持していた0比較例 五
エチ/I/Vリケード440所)と0.05規定塩酸水
溶液360Tnlを激しく攪拌し、無色透明の均一溶液
を得た。そこに超微粉末シリカ(AerosilOX−
50)1501!を徐々に添加し、充分に攪拌し、充分
に攪拌した。このゾルを20℃に保ちながら28KHz
の超音波を2時間照射し、更に1500Gの遠心力を1
0分間かけた後、1μmのフィルターを通過させた。そ
こに塩化アンモニウム粉末118g (NH4C1/5
t02−40%)を添加し、10分間攪拌した。更に0
.1規定アンモニア水を滴下し、PH4,2に調整した
。Thickness Z tax K m heavy polishing, 50,000 yen in dark room
A condensing lamp was applied so that the illuminance was 0 Aux, but no light spot could be detected. The crystals have completely disappeared,
There was no distortion, and the material was optically of madder quality. No alkali metals or alkaline earth metals were detected in the chemical analysis. In addition, the transmittance in the ultraviolet region was maintained at 90% or more up to 250 m (Comparative Example 440 points) and 360 Tnl of a 0.05N hydrochloric acid aqueous solution were vigorously stirred to form a colorless and transparent homogeneous solution. I got it. There, ultrafine powdered silica (AerosilOX-
50) 1501! was gradually added and thoroughly stirred. 28KHz while keeping this sol at 20℃
Ultrasonic waves were applied for 2 hours, and centrifugal force of 1500G was applied for 1 hour.
After 0 minutes, it was passed through a 1 μm filter. There, 118g of ammonium chloride powder (NH4C1/5
t02-40%) was added and stirred for 10 minutes. 0 more
.. 1N ammonia water was added dropwise to adjust the pH to 4.2.
内寸50cIIL×30cr、×10cIrLHのポリ
プロピレン製容器に7001rL13注入し、密閉状態
で3日間50℃に保った。開口率1%のフタをして、6
0℃で7日間乾燥させた。塩化アンモニウムがドライゲ
ル表面に多量析出していた。7001rL13 was poured into a polypropylene container with inner dimensions of 50cIIL x 30cr and x 10cIrLH, and kept at 50°C for 3 days in a sealed state. Close the lid with an opening ratio of 1%, and
It was dried at 0°C for 7 days. A large amount of ammonium chloride was precipitated on the surface of the dry gel.
実施例1.と同様の方法で焼結したところクラックが多
数発生し、ち密なガラス状態にはならなかった0
〔発明の効果〕
以上述べたように本発明によれば、アルキルシリケート
を酸性試薬で加水分解して得られる溶液とシリカ超微粉
末とを、所定の割合で混合して得られるゾル溶液を原料
として作製したドライヴμを、ヘリウム雰囲気あるいは
減圧下で閉孔化し、得られたガラスまたはガラス前駆体
を1500〜2200℃に加熱し、一定時間保持する石
英ガラス合成において、ゾル中に金属イオンを含まない
塩を添加することにより、石英ガラス純度を悪くするこ
となくドライゲルの閉孔化温度を低下させ効率よく高品
質な石英ガラスを製造することができる。Example 1. When sintered in the same manner as above, many cracks occurred and a dense glass state was not obtained.0 [Effects of the Invention] As described above, according to the present invention, alkyl silicate is hydrolyzed with an acidic reagent. The glass or glass precursor obtained by closing the pores of Drive μ, which is prepared from a sol solution obtained by mixing the solution obtained by In silica glass synthesis, in which silica glass is heated to 1500-2200℃ and held for a certain period of time, by adding salt that does not contain metal ions to the sol, the pore-closing temperature of the dry gel can be lowered without degrading the purity of the silica glass. High quality quartz glass can be manufactured efficiently.
本発明により、ゾル−ゲル法による石英ガラスでも、薄
膜トランジスター用石英基板、ICマスク用石英基板、
更には光通信ファイバー用すポートチェープ等への応用
が可能となった。According to the present invention, even quartz glass produced by the sol-gel method can be used to produce quartz substrates for thin film transistors, quartz substrates for IC masks,
Furthermore, it has become possible to apply it to port chains for optical communication fibers, etc.
以上that's all
Claims (1)
られる溶液とシリカ超微粉末とを、所定の割合で混合し
て得られるゾル溶液を原料として作製したドライゲルを
、ヘリウム雰囲気あるいは減圧下で閉孔化し、得られた
ガラスまたはガラス前駆体を1500〜2200℃に加
熱し、一定時間保持する石英ガラス合成において、ゾル
中に金属イオンを含まない塩を添加することを特徴とす
る石英ガラスの製造方法。 (2)ゾル中に添加する塩が、NH_4Cl、(NH_
4)_2SO_4等のアンモニウム塩であることを特徴
とする特許請求の範囲第1項記載の石英ガラスの製造方
法。 (6)塩の添加量は、焼結後の石英ガラス重量に対し0
.1〜30%であることを特徴とする特許請求の範囲第
1項又は第2項記載の石英ガラスの製造方法。[Claims] (1) A dry gel prepared using a sol solution obtained by mixing a solution obtained by hydrolyzing an alkyl silicate with an acidic reagent and ultrafine silica powder at a predetermined ratio as a raw material, In silica glass synthesis, in which the pores are closed in an atmosphere or under reduced pressure, the resulting glass or glass precursor is heated to 1500 to 2200°C, and held for a certain period of time, a salt that does not contain metal ions is added to the sol. A method for producing quartz glass. (2) The salts added to the sol are NH_4Cl, (NH_
4) The method for producing quartz glass according to claim 1, wherein the quartz glass is an ammonium salt such as _2SO_4. (6) The amount of salt added is 0 to the weight of quartz glass after sintering.
.. The method for producing quartz glass according to claim 1 or 2, wherein the content is 1 to 30%.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP5165486A JPS62207724A (en) | 1986-03-10 | 1986-03-10 | Production of quartz glass |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP5165486A JPS62207724A (en) | 1986-03-10 | 1986-03-10 | Production of quartz glass |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS62207724A true JPS62207724A (en) | 1987-09-12 |
Family
ID=12892859
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP5165486A Pending JPS62207724A (en) | 1986-03-10 | 1986-03-10 | Production of quartz glass |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS62207724A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20000060200A (en) * | 1999-03-12 | 2000-10-16 | 윤종용 | Manufacturing method of silica glass for sol-gel process |
-
1986
- 1986-03-10 JP JP5165486A patent/JPS62207724A/en active Pending
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20000060200A (en) * | 1999-03-12 | 2000-10-16 | 윤종용 | Manufacturing method of silica glass for sol-gel process |
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