JPS638228A - Production of quartz glass - Google Patents
Production of quartz glassInfo
- Publication number
- JPS638228A JPS638228A JP15046586A JP15046586A JPS638228A JP S638228 A JPS638228 A JP S638228A JP 15046586 A JP15046586 A JP 15046586A JP 15046586 A JP15046586 A JP 15046586A JP S638228 A JPS638228 A JP S638228A
- Authority
- JP
- Japan
- Prior art keywords
- glass
- quartz glass
- dry gel
- gel
- container
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 title claims abstract description 40
- 238000004519 manufacturing process Methods 0.000 title claims description 8
- 239000011521 glass Substances 0.000 claims abstract description 20
- 238000010438 heat treatment Methods 0.000 claims abstract description 12
- 239000002243 precursor Substances 0.000 claims abstract description 10
- -1 alkyl silicate Chemical compound 0.000 claims abstract description 7
- 239000002994 raw material Substances 0.000 claims abstract description 5
- 238000000034 method Methods 0.000 claims abstract 3
- 239000011148 porous material Substances 0.000 claims description 6
- 230000015572 biosynthetic process Effects 0.000 claims description 2
- 238000003786 synthesis reaction Methods 0.000 claims description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 abstract description 4
- 239000010439 graphite Substances 0.000 abstract description 4
- 229910002804 graphite Inorganic materials 0.000 abstract description 4
- 239000000377 silicon dioxide Substances 0.000 abstract description 3
- 239000000843 powder Substances 0.000 abstract description 2
- 239000006260 foam Substances 0.000 abstract 2
- 230000000717 retained effect Effects 0.000 abstract 1
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 8
- 230000005484 gravity Effects 0.000 description 6
- 238000003980 solgel method Methods 0.000 description 5
- 239000007864 aqueous solution Substances 0.000 description 4
- 239000007789 gas Substances 0.000 description 4
- 150000001768 cations Chemical class 0.000 description 3
- 239000001307 helium Substances 0.000 description 3
- 229910052734 helium Inorganic materials 0.000 description 3
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 3
- 239000012456 homogeneous solution Substances 0.000 description 3
- 239000010453 quartz Substances 0.000 description 3
- 150000003839 salts Chemical class 0.000 description 3
- 238000004017 vitrification Methods 0.000 description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 3
- VHUUQVKOLVNVRT-UHFFFAOYSA-N Ammonium hydroxide Chemical compound [NH4+].[OH-] VHUUQVKOLVNVRT-UHFFFAOYSA-N 0.000 description 2
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 2
- 239000004743 Polypropylene Substances 0.000 description 2
- BOTDANWDWHJENH-UHFFFAOYSA-N Tetraethyl orthosilicate Chemical compound CCO[Si](OCC)(OCC)OCC BOTDANWDWHJENH-UHFFFAOYSA-N 0.000 description 2
- 238000010521 absorption reaction Methods 0.000 description 2
- 235000011114 ammonium hydroxide Nutrition 0.000 description 2
- 238000001035 drying Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 229920001155 polypropylene Polymers 0.000 description 2
- 238000005245 sintering Methods 0.000 description 2
- 229910002012 Aerosil® Inorganic materials 0.000 description 1
- 101100410786 Arabidopsis thaliana PXG5 gene Proteins 0.000 description 1
- 241000238558 Eucarida Species 0.000 description 1
- 229910019142 PO4 Inorganic materials 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000005286 illumination Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 239000010452 phosphate Substances 0.000 description 1
- NBIIXXVUZAFLBC-UHFFFAOYSA-K phosphate Chemical compound [O-]P([O-])([O-])=O NBIIXXVUZAFLBC-UHFFFAOYSA-K 0.000 description 1
- 230000001737 promoting effect Effects 0.000 description 1
- 238000007712 rapid solidification Methods 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 238000002834 transmittance Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B19/00—Other methods of shaping glass
- C03B19/12—Other methods of shaping glass by liquid-phase reaction processes
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Manufacturing & Machinery (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Glass Melting And Manufacturing (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
大発明はゾル−ゲル法による石英ガラスの製造方法に関
する。DETAILED DESCRIPTION OF THE INVENTION [Industrial Field of Application] The present invention relates to a method for producing quartz glass by a sol-gel method.
ゾル−ゲル法を用いて作製し几ドライゲルを、ヘリウム
雰囲気あるいは減圧下で閉孔化し、石英ガラス士ｔはガ
ラス前駆体とした試料を１５００〜２２００’ＣＫ一般
に使おれている炉中で加熱処理すると、インクルージ１
ンの全（存在しない、光学的に高品質な石英ガラスを製
造することばできろ。A dry gel prepared using the sol-gel method is pore-closed in a helium atmosphere or under reduced pressure, and the quartz glass specialist heat-treats the sample as a glass precursor in a commonly used furnace at 1500 to 2200°C. Then, Inc. 1
It is possible to manufacture optically high-quality silica glass, which does not exist.
〔発明が解決しよ５とする問題点〕
しかし、炉材から陽イオンｈ；拡散し、ドライゲルの表
面に寸着する九め、表面部分のみ焼結ｂ；促進されてし
まう。ドライゲル内部に、塩や多量の水分を取り込んだ
まま表面部分のλ閉孔化してしまうと、１５００〜２２
００℃に加熱する際、ガラス内部から気泡が発生すると
いう現象ｈｔ起こる。[Problems to be solved by the invention] However, cations diffuse from the furnace material and reach the surface of the dry gel, promoting sintering only on the surface portion. If the surface part of the dry gel becomes closed pores with salt and a large amount of moisture taken in, the dry gel will have a
When heated to 00°C, a phenomenon occurs in which bubbles are generated from inside the glass.
そこで本発明はこのような問題点を解決するもので、そ
の目的とするところは、気泡の全く存在しない光学的に
極めて高品質な石英ガラスを、ゾル−ゲル法を用いて製
造するところだある。The present invention aims to solve these problems, and its purpose is to manufacture optically extremely high-quality quartz glass without any bubbles using the sol-gel method. .
本発明は少なくともアルそルシリケートを原料とＩ７、
ゾル−ゲル法で作製したガラスあるいはガラス前駆体を
１５００〜２２００℃に加熱し、一定時間保持する石英
ガラス合１１ｉ１２Ｋをいて、ドライゲルの１２００℃
までの加熱を石英ガラス容器内で行なうことを特徴とす
る。The present invention uses at least alkyl silicate as a raw material and I7,
Glass or glass precursor produced by the sol-gel method is heated to 1500 to 2200°C and held for a certain period of time.
It is characterized in that the heating is carried out in a quartz glass container.
６００〜１２１１０’Ｃの温度域ではＨｅ雰囲気あるい
は真空雰囲気をダちなり；ら焼結することが望ましく前
記条件で閉石化／′１″−終了しないドライグル〈つい
ては１石英ガラス容器を用いずにＨｅ雰囲気あるいは真
空雰囲気で閉孔化させ、ガラスま之はガラス前駆体とす
る必要ｔ；ある。In the temperature range of 600 to 12110'C, it is preferable to sinter in a He atmosphere or a vacuum atmosphere. It is necessary to close the pores in an atmosphere or a vacuum atmosphere and use the glass precursor as a glass precursor.
石英ガラスＦｉ陽イオンを含まない高純度ガラスで、高
温まで加熱しても陽イオンが拡散すること汀ない。耐熱
性も高く、通用で１１００℃、短時間なら１２００℃で
も使用可能である。Silica glass is a high-purity glass that does not contain Fi cations, and the cations will not diffuse even when heated to high temperatures. It also has high heat resistance, and can be used at temperatures up to 1,100°C for normal use, and up to 1,200°C for short periods of time.
ドライゲル内部に残存する塩や水分のほとんどが、１１
００℃までの加熱で拡散除去される。１２００℃まで石
英容器内で焼結をすすめれば、ドライゲル内部に問題と
なる量の塩や水分が残存することはない。Most of the salt and water remaining inside the dry gel are
It is diffused and removed by heating up to 00°C. If sintering is carried out in a quartz container up to 1200°C, no problematic amounts of salt or moisture will remain inside the dry gel.
ドライゲルの種類によれば７００℃前後から閉孔化が始
まる定め、６００℃からＨｅ雰囲気あるいは真空雰囲気
を保ちなｈｔら焼結することが望ましい。Depending on the type of dry gel, pore closure begins at around 700°C, and it is desirable to sinter the dry gel from 600°C while maintaining a He atmosphere or a vacuum atmosphere.
１２００℃で閉孔化ｈ；終了しない場合、石英ガラス容
器の使用限界を越える之め、石英ガラスを用いずにＨｅ
雰囲気あるいは真空雰囲気で閉孔化を終了させろ。既に
壇や水分が除去されているため、１５００〜２２００℃
に加熱しても、ガラス内部から気泡ｈ；発生する現象げ
起こらない。Pore closure h at 1200°C; if this does not occur, the use limit of the quartz glass container will be exceeded, so the He
Complete pore closure in atmosphere or vacuum atmosphere. 1500 to 2200℃ because the stage and moisture have already been removed.
Even if the glass is heated to a temperature of
実施例１゜
エチルシリケー） ４．４ ｔとＣＬＯ５規定塩酸水溶
液１６ｔを激しく攪拌し、無色透明の均一溶液を得比。Example 1 4.4 tons of ethyl silica and 16 tons of CLO5 normal hydrochloric acid aqueous solution were vigorously stirred to obtain a colorless and transparent homogeneous solution.
そこに超微粉末シリカ（Ｃａｂ−ｏ−ｓｉｌ Ｌ −
９０）ｔ２１’ｑ＋徐々に添加し、充分に攪拌した。こ
のゾルを２０℃に枳ちながら２８ Ｋ Ｈｚの超音波を
２時間照射（７，更に１５００Ｇの遠心力を１０分間か
け比重、１風のフィルターを通過させ友。There, ultrafine powdered silica (Cab-o-sil L-
90) t21'q+ Gradually added and stirred thoroughly. This sol was heated to 20°C and irradiated with 28 KHz ultrasonic waves for 2 hours (7), and then subjected to a centrifugal force of 1500 G for 10 minutes and passed through a filter with a specific gravity of 1 wind.
得られた均賀！の高いゾルを０．１規定アンモニア水で
ＰＨ４，２に調整してからポリプロピレン製容器（内寸
３０ｃｙｘ ５０ｃ！ｎｘ １５ｃｙｔ Ｔｌ ）Ｉｃ
１ を注入し九〇開口率１％の７タをし、６０℃で１
０日間乾燥させ次ところ２１ｃ＋＋＋Ｘ２１ｃｍｘ０．
７ｃｍ のドライゲルが作製できＬ
石英ガラスの炉心管を備え之ガス鴬換炉内にドライゲル
を入れ、乾燥空気を流入しながら６０℃／ｈｒの速度で
７００”Ｃまで昇温し次。７００℃から紳ヘリウムガス
を１１７ｍ１ｎの流量で流入しけじめ、５０’（、／ｈ
ｒの速度で１１５０’Ｃまで昇温し、１１５０’Ｃで３
時間保持した。半透明状態だった／＋”−表面はガラス
化しており、比重は２．２０になっていＬ
得られ次石英ガラス前駆体を黒鉛発熱炉で１８００’ｃ
＋／Ｃｍ熱し、２０分間保持した。１２０ｏ ’ｃまで
１０００’Ｃ／ｈｒの速度で降温し、それ以後室温まで
１００゛シ舒の速度で降温し比ゆガラス化が終了し、肉
視では気泡＾；観察されなかりｔ００ｔ性は良好で、大
きさけ１５α×１５１Ｘα５αであっｔｏ、Ｉ！！［さ
０．３ ｃＲＶＣ鏡面研磨し、暗室内で５０．０００
ｌｕｘの照度になるよう集光巧ンプを当て友が、光点は
全く検出できなかつ比。紫外域での透過高を測定したと
ころ、２００ｎｍで８５俤であり、それ以上の波長域で
は特定の吸収は認められなかった。Obtained Junga! After adjusting the pH of the high sol to 4.2 with 0.1N ammonia water, it was placed in a polypropylene container (inner size 30cyx 50c!nx 15cyt Tl) Ic
1 was injected, 90° was heated at 60°C with an opening ratio of 1%.
After drying for 0 days, the size was 21c+++X21cmx0.
A dry gel of 7 cm was prepared. The dry gel was placed in a gas exchange furnace equipped with a quartz glass furnace tube, and the temperature was raised to 700"C at a rate of 60°C/hr while flowing dry air. From 700°C. Helium gas was introduced at a flow rate of 117 m1n, and the flow rate was 50' (,/h
Raise the temperature to 1150'C at a rate of r, and at 1150'C
Holds time. The surface was vitrified and the specific gravity was 2.20.The resulting quartz glass precursor was heated to 1800'C in a graphite heating furnace.
+/Cm and held for 20 minutes. The temperature was lowered at a rate of 1000'C/hr to 120o'C, and then the temperature was lowered to room temperature at a rate of 100oC/hr until vitrification was completed and no bubbles were observed with the naked eye, so the t00t properties were good. So, the size is 15α×151Xα5α, to, I! ! [Size: 0.3cRVC mirror polished, 50.000cm in a dark room
I used a light condensing lamp to achieve the illuminance of lux, but I could not detect any light spots at all. When the transmission height in the ultraviolet region was measured, it was 85 at 200 nm, and no specific absorption was observed in the wavelength range beyond that.
実施例２ エチルシリケートｔａＺ、エタノール２．７ ｔ 。Example 2 Ethyl silicate taZ, ethanol 2.7 t.
１規定アンそニア水［１７’ ｔを均一に混合し、室温
で３日静電した。白濁したゾルに純水Ｃ１，４ｔを添加
してからロータリーエバポレーターを用いて１ｔｌ′ｃ
＠縮した。更に２規定塩酸水溶液を添加してｐ′Ｈ４，
ｏに調整した。1N aqueous anthonia [17't] was mixed uniformly and electrostatically charged at room temperature for 3 days. Add 1.4t of pure water C to the cloudy sol, and then boil it to 1tl'c using a rotary evaporator.
@ Shrunk. Furthermore, 2N hydrochloric acid aqueous solution was added to reduce p'H4,
Adjusted to o.
それとけ別にエチルシリケー） ０．９１と０．０２規
定塩酸水溶液ｃｌＳｔを激しく攪拌し、無色透明の均一
溶液を１比。前述のゾルと均一に混合し比重１μｍのフ
ィルターを通過させ比。０．１規定７ンモア水でＰＨ４
，０１Ｃ’ｌｌ整してから、 ｊ５Ｇｏ Ｇノ遠心力
を１０分間かけ念後、再び１μｍのフィルターを通過さ
せｔｏ
得ちれ之均買度の高いゾルをポリプロピレン製容器（内
寸３０ｍｘ ３０ＣＩＩＩＸ １５Ｇ１１）Ｔ ）に１
を注入［−１た。開口率１チのフタをし、６０℃で１０
日間乾燥させ九ところ、２１ｃｒＲＸ２１ｃｒＲＸ０．
７Ｃ１１１のドライゲルが作製でき念。Separately, 0.91 and 0.02 N hydrochloric acid aqueous solutions clSt were stirred vigorously to form a colorless and transparent homogeneous solution in a ratio of 1 to 1. Mix uniformly with the above-mentioned sol and pass through a filter with a specific gravity of 1 μm. 0.1 PH4 with 7 molar water
After adjusting the sol, apply centrifugal force for 10 minutes, and then pass it through a 1 μm filter again. T ) to 1
Inject [-1]. Cover with a lid with an opening ratio of 1 inch and heat at 60℃ for 10 minutes.
After 9 days of drying, 21crRX21crRX0.
I am sure that a dry gel of 7C111 could be prepared.
石英ガラスの炉心管を備えｔガス置換炉内にドライゲル
を入れ、乾燥空気を流入しなｈ；ら６０℃／ｈｒの速度
で６ａａ’ｃまで昇温し、２０時間保持した。純ヘリウ
ムガスを１１７ｍ１ｎの流量で流入しけじめ、３０℃／
ｈτの速度でｊ１００’ｃまで昇温し、１１００℃まで
昇温し＋ １１００℃で５時間保持した。ガラス化カ終
了し、ており、比重Ｆｉ２−２０になってい友。The dry gel was placed in a t-gas replacement furnace equipped with a quartz glass furnace core tube, and the temperature was raised to 6 aa'c at a rate of 60° C./hr without introducing dry air, and maintained for 20 hours. Pure helium gas was introduced at a flow rate of 117 m1n, and the temperature was kept at 30°C/
The temperature was raised to j100'c at a rate of hτ, and then to 1100°C and held at +1100°C for 5 hours. The vitrification has been completed and the specific gravity is Fi2-20.
得れｔ石英ガラス板を１９００℃の黒鉛発熱炉内に投入
し、５分間保持し７． １２００℃まで１０００℃’ｙ
’ｈｒの速度で降温し、それ以後室温まで１００℃／ん
ｒの速度で降温し九〇
１５αＸ１５Ｃ＋１ＩＸＯ１３備の大ぎさに鏝面研磨し
、暗室内で５０．（］ＱＯ２π２の照度くなるようだ集
光ランプを当てｔが、光点は全く検出で弾なかっｔ０紫
外域での透過率を測定し次とこち、２０１ｍまで９０チ
以上を保持しており、特定の吸収は認ぬられなかった。7. The obtained quartz glass plate was placed in a graphite heating furnace at 1900°C and held for 5 minutes. 1000℃'y up to 1200℃
After that, the temperature was lowered to room temperature at a rate of 100℃/hr, and the trowel surface was polished to a size of 9015αX15C+1IXO13 in a dark room at 50℃. () It seems that the illumination intensity will be QO2π2.I applied a condensing lamp, but the light spot did not bounce at all.I measured the transmittance in the ultraviolet region, and it maintained over 90cm up to 201m. No specific absorption was observed.
実施例工
エチルシリケート４．４１と０．０５規定塩酸水溶液五
６ｔを激しく攪拌し、無色透明の均一溶液を得た。そこ
に超微粉末シリ！Ｊ（Ａｅｒｏｓｉｌ ０Ｘ−５０）ｔ
５Ｋｆを徐々に添加し、充分（攪拌し次。このゾルを２
０℃に梶ちながら２８ＫＨ２の超音波を２時間照射し、
更に１５００Ｇの遠心力を１０分間かけｔ後、１１１ｒ
ｎのフィルターを通過させた。EXAMPLE 4.41 tons of engineered ethyl silicate and 56 tons of 0.05N hydrochloric acid aqueous solution were vigorously stirred to obtain a colorless and transparent homogeneous solution. There's ultra-fine powder Siri! J(Aerosil 0X-50)t
Gradually add 5Kf and stir thoroughly.
Irradiated with 28KH2 ultrasonic waves for 2 hours while heating to 0℃,
After applying centrifugal force of 1500G for 10 minutes, 111r
passed through n filters.
得られた均質度の高−ゾルを０．１規定アンモニア水で
ＰＨ４，２に調整してからポリプロピレン製容器（内寸
３０＞ｘ３０ｃｍｘ １５ｍ ｌ（）に１を注入した。The resulting highly homogeneous sol was adjusted to pH 4.2 with 0.1 N ammonia water, and then 1 was poured into a polypropylene container (inner dimensions 30>30 cm x 15 ml).
開口＊１４のフタをし、６０℃で１０日間乾燥させたと
ころ、板状のドライゲルが作製で弾た。When the opening *14 was covered and dried at 60° C. for 10 days, a plate-shaped dry gel was formed.
真空炉内に石英ガラス容器を設置し１石英ガラス容器内
にドライゲルな入れた。石英ガラス容器ＫＦ′ｉ、若干
の隙間を設けておいた。真空炉を常圧のま士６０℃、／
ｈｒの速度で９００℃まで昇温し、５時間９持し次。ロ
ータリーポンプを用いてＩ ＴＯ？−ｒ以下まで減圧に
し、以後この減圧変を完ちなｈｉら、５０ ’Ｃ／ｈｒ
の速度で１２００℃まで昇温し、２時間保持し友。A quartz glass container was placed in a vacuum furnace, and a dry gel was placed in the quartz glass container. A slight gap was provided in the quartz glass container KF'i. Heat the vacuum furnace at normal pressure to 60℃, /
The temperature was raised to 900°C at a rate of 1 hour and held for 5 hours. I TO using a rotary pump? Reduce the pressure to below -r, and then complete this pressure change at 50'C/hr.
Raise the temperature to 1200℃ at a rate of 1,200℃ and hold for 2 hours.
ドライゲルＦ′！マだ透明化が進行しておらず、比重も
２．０５であった。石英ガラス容器を真空炉から取り出
し、このドライゲルを再び炉内に入れ、１ＴＯｆｆ以上
まで減圧にした。１３００℃まで昇温し、２時間保持し
たところ、ガラス化が終了し、比重が２．２０’になっ
た。Dry gel F'! The mud had not become transparent, and the specific gravity was 2.05. The quartz glass container was taken out from the vacuum furnace, and this dry gel was put back into the furnace and the pressure was reduced to 1Toff or more. When the temperature was raised to 1300°C and held for 2 hours, vitrification was completed and the specific gravity became 2.20'.
得られ次石英ガラス板を黒鉛発熱炉で１７５０℃に加熱
し、１時間憬時し念。１２００’Ｃまで１０００℃／ｈ
τの速凝で降温し、それ以後室温まで１００℃７ｈｒの
速度で降温した。１５ｃｍ ｘ １５ｃｒｎｘ Ｏ，３
αの大きさに鏡面研磨し、暗室内で５０．（ＴＯＯｌｕ
ｘの照度になるよう集光ランプを当てたが、光点は全く
検出できなかつ念。The obtained quartz glass plate was then heated to 1750°C in a graphite heating furnace and allowed to stand for 1 hour. 1000℃/h up to 1200'C
The temperature was lowered by rapid solidification of τ, and thereafter the temperature was lowered to room temperature at a rate of 100° C. for 7 hours. 15cm x 15crnx O, 3
Mirror polished to the size of α, 50. (TOOlu
I shined a condensing lamp so that the illuminance was x, but I couldn't detect any light spots.
以、上述べ定ように本発明によれば、少なくともアル中
ルシ１１ケートを原料とし、ゾル−ゲル法で作製し次ガ
ラスあるいはガラス前駆体を１５００℃〜２２００℃だ
加熱し、一定時間保持する石英ガラス合成において、ド
ライゲルの１２００℃までの加熱を石英ガラス容器内で
行な５ことにより、気泡の全く存在しない、光学的Ｖｃ
＠めて高品質な石英ガラスを製造することｈＳでき友。As described above, according to the present invention, quartz is produced by using at least 11 phosphate in alkali as a raw material, by a sol-gel method, and then heating a glass or a glass precursor to 1500°C to 2200°C and holding it for a certain period of time. In glass synthesis, by heating the dry gel to 1200°C in a quartz glass container5, an optical Vc without any bubbles is obtained.
A friend of hS who was able to manufacture high-quality quartz glass for the first time.
本発明により、ＩＣマスク用石英基板への応用が可能と
なった。The present invention enables application to quartz substrates for IC masks.
以 上 出Ｈ人 セイコーエプソン株式谷社 代理人 弁理士 最上 務 や１名 “Ｎ−that's all H person Seiko Epson Co., Ltd. Tanisha Agent: Patent attorney Mogami and one other person “N-
Claims (3)
ゲル法で作製したガラスあるいはガラス前駆体を１５０
０〜２２００℃に加熱し、一定時間保持する石英ガラス
合成において、ドライゲルの１２００℃までの加熱を石
英ガラス容器内で行なうことを特徴とする石英ガラスの
製造方法。(1) Sol using at least alkyl silicate as raw material
150% of glass or glass precursor made by gel method
A method for producing quartz glass, which comprises heating a dry gel to 1200°C in a quartz glass container in silica glass synthesis by heating to 0 to 2200°C and holding it for a certain period of time.
いて、６００℃〜１２００℃の温度域ではＨｅ雰囲気あ
るいは真空雰囲気を保つことを特徴とする特許請求の範
囲第１項記載の石英ガラスの製造方法。(2) The method for producing quartz glass according to claim 1, wherein a He atmosphere or a vacuum atmosphere is maintained in the temperature range of 600°C to 1200°C during heating of the dry gel in the quartz glass container. .
後、Ｈｅ雰囲気あるいは真空雰囲気で閉孔化させ、ガラ
スまたはガラス前駆体とすることを特徴とする特許請求
の範囲第１項または第２項記載の石英ガラスの製造方法
。(3) After the dry gel is heat-treated in the quartz glass container, the pores are closed in a He atmosphere or a vacuum atmosphere to form a glass or a glass precursor. The method for manufacturing the quartz glass described.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP15046586A JPS638228A (en) | 1986-06-26 | 1986-06-26 | Production of quartz glass |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP15046586A JPS638228A (en) | 1986-06-26 | 1986-06-26 | Production of quartz glass |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS638228A true JPS638228A (en) | 1988-01-14 |
Family
ID=15497509
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP15046586A Pending JPS638228A (en) | 1986-06-26 | 1986-06-26 | Production of quartz glass |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS638228A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH01266248A (en) * | 1988-04-19 | 1989-10-24 | Royal Kogyo Kk | Process for determining dimension of drawing pattern for knitting and dressmaking |
-
1986
- 1986-06-26 JP JP15046586A patent/JPS638228A/en active Pending
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH01266248A (en) * | 1988-04-19 | 1989-10-24 | Royal Kogyo Kk | Process for determining dimension of drawing pattern for knitting and dressmaking |
| JPH0411659B2 (en) * | 1988-04-19 | 1992-03-02 | Royal Kogyo Kk |
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