JPS62203265U - - Google Patents

Info

Publication number
JPS62203265U
JPS62203265U JP9049186U JP9049186U JPS62203265U JP S62203265 U JPS62203265 U JP S62203265U JP 9049186 U JP9049186 U JP 9049186U JP 9049186 U JP9049186 U JP 9049186U JP S62203265 U JPS62203265 U JP S62203265U
Authority
JP
Japan
Prior art keywords
chamber
sputtering device
ionization mechanism
gas
anode
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP9049186U
Other languages
English (en)
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP9049186U priority Critical patent/JPS62203265U/ja
Publication of JPS62203265U publication Critical patent/JPS62203265U/ja
Pending legal-status Critical Current

Links

Landscapes

  • Physical Vapour Deposition (AREA)
  • Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
JP9049186U 1986-06-16 1986-06-16 Pending JPS62203265U (xx)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP9049186U JPS62203265U (xx) 1986-06-16 1986-06-16

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9049186U JPS62203265U (xx) 1986-06-16 1986-06-16

Publications (1)

Publication Number Publication Date
JPS62203265U true JPS62203265U (xx) 1987-12-25

Family

ID=30950405

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9049186U Pending JPS62203265U (xx) 1986-06-16 1986-06-16

Country Status (1)

Country Link
JP (1) JPS62203265U (xx)

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