JPS62202949A - Expanding method for clean unit - Google Patents
Expanding method for clean unitInfo
- Publication number
- JPS62202949A JPS62202949A JP61046808A JP4680886A JPS62202949A JP S62202949 A JPS62202949 A JP S62202949A JP 61046808 A JP61046808 A JP 61046808A JP 4680886 A JP4680886 A JP 4680886A JP S62202949 A JPS62202949 A JP S62202949A
- Authority
- JP
- Japan
- Prior art keywords
- space
- unit
- clean
- clean unit
- air
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000000034 method Methods 0.000 title claims abstract description 8
- 230000003749 cleanliness Effects 0.000 claims abstract description 30
- 238000004519 manufacturing process Methods 0.000 abstract description 29
- 230000001105 regulatory effect Effects 0.000 abstract 1
- 238000005192 partition Methods 0.000 description 5
- 239000004065 semiconductor Substances 0.000 description 3
- 238000010586 diagram Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 1
- 238000005086 pumping Methods 0.000 description 1
- 239000003566 sealing material Substances 0.000 description 1
Classifications
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F24—HEATING; RANGES; VENTILATING
- F24F—AIR-CONDITIONING; AIR-HUMIDIFICATION; VENTILATION; USE OF AIR CURRENTS FOR SCREENING
- F24F3/00—Air-conditioning systems in which conditioned primary air is supplied from one or more central stations to distributing units in the rooms or spaces where it may receive secondary treatment; Apparatus specially designed for such systems
- F24F3/12—Air-conditioning systems in which conditioned primary air is supplied from one or more central stations to distributing units in the rooms or spaces where it may receive secondary treatment; Apparatus specially designed for such systems characterised by the treatment of the air otherwise than by heating and cooling
- F24F3/16—Air-conditioning systems in which conditioned primary air is supplied from one or more central stations to distributing units in the rooms or spaces where it may receive secondary treatment; Apparatus specially designed for such systems characterised by the treatment of the air otherwise than by heating and cooling by purification, e.g. by filtering; by sterilisation; by ozonisation
- F24F3/163—Clean air work stations, i.e. selected areas within a space which filtered air is passed
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F24—HEATING; RANGES; VENTILATING
- F24F—AIR-CONDITIONING; AIR-HUMIDIFICATION; VENTILATION; USE OF AIR CURRENTS FOR SCREENING
- F24F3/00—Air-conditioning systems in which conditioned primary air is supplied from one or more central stations to distributing units in the rooms or spaces where it may receive secondary treatment; Apparatus specially designed for such systems
- F24F3/12—Air-conditioning systems in which conditioned primary air is supplied from one or more central stations to distributing units in the rooms or spaces where it may receive secondary treatment; Apparatus specially designed for such systems characterised by the treatment of the air otherwise than by heating and cooling
- F24F3/16—Air-conditioning systems in which conditioned primary air is supplied from one or more central stations to distributing units in the rooms or spaces where it may receive secondary treatment; Apparatus specially designed for such systems characterised by the treatment of the air otherwise than by heating and cooling by purification, e.g. by filtering; by sterilisation; by ozonisation
- F24F3/167—Clean rooms, i.e. enclosed spaces in which a uniform flow of filtered air is distributed
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Combustion & Propulsion (AREA)
- Mechanical Engineering (AREA)
- General Engineering & Computer Science (AREA)
- Ventilation (AREA)
Abstract
Description
【発明の詳細な説明】
〈産業上の利用分野〉
この発明は、生産装置などを収納する空間を高い空気清
浄度に維持するクリーンユニットのクリーンゾーンを拡
張するクリーンユニットの拡張方法に関する。DETAILED DESCRIPTION OF THE INVENTION <Industrial Application Field> The present invention relates to a clean unit expansion method for expanding the clean zone of a clean unit that maintains high air cleanliness in a space housing production equipment and the like.
〈従来の技術〉
従来、清浄空間室内において、作業通路域よりも高い空
気清浄度を有する高清浄度空間に半導体等を生産する機
器を設置しなければならない。このため、従来のトンネ
ル型の高清浄度空間を形成するクリーンユニットとして
は第３図に示すものがある。このクリーンユニット１．
Ｎよ、清浄空間室２の略中央部の作業通路域３を挟んで
左右に対向して清浄空間室２の天井面２ａにそれぞれ設
置されている。そして、上記クリーンユニットｌは、高
性能フィルタ５の下方に高清浄度空間６をトンネル状に
形成し、この高清浄度空間６に生産袋ｒ１１７を収納し
て、高性能フィルタ５から下方の高清浄度空間６に向け
て清浄空気を吹き出し、高清浄度空間６を作業通路域３
よりも高い空気清浄度に維持している。<Prior Art> Conventionally, equipment for producing semiconductors and the like must be installed in a high-cleanliness space, which has a higher air cleanliness than the work passage area, in a clean space room. For this reason, a conventional clean unit that forms a tunnel-type high-cleanliness space is shown in FIG. 3. This clean unit 1.
N, they are installed on the ceiling surface 2a of the clean space chamber 2, facing each other on the left and right with the work passage area 3 in the approximate center of the clean space chamber 2 in between. The clean unit l forms a tunnel-like high cleanliness space 6 below the high-performance filter 5, stores the production bag r117 in this high-cleanliness space 6, and carries out the high-performance filter 5 downward from the high-performance filter 5. Blows out clean air toward the cleanliness space 6, converting the high cleanliness space 6 into the work passage area 3.
It maintains a higher level of air cleanliness.
ところが、上記従来のクリーンユニットでは、一度所定
位置に取付けられると、それ以後は高清浄度空間６の左
右方向の幅寸法が固定されるため、半導体などの生産工
程を変更する場合や生産装置７の大型化を図る場合、特
に生産装置７が幅方向に大きくなる場合、高清浄度空間
６に収納された生産装置７が高清浄度空間６からはみ出
て、低い空気清浄度の作業通路域３に突出する・ことに
なり、生産装置７の雰囲気全体を高い空気清浄度に維持
できないという問題がある。However, in the conventional clean unit described above, once it is installed in a predetermined position, the horizontal width dimension of the high cleanliness space 6 is fixed, so when changing the production process of semiconductors or the like, or when changing the production equipment 7 When increasing the size of the production equipment 7, especially when the production equipment 7 becomes larger in the width direction, the production equipment 7 housed in the high cleanliness space 6 protrudes from the high cleanliness space 6, resulting in the work passage area 3 having low air cleanliness. As a result, there is a problem that the entire atmosphere of the production equipment 7 cannot be maintained at a high level of air cleanliness.
また生産工程の変更あるいは生産装置７の大型化ζこ応
じてそれに対応する大きさのクリーンユニット璽を用い
ることも考えられるが、この場合には、その都度、クリ
ーンユニット１の取替工事が必要と°なって、その取替
工事に手間と費用を要するという問題がある。Additionally, depending on the change in the production process or the increase in the size of the production equipment 7, it may be possible to use a clean unit seal of a corresponding size, but in this case, it is necessary to replace the clean unit 1 each time. Therefore, there is a problem in that the replacement work requires time and money.
〈発明の目的〉
そこで、この発明の目的は、生産工程の変更および生産
装置の大型化をした場合に、必要に応じた大きさの高清
浄度空間を簡単かつ安価に拡張できて、生産装置を常に
高清浄度空間に収納でき、生産装置の雰囲気を高い空気
清浄度に維持できるクリーンユニットの拡張方法を提供
することにある。<Purpose of the Invention> Therefore, the purpose of the present invention is to easily and inexpensively expand a highly clean space according to the size of the production equipment when changing the production process or increasing the size of the production equipment. To provide a method for expanding a clean unit that can always store the air in a highly clean space and maintain the atmosphere of production equipment at a high level of air cleanliness.
〈発明の構成ン
上記目的を達成するために、この発明のクリーンユニッ
トの拡張方法は、清浄空間室内において、作業通路域の
空気清浄度よりもさらに高い空気清浄度を有するトンネ
ル状の高清浄度空間を形成するために高性能フィルタか
ら清浄空気を下方に吹き出すようにしたクリーンユニッ
トを拡張するクリーンユニットの拡張方法であつて、上
記クリーンユニットの高性能フィルタ上の空間の作業通
路域に面する前端部に接続口を設け、上記クリーンユニ
ットの作業通路域側に増設ユニットを設け、上記クリー
ンユニットの高性能フィルタ上の空間に上記増設ユニッ
トの高性能フィルタ上の空間を上記接続口により接続し
て高清浄度空間を拡張したことを特徴とする。<Structure of the Invention> In order to achieve the above object, the clean unit expansion method of the present invention provides a tunnel-like high cleanliness system having an air cleanliness higher than that of the work passage area in a clean space room. A clean unit expansion method for expanding a clean unit configured to blow clean air downward from a high-performance filter to form a space, the clean unit facing a working passage area of the space above the high-performance filter of the clean unit. A connection port is provided at the front end, an extension unit is provided on the work passage area side of the clean unit, and the space above the high performance filter of the extension unit is connected to the space above the high performance filter of the clean unit through the connection port. It is characterized by an expanded high-cleanliness space.
〈実施例〉
第１図は拡張後のクリーンユニットを示す概略図、第２
図は拡張前のクリーンユニットを示す図である。第２図
において、１０は清浄空間室、Ｉ！は清ｎ−空間室」０
の略中央部に位置する作業通路域、１２は作業通路域１
１をはさんで左右に対向して清浄空間室！Ｏの天井面１
０ａに設置される１対のクリーンユニットのうちの右側
のクリーンユニットである。ｍ２図中一点鎖線Ａで示す
面を対称面にして上記作業通路域１１と１対のクリーン
ユニット１２．１２と全く同じものが紙面と直交する方
向に幾νりも配列されている。また、１４は清浄空間室
１０の天井面１０ａの背面に設置され、空゛気調和装ｅ
１（図示せず）からの空気を清浄化して作業通路域２に
送るフィルタユ千ット、１６はグレーチング１フ上に設
置され、かつクリーンユニット１２の下方の高清浄度空
間１８内に収納された半導体等の生産装置である。<Example> Figure 1 is a schematic diagram showing the clean unit after expansion, Figure 2 is a schematic diagram showing the clean unit after expansion.
The figure shows the clean unit before expansion. In FIG. 2, 10 is a clean space chamber, I! ``Sei n-space room'' 0
A working passage area 12 is located approximately in the center of the working passage area 1.
Clean space rooms facing left and right across 1! O ceiling surface 1
This is the right clean unit of the pair of clean units installed at 0a. A number of units exactly the same as the working passage area 11 and the pair of clean units 12, 12 are arranged in a direction perpendicular to the plane of the paper, with the plane indicated by the dashed line A in the drawing as a plane of symmetry. Further, reference numeral 14 is installed at the back of the ceiling surface 10a of the clean space room 10, and an air conditioner e.
A filter unit 16 is installed on the grating 1 and housed in the high cleanliness space 18 below the clean unit 12. This is production equipment for semiconductors, etc.
上記クリーンユニット１２は、生産ラインに沿ワて長い
トンネル状に形成された箱型のケーシング７０内にファ
ン２Ｂと高性能フィルタ２６とダンパ３３とを収納して
いる。上記クリーンユニット１２のケーシング７０の前
端部としての前壁２３には、作業通路域Ｉｔに通じる矩
形の接続口２４゜２４・・・を生産ラインに沿って互い
に一定間隔をあけて複数個設けている。上記クリーンユ
ニット１２の接続口２４には四角形の盲［４４をボルト
（図示せず）などにより取り付けている。この盲板４４
を覆うように化粧ＦＬ４５を作業通路域１１側から設け
ている。前壁２３と盲板４４との間は空気が漏れないよ
うにシール材などが分岐されている。The clean unit 12 houses a fan 2B, a high-performance filter 26, and a damper 33 in a box-shaped casing 70 formed in a long tunnel shape along the production line. In the front wall 23 as the front end of the casing 70 of the clean unit 12, a plurality of rectangular connection ports 24, 24, . There is. A rectangular blind [44] is attached to the connection port 24 of the clean unit 12 with a bolt (not shown) or the like. This blind board 44
A makeup FL 45 is provided from the working passage area 11 side so as to cover the area. A sealing material or the like is branched between the front wall 23 and the blind plate 44 to prevent air from leaking.
上記ケーシング７０の底面７０ａは下方に開口されてい
て、この開口部に高性能フィルタ２６．２６・・・を生
産ラインに沿って複数個設置している。上記ケーシング
７０内の後部には空気を圧送するファン２８を収納した
ファン室２９を設け、上記ファン室２９の上面２９ａに
は空気吸込口３１を設ける一方、ファン室２９の下面２
９ｂにはリターン空気吸込口３２を設けている。高性能
フィルタ２６とファン室２９との間にはバヅブル８０を
設けている。また高性能フィルタ２６とファン室２９と
の境に位置するケーシング７０の底面７０ａには、右隔
壁１３の上端を取り付けて右隔壁を下方に吊り下げてい
る。上記右隔壁１３の下端とグレーチング１７との間に
通気口３４を形成している。The bottom surface 70a of the casing 70 is opened downward, and a plurality of high performance filters 26, 26, . . . are installed along the production line in this opening. A fan chamber 29 housing a fan 28 for pumping air is provided in the rear part of the casing 70, and an air suction port 31 is provided in the upper surface 29a of the fan chamber 29, while the lower surface 29 of the fan chamber 29
A return air suction port 32 is provided at 9b. A bubble 80 is provided between the high performance filter 26 and the fan chamber 29. Further, the upper end of the right partition wall 13 is attached to the bottom surface 70a of the casing 70 located at the boundary between the high performance filter 26 and the fan chamber 29, and the right partition wall is suspended downward. A vent hole 34 is formed between the lower end of the right partition wall 13 and the grating 17.
この右隔壁１３により、クリーンユニット１２の高清浄
度空間Ｉ８とサービススペース２Ｉとが分離されている
。そして、上記ファン室２９の空気吸込口３１を通して
空気調和装置からの空気をダクトを介して（図示せず）
ファン室２９に導入すると共に、リターン空気吸込口３
２を通して高清浄度空間１８、右隔壁Ｉ３の下部の通気
口３４からのリターン空気をファン室２９に導入してい
る。This right partition wall 13 separates the high cleanliness space I8 of the clean unit 12 from the service space 2I. Then, the air from the air conditioner is passed through the air suction port 31 of the fan chamber 29 through a duct (not shown).
In addition to introducing the air into the fan chamber 29, the return air suction port 3
2, return air from the high cleanliness space 18 and the vent 34 at the bottom of the right bulkhead I3 is introduced into the fan chamber 29.
一方、クリーンユニット１２の前壁２３の下端には下方
に向かって吊り下げた左隔壁２０を取り付けている。On the other hand, a left partition wall 20 suspended downward is attached to the lower end of the front wall 23 of the clean unit 12.
しかして、第２図に示すクリーンユニットの拡張前の状
態から次のようにして第１図に示すクリーンユニットの
拡張した状態にする。Thus, the state before expansion of the clean unit shown in FIG. 2 is changed to the expanded state of the clean unit shown in FIG. 1 in the following manner.
第１図において、クリーンユニット１２の接続口２４の
ファン２８側にダンパ４１とロッド４３を取り付１片つ
いで接続口２４の作業通路域１１側に生産装置１６の大
きさに応じた大きさの増設ユニット！５をボルトで増設
して、各ユニット１゜２、Ｉ５の高性能フィルタ２６．
３８の下方の高清浄度空間Ｉ８を拡張し、この高清浄度
空間１８内に生産装置１６を収める。この増設ユニット
１５は、箱型のケーシング３７の右壁１５ａを開口し、
下面１５ｂに高性能フィルタ３８を設置してなる。In FIG. 1, a damper 41 and a rod 43 are attached to the fan 28 side of the connection port 24 of the clean unit 12, and a damper 41 and a rod 43 are attached to the work passage area 11 side of the connection port 24, and a damper 43 of a size corresponding to the size of the production equipment 16 is attached to the work passage area 11 side of the connection port 24. Expansion unit! 5 with bolts, each unit 1゜2, I5 high performance filter 26.
The high cleanliness space I8 below 38 is expanded, and the production equipment 16 is housed within this high cleanliness space 18. This extension unit 15 opens the right wall 15a of the box-shaped casing 37,
A high performance filter 38 is installed on the lower surface 15b.
このケーシング３７の天井面３５の一端をクリーンユニ
ット■２の前壁２３の上部の型ｊｌｌｊ１８０にボルト
（図示せず）などで連結する。そして、上記増設ユニッ
ト１５の高性能フィルタ３８の上部の空間４７とフィル
タユニット１２の高性能フィルタ２６の上部の空間２７
が接続口２４を介して連通される。またクリーンユニッ
トＩ２の各接続口２４．２４・・・のファン２８側には
、ファン２８からの空気の流量をクリーンユニット１２
側と増設ユニット１５側とに配分するダンパ４ ｆ、４
１・・をそれぞれ設ける。このダンパ４１は前壁２３に
着脱自在にボルトなどで取り付けられる。上記ダンパ４
にの開度を調整するハンドル４２は、傘歯車５０を介し
てダンパ４１からケーシング７０の天井面７０ａ近傍に
沿ってサービススペース２１の上部まで延びるロッド４
８３の先端に接続され、手動で操作できるようになって
いる。上記ロッド４３はダンパ４Ｉから容易に取り外せ
るようにダンパ４１にネジなどで連結されている。One end of the ceiling surface 35 of this casing 37 is connected to the mold 180 on the upper part of the front wall 23 of the clean unit 2 with a bolt (not shown) or the like. A space 47 above the high-performance filter 38 of the expansion unit 15 and a space 27 above the high-performance filter 26 of the filter unit 12.
are communicated via the connection port 24. In addition, the flow rate of air from the fan 28 is connected to the fan 28 side of each connection port 24, 24... of the clean unit I2.
Damper 4 f, 4 distributed between the side and the expansion unit 15 side
1... are provided respectively. This damper 41 is detachably attached to the front wall 23 with bolts or the like. Above damper 4
The handle 42 that adjusts the opening degree of the rod 4 extends from the damper 41 to the upper part of the service space 21 along the vicinity of the ceiling surface 70a of the casing 70 via the bevel gear 50.
It is connected to the tip of 83 and can be operated manually. The rod 43 is connected to the damper 41 with a screw or the like so that it can be easily removed from the damper 4I.
そして、上記高清浄度空間１８に生産装置１６を収納し
て、クリーンユニット１２側と増設ユニット１５側に所
定流出の空気が供給されるようにダンパ４１の１１０度
をハンドル４２によりｇ、ｖ整する。Then, the production equipment 16 is housed in the high cleanliness space 18, and the damper 41 is adjusted by g and v at 110 degrees with the handle 42 so that a predetermined outflow of air is supplied to the clean unit 12 side and the expansion unit 15 side. do.
その後、ファン２８を起動して高性能フィルタ２６．３
８から下方に高清浄化した清浄空気を生産装置１６に向
けて送り、生産装置■６の雰囲気全体を高い空気清浄度
に維持する。After that, the fan 28 is started and the high performance filter 26.3
Highly purified clean air is sent downward from 8 toward the production equipment 16 to maintain the entire atmosphere of the production equipment 6 at a high level of air cleanliness.
このように、クリーンユニットＩ２の前壁に増設ユニッ
ト１５を接続して両者を接続口２４で接続するだけで、
簡単に高清浄度空ｕ１１が拡張できるのである。In this way, simply by connecting the extension unit 15 to the front wall of the clean unit I2 and connecting both through the connection port 24,
The high cleanliness space u11 can be easily expanded.
一方、幅寸法の小さい生産装置１６の場合には、第２図
に示すように、既設のクリーンユニット１２の前壁２３
の接続口２４から増設ユニット１５とダンパ４１とロッ
ド４３を取り外して接続口２４に盲板４４および化粧板
４５をボルトで取り付け、高性能フィルタ２６の下方の
高清浄度空間１８に生産装置１６を収納する。On the other hand, in the case of the production equipment 16 having a small width dimension, as shown in FIG.
Remove the expansion unit 15, damper 41, and rod 43 from the connection port 24, attach the blind plate 44 and decorative plate 45 to the connection port 24 with bolts, and install the production equipment 16 in the high-cleanliness space 18 below the high-performance filter 26. Store it.
このように、この方法によれば生産装置１６の幅寸法に
応じて、既設のクリーンユニット１２に適宜な大きさの
増設ユニット１５を簡単かつ安価に増設できる。また、
生産工程を変更したりする場合、その変更に応じて高清
浄度空間１８を任意の大きさに拡大することができる。In this manner, according to this method, it is possible to easily and inexpensively add an appropriate size extension unit 15 to the existing clean unit 12 according to the width dimension of the production device 16. Also,
When changing the production process, the high cleanliness space 18 can be expanded to an arbitrary size according to the change.
〈発明の効果〉
以上より明らかなように、この発明によれば、クリーン
ユニットの高性能フィルタ上の空間の作業通路域に面す
る前端部に接続口を設け、上記クリーンユニットの作業
通路域側に増設ユニットを設け、上記クリーンユニット
の高性能フィルタ上の空間に上記増設ユニットの高性能
フィルタ上の空間を上記接続口により接続しているので
、既設のクリーンユニットを用いて高性能フィルタの下
方の高清浄度空間を適切な大きさに簡単、安価に拡張で
きる。またこの発明によれば、クリーンユニットと増設
ユニットとを接続口を介して接続できるようにしている
ので、クリーンユニットを取り付は後であっても、その
まま、そのクリーンユニットと増設ユニットとを接続口
で接続するだけで高清浄度空間を簡単に拡張できる。ま
たクリーンユニットに増設ユニットを接続するという簡
単な構造で高清浄度空間を拡張できるようにしているの
で、従来のクリーンユニットと全く同様に取り扱い操作
することができる。<Effects of the Invention> As is clear from the above, according to the present invention, a connection port is provided at the front end facing the working passage area of the space above the high-performance filter of the clean unit, and the connection port is provided on the working passage area side of the clean unit. An extension unit is installed at A highly clean space can be easily and inexpensively expanded to an appropriate size. Further, according to this invention, the clean unit and the extension unit can be connected through the connection port, so even if the clean unit is installed later, the clean unit and the extension unit can be connected as is. You can easily expand your high-cleanliness space just by connecting with your mouth. In addition, the high cleanliness space can be expanded with the simple structure of connecting an extension unit to the clean unit, so it can be handled and operated in exactly the same way as a conventional clean unit.
第１図はこの発明の一実施例を示す概略断面図、第２図
は上記実施例の増設ユニットを取り外した状態を示す一
部断面図、第３図は従来例を示す概略断面図である。
ＩＯ・・・清浄空間室、２・・・作業通路域、Ｉ２・・
・クリーンユニット、１５・・・増設ユニット、１６・
・・生産装置、１８・・・高清浄度空間、２４・・・接
続口、２６．３８・・・高性能フィルタ、２７．４７・
・・空間。FIG. 1 is a schematic sectional view showing an embodiment of the present invention, FIG. 2 is a partial sectional view showing the above embodiment with the extension unit removed, and FIG. 3 is a schematic sectional view showing a conventional example. . IO...Clean space room, 2...Work passage area, I2...
・Clean unit, 15... Expansion unit, 16・
・・Production equipment, 18・High cleanliness space, 24・Connection port, 26.38・High performance filter, 27.47・
··space.
Claims (1)
よりもさらに高い空気清浄度を有するトンネル状の高清
浄度空間を形成するために高性能フィルタから清浄空気
を下方に吹き出すようにしたクリーンユニットであって
、 上記クリーンユニットの高性能フィルタ上の空間の作業
通路域に面する前端部に接続口を設け、上記クリーンユ
ニットの作業通路域側に増設ユニットを設け、上記クリ
ーンユニットの高性能フィルタ上の空間に上記増設ユニ
ットの高性能フィルタ上の空間を上記接続口により接続
して高清浄度空間を拡張したことを特徴とするクリーン
ユニットの拡張方法。(1) Clean space A clean room in which clean air is blown downward from a high-performance filter to form a tunnel-shaped high-cleanliness space with an air cleanliness higher than that of the work passage area. A connection port is provided at the front end facing the work passage area of the space above the high-performance filter of the clean unit, an extension unit is provided on the work passage area side of the clean unit, and the high-performance clean unit A method for expanding a clean unit, characterized in that the high cleanliness space is expanded by connecting the space above the high-performance filter of the expansion unit to the space above the filter through the connection port.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP61046808A JPS62202949A (en) | 1986-03-03 | 1986-03-03 | Expanding method for clean unit |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP61046808A JPS62202949A (en) | 1986-03-03 | 1986-03-03 | Expanding method for clean unit |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS62202949A true JPS62202949A (en) | 1987-09-07 |
| JPH0319456B2 JPH0319456B2 (en) | 1991-03-15 |
Family
ID=12757629
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP61046808A Granted JPS62202949A (en) | 1986-03-03 | 1986-03-03 | Expanding method for clean unit |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS62202949A (en) |
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6668565B1 (en) | 2002-04-12 | 2003-12-30 | American Power Conversion | Rack-mounted equipment cooling |
| US6859366B2 (en) | 2003-03-19 | 2005-02-22 | American Power Conversion | Data center cooling system |
| US7173820B2 (en) | 2003-03-19 | 2007-02-06 | American Power Conversion Corporation | Data center cooling |
| US7259963B2 (en) | 2004-12-29 | 2007-08-21 | American Power Conversion Corp. | Rack height cooling |
| US20100022179A1 (en) * | 2007-10-26 | 2010-01-28 | Katsuhito Uematsu | Clean room |
| US7841199B2 (en) | 2005-05-17 | 2010-11-30 | American Power Conversion Corporation | Cold aisle isolation |
-
1986
- 1986-03-03 JP JP61046808A patent/JPS62202949A/en active Granted
Cited By (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6668565B1 (en) | 2002-04-12 | 2003-12-30 | American Power Conversion | Rack-mounted equipment cooling |
| US8432690B2 (en) | 2003-03-19 | 2013-04-30 | American Power Conversion Corporation | Data center cooling |
| US6859366B2 (en) | 2003-03-19 | 2005-02-22 | American Power Conversion | Data center cooling system |
| US7173820B2 (en) | 2003-03-19 | 2007-02-06 | American Power Conversion Corporation | Data center cooling |
| US8780555B2 (en) | 2003-03-19 | 2014-07-15 | American Power Conversion Corporation | Data center cooling |
| US7881057B2 (en) | 2003-03-19 | 2011-02-01 | American Power Conversion Corporation | Data center cooling |
| US7259963B2 (en) | 2004-12-29 | 2007-08-21 | American Power Conversion Corp. | Rack height cooling |
| US7403391B2 (en) | 2004-12-29 | 2008-07-22 | American Power Conversion Corporation | Rack height cooling |
| US7841199B2 (en) | 2005-05-17 | 2010-11-30 | American Power Conversion Corporation | Cold aisle isolation |
| US8156753B2 (en) | 2005-05-17 | 2012-04-17 | American Power Conversion Corporation | Cold aisle isolation |
| US7992402B2 (en) | 2005-05-17 | 2011-08-09 | American Power Conversion Corporation | Cold aisle isolation |
| US8545296B2 (en) * | 2007-10-26 | 2013-10-01 | Panasonic Corporation | Clean room |
| US20100022179A1 (en) * | 2007-10-26 | 2010-01-28 | Katsuhito Uematsu | Clean room |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0319456B2 (en) | 1991-03-15 |
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