JPS62197917A - Magnetic recording medium - Google Patents

Magnetic recording medium

Info

Publication number
JPS62197917A
JPS62197917A JP3921486A JP3921486A JPS62197917A JP S62197917 A JPS62197917 A JP S62197917A JP 3921486 A JP3921486 A JP 3921486A JP 3921486 A JP3921486 A JP 3921486A JP S62197917 A JPS62197917 A JP S62197917A
Authority
JP
Japan
Prior art keywords
film
protective film
hard material
hard
soft
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP3921486A
Other languages
Japanese (ja)
Inventor
Masaaki Futamoto
二本 正昭
Sanehiro Kudo
實弘 工藤
Yukio Honda
幸雄 本多
Shinichiro Saito
斎藤 真一郎
Kazuyoshi Yoshida
吉田 和悦
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Maxell Ltd
Original Assignee
Hitachi Ltd
Hitachi Maxell Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd, Hitachi Maxell Ltd filed Critical Hitachi Ltd
Priority to JP3921486A priority Critical patent/JPS62197917A/en
Publication of JPS62197917A publication Critical patent/JPS62197917A/en
Pending legal-status Critical Current

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  • Magnetic Record Carriers (AREA)
  • Manufacturing Of Magnetic Record Carriers (AREA)

Abstract

PURPOSE:To provide a titled medium which has excellent wear resistance and has excellent slipperiness with a head by forming a protective film of discontinuous films consisting of a hard material on a magnetic film formed on a nonmagnetic substrate and a soft material disposed on the discontinuous parts thereof. CONSTITUTION:The composite film consisting of the soft material 4 and hard material 5 is used as the protective film. The composite film refers not to the laminated film consisting of the hard material 5 and the soft material 4 but to the case in which the part of the hard material 5 and the part of the soft material 4 are alternated in the intra-surface direction; for example, to such a case in which the spacing between the part of the network-like hard material 5 is filled with the soft material 4. A material having >=1,000kg/mm<2> Vickers hardness is preferable as the hard material 5. Any material which has the hardness value smaller than the hardness value of the hard material 5 to be combined is usable as the soft material 4.

Description

【発明の詳細な説明】 〔産業上の利用分野〕 本発明は磁気記録媒体の改良に関する。[Detailed description of the invention] [Industrial application field] The present invention relates to improvements in magnetic recording media.

〔発明が解決しようとする問題点〕[Problem that the invention seeks to solve]

従来より高記録密度を実現するために、連続磁性膜を磁
気記録媒体に用いる研究開発が進められている。これら
の磁気記録媒体は高分子フィルム。
BACKGROUND ART In order to achieve higher recording density than ever before, research and development on using continuous magnetic films in magnetic recording media has been progressing. These magnetic recording media are polymer films.

アルミニウム、ガラスなどの非磁性材料の基板上に、F
e、Go、Ni等の強磁性金属またはこれらの元素を主
成分とする合金や化合物を主体とする磁性体の薄膜を真
空蒸着法、スパッタリング法、イオンブレーティング法
、電気メツキ法、化学メッキ法等で形成して、製造して
いる。この磁性膜表面に記録再生用のヘッドを直接接触
させると、磁性膜表面が摩耗したり、ヘッドも損傷し易
いという問題がある。
F on a substrate made of non-magnetic material such as aluminum or glass.
Vacuum deposition, sputtering, ion blasting, electroplating, and chemical plating are used to deposit thin films of magnetic materials mainly made of ferromagnetic metals such as e, Go, and Ni, or alloys and compounds containing these elements as main components. It is manufactured by forming it with etc. If a recording/reproducing head is brought into direct contact with the surface of this magnetic film, there is a problem in that the surface of the magnetic film is easily worn and the head is easily damaged.

このような点を解決する手段として、磁性膜表面に5i
ns、 AQxOs、 S i C,T i Cなどの
硬質材料から成る保護層を形成したり(特開昭50−1
04602、特開昭58−130437) 、あるいは
A u 。
As a means to solve this problem, 5i is applied to the surface of the magnetic film.
ns, AQxOs, S i C, T i C, etc.
04602, JP-A-58-130437), or A u.

Pt、Rh、Pd、AQ等の金属膜を保護層として形成
する手法(特開昭53−40505.特開昭57−17
6537)などが提案されている。
Method of forming a metal film such as Pt, Rh, Pd, AQ, etc. as a protective layer (JP-A-53-40505; JP-A-57-17
6537) etc. have been proposed.

〔発明が解決しようとする問題点〕。[Problem that the invention seeks to solve].

本発明者らの実験によると金属系の保護膜の場合は耐摩
耗性が十分ではなく、また化合物系の硬質材料の場合は
もろくて衝撃力に対して弱く、またヘッドを損傷させ易
いといった問題点があることがわかった。
According to experiments conducted by the inventors, metal-based protective films do not have sufficient wear resistance, and compound-based hard materials are brittle and weak against impact forces, and can easily damage the head. It turns out that there is a point.

本発明はこのような問題点に鑑み成されたものであり、
保護膜の耐摩耗性とヘッドに対する滑性を改善すること
を目的とする。
The present invention has been made in view of these problems,
The purpose is to improve the wear resistance of the protective film and the slipperiness of the head.

〔問題点を解決するための手段〕[Means for solving problems]

保護膜に必要な条件は、耐蝕性があって磁性膜を保護す
ることに加えて、耐摩耗性があること、磁気ヘッドに対
して滑性があること、さらに液体潤滑剤を塗布して滑性
を更に高める場合には潤滑剤に対して親和性があること
、および電磁変換特性の低下を抑えるために膜厚はでき
るだけ小さいこと(2000Å以下、好ましくは100
0Å以下)等である。
The protective film must have corrosion resistance to protect the magnetic film, as well as wear resistance, lubricity to the magnetic head, and a liquid lubricant to ensure lubricity. In order to further improve the properties, the film thickness must be as small as possible (2000 Å or less, preferably 100 Å or less, to prevent deterioration of electromagnetic conversion characteristics.
0 Å or less).

A Q zOs、 5ift、 Zr0z、 Ties
などの酸化物、S iC,BaC,TiC,WC,Zr
Cなどの炭化物、5iaNa、 T i N 、 Z 
r Nなどの窒化物はいずれも極めて硬い材料であり、
耐摩耗性が大きい。
A Q zOs, 5ift, Zr0z, Ties
oxides such as SiC, BaC, TiC, WC, Zr
Carbides such as C, 5iaNa, T i N, Z
All nitrides such as rN are extremely hard materials,
High wear resistance.

しかし、逆にヘッドを摩耗させたり、衝撃力に弱いとい
った問題点がある。一方、Sn、Pd*Sb、Bi、 
 In、Au、Ag、Pt、AQ。
However, there are problems with the head being worn out and being weak against impact forces. On the other hand, Sn, Pd*Sb, Bi,
In, Au, Ag, Pt, AQ.

Zn、Cuなどの金属は軟かいためヘッドを傷めること
もなく、衝撃力にも弱い反面、耐摩耗性が十分でない。
Since metals such as Zn and Cu are soft, they do not damage the head and are weak against impact forces, but they do not have sufficient wear resistance.

Z n S 、 5bzSa、 Cr S 、 No2
s。
ZnS, 5bzSa, CrS, No2
s.

Zn5e、 CdSe、 B N 、などの化合物材料
やステアリン酸、あるいは高分子材料も軟質材料であり
、前記の金属と同様の性質を有す0本発明者らの実験に
よると軟質材料と硬質材料の両者から成る複合膜を保護
膜として使用することにより、両者のメリットが組み合
わさり、保護膜として極めて優れた性質を示すことが明
らかとなった。ここでいう複合膜とは、硬質材料と軟質
材料の積層膜ではなく、膜を上方から見たとき、面内方
向で硬質材料の部分と軟質材料の部分が交互になってい
る場合を意味し、例えば、ネットワーク状の硬質材料が
一部分の間が軟質材料で埋められている様な場合を示す
Compound materials such as Zn5e, CdSe, BN, stearic acid, and polymeric materials are also soft materials and have properties similar to those of the metals mentioned above.According to experiments by the present inventors, the difference between soft and hard materials is It has been revealed that by using a composite film consisting of both as a protective film, the advantages of both are combined, and the film exhibits extremely excellent properties as a protective film. A composite film here is not a laminated film of hard and soft materials, but refers to a film in which hard material parts and soft material parts alternate in the in-plane direction when the film is viewed from above. , for example, shows a case where a part of a network-like hard material is filled with a soft material.

硬質材料としては、ビッカス硬度で1000kg/am
”以上の材料が好ましい、この値未満の硬度値になると
十分な耐摩耗性が得られ難くなる。このような材料の一
例はすでに示したが、これ以外にも多くの材料が用いら
れる。軟質材料としては、組み合わせる硬質材料の硬度
値より小さい硬度値をもつものであればよいが、望まし
くは両者の硬度値の差が100kg/mm2以上あるも
のが好ましく、300kg/■2以上あるものがより好
ましい、また硬質材料も軟質材料も非磁性材料であるこ
とが好ましい。
As a hard material, Vickers hardness is 1000 kg/am
"Materials with a hardness value of less than this value are preferred; if the hardness value is less than this value, it becomes difficult to obtain sufficient wear resistance. An example of such a material has already been shown, but many other materials can be used. The material may be any material as long as it has a hardness value smaller than that of the hard material to be combined, but it is preferable that the difference in hardness value between the two is 100 kg/mm2 or more, more preferably 300 kg/mm2 or more. Preferably, both the hard and soft materials are non-magnetic materials.

保護膜中の硬質材料の比率、つまり膜を上がら見たとき
の面積比は10〜90%の範囲であることが好ましい、
この比率は保護膜の実用的な部分がこの範囲内であれば
よい、すなわち、保護膜の上部に軟質材料のみの層があ
っても、軟質材料の部分はすみやかに摩耗するので、そ
の下の実用的に保護膜として作用する部分が、上記の如
き比率であればよい。
The ratio of the hard material in the protective film, that is, the area ratio when looking at the film from above, is preferably in the range of 10 to 90%.
This ratio is sufficient as long as the practical part of the protective film is within this range.In other words, even if there is a layer of only soft material on the top of the protective film, the soft material part will quickly wear out, so the layer below it will be It is sufficient that the portion that practically functions as a protective film has the above-mentioned ratio.

保護膜の膜JOは、50〜2000人であるのが好まし
く、100〜1000人の範囲がより好ましい。
The film JO of the protective film preferably ranges from 50 to 2000 people, more preferably from 100 to 1000 people.

この様な構造を持つ膜は、例えば、以下の原理に基づい
て実現することができる。
A film having such a structure can be realized, for example, based on the following principle.

すなわち、基板上に真空蒸着法やスパッタ法で膜を形成
する場合、膜形成の初期段階で、いわゆる島状構造とい
われる不連続な膜がまず形成される。島の大きさは、基
板の種類、膜材料や基板温度などの形成条件で変化する
が、20人〜10μm程度の範囲となり、これは形成条
件を適当に選ぶことによって任意にコントロールするこ
とができる。島状構造を持つ不連続膜が形成された段階
で異なった材料を蒸着すれば、基板が露出した部分にそ
の材料が付着することになる。島状の部分上部に付着し
た異種材料を研摩等の手段で除去すれば、孤立した島と
その間を埋める部分が互いに異質な材料から成る複合膜
を形成することができる。いずれか一方の材料を硬質材
料から選び、他方を軟質材料の中から選べば、目的の保
護膜を得ることができる。ただし、複合膜形成法は上述
の薄膜成長現像を応用した場合に限られるものではなく
、例えば半導体工業部門で広く用いられているフォトエ
ツチング、マスク蒸着などの手法を用いても良い。
That is, when a film is formed on a substrate by a vacuum evaporation method or a sputtering method, a discontinuous film having a so-called island structure is first formed in the initial stage of film formation. The size of the island varies depending on the formation conditions such as the type of substrate, film material, and substrate temperature, but it ranges from about 20 to 10 μm, and this can be arbitrarily controlled by appropriately selecting the formation conditions. . If a different material is deposited at the stage where a discontinuous film having an island-like structure is formed, that material will adhere to the exposed portions of the substrate. By removing the different materials attached to the tops of the island-like portions by means such as polishing, it is possible to form a composite film in which the isolated islands and the portions filling in between are made of different materials. If one of the materials is selected from hard materials and the other from soft materials, the desired protective film can be obtained. However, the method for forming a composite film is not limited to the case where the above-mentioned thin film growth and development is applied; for example, methods such as photoetching and mask vapor deposition, which are widely used in the semiconductor industry, may also be used.

〔作用〕[Effect]

本発明の保護膜は、耐摩耗性に優れ、かつヘッドに対し
滑性を有する。
The protective film of the present invention has excellent wear resistance and lubricity with respect to the head.

〔発明の実施例〕[Embodiments of the invention]

以下、本発明を実施例によって説明する。 Hereinafter, the present invention will be explained by examples.

実施例1 基板としてポリイミドフィルムを用いて、蒸着法および
スパッタ法によって、第1図に示す順序で磁気記録媒体
を作製した@ 10−’Torr以下に真空排気した蒸
着装置中でポリイミドフィルム(1)を200℃に加熱
して下地層(2)のGeを300人形成した後、磁性膜
(3)としてGo−と 23wt%c7を膜を2000人厚真空蒸着した。つい
で基板温度を室温付近まで下げて5n(4)をわずかに
蒸着した。このときSnは第1図(b)に示すようにM
2O0〜300人、高さ100〜300人の島状の不連
続膜となった。ついで、試料をスパッタ装置に移してA
nzOa(5)をI×10−”TorrA r雰囲気中
で高周波出力4 w / ai、基板温度100℃の条
件で200人厚形成しくC)に示す構造を得た。突出し
た表面をラッピングによって(d)に示す様に平担化し
、膜厚が200人のS n ji’A Q zOaから
成る保護膜を実現した。ここで軟質材料はSn、硬質材
料はA Q zOδである。
Example 1 A magnetic recording medium was manufactured using a polyimide film as a substrate by vapor deposition and sputtering in the order shown in FIG. was heated to 200° C. to form a Ge base layer (2) of 300 layers, and then a magnetic film (3) of Go- and 23 wt % C7 was vacuum-deposited to a thickness of 2000 layers. Then, the substrate temperature was lowered to around room temperature, and a small amount of 5n(4) was vapor-deposited. At this time, Sn is M as shown in FIG. 1(b).
It became an island-like discontinuous film with 200 to 300 people and a height of 100 to 300 people. Then, the sample was transferred to a sputtering device and A
The structure shown in C) was obtained by forming nzOa(5) in an I×10-” TorrAr atmosphere with a high frequency output of 4 w/ai and a substrate temperature of 100°C to obtain a structure shown in C). As shown in d), a protective film made of Sn ji'A Q zOa and having a film thickness of 200 was realized by flattening as shown in d). Here, the soft material is Sn and the hard material is A Q zOδ.

また比較試料として、保護膜を全く設けない磁気記録媒
体、蒸着法で形成した200人の厚のSnだけから成る
連続保護膜を設けた磁気記録媒体、スパッタ法で形成し
た200人厚のA Q zosだけから成る連続保N膜
を設けた磁気記録媒体を準備した。
In addition, as comparison samples, a magnetic recording medium with no protective film provided at all, a magnetic recording medium with a continuous protective film made only of Sn with a thickness of 200 mm formed by vapor deposition, and a magnetic recording medium with a continuous protective film formed only of Sn with a thickness of 200 mm formed by sputtering method. A magnetic recording medium provided with a continuous N film consisting only of ZOS was prepared.

同様の手法で、軟質材料としてPb、In。Using a similar method, Pb and In were used as soft materials.

Sb、Bi、Au、Ag、Cu、Pt、A(1゜Zn、
Cd、Rhを、硬質材料として5ift、 Zr0z。
Sb, Bi, Au, Ag, Cu, Pt, A (1°Zn,
Cd, Rh as hard materials, 5ift, Zr0z.

Ti1t、 S i C,BaC,T i C,WC,
Z rC。
Tilt, S i C, BaC, T i C, WC,
ZrC.

5isN4. TiN、 Z r N、 B 、 S 
iを用いて、各々の軟質材料を硬質材料を組合せた複合
膜から成る保1膜を持つ磁気記録媒体を作製した。なお
、この場合膜形成の基板温度、蒸着速度などの膜形成条
件を各々の場合について調節し、SnとA Q xis
℃ の組合せの場合に得られたのと同様の寸法!構造の複合
膜が得られるように注意を払った。
5isN4. TiN, ZrN, B, S
A magnetic recording medium having a protective film made of a composite film made of a combination of each soft material and a hard material was fabricated using i. In this case, film formation conditions such as substrate temperature and evaporation rate are adjusted for each case, and Sn and A Q
Dimensions similar to those obtained for the combination of °C! Care was taken to obtain a structured composite membrane.

これらの試料について、以下のヘッドによる耐摺動テス
トを行った。耐摺動テストは、各試料からディスク試料
を切り出し、液体潤滑剤を塗布してディスク回転装置に
セットした後、荷重16gのヘッドを接触させてディス
クを2 m / sの速度で連続回転させ、磁気記録媒
体もしくはヘッドに傷が入り、出力が出なくなるまでの
回転の数を測定した。結果を第1表にまとめて示す。
These samples were subjected to a sliding resistance test using the following head. In the sliding test, a disk sample was cut out from each sample, coated with liquid lubricant, and set in a disk rotating device.The disk was then continuously rotated at a speed of 2 m/s by contacting with a head with a load of 16 g. The number of rotations until the magnetic recording medium or head was scratched and no output was produced was measured. The results are summarized in Table 1.

保護膜を設けない場合の回転数は1.2 X 10Mか
ら成る保護膜を設けた場合は2 X 10’〜5X10
11回であるのに対し、本発明の複合膜から成る保護膜
を設けた場合は5 X 10B〜I X 10’回と大
幅に耐摺動性が改善されることが明らかになった。
The number of revolutions when no protective film is provided is 1.2 x 10M, and 2 x 10' to 5 x 10 when a protective film of 10M is provided.
It was revealed that the sliding resistance was significantly improved to 5 x 10B to I x 10' times when the protective film made of the composite film of the present invention was provided, whereas the sliding resistance was 11 times.

なお実施例に用いた硬質材料、軟質材料のビッカス硬度
(kglon”)をつぎに示す。
The Vickers hardness (kglon'') of the hard and soft materials used in the examples is shown below.

AQOa     1850 S i Ox        1200ZrOz   
     1300 T i Oz        1075SiC2560 B4C2450 TiC2300 WC2200 ZrC2600 SiaNa       2050 TiN         1730 7、 r N         1670B     
       3300 Si           1200 S  n              6 1Pb  
             38In        
        9Sb             2
94Bi              94Au   
          190人g          
  210 Cu             98 Pt           420 AQ           150 Zn           250 Cd          200 Rh          950 実施例2 Aα基板上に形成されたCo−Ni1iii性膜−ヒに
以下の手順で複合膜から成る保護膜を形成した。
AQOa 1850 S i Ox 1200ZrOz
1300 T i Oz 1075SiC2560 B4C2450 TiC2300 WC2200 ZrC2600 SiaNa 2050 TiN 1730 7, r N 1670B
3300 Si 1200 S n 6 1Pb
38In
9Sb 2
94Bi 94Au
190 peopleg
210 Cu 98 Pt 420 AQ 150 Zn 250 Cd 200 Rh 950 Example 2 A protective film consisting of a composite film was formed on the Co-NiIII film formed on the Aα substrate by the following procedure.

第2図(a)に示すように低蒸気圧油を霧状で磁性膜表
面に付着した。ついでこの試料をスパッタ装置に取付け
SiC膜をスパッタ法で500λノダ形成した後、外に
取り出し有機溶剤等で化学処理しくb)に示す状態を実
現した。これに、再びスパッタ法でポリイミド膜を50
0人厚形成し、突部をラッピングによって、平担化して
(c)に示す複合膜から成る保護膜を形成した。
As shown in FIG. 2(a), a mist of low vapor pressure oil was applied to the surface of the magnetic film. Next, this sample was attached to a sputtering device and a SiC film of 500 λ was formed by sputtering, and then taken out and chemically treated with an organic solvent etc. to achieve the state shown in b). A polyimide film of 50% was applied to this again by sputtering.
A protective film made of a composite film as shown in (c) was formed by forming the film to a thickness of 0.05 cm and flattening the protrusions by lapping the protrusions.

ライド、ステアリン酸、 Z n S 、 5bzSs
、 Cr5z。
Ride, stearic acid, Z n S, 5bzSs
, Cr5z.

MO2S、 Zn5e、 CdSe、 B Nを用いて
、実施例1と同様各種材料の組合せから成る複合膜保護
膜を形成した。
A composite protective film made of a combination of various materials was formed using MO2S, Zn5e, CdSe, and BN, as in Example 1.

これらの試料を実施例1と同様の評価法でその耐摺動性
を調べた結果、いずれも108回以上の耐摺動性が得ら
れ、保護膜として極めて優れていることがわかった。
As a result of examining the sliding resistance of these samples using the same evaluation method as in Example 1, it was found that all of them had a sliding resistance of 108 times or more, and were extremely excellent as protective films.

また、実施例1、実施例2共に保護膜の膜厚を変えると
、厚くなる程耐摺動性が改善される傾向が認められたが
、磁性膜とヘッドの距離が大きくなろと電磁変換特性が
劣化した。保護膜としては50〜2000人までの範囲
が望ましく、さらに望ましくは100〜1000人の範
囲であることがわかった。
In addition, when the thickness of the protective film was changed in both Examples 1 and 2, it was observed that the sliding resistance tended to improve as the thickness increased, but as the distance between the magnetic film and the head increased, the electromagnetic conversion characteristics has deteriorated. It has been found that the protective film preferably has a range of 50 to 2,000 people, and more preferably a range of 100 to 1,000 people.

なお1本発明では硬質材料として15種類、軟質材料と
して23種類の例を挙げたが、材料の種類は上記に限定
されるものではない。
In addition, in the present invention, 15 types of hard materials and 23 types of soft materials are given as examples, but the types of materials are not limited to the above.

また、本実施例では保護膜の形成法として真空蒸着法と
スパッタ法を挙げたが、これらの手法に限られるもので
なはなく、イオンブレーティング法、CVO法、電気メ
ツキ法、化学メッキ法、吹付は法、塗布法など一般の膜
形成法のいずれを用いても良い。
In addition, in this example, vacuum evaporation method and sputtering method are used as methods for forming the protective film, but the method is not limited to these methods. Any general film forming method such as a spraying method or a coating method may be used.

〔発明の効果〕〔Effect of the invention〕

以−ヒの如く本発明の保護膜は耐I@耗性に優れ、かつ
ヘッドに対し滑性を有し、磁気記録媒体の長寿命化を達
成するために有用である。
As described below, the protective film of the present invention has excellent abrasion resistance and lubricity with respect to the head, and is useful for extending the life of the magnetic recording medium.

本発明の保護膜において硬質材料は主に耐摩耗性向上に
寄与し、軟質材料はヘッドと保護膜間の衝撃力を弱めヘ
ッド側の破壊を防ぐ効果を果していると考えられる。
In the protective film of the present invention, the hard material mainly contributes to improving wear resistance, and the soft material is considered to have the effect of weakening the impact force between the head and the protective film and preventing damage to the head side.

【図面の簡単な説明】[Brief explanation of drawings]

ある。 be.

Claims (1)

【特許請求の範囲】 1、非磁性基板上に形成された磁性膜上に、硬質材料か
らなる不連続膜と、その不連続部に配置された軟質材料
とからなる保護膜を有することを特徴とする磁気記録媒
体。 2、上記硬質材料の不連続膜の部分は、面積比で保護膜
中の10〜90%の範囲である特許請求の範囲第1項記
載の磁気記録媒体。 3、上記硬質材料はビッカス硬度で1000kg/mm
^2以上の硬度値を有する材料である特許請求の範囲第
1項記載の磁気記録媒体。
[Claims] 1. A magnetic film formed on a non-magnetic substrate has a discontinuous film made of a hard material and a protective film made of a soft material disposed in the discontinuous portion. magnetic recording media. 2. The magnetic recording medium according to claim 1, wherein the area of the discontinuous film of the hard material is in the range of 10 to 90% of the area of the protective film. 3. The above hard material has a Vickers hardness of 1000 kg/mm.
The magnetic recording medium according to claim 1, which is a material having a hardness value of ^2 or more.
JP3921486A 1986-02-26 1986-02-26 Magnetic recording medium Pending JPS62197917A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP3921486A JPS62197917A (en) 1986-02-26 1986-02-26 Magnetic recording medium

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3921486A JPS62197917A (en) 1986-02-26 1986-02-26 Magnetic recording medium

Publications (1)

Publication Number Publication Date
JPS62197917A true JPS62197917A (en) 1987-09-01

Family

ID=12546884

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3921486A Pending JPS62197917A (en) 1986-02-26 1986-02-26 Magnetic recording medium

Country Status (1)

Country Link
JP (1) JPS62197917A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0194518A (en) * 1987-10-06 1989-04-13 Hitachi Ltd Magnetic recording medium

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0194518A (en) * 1987-10-06 1989-04-13 Hitachi Ltd Magnetic recording medium

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