JPS6292115A - Magnetic recording medium - Google Patents

Magnetic recording medium

Info

Publication number
JPS6292115A
JPS6292115A JP19781986A JP19781986A JPS6292115A JP S6292115 A JPS6292115 A JP S6292115A JP 19781986 A JP19781986 A JP 19781986A JP 19781986 A JP19781986 A JP 19781986A JP S6292115 A JPS6292115 A JP S6292115A
Authority
JP
Japan
Prior art keywords
film layer
base film
silicon
recording medium
magnetic recording
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP19781986A
Other languages
Japanese (ja)
Other versions
JPS6330690B2 (en
Inventor
Kunio Wakai
若居 邦夫
Takayuki Toko
都甲 隆之
Tsunemi Oiwa
大岩 恒美
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Maxell Ltd
Original Assignee
Hitachi Maxell Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Maxell Ltd filed Critical Hitachi Maxell Ltd
Priority to JP19781986A priority Critical patent/JPS6292115A/en
Publication of JPS6292115A publication Critical patent/JPS6292115A/en
Publication of JPS6330690B2 publication Critical patent/JPS6330690B2/ja
Granted legal-status Critical Current

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Abstract

PURPOSE:To obtain a magnetic recording medium having a thin ferromagnetic metallic film which excels in magnetic characteristics and scratching resistance by using silicon alone or silicon alloy to form an underlying layer to be interposed between a substrate and the thin ferromagnetic metallic film. CONSTITUTION:This magnetic recording medium is constituted by forming the underlying film layer consisting of the silicon alone or silicon alloy on the substrate and further forming the thin ferromagnetic metallic film layer on the underlying film layer. The underlying film layer consisting of the silicon alone or silicon alloy in contact with the thin ferromagnetic metallic film is formed of the uniform silicon or silicon alloy and therefore, the dense underlying film layer having good smoothness is formed. The thin ferromagnetic metallic film which is uniform and has the excellent smoothness is thereby formed on the underlying film layer, by which the magnetic characteristics are improved and the scratching resistance is improved.

Description

【発明の詳細な説明】 〔産業上の利用分野〕 この発明は強磁性金属薄膜型磁気記録媒体に関し、さら
に詳しくは磁気特性および耐IN傷性に優れた強磁性金
属薄膜型磁気記録媒体に関する。
DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a ferromagnetic metal thin film magnetic recording medium, and more particularly to a ferromagnetic metal thin film magnetic recording medium that has excellent magnetic properties and IN scratch resistance.

〔従来の技術〕[Conventional technology]

近年、磁気記録の高密度化に対応して、ポリエステル、
ポリイミド、ポリアミド等の高分子成形物からなるベー
スフィルム上に、強磁性金属またはその合金或いはこれ
らの金属を含む化合物からなる強磁性金属薄膜層を蒸着
等によって被着形成した強磁性金属薄膜型磁気記録媒体
が開発されている。この種の磁気記録媒体は、従来の磁
性粉末を有機バインダー中に分散して塗布する塗布型磁
気記録媒体に比べ高密度記録に通した特性を有するが、
高分子成形物からなるベースフィルムが結晶質部分と無
定形部分とからなる微細な結晶性組織を有し本質的に不
均一である上に、延伸などの機械的処理による配向組織
や、表面の平滑性を調節するための充填粒子の存在、さ
らに汚染物質の吸着などによって表面がさらに不均一に
なり、このベースフィルム表面の不均一性が原因となっ
てこの上に蒸着等によって被着形成される強磁性金属薄
膜層が不均一になり易く、このためノイズが高くなり、
又出力変動も大きくなって所望の磁気特性を有する強磁
性金属薄膜層が得られにくい稚虫がある。
In recent years, in response to the increasing density of magnetic recording, polyester,
A ferromagnetic metal thin film type magnet in which a ferromagnetic metal thin film layer made of a ferromagnetic metal, its alloy, or a compound containing these metals is formed by vapor deposition on a base film made of a polymer molded product such as polyimide or polyamide. Recording media are being developed. This type of magnetic recording medium has characteristics that allow for high-density recording compared to conventional coated magnetic recording media in which magnetic powder is dispersed and coated in an organic binder.
The base film made of a polymer molded product has a fine crystalline structure consisting of a crystalline part and an amorphous part, and is essentially non-uniform. The presence of filler particles to adjust smoothness and the adsorption of contaminants make the surface even more uneven, and this unevenness of the base film surface causes deposits to be formed on it by vapor deposition, etc. The ferromagnetic metal thin film layer tends to be non-uniform, which increases the noise.
In addition, the output fluctuation becomes large, making it difficult to obtain a ferromagnetic metal thin film layer with desired magnetic properties in some cases.

そこで、このような欠点を克服する手段として強磁性金
属薄膜層の下に5io2からなる一層の下地膜層を介在
させることが提案されている。
Therefore, as a means to overcome these drawbacks, it has been proposed to interpose a single base film layer made of 5io2 under the ferromagnetic metal thin film layer.

〔発明が解決しようとする問題点〕[Problem that the invention seeks to solve]

ところが、この下地膜層では基体との接着性に優れる反
面下地膜層表面が荒れ易く、充分に満足できる磁気特性
が得られない。
However, although this base film layer has excellent adhesion to the substrate, the surface of the base film layer tends to become rough, making it impossible to obtain sufficiently satisfactory magnetic properties.

〔問題点を解決するための手段〕[Means for solving problems]

この発明考らはかかる問題を解決するため種々検討を行
った結果、基体と強磁性全屈薄膜、暖との間に介在させ
る下地層を、ケイ素単体あるいはケイ素合金で形成する
と磁気特性および耐擦傷性に優れた強磁性金属薄膜層を
有する磁気記録媒体が得られることをみいだし、この発
明をなすに至った。
As a result of various studies to solve this problem, the present invention has been devised to improve magnetic properties and abrasion resistance by forming the underlayer between the substrate and the ferromagnetic fully refracting thin film from silicon alone or from a silicon alloy. The present inventors have discovered that a magnetic recording medium having a ferromagnetic metal thin film layer with excellent properties can be obtained, and have completed the present invention.

この発明によれば、強磁性金属薄膜層と接するケイ素単
体あるいはケイ素合金の下地膜層が結晶成長が均一なケ
イ素またはケイ素合金で形成されているため、平滑性の
よい緻密な下地膜層が形成され、このためこの下地膜層
上には均一でかつ平滑性に優れた強磁性金属薄膜層が形
成されて磁気特性も改善され、又耐擦傷性も改善される
According to this invention, since the base film layer of simple silicon or silicon alloy in contact with the ferromagnetic metal thin film layer is formed of silicon or silicon alloy with uniform crystal growth, a dense base film layer with good smoothness is formed. Therefore, a uniform ferromagnetic metal thin film layer with excellent smoothness is formed on this base film layer, and the magnetic properties are improved, and the scratch resistance is also improved.

この発明において、基体への下地膜層および強磁性金属
薄膜層の形成は、真空蒸着、イオンブレーティング、ス
パッタリング、メッキ等の手段によって行なわれ、基体
としてはガラス、アルミニウム全屈基板、あるいはポリ
エステル、ポリイミド、ポリアミド等一般に使用されて
いる高分子成形物からなるベースフィルムが使用される
In this invention, the base film layer and the ferromagnetic metal thin film layer are formed on the substrate by means such as vacuum evaporation, ion blasting, sputtering, and plating. A base film made of a commonly used polymer molded material such as polyimide or polyamide is used.

下地膜層の形成材料としては、ケイ素単体あるいはケイ
素を含む合金が好適なものとして使用され、これらの元
素は結晶成長が均一であるため平滑性のよい緻密な下地
膜層が形成される。従ってこの上に形成される強磁性金
属薄膜層は均一かつ平滑性に優れたものとなり、磁気特
性が改善される。
As the material for forming the base film layer, silicon alone or an alloy containing silicon is preferably used, and since these elements have uniform crystal growth, a dense base film layer with good smoothness is formed. Therefore, the ferromagnetic metal thin film layer formed thereon is uniform and has excellent smoothness, and the magnetic properties are improved.

本発明による下地膜層の層厚は、充分な下地膜効果を発
揮し、かつ基体と下地膜層との熱膨張係数の相違にもと
づく下地膜層の微細な割れや熱変形を防止するため20
0〜2000人の範囲にするのが適当で、400〜70
0人の範囲にするのがより好ましい。
The layer thickness of the base film layer according to the present invention is set to 20 mm in order to exhibit a sufficient base film effect and to prevent minute cracks and thermal deformation of the base film layer due to the difference in thermal expansion coefficient between the substrate and the base film layer.
It is appropriate to have a range of 0 to 2000 people, and 400 to 70 people.
It is more preferable to set the number to 0 people.

強磁性金属薄膜層を形成する磁性材としては、コバルト
、ニッケル、鉄などの全屈単体の他、コバルト−ニッケ
ル、コバルト−鉄、コバルト−クロム、コバルト−ニッ
ケルークロムなどの合金するいは酸化物、およびCo−
P、 Co−Ni −Pなどが好適なちとして使用され
る。
The magnetic materials forming the ferromagnetic metal thin film layer include total bending elements such as cobalt, nickel, and iron, as well as alloys or oxidized materials such as cobalt-nickel, cobalt-iron, cobalt-chromium, and cobalt-nickel-chromium. material, and Co-
P, Co-Ni-P, etc. are preferably used.

基体として高分子成形物からなるベースフィルムを使用
する場合には、このベースフィルムとケイ素単体あるい
はケイ素合金からなる下地膜層との接着性に幾分難点が
あるため、この下地膜層と基体との間にTi01Ti2
03、TiO2などの酸化チタン、酸化銀(Ago)、
M化アルミニウム(Al□Oa)、Sin、SiO,+
等の酸化ケイ素、酸化ビスマス(Bi203)などの酸
化物層を介在させるのが好ましく、これらの酸化物層を
介在させると、ベースフィルムとケイ素単体あるいはケ
イ素合金からなる下地膜層との接着性がより改善される
。特に、ケイ素単体あるいはケイ素合金からなる下地膜
層と同じ元素の酸化物である酸化ケイ素層を、前記下地
膜層とベースフィルム間に介在させたときは、接着性だ
けでなく、磁気特性および##擦傷性も一段と優れ、推
奨される。
When using a base film made of a polymer molded product as a substrate, there is some difficulty in adhesion between this base film and a base film layer made of simple silicon or a silicon alloy. Between Ti01Ti2
03, titanium oxide such as TiO2, silver oxide (Ago),
Aluminum Mide (Al□Oa), Sin, SiO, +
It is preferable to interpose an oxide layer such as silicon oxide or bismuth oxide (Bi203), etc. When these oxide layers are interposed, the adhesion between the base film and the base film layer made of simple silicon or silicon alloy is improved. More improved. In particular, when a silicon oxide layer, which is an oxide of the same element as the base film layer made of simple silicon or a silicon alloy, is interposed between the base film layer and the base film, not only adhesive properties but also magnetic properties and #It has much better scratch resistance and is recommended.

〔実施例〕〔Example〕

次に、この発明の実施例について説明する。 Next, embodiments of the invention will be described.

実施例1 約6μ厚のポリエステルベースフィルムに表面処理(A
rガス、ボンバード処理)を施した後、これを真空蒸着
装置に装填し、下記第1表に示す第1蒸着物をそれぞれ
の条件で蒸発させて第1の下地膜層を形成し、次いで同
表に示す第2蒸着物をそれぞれの条件で蒸発させて第2
の下地膜層を形成した。
Example 1 Surface treatment (A
r gas, bombardment treatment), this is loaded into a vacuum evaporation device, and the first evaporated material shown in Table 1 below is evaporated under the respective conditions to form a first base film layer. The second evaporated material shown in the table is evaporated under the respective conditions.
A base film layer was formed.

第  1  表 次に、この二層構造の下地膜層を形成したベースフィル
ム上に酸素圧5X10−’)−ルの残留ガス圧の下で、
コバルト金属を2000人の膜厚になるように蒸着して
強磁性金属薄膜層を形成した。コバルト金属の蒸着はコ
バルト金属の蒸気の入射方向とヘースフイルムの法線方
向とのなす角(入射角)が45℃以上となるように蒸着
装置内に防着板を設けて連続斜め入射蒸着を行なった。
Table 1 Next, under a residual gas pressure of 5 x 10-') oxygen pressure on the base film on which the base film layer of this two-layer structure was formed,
A ferromagnetic metal thin film layer was formed by depositing cobalt metal to a thickness of 2000 nm. For cobalt metal vapor deposition, continuous oblique incidence vapor deposition is performed by installing a deposition prevention plate in the vapor deposition equipment so that the angle between the incident direction of the cobalt metal vapor and the normal direction of the Haas film (incident angle) is 45°C or more. Ta.

次いで、これを所定の巾に裁断して磁気テープをつく 
った。
Next, cut this into a specified width and attach magnetic tape.
It was.

実施例2 実施1?IJ 1において、第1蒸着物の蒸着を省いて
下地膜層を一層にし、第2蒸着物のSiを用いて膜厚が
500人となるように蒸着し、一層のSi蒸着物下地膜
層を形成した以外は実施例1と同様にして磁気テープを
つくった。
Example 2 Implementation 1? In IJ 1, the first evaporation material was omitted to form a single base film layer, and the second evaporation material, Si, was deposited to a film thickness of 500 nm to form a single layer of Si evaporated base film layer. A magnetic tape was produced in the same manner as in Example 1 except for the formation.

比較例1 実施例2においてSi蒸着物下地膜層に代えてSiO□
下地膜層を形成した以外は実施例2と同様にして磁気テ
ープをつくった。
Comparative Example 1 In place of the Si vapor deposit base film layer in Example 2, SiO□
A magnetic tape was produced in the same manner as in Example 2 except that the underlayer was formed.

各実施例および各比較例で得られた磁気テープについて
保磁力(Hc)および角型(Br/8m)を測定し、接
着力および耐擦傷性を試験した。
The coercive force (Hc) and square shape (Br/8m) of the magnetic tapes obtained in each Example and each Comparative Example were measured, and the adhesive strength and scratch resistance were tested.

接着力はセロテープi7.111iSlt試験及びダイ
ヤモンド描画試験によって行ない、耐擦傷性は脱脂面に
よる擦傷によって行なった。
Adhesion strength was determined by cellotape i7.111iSlt test and diamond drawing test, and scratch resistance was determined by scratching with a degreased surface.

下記第2表はその結果である。Table 2 below shows the results.

第2表 C発明の効果〕 上記第2表らか明らかなように、この発明によって得ら
れた磁気テープ(実施例1および2)は5in2の下t
tt+膜層を形成して得られた磁気テープ(比較例1)
に比し、いずれも保磁力が大きく、磁気特性に優れてい
ることがわかる。特に、実施例1で示すSiO2−81
の2層の下地膜層からなるものは保磁力、角型ともより
良好な特性を示し、さらに接着力及び耐tM (a性も
従来の磁気テープに比しいずれも良好で、接着性及び耐
擦傷にも優れていることがわかる。
Table 2 C Effects of the Invention] As is clear from Table 2 above, the magnetic tapes (Examples 1 and 2) obtained by the present invention had a 5in2 lower t
Magnetic tape obtained by forming tt+ film layer (Comparative Example 1)
It can be seen that both have a large coercive force and excellent magnetic properties. In particular, SiO2-81 shown in Example 1
The magnetic tape consisting of two base film layers exhibits better properties in terms of coercive force and square shape, and also has better adhesion and tM (a) properties than conventional magnetic tapes. It can be seen that it is also excellent against scratches.

Claims (1)

【特許請求の範囲】[Claims] 1、基体上に、ケイ素単体もしくはケイ素合金からなる
下地膜層を形成し、さらにこの下地膜層上に強磁性金属
薄膜層を形成したことを特徴とする磁気記録媒体
1. A magnetic recording medium characterized in that a base film layer made of simple silicon or a silicon alloy is formed on a substrate, and a ferromagnetic metal thin film layer is further formed on this base film layer.
JP19781986A 1986-08-23 1986-08-23 Magnetic recording medium Granted JPS6292115A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP19781986A JPS6292115A (en) 1986-08-23 1986-08-23 Magnetic recording medium

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP19781986A JPS6292115A (en) 1986-08-23 1986-08-23 Magnetic recording medium

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
JP10830679A Division JPS5634142A (en) 1979-08-25 1979-08-25 Magnetic recording medium

Publications (2)

Publication Number Publication Date
JPS6292115A true JPS6292115A (en) 1987-04-27
JPS6330690B2 JPS6330690B2 (en) 1988-06-20

Family

ID=16380868

Family Applications (1)

Application Number Title Priority Date Filing Date
JP19781986A Granted JPS6292115A (en) 1986-08-23 1986-08-23 Magnetic recording medium

Country Status (1)

Country Link
JP (1) JPS6292115A (en)

Also Published As

Publication number Publication date
JPS6330690B2 (en) 1988-06-20

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