JPS62192501A - Co-w coated wc powder - Google Patents
Co-w coated wc powderInfo
- Publication number
- JPS62192501A JPS62192501A JP61031875A JP3187586A JPS62192501A JP S62192501 A JPS62192501 A JP S62192501A JP 61031875 A JP61031875 A JP 61031875A JP 3187586 A JP3187586 A JP 3187586A JP S62192501 A JPS62192501 A JP S62192501A
- Authority
- JP
- Japan
- Prior art keywords
- powder
- cobalt
- tungstate
- hydrazine
- plating bath
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000000843 powder Substances 0.000 title claims abstract description 26
- OAKJQQAXSVQMHS-UHFFFAOYSA-N Hydrazine Chemical compound NN OAKJQQAXSVQMHS-UHFFFAOYSA-N 0.000 claims abstract description 14
- 229910017052 cobalt Inorganic materials 0.000 claims abstract description 14
- 239000010941 cobalt Substances 0.000 claims abstract description 14
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 claims abstract description 14
- 238000007747 plating Methods 0.000 claims abstract description 12
- 229910045601 alloy Inorganic materials 0.000 claims abstract description 10
- 239000000956 alloy Substances 0.000 claims abstract description 10
- PBYZMCDFOULPGH-UHFFFAOYSA-N tungstate Chemical compound [O-][W]([O-])(=O)=O PBYZMCDFOULPGH-UHFFFAOYSA-N 0.000 claims abstract description 8
- 229910020515 Co—W Inorganic materials 0.000 claims abstract description 5
- 230000003213 activating effect Effects 0.000 claims abstract description 3
- 238000004519 manufacturing process Methods 0.000 claims description 3
- -1 hydrazine compound Chemical class 0.000 claims description 2
- 229910001080 W alloy Inorganic materials 0.000 claims 1
- 239000011248 coating agent Substances 0.000 abstract description 7
- 238000000576 coating method Methods 0.000 abstract description 7
- XMVONEAAOPAGAO-UHFFFAOYSA-N sodium tungstate Chemical compound [Na+].[Na+].[O-][W]([O-])(=O)=O XMVONEAAOPAGAO-UHFFFAOYSA-N 0.000 abstract description 5
- 210000001787 dendrite Anatomy 0.000 abstract description 4
- BIVUUOPIAYRCAP-UHFFFAOYSA-N aminoazanium;chloride Chemical compound Cl.NN BIVUUOPIAYRCAP-UHFFFAOYSA-N 0.000 abstract description 3
- GVPFVAHMJGGAJG-UHFFFAOYSA-L cobalt dichloride Chemical compound [Cl-].[Cl-].[Co+2] GVPFVAHMJGGAJG-UHFFFAOYSA-L 0.000 abstract description 3
- 238000004663 powder metallurgy Methods 0.000 abstract description 3
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 abstract description 3
- 229910052721 tungsten Inorganic materials 0.000 abstract description 3
- 230000004913 activation Effects 0.000 abstract description 2
- 239000010937 tungsten Substances 0.000 abstract description 2
- 229910002666 PdCl2 Inorganic materials 0.000 abstract 1
- 239000002245 particle Substances 0.000 description 9
- 238000007772 electroless plating Methods 0.000 description 5
- 239000003638 chemical reducing agent Substances 0.000 description 4
- 238000000034 method Methods 0.000 description 4
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 4
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- 239000002244 precipitate Substances 0.000 description 3
- 238000005245 sintering Methods 0.000 description 3
- 238000001994 activation Methods 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- 238000010908 decantation Methods 0.000 description 2
- 229910052759 nickel Inorganic materials 0.000 description 2
- 229910052763 palladium Inorganic materials 0.000 description 2
- NLJMYIDDQXHKNR-UHFFFAOYSA-K sodium citrate Chemical compound O.O.[Na+].[Na+].[Na+].[O-]C(=O)CC(O)(CC([O-])=O)C([O-])=O NLJMYIDDQXHKNR-UHFFFAOYSA-K 0.000 description 2
- 239000001509 sodium citrate Substances 0.000 description 2
- BFKLIGQXXNIIEL-ODZAUARKSA-N (z)-but-2-enedioic acid;hydrazine Chemical compound NN.OC(=O)\C=C/C(O)=O BFKLIGQXXNIIEL-ODZAUARKSA-N 0.000 description 1
- FUSNOPLQVRUIIM-UHFFFAOYSA-N 4-amino-2-(4,4-dimethyl-2-oxoimidazolidin-1-yl)-n-[3-(trifluoromethyl)phenyl]pyrimidine-5-carboxamide Chemical compound O=C1NC(C)(C)CN1C(N=C1N)=NC=C1C(=O)NC1=CC=CC(C(F)(F)F)=C1 FUSNOPLQVRUIIM-UHFFFAOYSA-N 0.000 description 1
- OYPRJOBELJOOCE-UHFFFAOYSA-N Calcium Chemical compound [Ca] OYPRJOBELJOOCE-UHFFFAOYSA-N 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 1
- 101150003085 Pdcl gene Proteins 0.000 description 1
- VFTOLAKHPLTCIF-UHFFFAOYSA-N aminoazanium;dihydrogen phosphate Chemical compound NN.OP(O)(O)=O VFTOLAKHPLTCIF-UHFFFAOYSA-N 0.000 description 1
- 239000011230 binding agent Substances 0.000 description 1
- UORVGPXVDQYIDP-UHFFFAOYSA-N borane Chemical class B UORVGPXVDQYIDP-UHFFFAOYSA-N 0.000 description 1
- 229910052796 boron Inorganic materials 0.000 description 1
- 239000011575 calcium Substances 0.000 description 1
- 229910052791 calcium Inorganic materials 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- PTYMQUSHTAONGW-UHFFFAOYSA-N carbonic acid;hydrazine Chemical compound NN.OC(O)=O PTYMQUSHTAONGW-UHFFFAOYSA-N 0.000 description 1
- 150000001868 cobalt Chemical class 0.000 description 1
- 229940011182 cobalt acetate Drugs 0.000 description 1
- 229910021446 cobalt carbonate Inorganic materials 0.000 description 1
- 229940044175 cobalt sulfate Drugs 0.000 description 1
- 229910000361 cobalt sulfate Inorganic materials 0.000 description 1
- KTVIXTQDYHMGHF-UHFFFAOYSA-L cobalt(2+) sulfate Chemical compound [Co+2].[O-]S([O-])(=O)=O KTVIXTQDYHMGHF-UHFFFAOYSA-L 0.000 description 1
- ZOTKGJBKKKVBJZ-UHFFFAOYSA-L cobalt(2+);carbonate Chemical compound [Co+2].[O-]C([O-])=O ZOTKGJBKKKVBJZ-UHFFFAOYSA-L 0.000 description 1
- QAHREYKOYSIQPH-UHFFFAOYSA-L cobalt(II) acetate Chemical compound [Co+2].CC([O-])=O.CC([O-])=O QAHREYKOYSIQPH-UHFFFAOYSA-L 0.000 description 1
- 230000000536 complexating effect Effects 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- AAQNGTNRWPXMPB-UHFFFAOYSA-N dipotassium;dioxido(dioxo)tungsten Chemical compound [K+].[K+].[O-][W]([O-])(=O)=O AAQNGTNRWPXMPB-UHFFFAOYSA-N 0.000 description 1
- 238000000635 electron micrograph Methods 0.000 description 1
- 229910000377 hydrazine sulfate Inorganic materials 0.000 description 1
- 239000012493 hydrazine sulfate Substances 0.000 description 1
- AFEBXVJYLNMAJB-UHFFFAOYSA-N hydrazine;nitric acid Chemical class NN.O[N+]([O-])=O AFEBXVJYLNMAJB-UHFFFAOYSA-N 0.000 description 1
- 150000002429 hydrazines Chemical class 0.000 description 1
- DJZHPOJZOWHJPP-UHFFFAOYSA-N magnesium;dioxido(dioxo)tungsten Chemical compound [Mg+2].[O-][W]([O-])(=O)=O DJZHPOJZOWHJPP-UHFFFAOYSA-N 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 229910017604 nitric acid Inorganic materials 0.000 description 1
- ACVYVLVWPXVTIT-UHFFFAOYSA-N phosphinic acid Chemical class O[PH2]=O ACVYVLVWPXVTIT-UHFFFAOYSA-N 0.000 description 1
- 239000000047 product Substances 0.000 description 1
- UONOETXJSWQNOL-UHFFFAOYSA-N tungsten carbide Chemical compound [W+]#[C-] UONOETXJSWQNOL-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Powder Metallurgy (AREA)
- Chemically Coating (AREA)
Abstract
Description
【発明の詳細な説明】
〈産業上の利用分野〉
本発明は粉末冶金に使用するに適するタングステンカー
バイド(WCと記す)粉末とその製法に関する。DETAILED DESCRIPTION OF THE INVENTION <Industrial Application Field> The present invention relates to a tungsten carbide (abbreviated as WC) powder suitable for use in powder metallurgy and a method for producing the same.
〈従来技術とその問題点〉
超硬合金粉末、特にWCのそれは焼結合金用の材料とし
て広く使用されている0通常は、N1またはCo粉末を
結合剤として混合して焼結を行なうが均一性に欠けるた
めに、WC粉末自身に無電解めっき法によってNiある
いはCoを被覆することが試みられている。しかしこの
ような従来法ではNiあるいはCoはWC粉末の表面に
デンドライトとなって析出し、層状の均一な被覆を形成
しない。<Prior art and its problems> Cemented carbide powder, especially that of WC, is widely used as a material for sintered alloys.Normally, N1 or Co powder is mixed as a binder for sintering, but the sintering is not uniform. Because of the lack of properties, attempts have been made to coat the WC powder itself with Ni or Co by electroless plating. However, in such conventional methods, Ni or Co precipitates as dendrites on the surface of the WC powder and does not form a uniform layered coating.
従来は、還元剤として1次亜リン酸塩あるいは水素化ホ
ウ素化合物を用いた無電解めっき浴が使用されていたが
、このような還元剤では、皮膜中にPあるいはBがそれ
ぞれ3〜15%あるいは0.1〜5%合金されるため製
品に好ましくない結果を与える。またWCは焼結に際し
Cを遊離するため。Conventionally, electroless plating baths using primary hypophosphites or boron hydride compounds as reducing agents have been used, but with such reducing agents, P or B is contained in the film at a rate of 3 to 15%, respectively. Alternatively, since it is alloyed by 0.1 to 5%, it gives unfavorable results to the product. Also, WC liberates C during sintering.
これを捕捉するために少量のVを加えることも行われて
いる。本発明はこれらの欠点を克服した新規なWC粉末
を提供する。Adding a small amount of V has also been done to capture this. The present invention provides a new WC powder that overcomes these drawbacks.
本発明者等は、コバルト無電解めっき液にタングステン
酸塩を加え、ヒドラジンで還元することにより、従来知
られていない、優れた粉末冶金用WC粉末を得た。The present inventors added tungstate to a cobalt electroless plating solution and reduced it with hydrazine to obtain a previously unknown and excellent WC powder for powder metallurgy.
〈発明の構成〉
本発明によればCo −W合金で層状に被覆されたWC
粉末が提供される。<Configuration of the Invention> According to the present invention, WC coated in a layered manner with a Co-W alloy
A powder is provided.
本発明によれば、またCo −u合金で層状に被覆され
たWC粉末の製法であって、WC粒子を活性化処理し、
タングステン酸塩とヒドラジン化合物を含む無電解コバ
ルトめっき浴に浸漬することからなる方法が提供される
。According to the present invention, there is also a method for producing WC powder layered with a Co-u alloy, comprising: activating the WC particles;
A method is provided comprising immersing in an electroless cobalt plating bath containing a tungstate and a hydrazine compound.
本発明の方法に使用されるWC粉末の平均粒径は特定に
限定されないが、通常0.1〜50μ■の範囲であり、
好ましくは0.5〜30μ■の範囲である。The average particle size of the WC powder used in the method of the present invention is not particularly limited, but is usually in the range of 0.1 to 50 μ■,
Preferably it is in the range of 0.5 to 30μ.
本発明によってWC粉末にCo −u被覆を施すには、
wc粉末に、まず1例えば5nC1,−PdC11系の
活性化溶液で処理されて表面が活性化される。この活性
化処理自身は既知であり残留するSn、 Pd等の量は
WCに対して0.1 wt%以下であり、積極的意味を
有しない。To apply Co-u coating to WC powder according to the present invention,
The surface of the wc powder is activated by first treating it with an activation solution of 1, for example, 5nC1, -PdC11. This activation process itself is known and the amount of residual Sn, Pd, etc. is less than 0.1 wt% with respect to WC and has no positive meaning.
次に、Co−It皮膜を無電解めっき法により被覆する
。本発明においては、無電解めっき浴の還元剤としてヒ
ドラジン及びその誘導体を用いる。ここで用いられるヒ
ドラジン化合物とは、ヒドラジン及び水加ヒドラジン、
硝酸ヒドラジン、硫酸ヒドラジン、塩酸ヒドラジン、マ
レイン酸ヒドラジン、リン酸ヒドラジン、炭酸ヒドラジ
ンの誘導体等である。これらを還元剤として用いるため
、Nが約0.3 vt%被覆合金中に入り込んで来るが
積極的意味を有しない。Next, a Co-It film is applied by electroless plating. In the present invention, hydrazine and its derivatives are used as reducing agents in the electroless plating bath. The hydrazine compounds used here include hydrazine and hydrated hydrazine,
These include derivatives of hydrazine nitrate, hydrazine sulfate, hydrazine hydrochloride, hydrazine maleate, hydrazine phosphate, and hydrazine carbonate. Since these are used as reducing agents, about 0.3 vt% of N enters into the coated alloy, but it does not have a positive meaning.
また、本発明においてCoにVを合金させるために、タ
ングステン酸塩をコバルトの無電解液に加える。これに
より、VがCodに誘導されてCo −M合金としてW
C粒子表面に析出する。また使用できるコバルト塩は塩
化コバルト、硫酸コバルト、炭酸コバルト、酢酸コバル
ト等である。タングステン酸塩は、タングステン酸アン
モニウム、タングステン酸カリウム、タングステン酸カ
ルシウム、タングステン酸マグネシウム、タングステン
酸ナトリウム等である。めっき浴のコバルト濃度は0.
02mo1/1〜0.4mo1#l好ましくは0.04
*ol#1〜0.15膳o1/Qである。タングステン
濃度は合金させたいWの量によって決定されるが、通常
0.OO1+sol/Ω〜0.6−ol#l、好ましく
は0.005mo1/l〜0.2s+ol/Wである。Further, in the present invention, in order to alloy Co with V, tungstate is added to the cobalt electroless solution. As a result, V is induced into Cod and W becomes a Co-M alloy.
Precipitates on the surface of C particles. Cobalt salts that can be used include cobalt chloride, cobalt sulfate, cobalt carbonate, and cobalt acetate. Tungstates include ammonium tungstate, potassium tungstate, calcium tungstate, magnesium tungstate, sodium tungstate, and the like. The cobalt concentration in the plating bath is 0.
02mo1/1~0.4mo1#l preferably 0.04
*ol#1~0.15 servings o1/Q. The tungsten concentration is determined by the amount of W to be alloyed, but is usually 0. OO1+sol/Ω to 0.6-ol#l, preferably 0.005mol/l to 0.2s+ol/W.
ただし実際に肛粉末上に析出するCo、Wの量はめっき
液中のCo、Itの濃度に比例するものではない。However, the amounts of Co and W actually precipitated on the powder are not proportional to the concentrations of Co and It in the plating solution.
本発明の方法によれば、Co −W合金が、WC粉末の
表面に均一に層状に析出し、プントライ、トとなること
なく、優れた被覆を形成する。According to the method of the present invention, the Co-W alloy precipitates uniformly in a layer on the surface of the WC powder, forming an excellent coating without forming a layer.
〈発明の具体的記載〉 本発明を実施例と比較例によって具体的に例示する。<Specific description of the invention> The present invention will be specifically illustrated by Examples and Comparative Examples.
実施例1
平均粒径5μ−のwc 1001(を5nC1,10g
/j!、 IC120m1l#!を含む液に2分間浸
漬攪拌し、デカンテーションによって分離し水洗した0
次に、PdC1,1g/L HCI 2ta(1/Qを
含む液に2分間浸漬攪拌し、デカンテーションを行い水
洗した。Example 1 WC 1001 (5nC1, 10g with an average particle size of 5μ)
/j! , IC120m1l#! It was immersed in a solution containing water for 2 minutes, stirred, separated by decantation, and washed with water.
Next, it was immersed and stirred for 2 minutes in a solution containing PdCl, 1 g/L HCI 2ta (1/Q), decanted, and washed with water.
別に
塩化コバルト 0.1 *ol#1タ
ングステン酸ナトリウム 0.05mol/12ク
エン酸ナトリウム 0.4■ol/1塩酸ヒ
ドラジン 0.5 mol/1を含む無
電解コバルトめっき浴のpHを水酸化ナトリウムでPH
11,0に調整した。クエン酸ナトリウムは、コバルト
を錯化する目的で添加されるものである。この浴IQを
80℃に加温して前記!llC粉末を浸漬攪拌し、反応
が完全に終了して浴の色が無色透明になるのを確認して
から、デカンテーションによって分離し、水洗乾燥した
。第1図は、この粒子の2000倍の電子顕微鏡写真で
ある。そこに見られるように1粒子はデンドライトでは
なく層状に被覆されている。Separately, adjust the pH of an electroless cobalt plating bath containing cobalt chloride 0.1 *ol #1 Sodium tungstate 0.05 mol/12 Sodium citrate 0.4 ■ ol/1 Hydrazine hydrochloride 0.5 mol/1 with sodium hydroxide. P.H.
Adjusted to 11.0. Sodium citrate is added for the purpose of complexing cobalt. This bath IQ was heated to 80°C and the above! The 11C powder was immersed and stirred, and after confirming that the reaction had completed completely and the color of the bath became clear and colorless, it was separated by decantation, washed with water, and dried. FIG. 1 is an electron micrograph of this particle at 2000 times magnification. As seen there, each particle is not covered with dendrites but in layers.
この粒子を硝酸に浸漬し、めっき皮膜を完全に溶解して
分析を行ったところ、10粒子は、約0.3%のNを含
む2%り含有Co−り合金で被覆され。When the particles were immersed in nitric acid to completely dissolve the plating film and analyzed, 10 particles were coated with a 2% Co-based alloy containing about 0.3% N.
被覆量はWCに対して約6%で、浴中のコバルトは完全
に消費されていた。PdおよびSnの含有量はそれぞれ
43mgと6mgであった。The coverage was about 6% based on WC, and the cobalt in the bath was completely consumed. The contents of Pd and Sn were 43 mg and 6 mg, respectively.
比較例
実施例1と同じ処理をタングステン酸ナトリウムを含ま
ないコバルトめっき浴について繰り返したところ、第2
図に示すような被覆粉末が得られた。そこに見られるよ
うに、コバルト被覆はデンドライトとなってWC粒子は
完全に被覆されていない。Comparative Example When the same process as in Example 1 was repeated for a cobalt plating bath that did not contain sodium tungstate, the second
A coated powder as shown in the figure was obtained. As can be seen, the cobalt coating becomes dendrite and the WC particles are not completely coated.
実施例2〜8
実施例1と同様の条件でタングステン酸塩濃度を変えて
実施した。Examples 2 to 8 Examples were carried out under the same conditions as in Example 1, but with different tungstate concentrations.
タングステン酸塩ナトリウム濃度Woi/ffi
被覆実施例2 0.001
層状3 0.002
4 0.005
5 0.001
6 0.05
7 0.1
8 0.6
#本発明はl1IC粉末上にVを含むCoめっき液を用
いてめっきすることにより、均一な層状被覆を与え。Sodium tungstate concentration Woi/ffi
Coating Example 2 0.001
Layered 3 0.002 4 0.005 5 0.001 6 0.05 7 0.1 8 0.6
#The present invention provides a uniform layered coating by plating the I1IC powder using a Co plating solution containing V.
且つ遊離炭素捕捉用のVを供給することができる。Additionally, V for free carbon capture can be supplied.
Claims (1)
あって、WC粉末を活性化処理しタングステン酸塩とヒ
ドラジン化合物を含む無電解コバルトめっき浴に浸漬す
ることからなる方法。[Claims] 1. WC powder coated with a layer of Co-W alloy. 2. A method for producing WC powder coated in layers with a Co--W alloy, which comprises activating the WC powder and immersing it in an electroless cobalt plating bath containing a tungstate and a hydrazine compound.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP61031875A JPH0715122B2 (en) | 1986-02-18 | 1986-02-18 | Co-W coated WC powder and method for producing the same |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP61031875A JPH0715122B2 (en) | 1986-02-18 | 1986-02-18 | Co-W coated WC powder and method for producing the same |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS62192501A true JPS62192501A (en) | 1987-08-24 |
JPH0715122B2 JPH0715122B2 (en) | 1995-02-22 |
Family
ID=12343209
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP61031875A Expired - Lifetime JPH0715122B2 (en) | 1986-02-18 | 1986-02-18 | Co-W coated WC powder and method for producing the same |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH0715122B2 (en) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5505902A (en) * | 1994-03-29 | 1996-04-09 | Sandvik Ab | Method of making metal composite materials |
US5887242A (en) * | 1995-09-29 | 1999-03-23 | Sandvik Ab | Method of making metal composite materials |
CN104174854A (en) * | 2014-07-14 | 2014-12-03 | 昆山安泰美科金属材料有限公司 | Method for manufacturing miniature tungsten-based alloy part |
CN105478753A (en) * | 2015-12-15 | 2016-04-13 | 北京矿冶研究总院 | Tungsten carbide and tungsten composite powder and preparation method thereof |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS56150101A (en) * | 1980-04-18 | 1981-11-20 | Shinroku Kawakado | Preparation of powder coated with noble metal |
-
1986
- 1986-02-18 JP JP61031875A patent/JPH0715122B2/en not_active Expired - Lifetime
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS56150101A (en) * | 1980-04-18 | 1981-11-20 | Shinroku Kawakado | Preparation of powder coated with noble metal |
Cited By (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5505902A (en) * | 1994-03-29 | 1996-04-09 | Sandvik Ab | Method of making metal composite materials |
CN1070746C (en) * | 1994-03-29 | 2001-09-12 | 桑德维克公司 | Method of making metal composite materials |
US5887242A (en) * | 1995-09-29 | 1999-03-23 | Sandvik Ab | Method of making metal composite materials |
CN1072540C (en) * | 1995-09-29 | 2001-10-10 | 桑德维克公司 | Method of making metal composite materials |
CN104174854A (en) * | 2014-07-14 | 2014-12-03 | 昆山安泰美科金属材料有限公司 | Method for manufacturing miniature tungsten-based alloy part |
CN104174854B (en) * | 2014-07-14 | 2016-08-24 | 昆山安泰美科金属材料有限公司 | A kind of method preparing miniature tungsten-bast alloy part |
CN105478753A (en) * | 2015-12-15 | 2016-04-13 | 北京矿冶研究总院 | Tungsten carbide and tungsten composite powder and preparation method thereof |
CN105478753B (en) * | 2015-12-15 | 2018-02-06 | 北京矿冶研究总院 | Tungsten carbide and tungsten composite powder and preparation method thereof |
Also Published As
Publication number | Publication date |
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JPH0715122B2 (en) | 1995-02-22 |
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