JPS62192501A - Co-w coated wc powder - Google Patents

Co-w coated wc powder

Info

Publication number
JPS62192501A
JPS62192501A JP61031875A JP3187586A JPS62192501A JP S62192501 A JPS62192501 A JP S62192501A JP 61031875 A JP61031875 A JP 61031875A JP 3187586 A JP3187586 A JP 3187586A JP S62192501 A JPS62192501 A JP S62192501A
Authority
JP
Japan
Prior art keywords
powder
cobalt
tungstate
hydrazine
plating bath
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP61031875A
Other languages
Japanese (ja)
Other versions
JPH0715122B2 (en
Inventor
Akira Nakabayashi
明 中林
Toshiharu Hayashi
年治 林
Motohiko Yoshizumi
素彦 吉住
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Metal Corp
Original Assignee
Mitsubishi Metal Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Metal Corp filed Critical Mitsubishi Metal Corp
Priority to JP61031875A priority Critical patent/JPH0715122B2/en
Publication of JPS62192501A publication Critical patent/JPS62192501A/en
Publication of JPH0715122B2 publication Critical patent/JPH0715122B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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  • Powder Metallurgy (AREA)
  • Chemically Coating (AREA)

Abstract

PURPOSE:To produce excellent Co-W coated WC powder for powder metallurgy by subjecting the WC powder to an activation treatment and immersing the same into an electroless cobalt plating bath contg. tungstate and hydrazine compd. CONSTITUTION:The WC powder (about 0.1-50mu average grain size) is treated with, for example, an SnCl2-PdCl2 activating soln. by which the surface thereof is activated. The activated WC powder is immersed into the electroless cobalt plating bath contg. the tungstate (sodium tungstate, etc.) and hydrazine compd. (hydrazine hydrochloride, etc.). Cobalt chloride, etc., are used for the cobalt plating bath and the concn. of the cobalt is made about 0.02-0.4mol/l. The concn. of the tungsten is made usually about 0.001-0.6mol/l. The Co-W alloy is thereby precipitated in the form of a uniform layer on the surface of the WC powder and the excellent coating is formed without forming dendrite.

Description

【発明の詳細な説明】 〈産業上の利用分野〉 本発明は粉末冶金に使用するに適するタングステンカー
バイド(WCと記す)粉末とその製法に関する。
DETAILED DESCRIPTION OF THE INVENTION <Industrial Application Field> The present invention relates to a tungsten carbide (abbreviated as WC) powder suitable for use in powder metallurgy and a method for producing the same.

〈従来技術とその問題点〉 超硬合金粉末、特にWCのそれは焼結合金用の材料とし
て広く使用されている0通常は、N1またはCo粉末を
結合剤として混合して焼結を行なうが均一性に欠けるた
めに、WC粉末自身に無電解めっき法によってNiある
いはCoを被覆することが試みられている。しかしこの
ような従来法ではNiあるいはCoはWC粉末の表面に
デンドライトとなって析出し、層状の均一な被覆を形成
しない。
<Prior art and its problems> Cemented carbide powder, especially that of WC, is widely used as a material for sintered alloys.Normally, N1 or Co powder is mixed as a binder for sintering, but the sintering is not uniform. Because of the lack of properties, attempts have been made to coat the WC powder itself with Ni or Co by electroless plating. However, in such conventional methods, Ni or Co precipitates as dendrites on the surface of the WC powder and does not form a uniform layered coating.

従来は、還元剤として1次亜リン酸塩あるいは水素化ホ
ウ素化合物を用いた無電解めっき浴が使用されていたが
、このような還元剤では、皮膜中にPあるいはBがそれ
ぞれ3〜15%あるいは0.1〜5%合金されるため製
品に好ましくない結果を与える。またWCは焼結に際し
Cを遊離するため。
Conventionally, electroless plating baths using primary hypophosphites or boron hydride compounds as reducing agents have been used, but with such reducing agents, P or B is contained in the film at a rate of 3 to 15%, respectively. Alternatively, since it is alloyed by 0.1 to 5%, it gives unfavorable results to the product. Also, WC liberates C during sintering.

これを捕捉するために少量のVを加えることも行われて
いる。本発明はこれらの欠点を克服した新規なWC粉末
を提供する。
Adding a small amount of V has also been done to capture this. The present invention provides a new WC powder that overcomes these drawbacks.

本発明者等は、コバルト無電解めっき液にタングステン
酸塩を加え、ヒドラジンで還元することにより、従来知
られていない、優れた粉末冶金用WC粉末を得た。
The present inventors added tungstate to a cobalt electroless plating solution and reduced it with hydrazine to obtain a previously unknown and excellent WC powder for powder metallurgy.

〈発明の構成〉 本発明によればCo −W合金で層状に被覆されたWC
粉末が提供される。
<Configuration of the Invention> According to the present invention, WC coated in a layered manner with a Co-W alloy
A powder is provided.

本発明によれば、またCo −u合金で層状に被覆され
たWC粉末の製法であって、WC粒子を活性化処理し、
タングステン酸塩とヒドラジン化合物を含む無電解コバ
ルトめっき浴に浸漬することからなる方法が提供される
According to the present invention, there is also a method for producing WC powder layered with a Co-u alloy, comprising: activating the WC particles;
A method is provided comprising immersing in an electroless cobalt plating bath containing a tungstate and a hydrazine compound.

本発明の方法に使用されるWC粉末の平均粒径は特定に
限定されないが、通常0.1〜50μ■の範囲であり、
好ましくは0.5〜30μ■の範囲である。
The average particle size of the WC powder used in the method of the present invention is not particularly limited, but is usually in the range of 0.1 to 50 μ■,
Preferably it is in the range of 0.5 to 30μ.

本発明によってWC粉末にCo −u被覆を施すには、
wc粉末に、まず1例えば5nC1,−PdC11系の
活性化溶液で処理されて表面が活性化される。この活性
化処理自身は既知であり残留するSn、 Pd等の量は
WCに対して0.1 wt%以下であり、積極的意味を
有しない。
To apply Co-u coating to WC powder according to the present invention,
The surface of the wc powder is activated by first treating it with an activation solution of 1, for example, 5nC1, -PdC11. This activation process itself is known and the amount of residual Sn, Pd, etc. is less than 0.1 wt% with respect to WC and has no positive meaning.

次に、Co−It皮膜を無電解めっき法により被覆する
。本発明においては、無電解めっき浴の還元剤としてヒ
ドラジン及びその誘導体を用いる。ここで用いられるヒ
ドラジン化合物とは、ヒドラジン及び水加ヒドラジン、
硝酸ヒドラジン、硫酸ヒドラジン、塩酸ヒドラジン、マ
レイン酸ヒドラジン、リン酸ヒドラジン、炭酸ヒドラジ
ンの誘導体等である。これらを還元剤として用いるため
、Nが約0.3 vt%被覆合金中に入り込んで来るが
積極的意味を有しない。
Next, a Co-It film is applied by electroless plating. In the present invention, hydrazine and its derivatives are used as reducing agents in the electroless plating bath. The hydrazine compounds used here include hydrazine and hydrated hydrazine,
These include derivatives of hydrazine nitrate, hydrazine sulfate, hydrazine hydrochloride, hydrazine maleate, hydrazine phosphate, and hydrazine carbonate. Since these are used as reducing agents, about 0.3 vt% of N enters into the coated alloy, but it does not have a positive meaning.

また、本発明においてCoにVを合金させるために、タ
ングステン酸塩をコバルトの無電解液に加える。これに
より、VがCodに誘導されてCo −M合金としてW
C粒子表面に析出する。また使用できるコバルト塩は塩
化コバルト、硫酸コバルト、炭酸コバルト、酢酸コバル
ト等である。タングステン酸塩は、タングステン酸アン
モニウム、タングステン酸カリウム、タングステン酸カ
ルシウム、タングステン酸マグネシウム、タングステン
酸ナトリウム等である。めっき浴のコバルト濃度は0.
02mo1/1〜0.4mo1#l好ましくは0.04
*ol#1〜0.15膳o1/Qである。タングステン
濃度は合金させたいWの量によって決定されるが、通常
0.OO1+sol/Ω〜0.6−ol#l、好ましく
は0.005mo1/l〜0.2s+ol/Wである。
Further, in the present invention, in order to alloy Co with V, tungstate is added to the cobalt electroless solution. As a result, V is induced into Cod and W becomes a Co-M alloy.
Precipitates on the surface of C particles. Cobalt salts that can be used include cobalt chloride, cobalt sulfate, cobalt carbonate, and cobalt acetate. Tungstates include ammonium tungstate, potassium tungstate, calcium tungstate, magnesium tungstate, sodium tungstate, and the like. The cobalt concentration in the plating bath is 0.
02mo1/1~0.4mo1#l preferably 0.04
*ol#1~0.15 servings o1/Q. The tungsten concentration is determined by the amount of W to be alloyed, but is usually 0. OO1+sol/Ω to 0.6-ol#l, preferably 0.005mol/l to 0.2s+ol/W.

ただし実際に肛粉末上に析出するCo、Wの量はめっき
液中のCo、Itの濃度に比例するものではない。
However, the amounts of Co and W actually precipitated on the powder are not proportional to the concentrations of Co and It in the plating solution.

本発明の方法によれば、Co −W合金が、WC粉末の
表面に均一に層状に析出し、プントライ、トとなること
なく、優れた被覆を形成する。
According to the method of the present invention, the Co-W alloy precipitates uniformly in a layer on the surface of the WC powder, forming an excellent coating without forming a layer.

〈発明の具体的記載〉 本発明を実施例と比較例によって具体的に例示する。<Specific description of the invention> The present invention will be specifically illustrated by Examples and Comparative Examples.

実施例1 平均粒径5μ−のwc 1001(を5nC1,10g
/j!、  IC120m1l#!を含む液に2分間浸
漬攪拌し、デカンテーションによって分離し水洗した0
次に、PdC1,1g/L HCI 2ta(1/Qを
含む液に2分間浸漬攪拌し、デカンテーションを行い水
洗した。
Example 1 WC 1001 (5nC1, 10g with an average particle size of 5μ)
/j! , IC120m1l#! It was immersed in a solution containing water for 2 minutes, stirred, separated by decantation, and washed with water.
Next, it was immersed and stirred for 2 minutes in a solution containing PdCl, 1 g/L HCI 2ta (1/Q), decanted, and washed with water.

別に 塩化コバルト         0.1 *ol#1タ
ングステン酸ナトリウム   0.05mol/12ク
エン酸ナトリウム      0.4■ol/1塩酸ヒ
ドラジン        0.5 mol/1を含む無
電解コバルトめっき浴のpHを水酸化ナトリウムでPH
11,0に調整した。クエン酸ナトリウムは、コバルト
を錯化する目的で添加されるものである。この浴IQを
80℃に加温して前記!llC粉末を浸漬攪拌し、反応
が完全に終了して浴の色が無色透明になるのを確認して
から、デカンテーションによって分離し、水洗乾燥した
。第1図は、この粒子の2000倍の電子顕微鏡写真で
ある。そこに見られるように1粒子はデンドライトでは
なく層状に被覆されている。
Separately, adjust the pH of an electroless cobalt plating bath containing cobalt chloride 0.1 *ol #1 Sodium tungstate 0.05 mol/12 Sodium citrate 0.4 ■ ol/1 Hydrazine hydrochloride 0.5 mol/1 with sodium hydroxide. P.H.
Adjusted to 11.0. Sodium citrate is added for the purpose of complexing cobalt. This bath IQ was heated to 80°C and the above! The 11C powder was immersed and stirred, and after confirming that the reaction had completed completely and the color of the bath became clear and colorless, it was separated by decantation, washed with water, and dried. FIG. 1 is an electron micrograph of this particle at 2000 times magnification. As seen there, each particle is not covered with dendrites but in layers.

この粒子を硝酸に浸漬し、めっき皮膜を完全に溶解して
分析を行ったところ、10粒子は、約0.3%のNを含
む2%り含有Co−り合金で被覆され。
When the particles were immersed in nitric acid to completely dissolve the plating film and analyzed, 10 particles were coated with a 2% Co-based alloy containing about 0.3% N.

被覆量はWCに対して約6%で、浴中のコバルトは完全
に消費されていた。PdおよびSnの含有量はそれぞれ
43mgと6mgであった。
The coverage was about 6% based on WC, and the cobalt in the bath was completely consumed. The contents of Pd and Sn were 43 mg and 6 mg, respectively.

比較例 実施例1と同じ処理をタングステン酸ナトリウムを含ま
ないコバルトめっき浴について繰り返したところ、第2
図に示すような被覆粉末が得られた。そこに見られるよ
うに、コバルト被覆はデンドライトとなってWC粒子は
完全に被覆されていない。
Comparative Example When the same process as in Example 1 was repeated for a cobalt plating bath that did not contain sodium tungstate, the second
A coated powder as shown in the figure was obtained. As can be seen, the cobalt coating becomes dendrite and the WC particles are not completely coated.

実施例2〜8 実施例1と同様の条件でタングステン酸塩濃度を変えて
実施した。
Examples 2 to 8 Examples were carried out under the same conditions as in Example 1, but with different tungstate concentrations.

タングステン酸塩ナトリウム濃度Woi/ffi   
被覆実施例2        0.001      
     層状3        0.002 4        0.005 5        0.001 6        0.05 7        0.1 8        0.6             
#本発明はl1IC粉末上にVを含むCoめっき液を用
いてめっきすることにより、均一な層状被覆を与え。
Sodium tungstate concentration Woi/ffi
Coating Example 2 0.001
Layered 3 0.002 4 0.005 5 0.001 6 0.05 7 0.1 8 0.6
#The present invention provides a uniform layered coating by plating the I1IC powder using a Co plating solution containing V.

且つ遊離炭素捕捉用のVを供給することができる。Additionally, V for free carbon capture can be supplied.

Claims (1)

【特許請求の範囲】 1、Co−W合金で層状に被覆されたWC粉末。 2、Co−W合金で層状に被覆されたWC粉末の製法で
あって、WC粉末を活性化処理しタングステン酸塩とヒ
ドラジン化合物を含む無電解コバルトめっき浴に浸漬す
ることからなる方法。
[Claims] 1. WC powder coated with a layer of Co-W alloy. 2. A method for producing WC powder coated in layers with a Co--W alloy, which comprises activating the WC powder and immersing it in an electroless cobalt plating bath containing a tungstate and a hydrazine compound.
JP61031875A 1986-02-18 1986-02-18 Co-W coated WC powder and method for producing the same Expired - Lifetime JPH0715122B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP61031875A JPH0715122B2 (en) 1986-02-18 1986-02-18 Co-W coated WC powder and method for producing the same

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP61031875A JPH0715122B2 (en) 1986-02-18 1986-02-18 Co-W coated WC powder and method for producing the same

Publications (2)

Publication Number Publication Date
JPS62192501A true JPS62192501A (en) 1987-08-24
JPH0715122B2 JPH0715122B2 (en) 1995-02-22

Family

ID=12343209

Family Applications (1)

Application Number Title Priority Date Filing Date
JP61031875A Expired - Lifetime JPH0715122B2 (en) 1986-02-18 1986-02-18 Co-W coated WC powder and method for producing the same

Country Status (1)

Country Link
JP (1) JPH0715122B2 (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5505902A (en) * 1994-03-29 1996-04-09 Sandvik Ab Method of making metal composite materials
US5887242A (en) * 1995-09-29 1999-03-23 Sandvik Ab Method of making metal composite materials
CN104174854A (en) * 2014-07-14 2014-12-03 昆山安泰美科金属材料有限公司 Method for manufacturing miniature tungsten-based alloy part
CN105478753A (en) * 2015-12-15 2016-04-13 北京矿冶研究总院 Tungsten carbide and tungsten composite powder and preparation method thereof

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56150101A (en) * 1980-04-18 1981-11-20 Shinroku Kawakado Preparation of powder coated with noble metal

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56150101A (en) * 1980-04-18 1981-11-20 Shinroku Kawakado Preparation of powder coated with noble metal

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5505902A (en) * 1994-03-29 1996-04-09 Sandvik Ab Method of making metal composite materials
CN1070746C (en) * 1994-03-29 2001-09-12 桑德维克公司 Method of making metal composite materials
US5887242A (en) * 1995-09-29 1999-03-23 Sandvik Ab Method of making metal composite materials
CN1072540C (en) * 1995-09-29 2001-10-10 桑德维克公司 Method of making metal composite materials
CN104174854A (en) * 2014-07-14 2014-12-03 昆山安泰美科金属材料有限公司 Method for manufacturing miniature tungsten-based alloy part
CN104174854B (en) * 2014-07-14 2016-08-24 昆山安泰美科金属材料有限公司 A kind of method preparing miniature tungsten-bast alloy part
CN105478753A (en) * 2015-12-15 2016-04-13 北京矿冶研究总院 Tungsten carbide and tungsten composite powder and preparation method thereof
CN105478753B (en) * 2015-12-15 2018-02-06 北京矿冶研究总院 Tungsten carbide and tungsten composite powder and preparation method thereof

Also Published As

Publication number Publication date
JPH0715122B2 (en) 1995-02-22

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