JPH0293076A - Production of fine metal body utilized for electroless plating - Google Patents

Production of fine metal body utilized for electroless plating

Info

Publication number
JPH0293076A
JPH0293076A JP24677288A JP24677288A JPH0293076A JP H0293076 A JPH0293076 A JP H0293076A JP 24677288 A JP24677288 A JP 24677288A JP 24677288 A JP24677288 A JP 24677288A JP H0293076 A JPH0293076 A JP H0293076A
Authority
JP
Japan
Prior art keywords
fine metal
electroless plating
metal bodies
soln
plating
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP24677288A
Other languages
Japanese (ja)
Other versions
JPH0613753B2 (en
Inventor
Eisaku Kuninobu
国信 栄作
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
SANKO TOKUSHU KINZOKU KOGYO KK
Original Assignee
SANKO TOKUSHU KINZOKU KOGYO KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by SANKO TOKUSHU KINZOKU KOGYO KK filed Critical SANKO TOKUSHU KINZOKU KOGYO KK
Priority to JP63246772A priority Critical patent/JPH0613753B2/en
Publication of JPH0293076A publication Critical patent/JPH0293076A/en
Publication of JPH0613753B2 publication Critical patent/JPH0613753B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/18Pretreatment of the material to be coated
    • C23C18/20Pretreatment of the material to be coated of organic surfaces, e.g. resins
    • C23C18/28Sensitising or activating

Abstract

PURPOSE:To produce fine metal bodies utilized for electroless plating as a substitute for a catalyst by simple operation by adding a dispersant and a complexing agent to an aq. metallic salt soln., reducing the salt with a reducing agent and further adding a stabilizer. CONSTITUTION:A dispersant such as gelatin and a complexing agent such as monocarboxylic acid are added to an aq. metallic salt soln. contg. ions of Ni, Co, Cu, etc. An aq. soln. of a reducing agent such as sodium borohydride is poured while stirring to reduce the metallic salt and a stabilizer such as sodium hypochlorite is further added to the soln. contg. fine metal bodies formed by the reduction. A product to be plated is immersed in the soln. contg. the metal bodies to stick the metal bodies and plating is deposited on the product by immersion in an electroless plating soln. The fine metal bodies are used in the case of an electrically nonconductive material and a product on which a deposition reaction by electroless plating does not easily take place.

Description

【発明の詳細な説明】 〔産業上の利用分野〕 この発明は、ニッケル、コバルト、銅イオン等を利用し
て、無電解メッキに利用される微細な金属体の製造方法
に関するものである。
DETAILED DESCRIPTION OF THE INVENTION [Industrial Application Field] The present invention relates to a method for manufacturing fine metal bodies used in electroless plating using nickel, cobalt, copper ions, etc.

〔従来の技術〕[Conventional technology]

従来、非導電性物質及び無電解メッキの析出反応が容易
に起こらない被メッキ物に対して、広く用いられている
無電解メッキを行う方法としては被メッキ物を塩化第一
錫の塩酸溶液に浸漬させ、還元力の強い第一錫イオン結
合させ水洗いを行った後に塩化パラジウムの塩酸溶液に
浸漬させ、レドックス反応により被メッキ物表面にパラ
ジウム核を沈着させ、パラジウム核を触媒として、無電
解メッキを行い、メッキ被膜を得る方法はよく知られて
いる。外にもパラジウムやスズコロイドを利用するいく
つかの方法が知られている。
Conventionally, a widely used method for electroless plating for non-conductive substances and objects to which electroless plating precipitation reactions do not easily occur is to place the object to be plated in a hydrochloric acid solution of stannous chloride. It is immersed in a solution of palladium chloride in hydrochloric acid to bond with stannous ions, which have a strong reducing power, and then immersed in a hydrochloric acid solution of palladium chloride to deposit palladium nuclei on the surface of the plated object through a redox reaction. Using the palladium nuclei as a catalyst, electroless plating is performed. The method for obtaining a plated film is well known. Several other methods using palladium and tin colloids are also known.

(公開特許公報昭61〜207667号、昭61〜18
6480号) しかしながら、これらの方法は貴金属を核として使用す
るために、無電解メッキ液中に被メッキ物から離れた貴
金属触媒が無電解メッキ液の自己分解の大きな要因にな
るという欠点があり、また触媒が貴金属であるために生
産コストに占める、触媒を付与する作業工程上に掛かる
コストの割合が大きい欠点がある。そしてまた、塩化第
一錫塩酸溶液を使用する方法は、酸性や塩酸に弱い被メ
ッキ物に対しては、表面を損傷するという欠点があった
(Publication Patent Publication No. 1986-207667, 1983-18
(No. 6480) However, since these methods use noble metals as the core, they have the disadvantage that the noble metal catalyst that is separated from the object to be plated in the electroless plating solution becomes a major factor in the self-decomposition of the electroless plating solution. Furthermore, since the catalyst is a noble metal, there is a drawback that the cost involved in the process of applying the catalyst is large in the production cost. Furthermore, the method of using a stannous chloride hydrochloric acid solution has the disadvantage of damaging the surface of objects to be plated that are sensitive to acids and hydrochloric acid.

〔発明が解決しようとする問題点〕[Problem that the invention seeks to solve]

従来における無電解メッキの触媒は、貴金属触媒を利用
するものであるため貴金属触媒の混入による無電解メッ
キ液の自己分解、貴金属触媒の使用による生産コストの
増加及び被メッキ物表面が貴金属触媒を含む酸性水溶液
によって、損傷するという欠点があったが、この発明は
それらの問題を克服し貴金属触媒の代替え品を簡単なI
’を作で、しかも大量に安価で生産し得て工業的に実施
するのに有利な無電解メッキに利用される触媒の代替え
品となる微細な金属体の製造を提供しようとするもので
ある。
Conventional electroless plating catalysts use precious metal catalysts, so there are problems such as self-decomposition of the electroless plating solution due to the contamination of precious metal catalysts, increased production costs due to the use of precious metal catalysts, and the surface of the object to be plated containing precious metal catalysts. However, the present invention overcomes these problems and provides a simple and easy-to-use alternative to precious metal catalysts.
The present invention aims to provide a method for producing fine metal bodies that can be used as a substitute for catalysts used in electroless plating, which can be produced in large quantities at low cost, and is advantageous for industrial implementation. .

〔問題点を解決するだめの手段] 上記の目的を達成するために、本発明は無電解メッキに
ついて鋭意研究を重ねた結果、初めて貴金属の触媒を使
用せずに上記の問題点を解決したすなわちニッケル、コ
バルト、銅イオンを還元処理することにより、無電解メ
ッキの触媒代替え品にし得ることを発見し、この知見を
基に本発明をなすに到ったものである。本発明では、ニ
ッケル、コバルト、銅イオンを含む水溶液を還元剤によ
り還元処理を行い微細な金属体を生成させた後、これを
無電解メッキ触媒の代替え品として利用する。
[Means for Solving the Problems] In order to achieve the above object, the present invention has conducted intensive research on electroless plating, and as a result, the present invention has solved the above problems without using a precious metal catalyst for the first time. It was discovered that by reducing nickel, cobalt, and copper ions, they can be used as catalyst substitutes for electroless plating, and based on this knowledge, the present invention was developed. In the present invention, an aqueous solution containing nickel, cobalt, and copper ions is reduced with a reducing agent to generate fine metal bodies, which are then used as a substitute for an electroless plating catalyst.

本発明において金属塩水溶液を得るには、水を溶媒とし
て水に可溶な金属塩化合物である。
In order to obtain a metal salt aqueous solution in the present invention, a water-soluble metal salt compound is used as a solvent.

代表的な例としては、酢酸ニッケル(II)  ・4水
和物、硫酸ニッケル(II)アンモニウム・6水和物、
炭酸ニッケル(n)  ・4水和物、塩化ニッケル(I
I)  ・6水和物、硫酸ニッケル(II) ・6水和
物、酢酸コバルト(■)・4水和物、コバル’ト(If
)アンモニウム・6水和物、塩化コバルト(II)  
・6水和物、&tlWニアンモニウムコバルト(n) 
 ・6水和物、りん酸コバルト・8水和物、硫酸コバル
l−(II)  ・7水和物、酢酸銅(II)1水和物
、塩酸銅(n)  ・2水和物、塩化ニアンモニウム銅
(If)  ・2水和物、りん酸銅(II)3水和物、
塩化カリウム銅(n)  ・2水和物、硫酸銅(II)
  ・5水和物、及び塩化ニッケル(II)、硫酸ニッ
ケル(■)、塩化銅(■)、硫酸銅(■)、塩化コバル
ト(II) 、’6AMコバルト(II)等である。
Typical examples include nickel (II) acetate tetrahydrate, nickel (II) sulfate ammonium hexahydrate,
Nickel carbonate (n) ・tetrahydrate, nickel chloride (I
I) - Hexahydrate, nickel (II) sulfate - Hexahydrate, cobalt acetate (■) - Tetrahydrate, cobalt (If
) ammonium hexahydrate, cobalt(II) chloride
・Hexahydrate, &tlW ammonium cobalt (n)
・Hexahydrate, cobalt phosphate octahydrate, cobalt sulfate l-(II) ・7hydrate, copper(II) acetate monohydrate, copper hydrochloride (n) ・dihydrate, chloride Niammonium copper (If) dihydrate, copper (II) phosphate trihydrate,
Potassium copper (n) chloride dihydrate, copper (II) sulfate
- Pentahydrate, nickel (II) chloride, nickel sulfate (■), copper chloride (■), copper sulfate (■), cobalt (II) chloride, '6AM cobalt (II), etc.

還元剤として使用される薬品は、水素化ホウ素ナトリウ
ム、水素化ホウ素カリウム、ジメチルアミンボランなど
の使用により還元処理を行う。
Reduction treatment is performed by using the chemicals used as reducing agents, such as sodium borohydride, potassium borohydride, and dimethylamine borane.

微細な金属体を水溶液中で分散させるために、還元処理
を行う前に金属イオンを含む水溶液中に分散剤を予め混
入し撹拌して置く必要がある。
In order to disperse fine metal bodies in an aqueous solution, it is necessary to mix a dispersant into the aqueous solution containing metal ions and stir it before performing the reduction treatment.

分散剤としてはゼラチンを使用し、目的別により界面活
性剤等を入れる。通常はゼラチンで十分使用できるが、
界面活性剤を使用するときには被イオン系の界面活性剤
を用いるとよい。微細な金属体を分散させ被メッキ物に
付着が容易に起こるように、分散剤により水溶液の調整
を行う。
Gelatin is used as a dispersant, and surfactants and the like are added depending on the purpose. Gelatin is usually sufficient, but
When using a surfactant, it is preferable to use an ionizable surfactant. The aqueous solution is adjusted using a dispersant so that the fine metal bodies are dispersed and easily adhere to the object to be plated.

また還元処理により生成された微細な金属体がイオンに
、戻るのを防止するために、微細な金属体を含む溶液中
に、安定剤としてジメチルアミンボラン、または次亜リ
ン酸ナトリウムをIO〜40g/lの範囲で加えて常に
溶液中では、ゆるやかな還元反応が起こる状態にしてお
き、微細な金属体の存在を安定化させる。
In addition, in order to prevent the fine metal bodies generated by the reduction treatment from returning to ions, IO~40g of dimethylamine borane or sodium hypophosphite is added as a stabilizer to the solution containing the fine metal bodies. /l and always maintain a state in which a slow reduction reaction occurs in the solution to stabilize the presence of fine metal bodies.

微細な金属体を含む溶液を被メッキ物の表面状態により
、溶液のPH=1〜10の範囲内で変更することも可能
で、PHを変更する場合には、錯化剤を入れた後に、硫
酸、塩酸等の酸性を示す水溶液や水酸化ナトリウム等の
アルカリ性を示す物質を入れて被メッキ物の表面状態を
損傷しないようなPHの値に変更して使用する。PHを
調整する場合は錯化剤を入れ水酸化物が出来るのを防止
する。
It is also possible to change the pH of the solution containing fine metal bodies within the range of 1 to 10 depending on the surface condition of the object to be plated. When changing the pH, after adding the complexing agent, It is used after adding an acidic aqueous solution such as sulfuric acid or hydrochloric acid or an alkaline substance such as sodium hydroxide to change the pH value so as not to damage the surface condition of the object to be plated. When adjusting the pH, add a complexing agent to prevent the formation of hydroxides.

錯化剤は、モノカルボン酸、ジカルボン酸、オキシカル
ボン酸、及びカルボン酸塩類を使用する。代表的な例と
して安息香酸、コハク酸、乳酸、酢酸ナトリウムなどを
10〜50g/l入れて水酸化物の生成を錯化剤により
生成しないようにした後にPHの調整を行い使用する。
As complexing agents, monocarboxylic acids, dicarboxylic acids, oxycarboxylic acids, and carboxylic acid salts are used. As a typical example, 10 to 50 g/l of benzoic acid, succinic acid, lactic acid, sodium acetate, etc. are added to prevent the formation of hydroxide using a complexing agent, and then the pH is adjusted before use.

溶媒としてはイオン交換水または蒸留水を使用する。Ion-exchanged water or distilled water is used as the solvent.

このようにして上記の諸試薬を使用して無電解メッキの
触媒立替え品となる微細な金属体を製造するものである
In this way, the above-mentioned reagents are used to produce fine metal bodies that can be used as catalyst substitutes for electroless plating.

金属塩は5〜50 g / fの範囲で溶媒中に溶かし
、分散剤は1〜10g//!の濃度範囲で溶かし、撹拌
しながら金属イオンを還元処理する。
The metal salt is dissolved in the solvent in the range 5-50 g/f, the dispersant is 1-10 g//! The metal ions are reduced while stirring.

還元剤の濃度は金属イオン濃度、金属塩の種類により多
少異なるが、通常は1〜40g/lの範囲内で使用され
る。
The concentration of the reducing agent varies somewhat depending on the metal ion concentration and the type of metal salt, but is usually used within the range of 1 to 40 g/l.

上記の手順で製造された、微細な金属体を使用して非電
導性物質及び無電解メッキ被膜の析出が容易に起こらな
い被メッキ物に対しては、微細な金属体を含む溶液中に
被メッキ物を浸漬させ、微細な金属体を付着した後に、
被メッキ物表面に付着が十分でない微細な金属体を水で
洗い流して、無電解メッキ液中に浸漬して被メッキ物表
面にメッキ被膜の析出を行うものである。
For objects to be plated that use fine metal objects manufactured by the above procedure and do not allow easy deposition of non-conductive substances and electroless plated coatings, After dipping the plated object and attaching fine metal objects,
Fine metal bodies that are not sufficiently adhered to the surface of the object to be plated are washed away with water, and then immersed in an electroless plating solution to deposit a plating film on the surface of the object to be plated.

〔基本的な原理としての作用〕[Function as a basic principle]

本発明の微細な金属体の特徴の一つである、微細な物体
はど質量光たりの表面積の割合が増加することはよく知
られている事柄である。
It is well known that one of the characteristics of the fine metal body of the present invention is that the surface area ratio of a fine body to light increases.

この質量と表面積との関係を利用して、被メッキ物に微
細な金属体を付着させることで、実質はプラスチックな
がらプラスチックの表面は微細な金属体によって覆われ
、被メッキ物の表面は一種の金属と同様になり、通常の
パラジウムを使用した触媒効果とは根本的に異なる作用
で被メッキ物に金属メッキ被膜を得ることが可能である
Utilizing this relationship between mass and surface area, by attaching fine metal objects to the object to be plated, the surface of the plastic is covered with fine metal objects even though it is actually plastic, and the surface of the object to be plated becomes a kind of It is similar to metal, and it is possible to obtain a metal plating film on the object to be plated with an effect fundamentally different from the catalytic effect using ordinary palladium.

〔実施例=1〕 硫酸ニッケル・6水和物を30gとゼラチン3gを蒸留
水1j2に溶かし、よく撹拌を行いながら水素化ホウ素
ナトリウム25g/fを溶かした溶液200m!を前記
撹拌している水溶液中に徐々に加えて金属塩の還元処理
を行い、還元処理された微細な金属体を含む溶液中に、
次亜リン酸ナトリウム30gを安定剤として入れた後に
、硫酸を入れてPH=1に調整した後に、エツチングさ
れたABS樹脂を微細な金属体を含む溶液中に浸漬し、
付着させて水洗いを行い、一般的によく知られている、
硫酸ニッケル26 g / f 、酢酸ナトリウム26
呂/!、クエン酸ナトリウム15g/L 次亜リン酸ナ
トリウム16g/L チオ尿素3ppm、温度90°C
−P H在5.0の組成条件で無電解ニッケルメッキ液
中に浸漬し、ABS樹脂表面にニッケルメッキ被膜の析
出を行う。1時間無電解ニッケルメッキ液中に浸漬した
ところ、約17μのニッケルメッキ被膜を得ることがで
きた。
[Example = 1] 30g of nickel sulfate hexahydrate and 3g of gelatin were dissolved in 1j2 of distilled water, and while stirring well, 200ml of a solution was prepared by dissolving 25g/f of sodium borohydride! is gradually added to the stirring aqueous solution to reduce the metal salt, and in the solution containing the reduced fine metal bodies,
After adding 30 g of sodium hypophosphite as a stabilizer, adding sulfuric acid and adjusting the pH to 1, the etched ABS resin was immersed in a solution containing fine metal bodies.
It is generally well known that it is applied and washed with water.
Nickel sulfate 26 g/f, sodium acetate 26
Ro/! , Sodium citrate 15g/L Sodium hypophosphite 16g/L Thiourea 3ppm, Temperature 90°C
A nickel plating film is deposited on the ABS resin surface by immersing it in an electroless nickel plating solution under the composition condition of -PH content of 5.0. When it was immersed in an electroless nickel plating solution for 1 hour, a nickel plating film of about 17μ could be obtained.

〔実施例:2〕 塩化ニッケル・6水和物10gとゼラチIgを蒸留水1
1に溶かし、十分に撹拌を行いながら、水素化ホウ素ナ
トリウム30g/lを溶かした液100m1を、撹拌さ
れている前記水溶液中へ徐々に加えて還元処理を行い、
微細な金属体を製造した後に安定剤を加えて、前記の実
施例1と同様にエツチングされたABS樹脂を用いてニ
ッケルメッキを行った。
[Example: 2] 10 g of nickel chloride hexahydrate and 1 g of gelatin in distilled water
1, and while stirring thoroughly, 100 ml of a solution containing 30 g/l of sodium borohydride was gradually added to the aqueous solution being stirred to perform a reduction treatment,
After producing a fine metal body, a stabilizer was added and nickel plating was performed using etched ABS resin in the same manner as in Example 1 above.

〔実施例:3) 硫酸コバルl−(II)  ・7水和物を20gとゼラ
チン5gを、蒸留水11に溶かし、よく撹拌を行いなが
ら水素化ホウ素ナトリウム40g/lをとかした?&1
00mfを撹拌されている前記の水?容液中へ徐々に加
えて還元処理を行い、微細な金属体を製造した後に、次
亜リン酸ナトリウム30g、錯化剤として酢酸ナトリウ
ムを20gを溶かし、微細な金属体に入れた後、水酸化
ナトリウムによりPH=10、に調整する。
[Example: 3] Kobal sulfate l-(II) - 20 g of heptahydrate and 5 g of gelatin were dissolved in 11 parts of distilled water, and 40 g/l of sodium borohydride was dissolved while stirring well. &1
The above water being stirred at 00mf? After gradually adding it to the solution and performing reduction treatment to produce a fine metal body, dissolve 30 g of sodium hypophosphite and 20 g of sodium acetate as a complexing agent, add it to the fine metal body, and add water. Adjust the pH to 10 with sodium oxide.

エツチングされたABS樹脂を微細な金属体溶液中に浸
漬して、ABS樹脂表面に付着させ水洗いした後に無電
解コバルトメッキ浴中にてコバルトメッキ被膜を得るこ
とができる。
After the etched ABS resin is immersed in a fine metal solution to adhere to the ABS resin surface and washed with water, a cobalt plating film can be obtained in an electroless cobalt plating bath.

コバルトメッキ浴の組成は硫酸コバルト・7水和物20
 g / f、次亜リン酸ナトリウム21 g / f
、酒石酸すトリウム115g/f、はう酸30g/1.
. PH=9.0温度90°Cの浴組成でメッキを行っ
た。1時間の無電解コバルトメッキ液に浸漬したところ
、13μのコバルトメッキ被膜を得ることができた〔実
施例=4〕 硫酸銅(II)  ・2水和物を15gとゼラチンIg
を蒸留水1j2に溶かし撹拌しながら、水素化ホウ素ナ
トリウム10 g / fを溶かした400m 12の
水溶液を、前記撹拌されている水溶液へ徐々に加えて還
元処理を行い、微細な金属体を製造する。製造された微
細な金属体の安定剤として次亜リン酸ナトリウム30g
を入れて、エツチングされたABS樹脂を微細な金属体
溶液中に浸漬して水洗いを行い、ABS樹脂表面に付着
させて無電解銅メッキ液中にて銅メッキ被膜を得た。
The composition of the cobalt plating bath is cobalt sulfate heptahydrate 20
g/f, sodium hypophosphite 21 g/f
, storium tartrate 115g/f, oxalic acid 30g/1.
.. Plating was performed with a bath composition of pH=9.0 and temperature of 90°C. When immersed in an electroless cobalt plating solution for 1 hour, a 13μ cobalt plating film could be obtained [Example = 4] 15g of copper (II) sulfate dihydrate and gelatin Ig.
is dissolved in 1j2 of distilled water, and while stirring, 400 m12 of an aqueous solution containing 10 g/f of sodium borohydride is gradually added to the stirred aqueous solution for reduction treatment to produce a fine metal body. . 30g of sodium hypophosphite as a stabilizer for the manufactured fine metal bodies
The etched ABS resin was immersed in a fine metal solution, washed with water, and adhered to the surface of the ABS resin to obtain a copper plating film in an electroless copper plating solution.

無電解銅メッキ液の組成は、硫酸銅10 g / ff
i、エチレンジアミン4酢酸2ナトリウム30 g/ 
l、ホルムアルデヒド(37%)3mf/f、ビピリジ
ル若干、ポリエチレングリコール若干、PH=12.2
、温度70°Cの浴組成を使用した。
The composition of the electroless copper plating solution is copper sulfate 10 g/ff.
i, ethylenediaminetetraacetic acid disodium 30 g/
l, formaldehyde (37%) 3mf/f, some bipyridyl, some polyethylene glycol, PH=12.2
, a bath composition with a temperature of 70°C was used.

1時間にわたり無電解銅メッキ液に浸漬したところ、2
.2μの銅メッキ被膜を得ることができた。
When immersed in electroless copper plating solution for 1 hour, 2
.. A copper plating film with a thickness of 2μ could be obtained.

〔発明の効果] 本発明は、以上説明したように構成されているので、以
下記述のような幾多の効果を奏する。
[Effects of the Invention] Since the present invention is configured as described above, it has many effects as described below.

本発明方法に従うと、非導電性物質及び無電解メッキの
析出反応が容易に起こらない被メッキ物に対し無電解メ
ッキ浴の種類と同じ金属の微細な金属体を用いることが
でき、無電解メ・ツキ浴中に不要な異種金属の混入を防
ぐことができて無電解メッキ液の自己分析の危険性を少
なくすることができる。また従来の錫・パラジウム触媒
を使用するのに比べて約30%近く安い費用で製造する
ことができる。さらに実用上最大な問題であった微細な
金属体の安定化の条件も、次亜リン酸ナトリウムやジメ
チルアミンボランを調整しながら添加することによって
、微細な金属体が安定な状態で利用できる。なお通常行
われる貴金属触媒の回収や錫を含む塩酸水溶液の使用が
ないため、作業工程の簡略化などにより、製品価格を低
減する効果は大きく、貴金属触媒を使用しないため生産
コストを抑えて、容易に金属塩濃度を増加させ、被メッ
キ物表面に付着する微細な金属体を増加させることによ
り、析出速度を早めることが可能で析出されたメッキ被
膜の密着力においても従来の触媒と比較して勝るとも劣
ることはない。
According to the method of the present invention, fine metal objects of the same type as the electroless plating bath can be used for non-conductive substances and objects to be plated in which the precipitation reaction of electroless plating does not easily occur.・It is possible to prevent unnecessary dissimilar metals from being mixed into the plating bath, reducing the risk of self-analysis of the electroless plating solution. It can also be produced at a cost approximately 30% cheaper than using conventional tin/palladium catalysts. Furthermore, the conditions for stabilizing fine metal bodies, which has been the biggest problem in practice, can be solved by adding sodium hypophosphite and dimethylamine borane while adjusting the conditions, so that fine metal bodies can be used in a stable state. Furthermore, since there is no need to recover precious metal catalysts or use an aqueous hydrochloric acid solution containing tin, which is usually done, the work process is simplified, which has a significant effect of reducing product prices. By increasing the metal salt concentration and increasing the number of fine metal bodies that adhere to the surface of the plated object, it is possible to accelerate the deposition rate, and the adhesion of the deposited plating film is also superior to that of conventional catalysts. There's nothing better or worse.

またメッキ作業工程上で生ずる各種メッキ廃液の利用に
おいて、同様の触媒を得ることは実施例中の無電解メッ
キ浴の液組成と、微細な金属体を得る液組成は、はぼ同
じで微細な金属体を廃液から得ることは困難ではない。
In addition, in the use of various plating waste liquids generated during the plating work process, the liquid composition of the electroless plating bath in the example and the liquid composition for obtaining fine metal bodies are almost the same to obtain a similar catalyst. It is not difficult to obtain metal objects from waste liquids.

資源の有効利用からも本発明の効果が期待できるもので
ある。
The effects of the present invention can also be expected from the effective use of resources.

手続ネ市正書(自発) 平成 1年11月28日 特許庁格官 吉  1) 文  毅 殿1、事件の表示 昭和63年 特許側 第246772号2 発明の名称 無電解メッキに利用される微細な金属体の製造方法 3、補正をする者 事件との関係  特許出願人 住所 氏名   三晃特殊金属工業株式会社 4、代理人 ■730 酋082−221〜38095、補正命令の
日付 自発 以上 7、補正の内容 (1)  明細書第1頁第5行目よりの特許請求の範囲
を別紙の通り訂正する。(訂正箇所アンダーライン(2
)明細書第6頁第6行目「通常は・・・」より第8行目
「・・・を用いるとよい。」までを削除する。
Procedural official document (spontaneous) November 28, 1999 Patent Office Ranking Officer Yoshi 1) Moon Takeshi 1, Indication of the case 1986 Patent side No. 246772 2 Name of the invention Fine particles used in electroless plating Method of manufacturing a metal body 3, Relationship with the case of the person making the amendment Patent applicant address Name: Sanko Special Metal Industry Co., Ltd. 4, Agent ■730 No. 082-221~38095, Date of amendment order Voluntary or more 7, Amendment Contents (1) The scope of claims starting from line 5 on page 1 of the specification is corrected as shown in the attached sheet. (Corrected part underlined (2)
) Delete from page 6 of the specification, line 6 "Usually..." to line 8 "It is better to use...".

(3)明細書第6頁第14行目「10〜40g」を「3
〜40g」と訂正する。
(3) “10-40g” on page 6, line 14 of the specification is “3”
〜40g''.

(4)明細書第8頁第20行目「・・・と同様になり、
Jの次に「メッキ浴の自己触媒性を利用してメッキの析
出反応を起こすことにより、」を挿入する。
(4) Page 8, line 20 of the specification: “Same as...
After J, insert "by causing a plating precipitation reaction using the autocatalytic properties of the plating bath."

(5)明細書第12頁第18行目「自己分析」とあるを
「自己分解」と訂正する。
(5) On page 12, line 18 of the specification, the phrase "self-analysis" is corrected to "self-decomposition."

以上 〔別紙〕 2、特許請求の範囲 (1)金属塩の水溶液中に、分散剤、錯化剤を入れて還
元剤により還元処理した後に安定剤を混入して、無電解
メッキに利用される微細な金属体の製造方法。
Above [Attachment] 2. Claims (1) A dispersant and a complexing agent are added to an aqueous solution of a metal salt, and after reduction treatment with a reducing agent, a stabilizer is mixed and used for electroless plating. A method for manufacturing fine metal bodies.

(2)金属塩水溶液が、ニッケルイオン、コバルトイオ
ン、銅イオンを含む水溶液である特許請求の範囲第1項
記載の方法。
(2) The method according to claim 1, wherein the metal salt aqueous solution is an aqueous solution containing nickel ions, cobalt ions, and copper ions.

(3)分散剤が、ゼラチン、界面活性剤等である特許請
求の範囲第1項記載の方法。
(3) The method according to claim 1, wherein the dispersant is gelatin, a surfactant, or the like.

(4)錯化剤が、モノカルボン酸、ジカルボン酸1オキ
シカルボン酸、またはカルボン酸塩類である特許請求の
範囲第1項記載の方法。
(4) The method according to claim 1, wherein the complexing agent is a monocarboxylic acid, a dicarboxylic acid, a monocarboxylic acid, or a carboxylic acid salt.

(5)還元剤が、水素化ホウ素ナトリウム、水素化ホウ
素カリウム1 ジメチルアミンボランである特許請求の
範囲第1項記載の方法。
(5) The method according to claim 1, wherein the reducing agent is sodium borohydride or potassium borohydride 1 dimethylamine borane.

(6)安定剤が、次亜リン酸ナトリウム、ジメチルアミ
ンボランである特許請求の範囲第1項記載の方法。
(6) The method according to claim 1, wherein the stabilizer is sodium hypophosphite or dimethylamine borane.

(力 微細な金属体を含む?@液を、被メ・7キ物の表
面状態により、PH=1〜10に調整する特許請求の範
囲第1項記載の方法。
The method according to claim 1, wherein the liquid containing fine metal objects is adjusted to have a pH of 1 to 10 depending on the surface condition of the object.

Claims (7)

【特許請求の範囲】[Claims] (1)金属塩の水溶液中に、分散剤、錯化剤を入れて還
元剤により還元処理した後に安定剤を混入して、無電解
メッキに利用される微細な金属体の製造方法。
(1) A method for producing fine metal objects used in electroless plating, in which a dispersant and a complexing agent are added to an aqueous solution of a metal salt, the mixture is reduced with a reducing agent, and then a stabilizer is mixed therein.
(2)金属塩水溶液が、ニッケルイオン、コバルトイオ
ン、銅イオンを含む水溶液である特許請求の範囲第1項
記載の方法。
(2) The method according to claim 1, wherein the metal salt aqueous solution is an aqueous solution containing nickel ions, cobalt ions, and copper ions.
(3)分散剤が、ゼラチン、非イオン系界面活性剤であ
る特許請求の範囲第1項記載の方法。
(3) The method according to claim 1, wherein the dispersant is gelatin or a nonionic surfactant.
(4)錯化剤が、モノカルボン酸、ジカルボン酸、オキ
シカルボン酸、またはカルボン酸塩類である特許請求の
範囲第1項記載の方法。
(4) The method according to claim 1, wherein the complexing agent is a monocarboxylic acid, a dicarboxylic acid, an oxycarboxylic acid, or a carboxylic acid salt.
(5)還元剤が、水素化ホウ素ナトリウム、水素化ホウ
素カリウム、ジメチルアミンボランである特許請求の範
囲第1項記載の方法。
(5) The method according to claim 1, wherein the reducing agent is sodium borohydride, potassium borohydride, or dimethylamine borane.
(6)安定剤が、次亜リン酸ナトリウム、ジメチルアミ
ンボランである特許請求の範囲第1項記載の方法。
(6) The method according to claim 1, wherein the stabilizer is sodium hypophosphite or dimethylamine borane.
(7)微細な金属体を含む溶液を、被メッキ物の表面状
態により、PH=1〜10に調整する特許請求の範囲第
1項記載の方法。
(7) The method according to claim 1, wherein the pH of the solution containing fine metal bodies is adjusted to 1 to 10 depending on the surface condition of the object to be plated.
JP63246772A 1988-09-29 1988-09-29 Method for producing solution containing fine metal body used for electroless plating Expired - Lifetime JPH0613753B2 (en)

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JPH0613753B2 JPH0613753B2 (en) 1994-02-23

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JPS6333577A (en) * 1986-07-28 1988-02-13 Hitachi Condenser Co Ltd Electroless plating solution

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