JPS62189622A - Vertical magnetic recording medium - Google Patents

Vertical magnetic recording medium

Info

Publication number
JPS62189622A
JPS62189622A JP3092986A JP3092986A JPS62189622A JP S62189622 A JPS62189622 A JP S62189622A JP 3092986 A JP3092986 A JP 3092986A JP 3092986 A JP3092986 A JP 3092986A JP S62189622 A JPS62189622 A JP S62189622A
Authority
JP
Japan
Prior art keywords
film
perpendicularly magnetized
co2o3
cobalt
magnetized film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP3092986A
Other languages
Japanese (ja)
Inventor
Takayoshi Akamatsu
孝義 赤松
Tetsuo Oka
哲雄 岡
Kenji Hayashi
健二 林
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toray Industries Inc
Original Assignee
Toray Industries Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toray Industries Inc filed Critical Toray Industries Inc
Priority to JP3092986A priority Critical patent/JPS62189622A/en
Publication of JPS62189622A publication Critical patent/JPS62189622A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE:To provide wear resistance sufficient for practical use by forming the surface layer of the vertically magnetized film with a layer consisting essentially of Co2O3. CONSTITUTION:The surface layer of the vertically magnetized film is formed with a layer consisting essentially of Co2O3. The layer consisting essentially of Co2O3 can be recognized by the fact that a peak characteristic of Co, CoO, Co3O4, and Co(OH)2 is not seen or is not predominant in the measurement of a cobalt atom by XPS (X-ray Photoelectron Spectroscopy) and only the peak characteristic of Co2O3 can be observed. Although the thickness of the layer consisting essentially of Co2O3 is preferably decreased not to increase a spacing loss, some thickness is needed to impart sufficient wear resistance. Accordingly, the thickness is preferably controlled to 50-500Angstrom .

Description

【発明の詳細な説明】 [産業上の利用分野] 本発明は、垂直磁気記録媒体に関する。更に詳しくは、
コバルトおよび酸化コバルトから主として成る垂直磁化
膜を備え、耐摩耗性が改良された薄膜型の垂直磁気記録
媒体に関′する。
DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a perpendicular magnetic recording medium. For more details,
The present invention relates to a thin film type perpendicular magnetic recording medium having a perpendicular magnetization film mainly composed of cobalt and cobalt oxide and having improved wear resistance.

[従来の技術] 垂直磁気記録媒体を構成する垂直磁化膜としては、コバ
ルト−クロムなどのコバルトと他の金属との合金薄膜が
代表的なものとして知られている。
[Prior Art] As a perpendicularly magnetized film constituting a perpendicular magnetic recording medium, an alloy thin film of cobalt and other metals such as cobalt-chromium is known as a typical film.

これらの垂直磁化膜は、通常、スパッタリングや真空蒸
着で基体上に形成される。しかしながら、スパッタリン
グによるコバルト合金膜は、膜生成速度が遅く、また、
コバルト合金を電子ビーム蒸着する方法では合金組成の
制御が困難でおるという問題がある。また、両方法とも
磁気特性の良い膜を1qるには、基体を150〜300
′C程度の高温に加熱しなければならないという難点が
あり、特にプラスチック基体を使用する上で、大きな障
害となっている。
These perpendicularly magnetized films are usually formed on a substrate by sputtering or vacuum deposition. However, cobalt alloy films formed by sputtering have a slow film formation rate, and
The method of electron beam evaporation of cobalt alloys has a problem in that it is difficult to control the alloy composition. In addition, in both methods, in order to obtain 1 q of film with good magnetic properties, the substrate must be 150 to 300
It has the disadvantage that it must be heated to a high temperature of about 1000 ft, which is a major hindrance especially when using a plastic substrate.

かかる問題を改良する方法として、冷却された基体上に
、コバルトと酸化コバル1−からなる垂直磁化膜を得る
方法が提案されている(第7回応用磁気学会学術講演概
要集)。
As a method to improve this problem, a method of obtaining a perpendicularly magnetized film consisting of cobalt and cobalt oxide 1- on a cooled substrate has been proposed (Collection of Abstracts of the 7th Academic Conference of the Japan Society of Applied Magnetics).

これらの薄膜型の垂直磁化膜は高密度記録に適した特性
を持つものの、磁気ヘッドやガイドなどとの接触により
傷が入ったり剥離が生じたりし易く、耐摩耗性を向上さ
せることが実用化する上で最大の課題とされている。
Although these thin perpendicularly magnetized films have characteristics suitable for high-density recording, they are easily scratched or peeled off when they come into contact with magnetic heads, guides, etc., so it is important to improve their wear resistance for practical use. This is considered to be the biggest challenge in doing so.

耐摩耗性を向上させるためには種々の試みがなされてい
るが、垂直磁化膜自体の表層を酸化してやることが効宋
的だとされている。中でも垂直磁化膜を形成した後、そ
の表層を酸化してやる方法は、酸化に伴う体積膨張にJ
:って表層が緻密化し、大きく耐摩耗性を向上できると
され、コバルトを含む強磁性体層の表層にCoOとCo
3O4からなる保護層を形成させることが提案されてい
る(特開昭58−41439号公報)。
Various attempts have been made to improve wear resistance, but it is believed that oxidizing the surface layer of the perpendicularly magnetized film itself is effective. Among them, the method of forming a perpendicularly magnetized film and then oxidizing its surface layer is a method that reduces the volume expansion caused by oxidation.
: It is said that the surface layer becomes denser and the wear resistance can be greatly improved.
It has been proposed to form a protective layer made of 3O4 (Japanese Unexamined Patent Publication No. 58-41439).

[発明が解決しようとする問題点] しかしながら、この技術の場合、垂直磁化膜表層はco
o、Co3O4から主として成る状態に酸化されている
にもかかわらず、実用化に充分な耐摩耗性を協えていな
いことが明らかになった。
[Problems to be solved by the invention] However, in the case of this technology, the perpendicularly magnetized film surface layer is co
It has become clear that despite being oxidized to a state consisting mainly of o, Co3O4, it does not have sufficient wear resistance for practical use.

本発明者らは、耐摩耗性に優れたコバル]〜および酸化
コバルトから主としてなる垂直磁化膜を得んと鋭意検討
した結果、本発明に到達した。
The present inventors have conducted intensive studies to obtain a perpendicularly magnetized film mainly composed of cobalt and cobalt oxide, which have excellent wear resistance, and have finally arrived at the present invention.

し問題点を解決するための手段コ 即ち、本発明は、基体上に、コバルトおよび酸化コバル
トから主としてなる膜厚方向に磁気異方性を有する垂直
磁化膜を備えた垂直磁気記録媒体であって、該垂直磁化
膜表層がCo2O3から主としてなる層で形成されてな
ることを特徴とする垂直磁気記録媒体である。
Means for Solving the Problems Namely, the present invention provides a perpendicular magnetic recording medium comprising, on a substrate, a perpendicular magnetization film mainly made of cobalt and cobalt oxide and having magnetic anisotropy in the film thickness direction. , a perpendicular magnetic recording medium characterized in that the surface layer of the perpendicular magnetic film is formed of a layer mainly composed of Co2O3.

本発明でいうCo2O3から主としてなる層とは、X 
P S (X−ray Photoelectron 
5pectroscopy)によるコバルト原子のピー
ク測定において、C01coo、Co3O4およびCo
(OH)2特有のピークが見られず、もしくは支配的で
なく、Co2O3特有のピークのみが観察されることか
ら判定される。
In the present invention, the layer mainly composed of Co2O3 means
P S (X-ray Photoelectron
In the peak measurement of cobalt atoms by 5pectroscopy, C01coo, Co3O4 and Co
This is determined based on the fact that (OH)2-specific peaks are not observed or are not dominant, and only Co2O3-specific peaks are observed.

Co2O3から主としてなる層の厚さは、スペーシング
ロスを増大さゼないために薄い方が良く、また十分な耐
摩耗性を現出されるためにはめる程度の厚みが必要であ
るため、20人から700人の範囲であることか好まし
く、更に50人から500大の範囲であることが好まし
い。50人から300大の範囲であることが最も好まし
い。
The thickness of the layer mainly made of Co2O3 should be thinner to avoid increasing spacing loss, and it needs to be thick enough to fit into the layer to provide sufficient wear resistance. The number of participants is preferably in the range of 700 to 700, and more preferably 50 to 500. Most preferably, the number ranges from 50 to 300 people.

Co2O3から主としてなる層の厚さは、XPSによる
測定と試料のエツチングを繰返し行ない、co、coo
、Co3O4、Go (OH)2特有のピークが見られ
ないか、または支配的でなく、Co2O3特有のピーク
のみが観察される試料最表層から、Co、Coo、Co
3O4、Co (OH)2特有のピークが現われ始める
位置までのエッヂング深さをいう。
The thickness of the layer mainly composed of Co2O3 was determined by repeated XPS measurements and sample etching.
, Co3O4, Go Co, Coo, Co
3O4, refers to the edging depth to the position where the unique peak of Co(OH)2 begins to appear.

Co2O3から主としてなる層とは、Co2O3以外の
元素や化合物、例えば、鉄、ニッケル、銅、クロム、ア
ルミニウム、炭素、シリコン、バナジウム、チタン、亜
鉛、マンガンヤ金属酸化物などか、原子個数比で20%
以下、好ましくは10%以下含まれていても良い。また
、Co2O3以外の酸化コバルト、水酸化コバルト、コ
バルトは原子個数比で5%以下程度の極く少量であれば
含まれていても良い。
A layer mainly composed of Co2O3 means an element or compound other than Co2O3, such as iron, nickel, copper, chromium, aluminum, carbon, silicon, vanadium, titanium, zinc, manganese metal oxide, etc., with an atomic ratio of 20%.
The content may preferably be 10% or less. Further, cobalt oxide, cobalt hydroxide, and cobalt other than Co2O3 may be contained as long as they are in extremely small amounts of about 5% or less in terms of atomic number ratio.

垂直磁化膜表面にはドーム状突起が形成される。A dome-shaped protrusion is formed on the surface of the perpendicularly magnetized film.

本発明でいうドーム状突起について第1図おJζび第2
図を用いて説明する。第1図は、本発明の垂直磁化膜の
1例の表面形状を示すモデル図、第2図は、本発明の垂
直磁気記録媒体の1例の断面モデルである。
Regarding the dome-shaped protrusion referred to in the present invention, FIGS. 1 and 2
This will be explained using figures. FIG. 1 is a model diagram showing the surface shape of an example of a perpendicularly magnetized film of the invention, and FIG. 2 is a cross-sectional model of an example of a perpendicular magnetic recording medium of the invention.

図において、1は基板、2は該基板]上に形成された垂
直磁化膜で、その表面には微細なドーム状突起3が形成
されている。該突起の断面は、第2図にモデル的に示し
たように鋭角の凸部をもたず、また膜表面側から見てお
おむね円形状の形状を有するものである。
In the figure, 1 is a substrate, 2 is a perpendicularly magnetized film formed on the substrate, and fine dome-shaped protrusions 3 are formed on the surface thereof. The cross section of the protrusion does not have an acute-angled protrusion, as shown in the model in FIG. 2, and has a generally circular shape when viewed from the membrane surface side.

本発明において、ドーム状突起の粒径は第1図において
矢印で示したごとく各々の粒子の最大の幅をいう。
In the present invention, the grain size of the dome-shaped protrusions refers to the maximum width of each grain as indicated by the arrow in FIG.

ドーム状突起の粒径は、小さすぎると表面が平坦になり
すぎて摩擦係数の増加をJnき、また大きすぎるとヘッ
ドなどとの接触時に1つの突起に加わる力が大きくなっ
て、垂直磁化膜損傷の原因となり易いため、50人から
1000人の範囲が良く、より好ましくは、80人から
800人の範囲が良い。
If the grain size of the dome-shaped protrusions is too small, the surface will become too flat, leading to an increase in the coefficient of friction, and if it is too large, the force applied to a single protrusion will increase when it comes into contact with a head, etc., resulting in damage to the perpendicularly magnetized film. Since this can easily cause damage, a range of 50 to 1000 people is preferable, and more preferably a range of 80 to 800 people.

また、ドーム状突起の粒径は前記の好ましい範囲で不揃
いであることが耐摩耗性向上のために望ましい。
Further, it is desirable that the particle diameters of the dome-shaped protrusions be irregular within the above-mentioned preferred range in order to improve wear resistance.

ドーム状突起の密度は、同様に垂直磁化膜の損傷の原因
を少なくするためにI×108個/mm2から4X10
10個/ mm2の範囲が好ましく、更に1.5X10
8個/mm2から1.5X101°個/mm2の範囲が
好ましい。
Similarly, the density of the dome-shaped protrusions is set from I×108 pieces/mm2 to 4×10 to reduce the cause of damage to the perpendicularly magnetized film.
The range of 10 pieces/mm2 is preferable, and the range of 1.5×10
A range of 8 pieces/mm2 to 1.5×101° pieces/mm2 is preferable.

本発明でいうコバルトと酸化コバルトから主としてなる
垂直磁化膜は、表層を除き主としてコバルトおよびco
o、Co3O4などの酸化コバルトによって構成される
。酸化コバルトとしては、この他C00X (XはOを
越え、1.5未満の間の数)で表わされる非化学ω論的
な酸化物、過酸化物も含まれる。
The perpendicularly magnetized film mainly composed of cobalt and cobalt oxide in the present invention is composed mainly of cobalt and cobalt, except for the surface layer.
It is composed of cobalt oxides such as Co3O4 and Co3O4. Cobalt oxide also includes non-stoichiometric oxides and peroxides represented by C00X (X is a number greater than O and less than 1.5).

上記コバルトおよび酸化コバルトから主としてなる垂直
磁化膜には、表層を除きこれら以外の元素や化合物、例
えば鉄、ニッケル、銅、クロム、アルミニウム、炭素、
シリコン、バナジウム、チタン、亜鉛、マンガンや、金
属酸化物、金属窒化物、金属水酸化物などが磁気特性を
損わない範囲で含まれていても良い。
The perpendicularly magnetized film mainly composed of cobalt and cobalt oxide contains elements and compounds other than these, such as iron, nickel, copper, chromium, aluminum, carbon,
Silicon, vanadium, titanium, zinc, manganese, metal oxides, metal nitrides, metal hydroxides, etc. may be contained within the range that does not impair magnetic properties.

本発明でいう膜厚方向に磁気異方性を有する垂直磁化膜
は次のにうに規定される。
The perpendicularly magnetized film having magnetic anisotropy in the film thickness direction as used in the present invention is defined as follows.

JIS  C−2561に示される方法により膜面方向
と膜厚方向のヒステリシスループを測定する。それぞれ
のヒステリシスループで囲まれる面積を算出し、膜面方
向のヒステリシスループを囲まれる面積S〃、膜厚方向
のヒステリシスループで囲まれる面積をSふとする。S
工/ S //を磁気異方性係数とし、この値が1J:
り大ぎいもの、好ましくは1.2以上のもの、最も好ま
しくは1゜4以上のものを垂直磁化膜とする。
The hysteresis loop in the film surface direction and film thickness direction is measured by the method shown in JIS C-2561. The area surrounded by each hysteresis loop is calculated, and the area surrounded by the hysteresis loop in the film surface direction is defined as S, and the area surrounded by the hysteresis loop in the film thickness direction is defined as S. S
Let H/S// be the magnetic anisotropy coefficient, and this value is 1J:
The perpendicular magnetization film is preferably larger than 1.2, most preferably 1°4 or larger.

垂直磁化膜の膜厚は特に制限されないが、実用的には0
.02μmから5μmの範囲が良く、中でも0.03μ
mから3μm、特に0.05μmから2μmの範囲が可
撓性、ヘッドタッチが良好な点て最も好ましい。
The thickness of the perpendicularly magnetized film is not particularly limited, but practically it is 0.
.. A range of 0.02μm to 5μm is best, especially 0.03μm.
A range of m to 3 μm, particularly 0.05 μm to 2 μm is most preferable in terms of flexibility and good head touch.

また、垂直磁化膜表面に、走行性、耐摩耗性向上などの
目的で、他の保護層や潤滑層を一層あるいは複数層積層
させることは適宜許される。
Furthermore, it is permissible to laminate one or more other protective layers or lubricating layers on the surface of the perpendicularly magnetized film for the purpose of improving running properties, wear resistance, etc.

本発明で用いることのできる基体としては、特に限定さ
れるものではないが、アルミニウム、銅、鉄、ステンレ
スなどで代表される金属、ガラス、セラミックなどの無
機材料、プラスチックフィルムなどの有機重合体材料が
挙げられる。特にテープ、フレキシブルディスクなど加
]ニ性、形成性、可l尭性か重視される場合には、イj
機小会体材おlが適しており、中で二bポリエチレンテ
レフタレート、ポリエチーレンプフタレート、ポリエチ
レンジカルボキシレートなどのポリエステル、ポリエチ
レン、ポリプロピレン、ポリブテンなどのポリオレフィ
ン、ポリメチルメタアクリレ−1〜、ポリカーボネート
、ポリスルフ4ン、ポリアミド、芳香族ポリアミド、ポ
リフェニレンスルフィド、ボリフ工具しンオキl、)イ
ド、ポリアミドイミド、ポリイミド、ポリ塩化ビニル、
ポリ塩化ビニリデン、ポリ弗化ビニリデン、ポリテトラ
フルオロエチレン、酢酸セルローズ、メヂルセルローズ
、エチルセルローズ、エポキシ樹脂、ウレタン樹脂ある
いはこれらの混合物、共重合物などが適している。特に
二軸延伸されたフィルム、シート類は、平面性、寸法安
定性に優れ最も適しており、中でもポリエステル、ポリ
フェニレンスルフィド、芳香族ポリアミドなどが最も適
している。
Substrates that can be used in the present invention include, but are not particularly limited to, metals such as aluminum, copper, iron, and stainless steel, inorganic materials such as glass and ceramics, and organic polymer materials such as plastic films. can be mentioned. Particularly in tapes, flexible disks, etc., where flexibility, formability, and flexibility are important,
Suitable materials include polyesters such as polyethylene terephthalate, polyethylene pphthalate, and polyethylene dicarboxylate, polyolefins such as polyethylene, polypropylene, and polybutene, and polymethyl methacrylate. , polycarbonate, polysulfonate, polyamide, aromatic polyamide, polyphenylene sulfide, bolifluoride, polyamideimide, polyimide, polyvinyl chloride,
Polyvinylidene chloride, polyvinylidene fluoride, polytetrafluoroethylene, cellulose acetate, cellulose methyl, cellulose ethyl, epoxy resin, urethane resin, or mixtures and copolymers thereof are suitable. In particular, biaxially stretched films and sheets are most suitable due to their excellent flatness and dimensional stability, and among them, polyester, polyphenylene sulfide, aromatic polyamide, etc. are most suitable.

基体の形状は、ドラム状、ディスク状、シート状、テー
プ状、カード状などいずれでも良く、厚みも特に限定さ
れるものではない。シート状、テープ状、カード状等の
場合、加工性、寸法安定性の点で、厚みは2〜500μ
m、中でも4〜200μmの範囲が好ましい。
The shape of the base body may be any shape such as a drum shape, a disk shape, a sheet shape, a tape shape, a card shape, etc., and the thickness is not particularly limited. In the case of sheets, tapes, cards, etc., the thickness should be 2 to 500μ in terms of processability and dimensional stability.
m, preferably in the range of 4 to 200 μm.

本発明で用いられる単体は、磁性膜などの形成に先だち
、易接着化、平面性改良、着色、帯電防止、耐摩耗性付
与等の目的で各種の表面処理や前処理が施されても良い
Prior to forming a magnetic film, etc., the single substance used in the present invention may be subjected to various surface treatments or pretreatments for the purpose of facilitating adhesion, improving flatness, coloring, preventing static electricity, imparting wear resistance, etc. .

なお、本発明に述べる垂直磁化膜と基体の間には垂直磁
化膜の磁気時・ti向上、耐蝕性向上、接着力面上など
の目的で下地層を一層おるいは複数層積層させることは
適宜許される。特に下地層として軟磁性膜を設(プるこ
とは、記録・再生感度を上げるために大ぎな効果があり
、好ましい。
It should be noted that between the perpendicular magnetization film and the substrate described in the present invention, it is not allowed to laminate one or more underlayers for the purpose of improving the magnetic properties and ti of the perpendicular magnetization film, improving corrosion resistance, improving adhesive strength, etc. Permitted as appropriate. In particular, it is preferable to provide a soft magnetic film as an underlayer because it has a great effect on increasing the recording/reproducing sensitivity.

垂直磁化ll!3および下地層は、基体の片面、両面の
いずれに形成しても良い。
Perpendicular magnetization! 3 and the base layer may be formed on either one side or both sides of the substrate.

コバルトおよび酸化コバルトから主としてなる垂直磁化
膜を形成する方法としては、反応性蒸着、反応性イオン
ブレーティング、反応性スパッタリングなどの真空析出
法があるが、必ずしもこれらに限定されない。以下に反
応性蒸着法によるコバルトおよび酸化コバ・ルトから主
としてなる垂直磁化膜の製法の一例を示す。
Methods for forming a perpendicularly magnetized film mainly made of cobalt and cobalt oxide include, but are not necessarily limited to, vacuum deposition methods such as reactive evaporation, reactive ion blasting, and reactive sputtering. An example of a method for producing a perpendicularly magnetized film mainly made of cobalt and cobalt oxide using a reactive vapor deposition method will be shown below.

1X10−51−−ルに1)1気した後、真空系内に設
置した二軸延伸ポリエヂレンテレフタレートフィルム基
体上に、10 トールから10−2トールの酸素雰囲気
下で電子ビーム蒸着によりコバルトを毎分0.1μmか
ら20μmの速度で蒸着し、コバルトと酸化コバルトか
ら主としてなる垂直磁化膜を形成する。このとき基体の
裏面は、50℃以下に冷却されており、かつ、コバルト
蒸気がフィルム基体に大剣する際、入側蒸気と基体の法
線方向となす角度が45°以下となるよう、蒸発源との
間に遮蔽板を配置する。
1) Cobalt was applied to a biaxially stretched polyethylene terephthalate film substrate placed in a vacuum system by electron beam evaporation in an oxygen atmosphere of 10 Torr to 10 Torr. Vapor deposition is performed at a rate of 0.1 μm to 20 μm per minute to form a perpendicularly magnetized film mainly composed of cobalt and cobalt oxide. At this time, the back side of the substrate is cooled to 50°C or less, and when the cobalt vapor hits the film substrate, the evaporation is carried out so that the angle between the inlet vapor and the normal direction of the substrate is 45° or less. Place a shield plate between the source and the source.

コバルトおよび酸化コバルトから主としてなる垂直磁化
膜表面にドーム状突起を形成し、かつ該垂直磁化膜表層
をCo2O3から主としてなる層とする方法としては、
湿式あるいは乾式でコバルトおよび酸化コバルトから主
としてなる垂直磁化膜表面をエツチングしてドーム状突
起を形成し、次いで熱酸化や陽極酸化などによって該垂
直磁化膜表層を更に酸化してCo2O3とする方法や垂
直磁化膜表面に酸素を含む高エネルギー粒子をイオン源
ヤスバッタエツチング法などを使って照射し、ドーム状
構造とCo2O3の形成を同時に行なう方法があるが、
必ずしもこれらに限定されない。以下にコバルトおよび
酸化コバルトから主としてなる垂直磁化膜表面にドーム
状突起を形成し、かつ該垂直磁化膜表層をCo2O3か
ら主としてなる層とする方法の一例を示す。
A method of forming dome-shaped protrusions on the surface of a perpendicularly magnetized film mainly composed of cobalt and cobalt oxide and making the surface layer of the perpendicularly magnetized film a layer mainly composed of Co2O3 is as follows:
A method of etching the surface of a perpendicular magnetization film mainly made of cobalt and cobalt oxide to form dome-shaped protrusions using a wet or dry method, and then further oxidizing the surface layer of the perpendicular magnetization film to Co2O3 by thermal oxidation or anodic oxidation. There is a method of simultaneously forming a dome-like structure and Co2O3 by irradiating the surface of the magnetized film with high-energy particles containing oxygen using an ion source Yasbatta etching method.
It is not necessarily limited to these. An example of a method of forming a dome-shaped protrusion on the surface of a perpendicularly magnetized film mainly made of cobalt and cobalt oxide, and making the surface layer of the perpendicularly magnetized film a layer mainly made of Co2O3 will be described below.

真空(a内にコバルトおよび酸化コバルトから主として
なる垂直磁化膜をあらかじめ形成した基体を設置し、該
垂直磁化膜表面にイオンを照射できるようにイオン源を
設置する。真空槽内を1X10−5トールに排気した後
、イオン源に酸素ガスを真空槽内が2X10’トールと
なるように供給して、酸素イオンを作る。この酸素イオ
ンを150QeVに加速して該垂直磁化膜表面へ150
μA/dの密度で1分間前則スる。かくして表面にドー
ム状突起を右し、かつ表層がCo2O3から主としてな
るコバルト及び酸化コバル1〜から主としてなる垂直磁
化膜を得る。
A substrate on which a perpendicularly magnetized film mainly made of cobalt and cobalt oxide is pre-formed is installed in a vacuum (a), and an ion source is installed to irradiate the surface of the perpendicularly magnetized film with ions. After evacuation to
Preheat for 1 minute at a density of μA/d. In this way, a perpendicularly magnetized film having dome-shaped protrusions on the surface and whose surface layer is mainly composed of cobalt mainly composed of Co2O3 and cobalt oxides 1 to 1 is obtained.

[作用] コバルトおよび酸化コバルトから主としてなる垂直磁化
膜表層をCo2O3まで更に高度に酸化したことにより
、酸化に伴う体積膨張で表面か緻密化して硬度を増づこ
とができること、かつ、該垂直磁化膜表面に適当な形状
と大ぎさのドーム状突起を形成したことにJ:す、厚耗
係数を小さくでき、また該垂直磁化膜か損傷する原因を
少なくできたことなどの作用で、該垂直磁化膜を備えた
垂直磁気記録媒体の耐摩耗性を大きく向上でき゛たもの
と推察される。また、Co2O3から主としてなる層の
厚さは700Å以下でも十分耐摩耗性向上に効果がある
のでスペーシングロスを小さく保つことができる。
[Function] By oxidizing the surface layer of the perpendicularly magnetized film, which is mainly composed of cobalt and cobalt oxide, to a higher degree of oxidation to Co2O3, the surface becomes denser due to volume expansion accompanying oxidation and hardness can be increased; By forming dome-shaped protrusions of appropriate size and shape on the surface, the thickness coefficient can be reduced and the cause of damage to the perpendicularly magnetized film can be reduced. It is presumed that the wear resistance of the perpendicular magnetic recording medium equipped with the film could be greatly improved. Further, even if the thickness of the layer mainly composed of Co2O3 is 700 Å or less, it is sufficiently effective in improving wear resistance, so that spacing loss can be kept small.

[発明の効果] 本発明は、コバルトおよび酸化コバルトから主としてな
る垂直磁化膜表面にドーム状突起を形成し、かつ該垂直
磁化膜表層をCo2O3から主としてなる層としたので
、スペーシングロスが小さくかつ耐摩耗性の著しく優れ
た垂直磁気記録媒体を得ることができる。
[Effects of the Invention] In the present invention, a dome-shaped protrusion is formed on the surface of a perpendicularly magnetized film mainly made of cobalt and cobalt oxide, and the surface layer of the perpendicularly magnetized film is made a layer mainly made of Co2O3. A perpendicular magnetic recording medium with extremely excellent wear resistance can be obtained.

本発明で得られる垂直磁気記録媒体はデーブ、シー1〜
、カード、ディスク、ドラムなどの形状にて、オーディ
オ、ビデオ、デジタル信号などの磁気記録用に用いるこ
とができる。
The perpendicular magnetic recording medium obtained by the present invention is
It can be used for magnetic recording of audio, video, digital signals, etc. in the form of cards, disks, drums, etc.

特性の測定方法・評価基準 (1)  耐摩耗性試験方法 試料を5.25インチのフレキシブルディスク状に打ち
後き、弗化炭素系の潤滑剤(にRYTOX142ACデ
ュポン社製)を約200人厚に塗布し、ジャケットに納
める。これを市販の片面ヘッド型のフレキシブルディス
クドライブにかけ、300回転後に記録再生を行なう。
Measurement method and evaluation criteria for properties (1) Wear resistance test method A sample was punched into a 5.25-inch flexible disk, and a fluorocarbon-based lubricant (RYTOX142AC manufactured by DuPont) was applied to a thickness of approximately 200 mm. Apply it and put it in the jacket. This was applied to a commercially available single-sided head type flexible disk drive, and recording and reproduction was performed after 300 rotations.

この時の再生出力(E、o)を測定し、次いで同一トラ
ック上を再生出力を測定しながら走行させる。再生出力
がE、。の70%まで低下した時の走行回転数で耐摩耗
性を評価する。
The reproduction output (E, o) at this time is measured, and then the vehicle is run on the same track while measuring the reproduction output. The playback output is E. Abrasion resistance is evaluated based on the running speed when the speed decreases to 70% of the speed.

(2)記録密度の測定 試料を5.25インチのフレキシブルディスク状に打ら
扱き、潤滑剤(にRYTOX143^Cデュポン社製)
を約200人厚に塗布し、ジャケットに納める。この試
料を300 rpmで回転させつつ、ギャップ長が0.
25μmのリングヘッドで方形波を記録し、またその再
生出力を増幅してシンクロスコープ上で測定する。パル
スジェネレーターで発生させる方形波の波長を変化させ
ながら、記録再生を行ない、再生出力が最大値の半分に
低下する記録方形波の波長に対応した1インチ当りの磁
化反転密度(FCPI)を記録密度(D5o)とする。
(2) Measurement of recording density A sample was punched into a 5.25-inch flexible disk, and a lubricant (RYTOX143^C manufactured by DuPont) was applied.
Apply it to a thickness of about 200 people and store it in a jacket. While rotating this sample at 300 rpm, the gap length was set to 0.
A square wave is recorded with a 25 μm ring head, and the reproduced output is amplified and measured on a synchroscope. Recording and reproduction are performed while changing the wavelength of the square wave generated by a pulse generator, and the recording density is determined by the magnetization reversal density per inch (FCPI) corresponding to the wavelength of the recording square wave at which the reproduction output drops to half of the maximum value. (D5o).

(3)  垂直磁化膜表面の突起の観察電界放射型走査
電子顕微鏡(S−800型、日立製作所製)で試料表面
を観察し、突起の粒径および密度を求めた。また、試料
の超薄切片を切り出し、断面形状を透過型電子顕微鏡(
H−600型、日立製作所製)で観察した。
(3) Observation of protrusions on the surface of the perpendicularly magnetized film The sample surface was observed using a field emission scanning electron microscope (Model S-800, manufactured by Hitachi, Ltd.), and the grain size and density of the protrusions were determined. We also cut ultra-thin sections of the sample and examined the cross-sectional shape using a transmission electron microscope.
Observation was made using H-600 model (manufactured by Hitachi, Ltd.).

(4)  垂直磁化膜表層の組成分析 X P S (ESCALAB5 VGサイアンティフ
ィックリミテッド製)を用いて、試料表層の組成および
結合状層を分析した。またCo2O3から主としてなる
層の厚みは、試料のエツチングと、XPSによる測定を
繰返し行ない判定した。Co2O3から主としてなる層
とは、XPSににる測定において、 Co、coo、 
 Co3O4、Co  (OH)2特右のピークが見ら
れないか、または支配的でなく、Co2O3特有のピー
クのみが観察されることで特定される。詳しくは、Co
のメインピークとCo”(7)サテライトピークが見ら
れないか、または支配的でなく、Co2O3特有のピー
クのみが観察されることで特定される。Co2O3から
主としてなる層の厚みは、Co2O3特有のピークのみ
が観察される試料最表層から、Co、CoO1Co30
4、Co(OH)2特有のピークが現われ始める位置ま
でのエツチング深さとする。
(4) Composition analysis of perpendicular magnetization film surface layer The composition and bonded layer of the sample surface layer were analyzed using XPS (ESCALAB5 manufactured by VG Scientific Limited). The thickness of the layer mainly composed of Co2O3 was determined by repeatedly etching the sample and measuring by XPS. A layer mainly composed of Co2O3 means Co, coo,
Co3O4, Co(OH)2-specific peaks are not observed or are not dominant, and are identified by the observation of only Co2O3-specific peaks. For more information, see Co.
It is identified by the fact that the main peak of Co"(7) and the Co" (7) satellite peak are not observed or are not dominant, and only a peak specific to Co2O3 is observed.The thickness of the layer mainly composed of Co2O3 is From the outermost layer of the sample where only peaks are observed, Co, CoO1Co30
4. The etching depth is set to the position where a peak unique to Co(OH)2 begins to appear.

[実施例] 実施例1 基体に二軸延伸された厚さ50μmのポリエヂレンテレ
フタレートフィルムを使用した。
[Examples] Example 1 A biaxially stretched polyethylene terephthalate film with a thickness of 50 μm was used as the substrate.

真空槽内を1X10’l−−ルまでり1気した竣、分圧
比が50:50(体積%)の酸素と窒素の混合ガスを5
X10−4まで導入し、また別に垂直磁化膜の形成が終
了する位置へ酸素を吹き付けるようにして、真空槽内圧
力を1X10’トールとした。次いて、電子ビーム蒸6
によりコバルト蒸発させ、基体をドラムに沿って移動し
ながら連続的に10μr丁1/分の付4速度で厚さ約0
.25μrnのコバル1〜おにび酸化コバルlへから主
としてなる垂直磁化膜を基体上に形成した。
After filling the vacuum chamber to 1 x 10'l, a mixed gas of oxygen and nitrogen with a partial pressure ratio of 50:50 (volume %) was added.
The pressure inside the vacuum chamber was set to 1X10' Torr by introducing oxygen up to X10-4 and separately blowing oxygen to the position where the formation of the perpendicularly magnetized film was completed. Next, electron beam evaporation 6
The cobalt is evaporated by evaporation, and the substrate is continuously moved along the drum at a speed of 10μr/min to a thickness of about 0.
.. A perpendicularly magnetized film mainly consisting of 25 .mu.rn cobal 1 to cobal oxide 1 was formed on the substrate.

基体は5°Cに冷却されたホルダーに密着して設置し、
コバルト蒸気と基体面の法線のなす角が45度以上とな
るよう、45度を越える大剣粒子を遮蔽する水冷された
遮蔽板を基体全面に設置した。
The substrate was placed in close contact with a holder cooled to 5°C.
A water-cooled shielding plate was installed over the entire surface of the substrate to block large sword particles exceeding 45 degrees so that the angle between the cobalt vapor and the normal to the substrate surface was 45 degrees or more.

かくして得られた垂直磁化膜表面上には粒径約200人
の比較的鋭角な突起が約2.5X109個/ mm2の
密度で見られた。
On the surface of the perpendicularly magnetized film thus obtained, relatively sharp protrusions with a grain size of about 200 were observed at a density of about 2.5 x 109 pieces/mm2.

次に、該垂直磁化膜を設けた基体を5°Cに冷却された
ホルダーに密着して設置した後、酸素ガスを真空槽内が
2X10’トールになるようイオン源に供給しイオンビ
ームを形成して、これを該垂直磁化膜に照射した。イオ
ン源には、マグネトロン放電型イオン源(MIS−25
0日本電子株式会社製)を使用した。イオン照0=+密
度は約150μA/cJ、イオン加速電圧は、1.5K
ey 、イオンビーム照射時間は1分間とした。
Next, after placing the substrate with the perpendicular magnetization film in close contact with a holder cooled to 5°C, oxygen gas is supplied to the ion source so that the inside of the vacuum chamber becomes 2 x 10' torr to form an ion beam. Then, the perpendicularly magnetized film was irradiated with this. The ion source is a magnetron discharge ion source (MIS-25
0 (manufactured by JEOL Ltd.) was used. Ion irradiation 0=+ density is approximately 150μA/cJ, ion acceleration voltage is 1.5K
ey, the ion beam irradiation time was 1 minute.

イオンビーム照射後の垂直磁化膜表面には、300人か
ら600人の粒径を′4F′i”Jる不規則なドーム状
突起が約4×108個/mm2の密度で見られた。
On the surface of the perpendicularly magnetized film after ion beam irradiation, irregular dome-shaped protrusions with a grain size of 300 to 600 particles were observed at a density of about 4×10 8 /mm 2 .

XPSで垂直磁化膜最表層を測定したところ、Co2O
3に特有のピークのみが観察された。試料のエツチング
とXPSによる測定を繰返していったところ、エツチン
グ深さが約300大となったあたりからCo2O3に特
有のピークが小さくなっていき、C01CoO,Co3
O4、C。
When the outermost layer of the perpendicularly magnetized film was measured using XPS, it was found that Co2O
Only a peak specific to 3 was observed. When etching the sample and measuring by XPS were repeated, the peak specific to Co2O3 became smaller when the etching depth reached approximately 300 mm, and CO1CoO, Co3
O4,C.

(OH1)2のピークが観察され始めた。即ち、Co2
O3から主としてなる層の厚さは約300人であった。
A peak of (OH1)2 began to be observed. That is, Co2
The thickness of the layer consisting mainly of O3 was about 300 people.

潤滑剤をイオンビーム照射俊の垂直磁化股上に塗布し耐
摩耗性試験を行なったところ、耐摩耗性は100万回と
イオンビームを照射しないものに比べ、大ぎく向上した
When a lubricant was applied to the perpendicularly magnetized crotch of an ion beam irradiated model and a wear resistance test was conducted, the wear resistance was significantly improved after 1 million cycles compared to a model that was not irradiated with an ion beam.

また記録密度(D5o)は78キロFCPIであった。Further, the recording density (D5o) was 78 kg FCPI.

実施例2 コバル1〜と酸化コバルトから主としてなる垂直磁化膜
を実施例1と同様にして形成した。
Example 2 A perpendicularly magnetized film mainly composed of cobalt 1 and cobalt oxide was formed in the same manner as in Example 1.

次にイオン加速電圧を500cV、イオンビーム照射時
間を5分間とした以外は、実施例1と同様にして垂直磁
化膜にイオンビーム照射した。
Next, the perpendicularly magnetized film was irradiated with an ion beam in the same manner as in Example 1, except that the ion acceleration voltage was 500 cV and the ion beam irradiation time was 5 minutes.

かくして得られた垂直磁化膜表面には300人から60
0人の粒径を有する不規則なドーム状突起が約4X10
8を固/ 1m”の密度で見られた。
The surface of the perpendicularly magnetized film obtained in this way contains 300 to 60
Irregular dome shaped protrusions with particle size of 0 are about 4X10
8 with a density of 1 m”.

XPSで垂直磁化膜最表層を測定したところ、Co2O
3に特有のピークのみがI2察された。試料エツチング
とXPSによる測定を繰返していったところ、エツチン
グ深さが約200人となったあたりからCo2O3に特
有のピークが小さくなっていき、Co、coo、Co3
O4、Co (OFl)2のピークが観察され始めた。
When the outermost layer of the perpendicularly magnetized film was measured using XPS, it was found that Co2O
Only the peak specific to I2 was observed. As the sample etching and XPS measurements were repeated, the peak specific to Co2O3 became smaller when the etching depth reached approximately 200 people, and Co, coo, Co3
Peaks of O4, Co (OFl)2 began to be observed.

即ち、Co2O3から主としてなる層の厚さは約200
人であった。
That is, the thickness of the layer mainly composed of Co2O3 is about 200
It was a person.

潤滑剤をイオンビーム照則後の垂直磁化股上に塗布し耐
摩耗性試験を行なったところ、耐摩耗性は200万回と
大ぎく向上した。
When a lubricant was applied to the perpendicular magnetization crotch after ion beam illumination and a wear resistance test was conducted, the wear resistance was greatly improved to 2 million cycles.

またD50は80ギロFCPIであった。Also, D50 was 80 Giro FCPI.

実施例3 コバルトと酸化コバルトから主としてなる垂直磁化膜を
実施例1と同様にして形成した。
Example 3 A perpendicularly magnetized film mainly composed of cobalt and cobalt oxide was formed in the same manner as in Example 1.

次にイオン源に供給するガスをアルゴンガスとした以外
は、実施例1と同様にして垂直磁化膜にイオンビーム照
射した。
Next, the perpendicularly magnetized film was irradiated with an ion beam in the same manner as in Example 1, except that argon gas was used as the gas supplied to the ion source.

かくして得られた垂直磁化膜表面には300人から50
0人の粒径を有する比較的大きざの揃ったドーム状突起
が約1 X 109個/llll112の密度で見られ
た。
The surface of the perpendicularly magnetized film obtained in this way has 300 to 50
Relatively uniformly sized dome-like protrusions with a grain size of 0.05 mm were observed at a density of approximately 1 x 109 particles/llll112.

次にこの垂直磁化膜をn−メチルアセトアミドに硝酸カ
リウムを0.04Nを加えた電界液中で陽極酸化を行な
った。陽4ii!酸化電流を7mA/QTfとし、陽極
酸化電圧が当初の3倍に上昇するまで酸化を続けた。
Next, this perpendicularly magnetized film was anodized in an electrolytic solution containing n-methylacetamide and 0.04N of potassium nitrate. Yang 4ii! The oxidation current was set to 7 mA/QTf, and oxidation was continued until the anodic oxidation voltage increased three times the initial value.

かくして1qれた垂直磁化膜表面には陽極酸化前とあま
り変らない300人から500人の直径を有する比較的
大ぎさの揃ったドーム状突起が見られた。
Thus, on the surface of the perpendicularly magnetized film after 1q, dome-shaped protrusions of relatively uniform size were observed, with a diameter of 300 to 500 mm, which was not much different from that before anodization.

XPSで垂直磁化膜最表層を測定したところ、Co2O
3に’t:j右のピークのみが観?Iされた。試お1の
エツチングとXPSによる測定を繰返していったところ
、エツチング)墓ざが約350人となったあたりからC
o2O3に特有のピークが小ざくなっていき、co、c
oo、Co3O4、C0(OH)2のピークが観察され
始めた。
When the outermost layer of the perpendicularly magnetized film was measured using XPS, it was found that Co2O
3.'t:j Only the peak on the right is visible? It was done. After repeating the first trial etching and XPS measurements, it was found that when the number of graves reached approximately 350, C
The peaks specific to o2O3 become smaller, and co, c
Peaks of oo, Co3O4, and C0(OH)2 began to be observed.

かくして得られた垂直磁化膜に潤滑剤を塗布し耐摩耗性
試験を行なったところ、耐摩耗性は100万回と良かっ
た。またD50は75キロFCPIであった。
When a lubricant was applied to the perpendicularly magnetized film thus obtained and a wear resistance test was conducted, the wear resistance was good at 1 million cycles. Also, the D50 was 75 kg FCPI.

比較例1 コバルトおよび酸化コバルトから主としてなる垂直磁化
膜を実施例1と同様にして基体上に形成した。
Comparative Example 1 A perpendicularly magnetized film mainly composed of cobalt and cobalt oxide was formed on a substrate in the same manner as in Example 1.

次に潤滑剤をこの垂直磁化膜上に塗イ1jシ、耐摩耗性
試験を行なったところ、耐摩耗性は1万回と良くなかっ
た。
Next, a lubricant was applied to this perpendicularly magnetized film and a wear resistance test was conducted, and the wear resistance was 10,000 times, which was poor.

XPSで垂直磁化膜最表層を測定したところ、coo、
Co3O4、Co (OH1)2のピークが支配的に観
察された。
When the outermost layer of the perpendicularly magnetized film was measured using XPS, coo,
The peaks of Co3O4 and Co(OH1)2 were predominantly observed.

比較例2 コバルトと酸化コバルトから主としてなる垂直磁化膜を
実り題例1と同様にして基体上に形成した。
Comparative Example 2 A perpendicularly magnetized film mainly composed of cobalt and cobalt oxide was formed on a substrate in the same manner as in Practical Example 1.

次にイオン源に供給するガスをアルゴンガスとした以外
は、実施例1と同様にして垂直磁化膜にイオンビームを
照射した。
Next, the perpendicularly magnetized film was irradiated with an ion beam in the same manner as in Example 1, except that argon gas was used as the gas supplied to the ion source.

かくして得られた垂直磁化膜表面には300人から50
0人の直径を有する比較的大きざの揃ったドーム状突起
が約1 X 109個/市2の密度で見られた。
The surface of the perpendicularly magnetized film obtained in this way has 300 to 50
Relatively uniformly sized dome-like projections with a diameter of 0.0 cm were observed at a density of approximately 1 x 109 pieces/city 2.

XPSで垂直磁化膜最表層を測定したところ、Coo、
Co3O4、Co (OH)2のピークが支配的に観察
された。 ゛ 潤滑剤をイオンビーム照射後の垂直磁化膜上に塗イ「シ
耐摩耗性試験を行なったところ、ドーム状突起が形成さ
れたにもかかわらず、耐摩耗性は0゜4万回と著しく劣
っていた。
When the outermost layer of the perpendicularly magnetized film was measured using XPS, it was found that Coo,
The peaks of Co3O4 and Co(OH)2 were predominantly observed. ``We applied a lubricant to the perpendicularly magnetized film after ion beam irradiation and conducted a wear resistance test. Despite the formation of dome-shaped protrusions, the wear resistance was 0.4 million times, which was remarkable. It was inferior.

比較例3 コバルトと酸化コバルトから主としてなる垂直磁化膜を
実施例1と同様にして基体上に形成した。
Comparative Example 3 A perpendicularly magnetized film mainly composed of cobalt and cobalt oxide was formed on a substrate in the same manner as in Example 1.

次にイオン加速電圧を3008V、イオン照射密度を1
00μA / aK、イオンビーム照射時間を5分間と
した以外は、実施例1と同様にして垂直磁化膜にイオン
ビーム照射した。
Next, the ion acceleration voltage was set to 3008V, and the ion irradiation density was set to 1.
The perpendicularly magnetized film was irradiated with an ion beam in the same manner as in Example 1, except that the ion beam irradiation time was 00 μA/aK and 5 minutes.

かくして得られた垂直磁化膜表面は、鋭角な突起は減少
していたが、ドーム状突起は形成されていなかった。突
起の密度は約2X109f囚/mm2であった。
On the surface of the perpendicularly magnetized film thus obtained, sharp protrusions were reduced, but dome-shaped protrusions were not formed. The density of protrusions was approximately 2×109 f/mm2.

XPSで垂直磁化膜最表層を測定したところ1、C01
coo、Co3O4、Go (OH)2のピークが支配
的に12察された。
When the outermost layer of the perpendicular magnetization film was measured by XPS, it was 1, C01.
Twelve peaks of coo, Co3O4, and Go(OH)2 were dominantly observed.

潤滑剤をイオンビーム照射後の垂直磁化膜−ヒに塗布し
耐摩耗性試験を行なったところ、耐摩耗性は1万回とほ
とんど改良の効果はなかった。
When a lubricant was applied to the perpendicularly magnetized film after ion beam irradiation and an abrasion resistance test was conducted, the abrasion resistance was 10,000 times and there was almost no improvement effect.

実施例4 コバルトと酸化コバルトから主としてなる垂直磁化膜を
実施例1と同様にして基体上に形成した。
Example 4 A perpendicularly magnetized film mainly composed of cobalt and cobalt oxide was formed on a substrate in the same manner as in Example 1.

次に該垂直磁化膜が設けられた基体と基体裏面に密着し
たホルダーに一10KVの電圧を印加し、イオン照射密
度を約50μA/clTFとした以外は、実施例2と同
様にして該垂直磁化膜にイオンご一ム照射した。
Next, the perpendicular magnetization was carried out in the same manner as in Example 2, except that a voltage of -10 KV was applied to the substrate on which the perpendicular magnetization film was provided and a holder that was in close contact with the back surface of the substrate, and the ion irradiation density was set to about 50 μA/clTF. The membrane was irradiated with ions.

イオンビーム照射後の垂直磁化膜表面には不明瞭な30
0人から600人の直径を有する不規則なドーム状突起
が約2×109個/mm2の密度で見られた。
After ion beam irradiation, the surface of the perpendicularly magnetized film has an indistinct 30
Irregular dome-like projections with diameters ranging from 0 to 600 mm were found at a density of approximately 2 x 10 9 /mm 2 .

XPSで垂直磁化膜最表層を測定したところ、Co2O
3に特有のピークのみが観察された。試料エツチングと
XPSによる測定を繰返していったところ、エツチング
深さが約800人となったあたりからCo2O3に特有
のピークが小さくなっていぎ、C01Coo、Co3O
4、co (。
When the outermost layer of the perpendicularly magnetized film was measured using XPS, it was found that Co2O
Only a peak specific to 3 was observed. As the sample etching and XPS measurements were repeated, the peak specific to Co2O3 became smaller when the etching depth reached approximately 800 people, and the peaks specific to Co2O3 became smaller.
4, co (.

ト1)2のピークが支配的に観察され始めた。The peaks of 1) and 2 began to be predominantly observed.

潤滑剤をイオンビーム照射後の垂直磁化膜上に塗布し耐
摩耗性試験を行なったところ、耐摩耗性は200万回と
大ぎく向上した。一方、D50は40キロFCPIと幾
分小さかった。
When a lubricant was applied to the perpendicularly magnetized film after ion beam irradiation and a wear resistance test was conducted, the wear resistance was greatly improved to 2 million cycles. On the other hand, the D50 was somewhat smaller at 40km FCPI.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は本発明の垂直磁化膜の1例を表面形状を示すモ
デル図、第2図は本発明の垂直磁気記録媒体の1例を示
す断面−[デル図である。 1:基1仮   2:垂直磁化膜 3:ドーム状突起
FIG. 1 is a model diagram showing the surface shape of an example of a perpendicular magnetization film of the present invention, and FIG. 2 is a cross-sectional diagram showing an example of a perpendicular magnetic recording medium of the invention. 1: Base 1 provisional 2: Perpendicular magnetization film 3: Dome-shaped protrusion

Claims (3)

【特許請求の範囲】[Claims] (1)基体上に、コバルトおよび酸化コバルトから主と
してなる膜厚方向に磁気異方性を有する垂直磁化膜を備
えた垂直磁気記録媒体であつて、該垂直磁化膜表層がC
o_2O_3から主としてなる層で形成されてなること
を特徴とする垂直磁気記録媒体。
(1) A perpendicular magnetic recording medium comprising, on a substrate, a perpendicular magnetization film mainly composed of cobalt and cobalt oxide and having magnetic anisotropy in the film thickness direction, wherein the surface layer of the perpendicular magnetization film is C
A perpendicular magnetic recording medium characterized in that it is formed of a layer mainly consisting of o_2O_3.
(2)垂直磁化膜表面か、50Åから1000Åの粒径
をもつドーム状突起を有することを特徴とする特許請求
の範囲第(1)項記載の垂直磁気記録媒体。
(2) The perpendicular magnetic recording medium according to claim (1), characterized in that the surface of the perpendicularly magnetized film has dome-shaped projections having a grain size of 50 Å to 1000 Å.
(3)Co_2O_3から主としてなる層の厚さが20
Åから700Åの範囲であることを特徴とする特許請求
の範囲第(1)項記載の垂直磁気記録媒体。
(3) The thickness of the layer mainly composed of Co_2O_3 is 20
The perpendicular magnetic recording medium according to claim 1, wherein the perpendicular magnetic recording medium has a thickness in the range of Å to 700 Å.
JP3092986A 1986-02-17 1986-02-17 Vertical magnetic recording medium Pending JPS62189622A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP3092986A JPS62189622A (en) 1986-02-17 1986-02-17 Vertical magnetic recording medium

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3092986A JPS62189622A (en) 1986-02-17 1986-02-17 Vertical magnetic recording medium

Publications (1)

Publication Number Publication Date
JPS62189622A true JPS62189622A (en) 1987-08-19

Family

ID=12317371

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3092986A Pending JPS62189622A (en) 1986-02-17 1986-02-17 Vertical magnetic recording medium

Country Status (1)

Country Link
JP (1) JPS62189622A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01279416A (en) * 1988-04-30 1989-11-09 Sony Corp Perpendicular magnetic recording medium
US5244751A (en) * 1988-03-11 1993-09-14 Hitachi, Ltd. Perpendicular magnetic recording medium, its fabrication method and read-write machine using it

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5244751A (en) * 1988-03-11 1993-09-14 Hitachi, Ltd. Perpendicular magnetic recording medium, its fabrication method and read-write machine using it
JPH01279416A (en) * 1988-04-30 1989-11-09 Sony Corp Perpendicular magnetic recording medium

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