JPS62188136U - - Google Patents
Info
- Publication number
- JPS62188136U JPS62188136U JP7656186U JP7656186U JPS62188136U JP S62188136 U JPS62188136 U JP S62188136U JP 7656186 U JP7656186 U JP 7656186U JP 7656186 U JP7656186 U JP 7656186U JP S62188136 U JPS62188136 U JP S62188136U
- Authority
- JP
- Japan
- Prior art keywords
- tube
- furnace
- source inlet
- core tube
- wall
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000009792 diffusion process Methods 0.000 claims 1
- 238000010438 heat treatment Methods 0.000 claims 1
- 239000010453 quartz Substances 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Furnace Details (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP7656186U JPS62188136U (sv) | 1986-05-21 | 1986-05-21 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP7656186U JPS62188136U (sv) | 1986-05-21 | 1986-05-21 |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS62188136U true JPS62188136U (sv) | 1987-11-30 |
Family
ID=30923757
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP7656186U Pending JPS62188136U (sv) | 1986-05-21 | 1986-05-21 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS62188136U (sv) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH01270315A (ja) * | 1988-04-22 | 1989-10-27 | Fujitsu Ltd | 半導体ウェーハ熱処理装置 |
-
1986
- 1986-05-21 JP JP7656186U patent/JPS62188136U/ja active Pending
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH01270315A (ja) * | 1988-04-22 | 1989-10-27 | Fujitsu Ltd | 半導体ウェーハ熱処理装置 |