JPS62188135U - - Google Patents
Info
- Publication number
- JPS62188135U JPS62188135U JP7640086U JP7640086U JPS62188135U JP S62188135 U JPS62188135 U JP S62188135U JP 7640086 U JP7640086 U JP 7640086U JP 7640086 U JP7640086 U JP 7640086U JP S62188135 U JPS62188135 U JP S62188135U
- Authority
- JP
- Japan
- Prior art keywords
- door flange
- rings
- door
- quartz
- quartz tube
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000010453 quartz Substances 0.000 claims description 4
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 4
- 125000006850 spacer group Chemical group 0.000 claims description 2
- 238000004518 low pressure chemical vapour deposition Methods 0.000 description 1
Description
第１図は本考案の減圧ＣＶＤ装置のドアフラン
ジ部の断面及び真空排気系統を示す図、第２図は
従来例のＣＶＤ装置の反応炉のドア附近の断面図
である。
１……石英反応管、２……ドアフランジ、３…
…Ｏリング、４……スペーサー、５……バツクア
ツプリング、６……押さえ捻子、７……ドア。
FIG. 1 is a cross-sectional view of the door flange and vacuum exhaust system of the low-pressure CVD apparatus of the present invention, and FIG. 2 is a cross-sectional view of the vicinity of the reactor door of the conventional CVD apparatus. 1...Quartz reaction tube, 2...Door flange, 3...
...O-ring, 4...spacer, 5...back spring, 6...pressure screw, 7...door.
Claims (1)
スペーサーを介して２本のＯリングを挿入し、バ
ツクアツプリングを介して押さえ捻子で締めつけ
て前記２本のＯリングを前記石英管と前ドアフラ
ンジに圧着し、かつ前記スペーサーにより生じる
前記ドアフランジと前記石英管及び２本の前記Ｏ
リングで囲まれる空間から外部に通じる前記ドア
フランジに設けられた排気孔を有する事を特徴と
する減圧ＣＶＤ装置。 Two O-rings are inserted into the gap between the door flange of the reactor and the quartz reaction tube via a spacer, and tightened with a presser screw via a back-up spring to connect the two O-rings to the quartz tube and the front door. The door flange, the quartz tube, and the two O
A reduced pressure CVD apparatus characterized by having an exhaust hole provided in the door flange that communicates with the outside from a space surrounded by a ring.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP7640086U JPH0530355Y2 (en) | 1986-05-21 | 1986-05-21 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP7640086U JPH0530355Y2 (en) | 1986-05-21 | 1986-05-21 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS62188135U true JPS62188135U (en) | 1987-11-30 |
| JPH0530355Y2 JPH0530355Y2 (en) | 1993-08-03 |
Family
ID=30923441
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP7640086U Expired - Lifetime JPH0530355Y2 (en) | 1986-05-21 | 1986-05-21 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0530355Y2 (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2023127054A1 (en) * | 2021-12-27 | 2023-07-06 | 株式会社Kokusai Electric | Leakage detection device, method for manufacturing semiconductor device, substrate treatment method, and program |
-
1986
- 1986-05-21 JP JP7640086U patent/JPH0530355Y2/ja not_active Expired - Lifetime
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2023127054A1 (en) * | 2021-12-27 | 2023-07-06 | 株式会社Kokusai Electric | Leakage detection device, method for manufacturing semiconductor device, substrate treatment method, and program |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0530355Y2 (en) | 1993-08-03 |
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