JPS62182971U - - Google Patents
Info
- Publication number
- JPS62182971U JPS62182971U JP7129886U JP7129886U JPS62182971U JP S62182971 U JPS62182971 U JP S62182971U JP 7129886 U JP7129886 U JP 7129886U JP 7129886 U JP7129886 U JP 7129886U JP S62182971 U JPS62182971 U JP S62182971U
- Authority
- JP
- Japan
- Prior art keywords
- sputtering apparatus
- utility
- model registration
- electrode
- sputtering
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000000758 substrate Substances 0.000 claims description 6
- 230000005264 electron capture Effects 0.000 claims description 2
- 238000004544 sputter deposition Methods 0.000 claims 11
- 238000010891 electric arc Methods 0.000 claims 3
- 239000002245 particle Substances 0.000 claims 2
- 239000013077 target material Substances 0.000 claims 2
- 238000001755 magnetron sputter deposition Methods 0.000 claims 1
- 239000010409 thin film Substances 0.000 claims 1
Landscapes
- Physical Vapour Deposition (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP7129886U JPS62182971U (enrdf_load_stackoverflow) | 1986-05-14 | 1986-05-14 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP7129886U JPS62182971U (enrdf_load_stackoverflow) | 1986-05-14 | 1986-05-14 |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS62182971U true JPS62182971U (enrdf_load_stackoverflow) | 1987-11-20 |
Family
ID=30913727
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP7129886U Pending JPS62182971U (enrdf_load_stackoverflow) | 1986-05-14 | 1986-05-14 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS62182971U (enrdf_load_stackoverflow) |
-
1986
- 1986-05-14 JP JP7129886U patent/JPS62182971U/ja active Pending
Similar Documents
Publication | Publication Date | Title |
---|---|---|
AU557135B2 (en) | Magnetron cathode sputtering system | |
CA2011644A1 (en) | Vacuum switch apparatus | |
GB1309379A (en) | Electric high-vacuum discharge tube | |
JPS62182971U (enrdf_load_stackoverflow) | ||
GB1420545A (en) | Evaporation by electron beans | |
US3984720A (en) | Discharge display device | |
JPS6324068A (ja) | 連続真空蒸着メツキ装置 | |
JPS57194255A (en) | Sputtering device | |
JP2580149B2 (ja) | スパツタ装置 | |
JPS5585671A (en) | Sputtering apparatus | |
JPH07122131B2 (ja) | ア−ク式蒸発源 | |
JPH11172419A (ja) | 薄膜形成装置及び薄膜形成方法 | |
JPS61124568A (ja) | イオンビ−ムスパツタ装置 | |
JPH042773A (ja) | 高速成膜スパッタリング装置 | |
JPH0322063U (enrdf_load_stackoverflow) | ||
JPH0530276Y2 (enrdf_load_stackoverflow) | ||
JPH04318163A (ja) | スパッタ型イオン源 | |
JP4594455B2 (ja) | 蒸着源及び蒸着装置 | |
JPH02106457U (enrdf_load_stackoverflow) | ||
RU1802551C (ru) | Способ ионно-лучевого нанесения покрытий | |
JPH0372068A (ja) | 固体イオン源 | |
JPS54100988A (en) | Ion plating device | |
JPS6280263A (ja) | 薄膜形成装置 | |
JPS57171666A (en) | Thin film vapor-deposition device | |
JPS6428362A (en) | Method and device for forming thin insulating film |