JPS62182536U - - Google Patents
Info
- Publication number
- JPS62182536U JPS62182536U JP6874686U JP6874686U JPS62182536U JP S62182536 U JPS62182536 U JP S62182536U JP 6874686 U JP6874686 U JP 6874686U JP 6874686 U JP6874686 U JP 6874686U JP S62182536 U JPS62182536 U JP S62182536U
- Authority
- JP
- Japan
- Prior art keywords
- thin film
- source
- ion source
- substrate
- production device
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000000758 substrate Substances 0.000 claims description 4
- 238000010884 ion-beam technique Methods 0.000 claims description 3
- 238000000605 extraction Methods 0.000 claims description 2
- 239000002245 particle Substances 0.000 claims 3
- 239000010409 thin film Substances 0.000 claims 3
- 238000004519 manufacturing process Methods 0.000 claims 2
- 230000015572 biosynthetic process Effects 0.000 claims 1
- 238000010586 diagram Methods 0.000 description 1
- 238000005566 electron beam evaporation Methods 0.000 description 1
Description
第１図は本考案の一実施例を示す説明図、第２
図は第１図の一部拡大断面図である。
１……イオン源、２……真空容器、３……電子
ビーム蒸着装置、４……基板、５……基板ホルダ
ー、６……遮蔽体、７……ルツボ、８……イオン
ビーム、９，１０，１１……イオンビーム引き出
し電極。
Fig. 1 is an explanatory diagram showing one embodiment of the present invention;
The figure is a partially enlarged sectional view of FIG. 1. DESCRIPTION OF SYMBOLS 1... Ion source, 2... Vacuum container, 3... Electron beam evaporation device, 4... Substrate, 5... Substrate holder, 6... Shielding body, 7... Crucible, 8... Ion beam, 9, 10, 11...Ion beam extraction electrode.
Claims (1)
オン源と粒子源と薄膜形成用の基板を備えた薄膜
製作装置において、粒子源から見て基板を直視し
、イオン源を直視しない遮蔽体をイオン源と粒子
源のあいだに設けたことを特徴とする薄膜製作装
置。 In a thin film production device equipped with an ion source, a particle source, and a substrate for thin film formation, in which the ion beam extraction electrode is a porous electrode, the substrate is viewed directly from the particle source, and a shield that does not look directly at the ion source is placed between the ion source and the particles. A thin film production device characterized by being installed between the sources.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP6874686U JPS62182536U (en) | 1986-05-09 | 1986-05-09 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP6874686U JPS62182536U (en) | 1986-05-09 | 1986-05-09 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS62182536U true JPS62182536U (en) | 1987-11-19 |
Family
ID=30908846
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP6874686U Pending JPS62182536U (en) | 1986-05-09 | 1986-05-09 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS62182536U (en) |
-
1986
- 1986-05-09 JP JP6874686U patent/JPS62182536U/ja active Pending
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