JPS62177004A - ケイ素原子を含むスチレン系重合体およびパタ−ン形成方法 - Google Patents

ケイ素原子を含むスチレン系重合体およびパタ−ン形成方法

Info

Publication number
JPS62177004A
JPS62177004A JP61019442A JP1944286A JPS62177004A JP S62177004 A JPS62177004 A JP S62177004A JP 61019442 A JP61019442 A JP 61019442A JP 1944286 A JP1944286 A JP 1944286A JP S62177004 A JPS62177004 A JP S62177004A
Authority
JP
Japan
Prior art keywords
formula
styrene polymer
pattern
resist
polymer containing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP61019442A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0466243B2 (enrdf_load_stackoverflow
Inventor
Fumitake Watanabe
文武 渡辺
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp filed Critical NEC Corp
Priority to JP61019442A priority Critical patent/JPS62177004A/ja
Publication of JPS62177004A publication Critical patent/JPS62177004A/ja
Publication of JPH0466243B2 publication Critical patent/JPH0466243B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G03F7/0757—Macromolecular compounds containing Si-O, Si-C or Si-N bonds
    • G03F7/0758—Macromolecular compounds containing Si-O, Si-C or Si-N bonds with silicon- containing groups in the side chains

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
JP61019442A 1986-01-30 1986-01-30 ケイ素原子を含むスチレン系重合体およびパタ−ン形成方法 Granted JPS62177004A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP61019442A JPS62177004A (ja) 1986-01-30 1986-01-30 ケイ素原子を含むスチレン系重合体およびパタ−ン形成方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP61019442A JPS62177004A (ja) 1986-01-30 1986-01-30 ケイ素原子を含むスチレン系重合体およびパタ−ン形成方法

Publications (2)

Publication Number Publication Date
JPS62177004A true JPS62177004A (ja) 1987-08-03
JPH0466243B2 JPH0466243B2 (enrdf_load_stackoverflow) 1992-10-22

Family

ID=11999415

Family Applications (1)

Application Number Title Priority Date Filing Date
JP61019442A Granted JPS62177004A (ja) 1986-01-30 1986-01-30 ケイ素原子を含むスチレン系重合体およびパタ−ン形成方法

Country Status (1)

Country Link
JP (1) JPS62177004A (enrdf_load_stackoverflow)

Also Published As

Publication number Publication date
JPH0466243B2 (enrdf_load_stackoverflow) 1992-10-22

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