JPS62175925A - Vertical magnetic recording medium and its production - Google Patents
Vertical magnetic recording medium and its productionInfo
- Publication number
- JPS62175925A JPS62175925A JP1210086A JP1210086A JPS62175925A JP S62175925 A JPS62175925 A JP S62175925A JP 1210086 A JP1210086 A JP 1210086A JP 1210086 A JP1210086 A JP 1210086A JP S62175925 A JPS62175925 A JP S62175925A
- Authority
- JP
- Japan
- Prior art keywords
- layer
- film
- magnetic
- recording medium
- magnetic recording
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000004519 manufacturing process Methods 0.000 title claims description 12
- 239000010410 layer Substances 0.000 claims abstract description 46
- 238000004544 sputter deposition Methods 0.000 claims abstract description 26
- 239000011241 protective layer Substances 0.000 claims abstract description 18
- 238000011282 treatment Methods 0.000 claims abstract description 17
- 239000000758 substrate Substances 0.000 claims abstract description 8
- 150000004767 nitrides Chemical class 0.000 claims abstract description 6
- 238000005121 nitriding Methods 0.000 claims abstract description 4
- 238000000034 method Methods 0.000 claims description 13
- 239000000463 material Substances 0.000 claims description 7
- 230000015572 biosynthetic process Effects 0.000 claims description 3
- 239000010408 film Substances 0.000 abstract description 41
- 230000005415 magnetization Effects 0.000 abstract description 18
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 abstract description 14
- 229910052760 oxygen Inorganic materials 0.000 abstract description 11
- 239000001301 oxygen Substances 0.000 abstract description 11
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 abstract description 9
- 230000003647 oxidation Effects 0.000 abstract description 9
- 238000007254 oxidation reaction Methods 0.000 abstract description 9
- 229910052757 nitrogen Inorganic materials 0.000 abstract description 8
- 229910052804 chromium Inorganic materials 0.000 abstract description 4
- 150000002500 ions Chemical class 0.000 abstract description 4
- -1 oxygen ions Chemical class 0.000 abstract description 4
- 229910052799 carbon Inorganic materials 0.000 abstract description 3
- 208000028659 discharge Diseases 0.000 abstract description 2
- 239000010409 thin film Substances 0.000 abstract description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 abstract 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 abstract 2
- 229910052681 coesite Inorganic materials 0.000 abstract 1
- 229910052906 cristobalite Inorganic materials 0.000 abstract 1
- 238000002513 implantation Methods 0.000 abstract 1
- 230000001681 protective effect Effects 0.000 abstract 1
- 239000000377 silicon dioxide Substances 0.000 abstract 1
- 235000012239 silicon dioxide Nutrition 0.000 abstract 1
- 229910052682 stishovite Inorganic materials 0.000 abstract 1
- 229910052905 tridymite Inorganic materials 0.000 abstract 1
- 238000001771 vacuum deposition Methods 0.000 abstract 1
- 238000004804 winding Methods 0.000 description 6
- 229910000599 Cr alloy Inorganic materials 0.000 description 5
- 239000007789 gas Substances 0.000 description 4
- 239000000956 alloy Substances 0.000 description 3
- 238000010586 diagram Methods 0.000 description 3
- 229920001721 polyimide Polymers 0.000 description 3
- 229910020641 Co Zr Inorganic materials 0.000 description 2
- 229910020520 Co—Zr Inorganic materials 0.000 description 2
- 229910045601 alloy Inorganic materials 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000000696 magnetic material Substances 0.000 description 2
- 239000007769 metal material Substances 0.000 description 2
- 229910000889 permalloy Inorganic materials 0.000 description 2
- 230000035699 permeability Effects 0.000 description 2
- 229910018523 Al—S Inorganic materials 0.000 description 1
- 229910020517 Co—Ti Inorganic materials 0.000 description 1
- MYMOFIZGZYHOMD-UHFFFAOYSA-N Dioxygen Chemical compound O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 description 1
- 229910000640 Fe alloy Inorganic materials 0.000 description 1
- 229910017315 Mo—Cu Inorganic materials 0.000 description 1
- 229910020018 Nb Zr Inorganic materials 0.000 description 1
- 229910003271 Ni-Fe Inorganic materials 0.000 description 1
- 229910018499 Ni—F Inorganic materials 0.000 description 1
- 239000004952 Polyamide Substances 0.000 description 1
- 235000010724 Wisteria floribunda Nutrition 0.000 description 1
- 229910000905 alloy phase Inorganic materials 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 238000009833 condensation Methods 0.000 description 1
- 230000005494 condensation Effects 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- HDRXZJPWHTXQRI-BHDTVMLSSA-N diltiazem hydrochloride Chemical compound [Cl-].C1=CC(OC)=CC=C1[C@H]1[C@@H](OC(C)=O)C(=O)N(CC[NH+](C)C)C2=CC=CC=C2S1 HDRXZJPWHTXQRI-BHDTVMLSSA-N 0.000 description 1
- 229910001882 dioxygen Inorganic materials 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000009963 fulling Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 229910001004 magnetic alloy Inorganic materials 0.000 description 1
- 229910052748 manganese Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 238000012544 monitoring process Methods 0.000 description 1
- 229910052755 nonmetal Inorganic materials 0.000 description 1
- 238000005192 partition Methods 0.000 description 1
- 229910052698 phosphorus Inorganic materials 0.000 description 1
- 229920002647 polyamide Polymers 0.000 description 1
- 239000002861 polymer material Substances 0.000 description 1
- 238000001556 precipitation Methods 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 239000002356 single layer Substances 0.000 description 1
- 238000007738 vacuum evaporation Methods 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は垂直磁気記録媒体及びその製造方法、特に走行
耐久性が改良された垂直磁気記録媒体及びその製造方法
に関する。DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a perpendicular magnetic recording medium and a method of manufacturing the same, and more particularly to a perpendicular magnetic recording medium with improved running durability and a method of manufacturing the same.
近年、記録媒体の膜面に対して垂直な方向に磁化容易軸
を有する磁気記録媒体を角いる垂直磁化記録方式が提案
されている。この垂直磁化記録方式fは、記録密度が高
まるtt4ど記録媒体中の反磁界が減少するため、優れ
た再生出力が得られ本質的に高密度記録に適した方式と
いえる。In recent years, a perpendicular magnetization recording method has been proposed in which a magnetic recording medium having an axis of easy magnetization in a direction perpendicular to the film surface of the recording medium is angled. This perpendicular magnetization recording method f provides excellent reproduction output because the demagnetizing field in the recording medium decreases at tt4 when the recording density increases, and can be said to be essentially a method suitable for high-density recording.
かかる垂直磁化記録方式の磁気記録を行なうには、記録
媒体の膜面に対して垂直な方向に磁化容易軸を有する磁
気記録媒体を必要とする。このような垂直磁気記録媒体
としては、高分子材料或いは非磁性金属等の非磁性材料
から成る基板又は支持体上に、Co−Cr合金等をス・
ぞツタリング法等フ形成したものが知られている。In order to perform magnetic recording using such perpendicular magnetization recording method, a magnetic recording medium having an axis of easy magnetization in a direction perpendicular to the film surface of the recording medium is required. Such perpendicular magnetic recording media are produced by coating a Co-Cr alloy or the like on a substrate or support made of a non-magnetic material such as a polymeric material or a non-magnetic metal.
Methods such as the tsutaring method are known.
また、垂直磁化記録再生時の記録再生効率の改善を図る
ため、前記のco −Cr合金膜よシ成る垂直磁気記録
層の下に下地層として軟磁性材料より成る高透磁率層、
例えば、パーマロイ(Ni −Fe系合金)膜を設けた
、いわゆる二層模型の垂直磁気記録媒体が知られている
。In addition, in order to improve the recording and reproducing efficiency during perpendicular magnetization recording and reproducing, a high magnetic permeability layer made of a soft magnetic material is provided as an underlayer under the perpendicular magnetic recording layer made of the co-Cr alloy film.
For example, a so-called two-layer model perpendicular magnetic recording medium provided with a permalloy (Ni--Fe alloy) film is known.
また、前記垂直磁化記録方式を用いたフレキシブルディ
スク等においては、支持体の両面に前記の二層型垂直磁
気記録媒体を形成した、いわゆる両面二層型垂直磁気記
録媒体の方が記録容量が大で且つカールの改善がやシ易
い等のため優れている。゛
上記例れのタイプの垂直磁気媒体も、上記材料をスパッ
タリング装置を用いて連続的又は非連続的に支持体に設
けることによって製造している。Furthermore, in flexible disks and the like that use the perpendicular magnetization recording method, so-called double-sided double-layer perpendicular magnetic recording media, in which the double-layer perpendicular magnetic recording medium is formed on both sides of a support, have a larger recording capacity. It is excellent because it improves curls and is easy to curl. ``Perpendicular magnetic media of the above-mentioned types are also manufactured by applying the above-mentioned materials to a support continuously or discontinuously using a sputtering device.
このような垂直磁気媒体は高記録密度に適した記録媒体
として磁気テープや磁気ディスクに期待されているが、
一つの大きな問題として一般に走行耐久性が極めて悪く
、例えばCo −Cr合金膜を設けた垂直磁気記録ディ
スクの場合1万回程度の走行・ぞスで表面の合金層の凝
結等が生じて走行不能になることが多い。Such perpendicular magnetic media is expected to be used as a recording medium suitable for high recording densities, such as magnetic tapes and magnetic disks.
One major problem is that running durability is generally very poor; for example, in the case of a perpendicular magnetic recording disk with a Co-Cr alloy film, after about 10,000 runs, the alloy layer on the surface condenses, making it impossible to run. It often becomes.
このような問題を解決するために、カーゼン、5i02
、BN(特開昭58−133627号公報)、StC(
特開昭58−130437号公報)等を保護層として磁
性層表面にスパッタリング等によって設けることが提案
されている。In order to solve such problems, Kazen, 5i02
, BN (Japanese Unexamined Patent Publication No. 58-133627), StC (
It has been proposed to provide a protective layer such as JP-A-58-130437 on the surface of the magnetic layer by sputtering or the like.
しかしながら、これらの処理としてもなお走行耐久性の
改良は不十分であシ、特に同じ製造工程にあっても製品
の再現性が悪く、耐久性の良いものや耐久性が極めて悪
いものが得られ一定して耐久性の良いものが得られない
という問題があった。However, even with these treatments, the improvement in running durability is still insufficient, and in particular, even if the manufacturing process is the same, the reproducibility of the product is poor, and products with good durability and products with extremely poor durability can be obtained. There was a problem in that it was not possible to obtain a product with consistently good durability.
従って、本発明は再現性良く走行耐久性が著しく改良さ
れた垂直磁気記録媒体及びその製造方法を提供すること
にある。Therefore, an object of the present invention is to provide a perpendicular magnetic recording medium with good reproducibility and significantly improved running durability, and a method for manufacturing the same.
本発明は前記問題を解決すべく鋭意研究を重ねた結果、
磁性層の表面に酸化層または窒化層を形成した後に保護
層を設けることにより、耐久性の著しく改良された垂直
磁気記録媒体を再現性よく得ることが〒きることを見出
し、本発明を達成した。The present invention was developed as a result of extensive research to solve the above problems.
The present invention has been achieved by discovering that by forming an oxide layer or a nitride layer on the surface of a magnetic layer and then providing a protective layer, it is possible to obtain a perpendicular magnetic recording medium with significantly improved durability with good reproducibility. .
すなわち、本発明は非磁性基板の少くとも1面に垂直異
方性を有する磁性層と保護層を設けた垂直磁気記録媒体
において、該磁性層の表面に酸化層または窒化層が形成
きれていることを特徴とする垂直磁気記録媒体及び非磁
性基板の少くとも1面にス・ぞツタリングにより垂直磁
気異方性を有する磁性層と保護層を設けることによる垂
直磁気記録材料の製造方法において、磁性層を設けた後
その表面を酸化処理または窒化処理し、次いで保護層を
設けることを特徴とする垂直磁気記録媒体の製造方法で
ある。That is, the present invention provides a perpendicular magnetic recording medium in which a magnetic layer having perpendicular anisotropy and a protective layer are provided on at least one surface of a nonmagnetic substrate, in which an oxide layer or a nitride layer is completely formed on the surface of the magnetic layer. In a perpendicular magnetic recording medium and a method for manufacturing a perpendicular magnetic recording material by providing a magnetic layer having perpendicular magnetic anisotropy and a protective layer on at least one surface of a non-magnetic substrate by streaking, This method of manufacturing a perpendicular magnetic recording medium is characterized in that after providing a layer, the surface thereof is oxidized or nitrided, and then a protective layer is provided.
以下、本発明の詳細な説明する。The present invention will be explained in detail below.
本発明においてはまず非磁性基板上に片面又は両面に膜
面に垂直な方向に磁化容易軸を有する垂直磁化膜、例え
ばCo −Cr膜をスパッタリング、真空蒸着、イオン
ブレーティング等のいわゆる薄膜形成方式で形成する。In the present invention, first, a perpendicularly magnetized film having an axis of easy magnetization in a direction perpendicular to the film surface, such as a Co-Cr film, is formed on one or both sides of a nonmagnetic substrate using a so-called thin film formation method such as sputtering, vacuum evaporation, or ion blating. to form.
この場合、垂直磁化膜を形成する前に低抗磁力または高
透磁率の軟磁性膜、例えば−ぞ−マロイ膜を同様にス・
ぞツタリング等によって設けてもよい。また上記垂直磁
化膜等は単層フあっても複数の層から構成されていても
よい。In this case, before forming the perpendicular magnetization film, a soft magnetic film with low coercive force or high magnetic permeability, such as a zo-Malloy film, is similarly coated.
It may also be provided by tucking or the like. Further, the perpendicular magnetization film and the like may be a single layer or may be composed of a plurality of layers.
また基板と垂直磁化層との間に非磁性下地層を設けても
良いし、軟磁性層と垂直磁化層との間に非磁性中間層を
設けてもよい。従って本発明で言う磁性層は、上記の如
き垂直磁化膜のみの場合や軟磁性膜と垂直磁化膜が設け
られた場合とを包含する0
本発明における非磁性基体としては、ポリエチレンテレ
フタレート(PET)、Jリイミド、ポリアミド等のフ
ィルム状高分子材料に対して特に顕著な効果を有するが
、金属材料、ガラス等の非金属材料等にも適用される。Further, a nonmagnetic underlayer may be provided between the substrate and the perpendicular magnetization layer, or a nonmagnetic intermediate layer may be provided between the soft magnetic layer and the perpendicular magnetization layer. Therefore, the magnetic layer referred to in the present invention includes cases in which only a perpendicular magnetization film as described above is provided, and cases in which a soft magnetic film and a perpendicular magnetization film are provided. Although it has a particularly remarkable effect on film-like polymer materials such as , J-limide, and polyamide, it is also applicable to metal materials and non-metal materials such as glass.
軟磁性膜の材料としては、Ni −Fe 、 Ni −
Fa−Mo、 Ni −Fe −Mo−Cu等のパー
”ftffイ合金に限らず、F@、Fe −Al −S
i、 Fe −Ni −0,Fe−Tf、Ni −F
e −Co −Cr −Mn、Fe−5f−B。Materials for the soft magnetic film include Ni-Fe, Ni-
Not limited to the alloys such as Fa-Mo, Ni-Fe-Mo-Cu, etc., but also F@, Fe-Al-S
i, Fe-Ni-0, Fe-Tf, Ni-F
e-Co-Cr-Mn, Fe-5f-B.
Fe−B−C,Fe −AI、 Co−V−Fe、
Co−Ta。Fe-B-C, Fe-AI, Co-V-Fe,
Co-Ta.
Co−Zr、 Co −Nb−Zr、 Co−Ti
XCo−Nb−TaXCo −Ni−ZrXFe −N
i−P、 Fe −Co −Zr、 Co −Mo
−Zr等のいわゆる軟磁性合金材料も適用↑きる。Co-Zr, Co-Nb-Zr, Co-Ti
XCo-Nb-TaXCo-Ni-ZrXFe-N
i-P, Fe-Co-Zr, Co-Mo
- So-called soft magnetic alloy materials such as Zr can also be applied.
膜厚としては0.03〜5ミクロン、特に0.1〜1ミ
クロン程度が好ましい。The film thickness is preferably about 0.03 to 5 microns, particularly about 0.1 to 1 micron.
垂直磁化膜としては、磁化容易軸が支持体表面に対して
ほぼ垂直の方向に向いていることが必要1あり、垂直磁
化膜の材料として知られているC。As a perpendicularly magnetized film, it is necessary that the axis of easy magnetization is oriented in a direction substantially perpendicular to the surface of the support 1, and C is known as a material for perpendicularly magnetized films.
とCrを主成分とする合金相料が望ましい。An alloy phase material containing Cr and Cr as main components is desirable.
膜厚としては、0.03〜5ミクロン程度に選ばれるが
、0.05〜1ミクロン程度が特に望ましい。The film thickness is selected to be about 0.03 to 5 microns, and preferably about 0.05 to 1 micron.
膜形成手段としては、蒸着、ス・セッター等が用いられ
るが後記の実施例〒のべるような複数個の円筒状キャン
の周囲に配置された複数個の高速スパッター室を有する
いわゆる連続スパッター室が望ましい。As the film forming means, vapor deposition, sputtering, etc. are used, but it is preferable to use a so-called continuous sputtering chamber having a plurality of high-speed sputtering chambers arranged around a plurality of cylindrical cans, as shown in the examples below. .
スパッター室としては、例えばCo −Cr合金の場合
Co −Cr合金をターゲットに用いてもよく、Coと
Crを別々なターゲットとして用いてもよい。In the sputtering chamber, for example, in the case of a Co--Cr alloy, a Co--Cr alloy may be used as a target, or Co and Cr may be used as separate targets.
円筒状中ヤンの温度としては、パーマロイ膜等の硬磁性
膜形成時は硬磁性膜の面内〒の磁気異方性が生じるのを
防ぐため30℃以上が望ましい。When forming a hard magnetic film such as a permalloy film, the temperature of the cylindrical core is preferably 30° C. or higher to prevent magnetic anisotropy in the plane of the hard magnetic film from occurring.
一方、キャン温度を余り高くすると支持体からのガス放
出や、オリゴマーの析出等が生ずるため90℃以下が望
ましい。On the other hand, if the can temperature is too high, gas release from the support, precipitation of oligomers, etc. will occur, so a temperature of 90° C. or lower is desirable.
磁気異方性と膜表面の凹凸を特に少なくするためには、
45〜65℃が特に望ましい。一方、c。In order to particularly reduce magnetic anisotropy and film surface irregularities,
A temperature of 45 to 65°C is particularly desirable. On the other hand, c.
−Cr膜の形成時には、所望のHe (垂直)を得るた
めに円筒状キャンの温度を90℃以上に加熱することが
望ましく、またHe (垂直)の垂直磁化膜を得るため
には、120℃以上が特に望ましい。When forming a -Cr film, it is desirable to heat the cylindrical can to 90°C or higher in order to obtain the desired He (perpendicular) magnetization, and to obtain a He (perpendicular) perpendicular magnetization film, it is desirable to heat the cylindrical can to 120°C or higher. The above is particularly desirable.
本発明においては、上記のようにして形成した磁性層表
面に酸化処理または窒化処理を施こし次いで保護層を設
けることを特徴としている。The present invention is characterized in that the surface of the magnetic layer formed as described above is subjected to oxidation treatment or nitridation treatment, and then a protective layer is provided.
酸化処理または窒化処理は、酸素又は窒素の存在下にグ
ロー放電処理(02又はN210−’〜1O−4Tor
r中500v程度)するか、酸素又は窒素の存在下に逆
スパツタリングを行なってもよいし、また酸素イオン又
は窒素イオンを磁性層表面にイオンガンを用いて打ちこ
んfもよい。スパッタリングの場合、磁性層を(円筒キ
ャンを+、ターゲットを−)スパッタリングによって設
け、この極性を逆にし、酸素又は窒素の10−1〜10
−’ Torrの雰囲気中1電圧を印加して逆スパツタ
リングを行えばよい。Oxidation treatment or nitriding treatment is performed by glow discharge treatment (02 or N210-'~1O-4Tor) in the presence of oxygen or nitrogen.
Alternatively, reverse sputtering may be performed in the presence of oxygen or nitrogen, or oxygen ions or nitrogen ions may be implanted onto the surface of the magnetic layer using an ion gun. In the case of sputtering, a magnetic layer (cylindrical can +, target -) is provided by sputtering, the polarity is reversed, and 10-1 to 10 of oxygen or nitrogen is applied.
Reverse sputtering may be performed by applying one voltage in an atmosphere of -' Torr.
このようにして表面に酸化層または窒化層が形成された
磁性層表面に次いフ保護層をスパッタリング等によって
設ける。A protective layer is then provided by sputtering or the like on the surface of the magnetic layer on which the oxide layer or nitride layer has been formed in this manner.
保護層としては、カー/y、5i02、Co −0−C
rXCr−0等が用いられる。これらのうち特にカーゼ
ンが好ましい。As a protective layer, Car/y, 5i02, Co-0-C
rXCr-0 etc. are used. Among these, carzene is particularly preferred.
保護層の膜厚としては0.002μm〜0.1μm1特
に0.005〜O,OSが好ましい。The thickness of the protective layer is preferably 0.002 μm to 0.1 μm, particularly 0.005 to O.OS.
本発明によるときは走行耐久性が著しく改良された垂直
磁気記録媒体を再現性良く得ることが1きる。According to the present invention, a perpendicular magnetic recording medium with significantly improved running durability can be obtained with good reproducibility.
第1図は本発明の垂直磁気記録媒体を作成するのに用い
られるスパッター装置の一例を示す概略図である。FIG. 1 is a schematic diagram showing an example of a sputtering apparatus used for producing the perpendicular magnetic recording medium of the present invention.
第1図に図示される両面連続スパッター装置を用いて両
面二層型垂直磁化媒体を作成した。50ミクロン厚のロ
ール状のポリイミドフィルム41を送出軸42にセット
し、中間ローラ及び冷却された円筒状キャ743.44
を経て巻取軸45に巻取られるようにした。真空槽は送
出室46、スパッター室47、巻取室48の3つに大別
し、各室は隔壁49.50で仕切シ、各室はそれぞれ排
気系51.52及び53.34により排気した。A double-sided double-layer perpendicularly magnetized medium was produced using the double-sided continuous sputtering apparatus shown in FIG. A roll-shaped polyimide film 41 with a thickness of 50 microns is set on the delivery shaft 42, and an intermediate roller and a cooled cylindrical cap 743.44 are set.
The film is then wound onto a winding shaft 45. The vacuum chamber was roughly divided into three parts: a delivery chamber 46, a sputtering chamber 47, and a winding chamber 48. Each chamber was partitioned by a partition wall 49.50, and each chamber was evacuated by exhaust systems 51.52 and 53.34, respectively. .
スパッター室にはカーゼンを有するDCプレーナマグネ
トロン方式のスパッターカソード55,57、及びCo
−Crターゲット(Co 82− Cr 18重量%
)を有するRFプレーナマグネトロン方式のスパッター
カソード56.58を設けた。The sputtering chamber is equipped with DC planar magnetron type sputtering cathodes 55, 57 and Co
-Cr target (Co82-Cr 18% by weight
) was provided with an RF planar magnetron type sputter cathode 56,58.
かかるスパッター装置のス・ぞツタ−室内47をI X
10− torr以下の圧力ま1真空排気した後、
ガス導入系59よシArガスを導入し約5 X 10−
3torrに維持した。送出軸42よp 20 m/−
の搬送速度で送出されたポリイミドフィルム41上に、
まずキャン43の位置でスパッターカソード56に−よ
り片面の面(0面)に約3,000 XのCo−Cr
−膜を形成した。続いてキャン44の位置でスパ
ッターカソード58によりもう一方の面(I面)に約3
.000 XのCo −Cr膜を形成し、巻取軸45で
巻取った。The sputtering chamber 47 of such a sputtering device is
After evacuation to a pressure of 10-torr or less,
Introduce Ar gas through the gas introduction system 59, approximately 5 x 10-
It was maintained at 3 torr. Delivery shaft 42 p 20 m/-
On the polyimide film 41 sent out at a conveyance speed of
First, at the position of the can 43, Co-Cr of about 3,000X is applied to one side (0 side) by the sputter cathode 56.
- Formed a film. Next, at the position of the can 44, the other surface (I surface) is coated with a sputter cathode 58 of about 3
.. A Co-Cr film of 000X was formed and wound up with a winding shaft 45.
このようにして両面にCo −Cr膜を形成したポリイ
ミドフィルムを再び逆転して巻取軸45から搬送し、再
度I X 10 Torr以下に排気した後Arガス
噴出を止め酸素ガスを約5X10 Torrに維持し
、スパッタの極性を切シ換え、キャン43及び44の位
置1酸素雰囲気中を逆スパツタリングを行い、両表面に
酸化処理を施した後巻軸42に巻取った。The polyimide film with the Co-Cr film formed on both sides in this manner is reversed again and conveyed from the take-up shaft 45, and after being evacuated again to below IX10 Torr, the Ar gas blowout is stopped and the oxygen gas is reduced to approximately 5X10 Torr. The polarity of sputtering was then changed, reverse sputtering was performed in an oxygen atmosphere at position 1 of cans 43 and 44, and both surfaces were subjected to oxidation treatment, and then wound onto a winding shaft 42.
次いで、酸素雰囲気をAr雰囲気となしスパッタの極性
をもとにもどし、巻軸42から再度退転し、キャン43
及び44の位置でカーゼンカソード55゜57よシカー
ゼンの保護層を淳さ200X−1’形成し、巻軸45に
巻き堆った。Next, the oxygen atmosphere is changed to an Ar atmosphere, the polarity of the sputter is returned to its original state, and the sputter is retracted from the winding shaft 42 again, and the can 43
At positions 44 and 44, a protective layer of shicasene was formed by cutting the shicasene cathode 55° and 57 degrees to form a 200×-1′ layer, and the protective layer was wound around the winding shaft 45.
このようにして作成した垂直磁気媒体を直径3.5イン
チのディスクにカットし、市販のディスクジャケットに
組み込んだ。The perpendicular magnetic media thus prepared were cut into 3.5 inch diameter disks and assembled into commercially available disk jackets.
市販3.570ツピデイスクドライブにより記録を行っ
た後、600 r、p、m、 T回転させ、再生信号を
モニターしながら走行させ走行が止まるまでのパス数を
測定した。(最大1000万・ぞスでテストを中止した
。)
比較のため上記作成で酸化処理(酸素雰囲気tの逆スパ
ツタリング処理)を行わなかったもの、及びCo −C
r層のみを設けたものを作シ同様なテストを行った。After recording with a commercially available 3.570 disc drive, it was rotated 600 r, p, m, and T, and the disc drive was run while monitoring the reproduction signal, and the number of passes until it stopped running was measured. (The test was stopped at a maximum of 10,000,000 zos.) For comparison, the above preparation without oxidation treatment (reverse sputtering treatment in oxygen atmosphere t) and Co -C
A similar test was conducted using a product with only the r layer.
各々10コの試料を作ってテストした。Ten samples of each were made and tested.
得られた結果を第2図に示した。The results obtained are shown in Figure 2.
第2図の結果からも明かなように、Co−Cr膜のみを
設けた試料は約1o、ooo、−eス以上で走行不能に
なシ、酸化処理を行わずにカーゼ/保護層を設けたもの
は、1万パスから1000万パスまで走行耐久性にばら
つきがあシ、再現性が悪かった。これに対して本発明に
よる場合は何れも約走行パスが1000万・セスに近い
著しく耐久性のすぐれた垂直磁気媒体を再現性良く製造
することができた。As is clear from the results in Figure 2, the sample with only a Co-Cr film cannot run at temperatures above about 1o, ooo, -e, and a case/protective layer is provided without oxidation treatment. However, the running durability varied from 10,000 passes to 10,000,000 passes, and the reproducibility was poor. On the other hand, in the case of the present invention, it was possible to produce perpendicular magnetic media with excellent durability and high reproducibility, each having a travel path of approximately 10 million cess.
上記実施例は逆スパツタリングにより酸化処理を行う場
合を示したが、グロー処理によって酸化処理することが
できる。また酸素の代シに窒素を用いてもほぼ同様の結
果が得られた。Although the above embodiment shows the case where the oxidation treatment is performed by reverse sputtering, the oxidation treatment can be performed by glow treatment. Also, almost the same results were obtained when nitrogen was used instead of oxygen.
また、Co−Cr膜のみでなく、前記した如き軟磁性層
を設けた上にCo−Cr膜を設けてもよい。In addition to the Co--Cr film, a Co--Cr film may be provided on the soft magnetic layer as described above.
第1図は本発明の垂直磁気媒体を製造する装置の一例を
示す概略図、第2図は実施例における走行パステストの
結果を示す図である。
43.44・・・キャン、55.57・・・カーゼンカ
ソード、56 、58−Co−Crカンード。
第 1 図
第 2 図
手続補正書
1.1呵牛の耘
昭和61年特i¥−IJeR12100号2、発明の名
称
垂直磁気記録媒体及びその製造方法
3、補正をする者
事件との関係:特許山崩v5
名称 (520)富士写真フィルム株式会社4、代理人
〒100
住所東京都千代田区霞が関3丁目2番5号霞が関ビル2
9階霞が関ビル内郵便局 私書箱第49号 電話(58
1)−9601((切・ 6.補正により増加する
発明の数: 0(2)明細書の「発明の詳細な説明」の
欄を次のように補正する。
1)IMi書第3頁15行目の「高記録密度jを「高密
度記録」と補正する。
2)同書筒3頁19行目の「1万回」をr100回」と
補正する。
3)同省第6頁20行目の「凝結」を「削れ」と補正す
る。
4)同省第7頁20行目の「硬磁性膜」を「軟磁性膜」
と補正する。
5)同省第8頁1行目の「望ましい。」の後にする。
6)同S第8頁5〜6行目の「磁気異方性・・・・・・
望ましい」を削除する。
7)同書第8頁20行目の「同筒キャンを+」を削除す
る。
8)同豊第9 頁8 行目f) r カーg:y J
(7)後K rMos2.5iOJを挿入する。
9)同書第10頁3〜4行目の「冷却斉れた」を、削除
する。
10)明細書画10頁15行目の「真壁排気した後」の
後に「キャンを150cVC加熱保持し」を挿入する。
11)同書第10頁17行目の「2Q 11111/f
ill! J をr20cm/順」と補正する。
12)同書第12頁14行目のrlo、ooo−ぐス」
を「100−ぞス」と補正する。
第 2 図FIG. 1 is a schematic diagram showing an example of an apparatus for manufacturing a perpendicular magnetic medium of the present invention, and FIG. 2 is a diagram showing the results of a running path test in the example. 43.44... Can, 55.57... Carzen cathode, 56, 58-Co-Cr cand. Figure 1 Figure 2 Amendment to Figure Procedures 1.1 1986 Special IJeR No. 12100 2, Name of invention Perpendicular magnetic recording medium and its manufacturing method 3, Person making the amendment Relationship to the case: Patent Yamazure v5 Name (520) Fuji Photo Film Co., Ltd. 4, Agent 100 Address Kasumigaseki Building 2, 3-2-5 Kasumigaseki, Chiyoda-ku, Tokyo
9th floor Kasumigaseki Building Post Office P.O. Box No. 49 Telephone (58
1) -9601 ((cut) 6. Number of inventions increased by amendment: 0 (2) The "Detailed description of the invention" column of the specification is amended as follows. 1) IMi, page 3, 15 Correct "high recording density j" in line 1 to "high density recording". 2) Correct "10,000 times" in line 19 on page 3 of the same book cylinder to "r100 times". 3) "Condensation" on page 6, line 20 of the same ministry is corrected to "scrape." 4) "Hard magnetic film" on page 7, line 20 of the same ministry is replaced with "soft magnetic film"
and correct it. 5) Place it after "desirable." on page 8, line 1 of the Ministry of Education. 6) "Magnetic anisotropy..." on page 8, lines 5-6 of the same S.
Delete “desirable”. 7) Delete "Dozutsu Can wo +" on page 8, line 20 of the same book. 8) Doho No. 9, page 8, line f) r car g:y J
(7) Insert K rMos2.5iOJ afterwards. 9) Delete the phrase "cooled down" from lines 3 to 4 on page 10 of the same book. 10) On page 10, line 15 of the specification, insert ``heat and hold the can at 150 cVC'' after ``after exhausting Makabe''. 11) “2Q 11111/f” on page 10, line 17 of the same book
ill! Correct J to "r20cm/order". 12) rlo, ooo-gusu, page 12, line 14 of the same book.”
is corrected to "100-zosu". Figure 2
Claims (3)
磁性層と保護層を設けた垂直磁気記録媒体において、該
磁性層の表面に酸化層または窒化層が形成されているこ
とを特徴とする垂直磁気記録媒体。(1) In a perpendicular magnetic recording medium in which a magnetic layer with perpendicular anisotropy and a protective layer are provided on at least one surface of a nonmagnetic substrate, an oxide layer or a nitride layer is formed on the surface of the magnetic layer. Features of perpendicular magnetic recording media.
り垂直磁気異方性を有する磁性層と保護層を設けること
による垂直磁気記録材料の製造方法において、磁性層を
設けた後その表面を酸化または窒化処理し、次いで保護
層を設けることを特徴とする垂直磁気記録媒体の製造方
法。(2) In a method of manufacturing a perpendicular magnetic recording material by providing a magnetic layer having perpendicular magnetic anisotropy and a protective layer on at least one surface of a non-magnetic substrate by sputtering, after providing the magnetic layer, the surface is oxidized or 1. A method for manufacturing a perpendicular magnetic recording medium, which comprises performing a nitriding treatment and then providing a protective layer.
真空槽中で行うことを特徴とする特許請求の範囲第(2
)項に記載の垂直磁気記録媒体の製造方法。(3) Claim (2) characterized in that the formation of the magnetic layer and the formation of the oxide layer or nitride layer are performed in the same vacuum chamber.
) The method for manufacturing a perpendicular magnetic recording medium according to item 1.
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP61012100A JPH0760522B2 (en) | 1986-01-24 | 1986-01-24 | Method of manufacturing perpendicular magnetic recording medium |
US07/506,493 US4994321A (en) | 1986-01-24 | 1990-04-05 | Perpendicular magnetic recording medium and the method for preparing the same |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP61012100A JPH0760522B2 (en) | 1986-01-24 | 1986-01-24 | Method of manufacturing perpendicular magnetic recording medium |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS62175925A true JPS62175925A (en) | 1987-08-01 |
JPH0760522B2 JPH0760522B2 (en) | 1995-06-28 |
Family
ID=11796146
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP61012100A Expired - Fee Related JPH0760522B2 (en) | 1986-01-24 | 1986-01-24 | Method of manufacturing perpendicular magnetic recording medium |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH0760522B2 (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6455703A (en) * | 1987-08-27 | 1989-03-02 | Tdk Corp | Magnetic recording and reproducing device |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6057535A (en) * | 1983-09-08 | 1985-04-03 | Hitachi Maxell Ltd | Magnetic recording medium |
JPS61117728A (en) * | 1984-11-13 | 1986-06-05 | Anelva Corp | Magnetic recording medium |
-
1986
- 1986-01-24 JP JP61012100A patent/JPH0760522B2/en not_active Expired - Fee Related
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6057535A (en) * | 1983-09-08 | 1985-04-03 | Hitachi Maxell Ltd | Magnetic recording medium |
JPS61117728A (en) * | 1984-11-13 | 1986-06-05 | Anelva Corp | Magnetic recording medium |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6455703A (en) * | 1987-08-27 | 1989-03-02 | Tdk Corp | Magnetic recording and reproducing device |
JPH0695363B2 (en) * | 1987-08-27 | 1994-11-24 | ティーディーケイ株式会社 | Magnetic recording / reproducing device |
Also Published As
Publication number | Publication date |
---|---|
JPH0760522B2 (en) | 1995-06-28 |
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