JPS6217483Y2 - - Google Patents
Info
- Publication number
- JPS6217483Y2 JPS6217483Y2 JP5086782U JP5086782U JPS6217483Y2 JP S6217483 Y2 JPS6217483 Y2 JP S6217483Y2 JP 5086782 U JP5086782 U JP 5086782U JP 5086782 U JP5086782 U JP 5086782U JP S6217483 Y2 JPS6217483 Y2 JP S6217483Y2
- Authority
- JP
- Japan
- Prior art keywords
- solution
- container
- lid
- high temperature
- processing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000004381 surface treatment Methods 0.000 claims description 8
- 239000000126 substance Substances 0.000 claims description 6
- 238000001704 evaporation Methods 0.000 claims description 5
- 230000008020 evaporation Effects 0.000 claims description 4
- 239000000243 solution Substances 0.000 description 23
- 238000012545 processing Methods 0.000 description 13
- 238000005530 etching Methods 0.000 description 6
- 238000000034 method Methods 0.000 description 5
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- 238000004140 cleaning Methods 0.000 description 3
- 230000007423 decrease Effects 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 238000007747 plating Methods 0.000 description 3
- 239000000758 substrate Substances 0.000 description 3
- 239000012670 alkaline solution Substances 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 238000005498 polishing Methods 0.000 description 2
- 230000005068 transpiration Effects 0.000 description 2
- 235000012431 wafers Nutrition 0.000 description 2
- 239000003929 acidic solution Substances 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 238000012993 chemical processing Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 239000012212 insulator Substances 0.000 description 1
- 238000005304 joining Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 235000011121 sodium hydroxide Nutrition 0.000 description 1
Landscapes
- Coating With Molten Metal (AREA)
- Cleaning And De-Greasing Of Metallic Materials By Chemical Methods (AREA)
- ing And Chemical Polishing (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP5086782U JPS58151667U (ja) | 1982-04-06 | 1982-04-06 | 高温処理槽 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP5086782U JPS58151667U (ja) | 1982-04-06 | 1982-04-06 | 高温処理槽 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS58151667U JPS58151667U (ja) | 1983-10-11 |
| JPS6217483Y2 true JPS6217483Y2 (enExample) | 1987-05-06 |
Family
ID=30061644
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP5086782U Granted JPS58151667U (ja) | 1982-04-06 | 1982-04-06 | 高温処理槽 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS58151667U (enExample) |
-
1982
- 1982-04-06 JP JP5086782U patent/JPS58151667U/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS58151667U (ja) | 1983-10-11 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JPS6217483Y2 (enExample) | ||
| US5881876A (en) | Method and vessel for storing a substrate cleaning brush | |
| US20220359236A1 (en) | Space filling device for wet bench | |
| CN209113980U (zh) | 蒸镀装置 | |
| JPH0334609Y2 (enExample) | ||
| CN115745058A (zh) | 一种GeSe基太阳能热蒸发海水淡化系统 | |
| CN119265539B (zh) | 用于简化mocvd反应室维护项目的腔体结构 | |
| KR102830020B1 (ko) | 납축전지 화성수조 냉각수 온도를 저감시켜주는 장치 | |
| JPS6233016Y2 (enExample) | ||
| JP3910830B2 (ja) | シリコンウェーハの酸化膜の除去方法及びその装置 | |
| CN220450294U (zh) | 一种用于沉积设备的调温装置 | |
| JP2002124507A (ja) | 化学処理工程用ウエハキャリア及びそれを用いたシリコンウエハの化学処理方法 | |
| JPS62245639A (ja) | ベ−パ乾燥装置 | |
| JPS642439Y2 (enExample) | ||
| JPS6276534U (enExample) | ||
| JPH0351334Y2 (enExample) | ||
| JPS5858278A (ja) | カ−ボンるつぼ | |
| JPH04332468A (ja) | 二次電池用焼結式電極の製造方法 | |
| JPH03238395A (ja) | 核燃料集合体用の収容筒 | |
| JPS6369967A (ja) | 蒸着膜形成装置 | |
| JPS54152862A (en) | Semiconductor producing device | |
| JPS6214674Y2 (enExample) | ||
| JP2503756Y2 (ja) | 蒸着用るつぼ | |
| JP2948791B2 (ja) | 液体貯蔵容器の交換方法 | |
| JPS5934135Y2 (ja) | 蒸着用基板の支持構造 |