JPS62170503U - - Google Patents
Info
- Publication number
- JPS62170503U JPS62170503U JP5744286U JP5744286U JPS62170503U JP S62170503 U JPS62170503 U JP S62170503U JP 5744286 U JP5744286 U JP 5744286U JP 5744286 U JP5744286 U JP 5744286U JP S62170503 U JPS62170503 U JP S62170503U
- Authority
- JP
- Japan
- Prior art keywords
- sample
- reflecting mirror
- moving device
- laser
- detaches
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000005259 measurement Methods 0.000 claims 1
- 238000000609 electron-beam lithography Methods 0.000 description 2
Landscapes
- Electron Sources, Ion Sources (AREA)
- Electron Beam Exposure (AREA)
- Length Measuring Devices By Optical Means (AREA)
Description
第1図は本考案の一実施例の電子線描画装置の
試料台部を示す縦断面図、第2図は他の実施例を
示す電子線描画装置の試料台部を示す平面図であ
る。
2,3,4…試料台、5…カセツト、6…試料
、9…レーザ干渉測長計、11…鏡、12…試料
交換装置。
FIG. 1 is a longitudinal sectional view showing a sample stage of an electron beam lithography apparatus according to an embodiment of the present invention, and FIG. 2 is a plan view showing a sample stage of an electron beam lithography apparatus according to another embodiment of the present invention. 2, 3, 4...sample stand, 5...cassette, 6...sample, 9...laser interferometric length meter, 11...mirror, 12...sample exchange device.
Claims (1)
する試料保持具に、試料台上の試料位置を測定す
るレーザ干渉計測長光の反射鏡を設けたことを特
徴とする試料移動装置。 2 請求の範囲第1項において、レーザー干渉測
長光が、反射鏡上で移動しないように構成したこ
とを特徴とする試料移動装置。[Claims for Utility Model Registration] 1. A sample holder that is integrated with the sample and attaches and detaches the sample onto the sample moving table is provided with a reflecting mirror for a laser interferometer long beam that measures the position of the sample on the sample table. sample moving device. 2. The sample moving device according to claim 1, characterized in that the laser interferometric length measurement light is configured so as not to move on the reflecting mirror.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP5744286U JPS62170503U (en) | 1986-04-18 | 1986-04-18 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP5744286U JPS62170503U (en) | 1986-04-18 | 1986-04-18 |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS62170503U true JPS62170503U (en) | 1987-10-29 |
Family
ID=30887145
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP5744286U Pending JPS62170503U (en) | 1986-04-18 | 1986-04-18 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS62170503U (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2014173885A (en) * | 2013-03-06 | 2014-09-22 | Ebara Corp | Installation structure of length meter |
-
1986
- 1986-04-18 JP JP5744286U patent/JPS62170503U/ja active Pending
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2014173885A (en) * | 2013-03-06 | 2014-09-22 | Ebara Corp | Installation structure of length meter |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JPS62170503U (en) | ||
JPS622250U (en) | ||
JPS63157607U (en) | ||
JPS61104307U (en) | ||
JPS61135212U (en) | ||
JPS6421303U (en) | ||
JPS6419911U (en) | ||
JPS60158653U (en) | Sample equipment for charged particle beam exposure equipment, etc. | |
JPS6427607U (en) | ||
JPS6393503U (en) | ||
JPH01180640U (en) | ||
JPH02137032U (en) | ||
JPH01117611U (en) | ||
JPS63111601U (en) | ||
JPS61146731U (en) | ||
JPS6316445U (en) | ||
JPS623626U (en) | ||
JPH0450801U (en) | ||
JPS61146750U (en) | ||
JPS63148307U (en) | ||
JPS6383645U (en) | ||
JPH01127688U (en) | ||
JPS62182403U (en) | ||
JPS62158351U (en) | ||
JPH0319931U (en) |