JPS60158653U - Sample equipment for charged particle beam exposure equipment, etc. - Google Patents
Sample equipment for charged particle beam exposure equipment, etc.Info
- Publication number
- JPS60158653U JPS60158653U JP4638484U JP4638484U JPS60158653U JP S60158653 U JPS60158653 U JP S60158653U JP 4638484 U JP4638484 U JP 4638484U JP 4638484 U JP4638484 U JP 4638484U JP S60158653 U JPS60158653 U JP S60158653U
- Authority
- JP
- Japan
- Prior art keywords
- sample
- charged particle
- particle beam
- equipment
- beam exposure
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Electron Beam Exposure (AREA)
Abstract
(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.
Description
第１図は従来の試料装置の主要部平面図、第２図は本考
案の一実施例の主要部平面図、第３図は第２図の斜視図
、第４図は本考案の他の実施例を示す平面図である。
１：移動ステージ、３Ｘ、３Ｙ：反射鏡、４Ｘ、４Ｙ：
し二ザ測長器、６：試料、７Ｘ、７Ｙ：断熱部材、８Ｘ
、８Ｙ：押圧体、９Ｘ、９Ｙニスプリング。Fig. 1 is a plan view of the main part of a conventional sample device, Fig. 2 is a plan view of the main part of an embodiment of the present invention, Fig. 3 is a perspective view of Fig. 2, and Fig. 4 is a plan view of the main part of an embodiment of the present invention. FIG. 2 is a plan view showing an example. 1: Moving stage, 3X, 3Y: Reflector, 4X, 4Y:
Shiniza Length Measuring Instrument, 6: Sample, 7X, 7Y: Heat Insulation Member, 8X
, 8Y: Pressing body, 9X, 9Y spring.
Claims (1)
光を照射し、その反射光と固定鏡からの反射光との干渉
を利用して前記試料移動ステージの移動量を正確に測定
し、前記ステージ上の試料の荷電粒子線に対する相対位
置を制御する装置において、前記反射鏡の反射面と反対
側に試料又は試料を保持したホルダの端面を押圧して該
反射鏡と試料又はそのホルダーを一体的に保持するよう
に構成し、前記反射鏡と試料又は試料ホルダの間に低熱
膨張率で低熱伝導率の材料を介在してなる荷電粒子線露
光装置等用試料装置。A reflecting mirror is attached to the sample moving stage, the reflecting mirror is irradiated with a laser beam, and the amount of movement of the sample moving stage is accurately measured by utilizing the interference between the reflected light and the reflected light from the fixed mirror. In a device that controls the relative position of a sample on a stage with respect to a charged particle beam, the reflector and the sample or its holder are integrated by pressing the end face of the sample or a holder holding the sample on the side opposite to the reflecting surface of the reflector. A sample device for a charged particle beam exposure apparatus, etc., which is configured to hold the sample at a fixed angle, and a material having a low thermal expansion coefficient and low thermal conductivity is interposed between the reflecting mirror and the sample or the sample holder.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP4638484U JPS60158653U (en) | 1984-03-30 | 1984-03-30 | Sample equipment for charged particle beam exposure equipment, etc. |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP4638484U JPS60158653U (en) | 1984-03-30 | 1984-03-30 | Sample equipment for charged particle beam exposure equipment, etc. |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS60158653U true JPS60158653U (en) | 1985-10-22 |
Family
ID=30560725
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP4638484U Pending JPS60158653U (en) | 1984-03-30 | 1984-03-30 | Sample equipment for charged particle beam exposure equipment, etc. |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS60158653U (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2000251826A (en) * | 1999-02-25 | 2000-09-14 | Toshiba Corp | Charged particle beam irradiation system |
| JP2017139175A (en) * | 2016-02-05 | 2017-08-10 | 日本電子株式会社 | Sample holder |
-
1984
- 1984-03-30 JP JP4638484U patent/JPS60158653U/en active Pending
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2000251826A (en) * | 1999-02-25 | 2000-09-14 | Toshiba Corp | Charged particle beam irradiation system |
| JP2017139175A (en) * | 2016-02-05 | 2017-08-10 | 日本電子株式会社 | Sample holder |
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