JPS62169458U - - Google Patents
Info
- Publication number
- JPS62169458U JPS62169458U JP5771786U JP5771786U JPS62169458U JP S62169458 U JPS62169458 U JP S62169458U JP 5771786 U JP5771786 U JP 5771786U JP 5771786 U JP5771786 U JP 5771786U JP S62169458 U JPS62169458 U JP S62169458U
- Authority
- JP
- Japan
- Prior art keywords
- view
- field
- photographing
- adjustment
- electron beam
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000010894 electron beam technology Methods 0.000 claims description 5
- 201000009310 astigmatism Diseases 0.000 claims 1
- 238000003384 imaging method Methods 0.000 claims 1
- 238000010586 diagram Methods 0.000 description 6
- 238000000034 method Methods 0.000 description 1
Description
第1図は本考案による電子線偏向装置の一実施
例を示す図、第2図は撮影視野と調整用視野との
位置関係を示す図、第3図は撮影手順を示す図で
、同図Aは視野選択の様子を示す図、同図Bは調
整時の様子を示す図、同図Cは撮影視野に戻した
状態を示す図である。
1……撮影対象視野、2……調整用視野、3…
…走査コイル、4……第1偏向コイル、5……第
2偏向コイル、6……試料、7,8……増幅器、
9……倍率制御器、10……スイツチ、11……
撮影視野の中心ビーム、11′,11″……走査
ビーム、12……調整用視野の中心ビーム、12
′,12″……走査ビーム。
FIG. 1 is a diagram showing an embodiment of the electron beam deflection device according to the present invention, FIG. 2 is a diagram showing the positional relationship between the photographing field of view and the adjustment field of view, and FIG. 3 is a diagram showing the photographing procedure. A is a diagram showing how the field of view is selected, B is a diagram showing a state during adjustment, and C is a diagram showing a state where the field of view is returned to photographing. 1... Field of view to be photographed, 2... Field of view for adjustment, 3...
...Scanning coil, 4...First deflection coil, 5...Second deflection coil, 6...Sample, 7, 8...Amplifier,
9... Magnification controller, 10... Switch, 11...
Center beam of photographing field of view, 11', 11''...Scanning beam, 12...Center beam of adjustment field of view, 12
', 12''...Scanning beam.
Claims (1)
調整用視野で行つた後撮影視野に偏向を戻して撮
影を行うための電子線偏向装置であつて、撮影視
野と調整用視野間の視野移動を、撮影視野と調整
用視野の大きさに応じた距離だけ行うことを特徴
とする電子線偏向装置。 (2) 前記視野選択は低倍率で行うことを特徴と
する実用新案登録請求の範囲第1項記載の電子線
偏向装置。 (3) 前記調整用視野は撮影視野より小さいこと
を特徴とする実用新案登録請求の範囲第1項記載
の電子線偏向装置。[Scope of Claim for Utility Model Registration] (1) An electron beam deflection device for performing imaging by correcting astigmatism and focusing in the adjustment field of view after selecting the field of view, and then returning the deflection to the field of view for photographing, An electron beam deflection device characterized in that the field of view is moved between a photographing field of view and an adjustment field of view by a distance corresponding to the size of the photographing field of view and the adjustment field of view. (2) The electron beam deflection device according to claim 1, wherein the field of view selection is performed at a low magnification. (3) The electron beam deflection device according to claim 1, wherein the field of view for adjustment is smaller than the field of view for photographing.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP5771786U JPS62169458U (en) | 1986-04-17 | 1986-04-17 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP5771786U JPS62169458U (en) | 1986-04-17 | 1986-04-17 |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS62169458U true JPS62169458U (en) | 1987-10-27 |
Family
ID=30887672
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP5771786U Pending JPS62169458U (en) | 1986-04-17 | 1986-04-17 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS62169458U (en) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH02139845A (en) * | 1988-11-18 | 1990-05-29 | Nippon Telegr & Teleph Corp <Ntt> | Focusing method |
JP2002134048A (en) * | 2000-10-27 | 2002-05-10 | Hitachi Ltd | Charged particle ray apparatus |
JP2003203594A (en) * | 2001-12-28 | 2003-07-18 | Hitachi High-Technologies Corp | Charged corpuscular beam device and sample image observing method |
JP2010244740A (en) * | 2009-04-02 | 2010-10-28 | Hitachi High-Technologies Corp | Review device and review method |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5727548A (en) * | 1980-07-25 | 1982-02-13 | Hitachi Ltd | Scanning type electron microscope |
-
1986
- 1986-04-17 JP JP5771786U patent/JPS62169458U/ja active Pending
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5727548A (en) * | 1980-07-25 | 1982-02-13 | Hitachi Ltd | Scanning type electron microscope |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH02139845A (en) * | 1988-11-18 | 1990-05-29 | Nippon Telegr & Teleph Corp <Ntt> | Focusing method |
JP2002134048A (en) * | 2000-10-27 | 2002-05-10 | Hitachi Ltd | Charged particle ray apparatus |
JP2003203594A (en) * | 2001-12-28 | 2003-07-18 | Hitachi High-Technologies Corp | Charged corpuscular beam device and sample image observing method |
JP2010244740A (en) * | 2009-04-02 | 2010-10-28 | Hitachi High-Technologies Corp | Review device and review method |
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