JPS62166626U - - Google Patents
Info
- Publication number
- JPS62166626U JPS62166626U JP5360686U JP5360686U JPS62166626U JP S62166626 U JPS62166626 U JP S62166626U JP 5360686 U JP5360686 U JP 5360686U JP 5360686 U JP5360686 U JP 5360686U JP S62166626 U JPS62166626 U JP S62166626U
- Authority
- JP
- Japan
- Prior art keywords
- electrode
- cooling mechanism
- flow path
- refrigerant
- perforation
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000003507 refrigerant Substances 0.000 claims description 9
- 239000000758 substrate Substances 0.000 claims description 4
- 230000037431 insertion Effects 0.000 claims description 2
- 238000003780 insertion Methods 0.000 claims description 2
- 238000001816 cooling Methods 0.000 claims 8
- 239000002826 coolant Substances 0.000 claims 1
- 239000004065 semiconductor Substances 0.000 claims 1
- 238000010586 diagram Methods 0.000 description 5
- 238000001312 dry etching Methods 0.000 description 1
- 239000011148 porous material Substances 0.000 description 1
Landscapes
- Drying Of Semiconductors (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1986053606U JPH066505Y2 (ja) | 1986-04-11 | 1986-04-11 | 電極の冷却機構 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1986053606U JPH066505Y2 (ja) | 1986-04-11 | 1986-04-11 | 電極の冷却機構 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS62166626U true JPS62166626U (US20100268047A1-20101021-C00003.png) | 1987-10-22 |
JPH066505Y2 JPH066505Y2 (ja) | 1994-02-16 |
Family
ID=30879829
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP1986053606U Expired - Lifetime JPH066505Y2 (ja) | 1986-04-11 | 1986-04-11 | 電極の冷却機構 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH066505Y2 (US20100268047A1-20101021-C00003.png) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0794495A (ja) * | 1993-05-14 | 1995-04-07 | Hughes Aircraft Co | プラズマ補助化学的エッチング処理に使用される電極 |
JP2003503838A (ja) * | 1999-06-30 | 2003-01-28 | ラム リサーチ コーポレーション | 温度均一性が改良されたプラズマ反応チャンバ構成部品 |
JP2008117533A (ja) * | 2006-10-31 | 2008-05-22 | Kyocera Corp | プラズマ発生体、反応装置及び光源装置 |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6014439A (ja) * | 1983-07-04 | 1985-01-25 | Hitachi Ltd | ウエハ回転式半導体製造装置 |
-
1986
- 1986-04-11 JP JP1986053606U patent/JPH066505Y2/ja not_active Expired - Lifetime
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6014439A (ja) * | 1983-07-04 | 1985-01-25 | Hitachi Ltd | ウエハ回転式半導体製造装置 |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0794495A (ja) * | 1993-05-14 | 1995-04-07 | Hughes Aircraft Co | プラズマ補助化学的エッチング処理に使用される電極 |
JP2003503838A (ja) * | 1999-06-30 | 2003-01-28 | ラム リサーチ コーポレーション | 温度均一性が改良されたプラズマ反応チャンバ構成部品 |
JP2008117533A (ja) * | 2006-10-31 | 2008-05-22 | Kyocera Corp | プラズマ発生体、反応装置及び光源装置 |
Also Published As
Publication number | Publication date |
---|---|
JPH066505Y2 (ja) | 1994-02-16 |