JPS62165917A - 露光装置 - Google Patents

露光装置

Info

Publication number
JPS62165917A
JPS62165917A JP61008228A JP822886A JPS62165917A JP S62165917 A JPS62165917 A JP S62165917A JP 61008228 A JP61008228 A JP 61008228A JP 822886 A JP822886 A JP 822886A JP S62165917 A JPS62165917 A JP S62165917A
Authority
JP
Japan
Prior art keywords
alignment
wafer
reticle
image
beam splitter
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP61008228A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0340497B2 (enrdf_load_html_response
Inventor
Masaru Sasako
勝 笹子
Masataka Endo
政孝 遠藤
Kazufumi Ogawa
一文 小川
Takeshi Ishihara
健 石原
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP61008228A priority Critical patent/JPS62165917A/ja
Priority to US07/004,133 priority patent/US4724466A/en
Publication of JPS62165917A publication Critical patent/JPS62165917A/ja
Priority to US07/104,041 priority patent/US4805000A/en
Publication of JPH0340497B2 publication Critical patent/JPH0340497B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7088—Alignment mark detection, e.g. TTR, TTL, off-axis detection, array detector, video detection

Landscapes

  • Engineering & Computer Science (AREA)
  • Multimedia (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP61008228A 1986-01-17 1986-01-17 露光装置 Granted JPS62165917A (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP61008228A JPS62165917A (ja) 1986-01-17 1986-01-17 露光装置
US07/004,133 US4724466A (en) 1986-01-17 1987-01-16 Exposure apparatus
US07/104,041 US4805000A (en) 1986-01-17 1987-10-02 Exposure apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP61008228A JPS62165917A (ja) 1986-01-17 1986-01-17 露光装置

Publications (2)

Publication Number Publication Date
JPS62165917A true JPS62165917A (ja) 1987-07-22
JPH0340497B2 JPH0340497B2 (enrdf_load_html_response) 1991-06-19

Family

ID=11687300

Family Applications (1)

Application Number Title Priority Date Filing Date
JP61008228A Granted JPS62165917A (ja) 1986-01-17 1986-01-17 露光装置

Country Status (1)

Country Link
JP (1) JPS62165917A (enrdf_load_html_response)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH08323517A (ja) * 1995-05-26 1996-12-10 Tetsuo Tagami 切削工具用チャック装置

Also Published As

Publication number Publication date
JPH0340497B2 (enrdf_load_html_response) 1991-06-19

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