JPS6215407A - 結晶膜厚測定法 - Google Patents
結晶膜厚測定法Info
- Publication number
- JPS6215407A JPS6215407A JP15450485A JP15450485A JPS6215407A JP S6215407 A JPS6215407 A JP S6215407A JP 15450485 A JP15450485 A JP 15450485A JP 15450485 A JP15450485 A JP 15450485A JP S6215407 A JPS6215407 A JP S6215407A
- Authority
- JP
- Japan
- Prior art keywords
- electron beam
- crystal
- growth
- film thickness
- intensity
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000013078 crystal Substances 0.000 title claims abstract description 35
- 238000000034 method Methods 0.000 title claims abstract description 22
- 238000010894 electron beam technology Methods 0.000 claims abstract description 38
- 239000000758 substrate Substances 0.000 claims abstract description 27
- 239000010408 film Substances 0.000 claims abstract description 25
- 239000010409 thin film Substances 0.000 claims abstract description 11
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims abstract 9
- 229910052710 silicon Inorganic materials 0.000 claims abstract 9
- 239000010703 silicon Substances 0.000 claims abstract 9
- 238000000691 measurement method Methods 0.000 claims description 3
- 239000010410 layer Substances 0.000 description 26
- 238000002003 electron diffraction Methods 0.000 description 11
- 230000010355 oscillation Effects 0.000 description 9
- 239000004065 semiconductor Substances 0.000 description 6
- 229910001218 Gallium arsenide Inorganic materials 0.000 description 5
- 238000000137 annealing Methods 0.000 description 3
- 238000010586 diagram Methods 0.000 description 3
- 238000000407 epitaxy Methods 0.000 description 3
- 230000008020 evaporation Effects 0.000 description 3
- 238000001704 evaporation Methods 0.000 description 3
- 238000005259 measurement Methods 0.000 description 3
- 239000002052 molecular layer Substances 0.000 description 3
- 238000002109 crystal growth method Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000001451 molecular beam epitaxy Methods 0.000 description 2
- 150000001875 compounds Chemical class 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 238000002050 diffraction method Methods 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 238000011065 in-situ storage Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 230000000737 periodic effect Effects 0.000 description 1
- 239000002356 single layer Substances 0.000 description 1
- 230000002123 temporal effect Effects 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
Landscapes
- Length-Measuring Devices Using Wave Or Particle Radiation (AREA)
- Analysing Materials By The Use Of Radiation (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP15450485A JPS6215407A (ja) | 1985-07-13 | 1985-07-13 | 結晶膜厚測定法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP15450485A JPS6215407A (ja) | 1985-07-13 | 1985-07-13 | 結晶膜厚測定法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6215407A true JPS6215407A (ja) | 1987-01-23 |
| JPH0446363B2 JPH0446363B2 (https=) | 1992-07-29 |
Family
ID=15585686
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP15450485A Granted JPS6215407A (ja) | 1985-07-13 | 1985-07-13 | 結晶膜厚測定法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6215407A (https=) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0733122A (ja) * | 1990-10-13 | 1995-02-03 | Fmc Corp | 滅菌装置 |
-
1985
- 1985-07-13 JP JP15450485A patent/JPS6215407A/ja active Granted
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0733122A (ja) * | 1990-10-13 | 1995-02-03 | Fmc Corp | 滅菌装置 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0446363B2 (https=) | 1992-07-29 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| EXPY | Cancellation because of completion of term |