JPS6214723U - - Google Patents
Info
- Publication number
- JPS6214723U JPS6214723U JP10621585U JP10621585U JPS6214723U JP S6214723 U JPS6214723 U JP S6214723U JP 10621585 U JP10621585 U JP 10621585U JP 10621585 U JP10621585 U JP 10621585U JP S6214723 U JPS6214723 U JP S6214723U
- Authority
- JP
- Japan
- Prior art keywords
- semiconductor wafers
- core tube
- furnace core
- furnace
- tube
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000004065 semiconductor Substances 0.000 claims description 9
- 235000012431 wafers Nutrition 0.000 claims description 7
- 238000010438 heat treatment Methods 0.000 claims description 2
- 238000004519 manufacturing process Methods 0.000 claims description 2
- 238000009792 diffusion process Methods 0.000 description 2
Landscapes
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
Description
第１図は本考案に係る半導体製造装置の一実施
例を示す正面図、第２図は第１図の装置における
半導体ウエーハの搬出入状態を示す正断面図、第
３図は第１図の装置における半導体ウエーハの熱
処理状態を示す正断面図である。第４図は本考案
の前提となる横型拡散炉の具体例を示す正断面図
、第５図はボート上の半導体ウエーハを示す正面
図、第６図は本考案の前提となる縦型拡散炉の具
体例を示す正断面図である。
１６……炉心管、２５……半導体ウエーハ。
FIG. 1 is a front view showing an embodiment of a semiconductor manufacturing apparatus according to the present invention, FIG. 2 is a front cross-sectional view showing the loading/unloading state of semiconductor wafers in the apparatus shown in FIG. 1, and FIG. FIG. 3 is a front cross-sectional view showing a state of heat treatment of a semiconductor wafer in the apparatus. Figure 4 is a front sectional view showing a specific example of a horizontal diffusion furnace that is the premise of the present invention, Figure 5 is a front view showing semiconductor wafers on a boat, and Figure 6 is a vertical diffusion furnace that is the premise of the present invention. It is a front sectional view showing a specific example. 16... Furnace tube, 25... Semiconductor wafer.
Claims (1)
る長尺な略筒状の炉心管を、垂直面内で回動自在
に支承し、上記半導体ウエーハの炉心管への搬入
・搬出時に炉心管を水平状態に配置し、半導体ウ
エーハの熱処理時に炉心管を直立状態に配置する
ようにしたことを特徴とする半導体製造装置。 A long, substantially cylindrical furnace core tube for storing and heat-treating a plurality of semiconductor wafers in an array is supported rotatably in a vertical plane, and the furnace core tube is kept in a horizontal state when the semiconductor wafers are carried into and out of the furnace core tube. 1. A semiconductor manufacturing apparatus characterized in that the furnace tube is arranged in an upright state during heat treatment of semiconductor wafers.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10621585U JPH0143857Y2 (en) | 1985-07-10 | 1985-07-10 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10621585U JPH0143857Y2 (en) | 1985-07-10 | 1985-07-10 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6214723U true JPS6214723U (en) | 1987-01-29 |
| JPH0143857Y2 JPH0143857Y2 (en) | 1989-12-19 |
Family
ID=30981365
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP10621585U Expired JPH0143857Y2 (en) | 1985-07-10 | 1985-07-10 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0143857Y2 (en) |
-
1985
- 1985-07-10 JP JP10621585U patent/JPH0143857Y2/ja not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0143857Y2 (en) | 1989-12-19 |