JPS62144742A - 真空処理装置 - Google Patents

真空処理装置

Info

Publication number
JPS62144742A
JPS62144742A JP28734285A JP28734285A JPS62144742A JP S62144742 A JPS62144742 A JP S62144742A JP 28734285 A JP28734285 A JP 28734285A JP 28734285 A JP28734285 A JP 28734285A JP S62144742 A JPS62144742 A JP S62144742A
Authority
JP
Japan
Prior art keywords
etching chamber
vacuum processing
vacuum
valve
etching
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP28734285A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0480733B2 (enExample
Inventor
Yoshikazu Maegaki
嘉一 前垣
Osamu Watanabe
修 渡辺
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tokuda Seisakusho Co Ltd
Original Assignee
Tokuda Seisakusho Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokuda Seisakusho Co Ltd filed Critical Tokuda Seisakusho Co Ltd
Priority to JP28734285A priority Critical patent/JPS62144742A/ja
Publication of JPS62144742A publication Critical patent/JPS62144742A/ja
Publication of JPH0480733B2 publication Critical patent/JPH0480733B2/ja
Granted legal-status Critical Current

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J3/00—Processes of utilising sub-atmospheric or super-atmospheric pressure to effect chemical or physical change of matter; Apparatus therefor
    • B01J3/006—Processes utilising sub-atmospheric pressure; Apparatus therefor

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Drying Of Semiconductors (AREA)
  • ing And Chemical Polishing (AREA)
JP28734285A 1985-12-20 1985-12-20 真空処理装置 Granted JPS62144742A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP28734285A JPS62144742A (ja) 1985-12-20 1985-12-20 真空処理装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP28734285A JPS62144742A (ja) 1985-12-20 1985-12-20 真空処理装置

Publications (2)

Publication Number Publication Date
JPS62144742A true JPS62144742A (ja) 1987-06-27
JPH0480733B2 JPH0480733B2 (enExample) 1992-12-21

Family

ID=17716129

Family Applications (1)

Application Number Title Priority Date Filing Date
JP28734285A Granted JPS62144742A (ja) 1985-12-20 1985-12-20 真空処理装置

Country Status (1)

Country Link
JP (1) JPS62144742A (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04313038A (ja) * 1991-04-08 1992-11-05 Mitsubishi Electric Corp ガス漏れ量検出装置

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04313038A (ja) * 1991-04-08 1992-11-05 Mitsubishi Electric Corp ガス漏れ量検出装置

Also Published As

Publication number Publication date
JPH0480733B2 (enExample) 1992-12-21

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Legal Events

Date Code Title Description
EXPY Cancellation because of completion of term